JPS61176618A - Production of resin for molding material of optical disk substrate - Google Patents

Production of resin for molding material of optical disk substrate

Info

Publication number
JPS61176618A
JPS61176618A JP60016607A JP1660785A JPS61176618A JP S61176618 A JPS61176618 A JP S61176618A JP 60016607 A JP60016607 A JP 60016607A JP 1660785 A JP1660785 A JP 1660785A JP S61176618 A JPS61176618 A JP S61176618A
Authority
JP
Japan
Prior art keywords
resin
disk substrate
molding material
parts
optical disk
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP60016607A
Other languages
Japanese (ja)
Inventor
Mitsutoshi Aritomi
有富 充利
Tadao Takeyama
武山 忠夫
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Petrochemical Co Ltd
Original Assignee
Mitsubishi Petrochemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Petrochemical Co Ltd filed Critical Mitsubishi Petrochemical Co Ltd
Priority to JP60016607A priority Critical patent/JPS61176618A/en
Publication of JPS61176618A publication Critical patent/JPS61176618A/en
Pending legal-status Critical Current

Links

Landscapes

  • Optical Record Carriers And Manufacture Thereof (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)

Abstract

PURPOSE:To obtain the titled resin having high heat resistance, high hardness and low water absorption, by radically polymerizing an acrylic compound having a specific structural formula. CONSTITUTION:Preferably 0.01-0.1pts.wt. radical initiator, e.g. benzoyl peroxide, is added to a compound expressed by the formula (R is H or CH3), e.g. 1,4-bis(methacryloyloxymethyl)cyclohexane, and reacted therewith at 10-150 deg.C preferably in the air to give the aimed resin having generally >=85% light transmittance, <=1X10<-5> birefringence, >=200 deg.C heat resistance and >=2H pencil hardness.

Description

【発明の詳細な説明】 (産業上の利用分野) 本発明は、光で読みだしを行う方式のディスク(ビデオ
ディスク、メモリーディスク、デジタルオーディオディ
スク等)の基板成形材料用樹脂の製造方法に関する。
DETAILED DESCRIPTION OF THE INVENTION (Field of Industrial Application) The present invention relates to a method for producing a resin for a substrate molding material for optically readable discs (video discs, memory discs, digital audio discs, etc.).

(従来技術) 光ディスクは、記録密度が著しく高く、又、それから再
生される画質、音質が優れることなど多くの特徴を有す
ることから、画像や音声の記録再生、多量の情報の記憶
再生等に広く実用されることが期待されている。
(Prior art) Optical discs have many characteristics such as extremely high recording density and excellent image and sound quality reproduced from them, so they are widely used for recording and reproducing images and audio, storing and reproducing large amounts of information, etc. It is hoped that this will be put into practical use.

メモリーディスクを例にとると、光デイスク基板材料と
しては、無機ガラス、ポリメチルメタアクリレート樹脂
が実用されている。しかし、ディスク材料としての無機
ガラスの場合、透湿性がないために記録層への悪影響は
少ないが、重量が重く、割れやすい。又、ガラスの精密
加工が高価である等の欠点がある。一方、ポリメチルメ
タアクリレート樹脂の場合、ガラスに比べて割れにくい
及び価格が安い等の長所があるが、傷がつき易いことか
ら光学的安定性に欠ける。また、耐熱性が低い、及び吸
湿性が高いことによシディスクがそりやすく、そのそり
のために記録再生光学系における絞り込みレンズの焦点
が合わなくなり、誤動作が起こるという致命的欠陥を有
しており、かかる欠点の改良が強く望まれている。
Taking memory disks as an example, inorganic glass and polymethyl methacrylate resin are practically used as optical disk substrate materials. However, when inorganic glass is used as a disc material, it has no moisture permeability, so although it has little negative effect on the recording layer, it is heavy and easily broken. Further, there are drawbacks such as the high precision processing of the glass. On the other hand, polymethyl methacrylate resin has advantages such as being less likely to break and being cheaper than glass, but it is easily scratched and lacks optical stability. In addition, due to its low heat resistance and high moisture absorption, the disc is prone to warping, which causes the aperture lens in the recording and reproducing optical system to become out of focus, resulting in a fatal flaw, causing malfunction. Therefore, it is strongly desired to improve these drawbacks.

(発明が解決しようとする問題点) 本発明は、前記した状況に鑑み、高耐熱性、高硬度、低
吸水性を有するディスク成形材料を提供することにある
(Problems to be Solved by the Invention) In view of the above-described circumstances, the present invention is to provide a disk molding material having high heat resistance, high hardness, and low water absorption.

(問題点を解決する具体的手段) 本発明は一般式(1) 〔式中、RはHまたは山である。〕 で表わされる化合物をラジカル重合することを特徴とす
る光デイスク基板成形材料用樹脂の製造方法を提供する
ものである。
(Specific means for solving the problems) The present invention is based on the general formula (1) [wherein R is H or a mountain]. ] Provided is a method for producing a resin for optical disk substrate molding material, which is characterized by radically polymerizing a compound represented by the following.

光デイスク基板用樹脂は前記一般式(Dで表わされるア
クリル系化合物を、一般的に用いられるラジカル重合法
と同様にして硬化させることにより得ることができる。
The resin for optical disk substrates can be obtained by curing the acrylic compound represented by the general formula (D) in the same manner as the commonly used radical polymerization method.

例えば、このアクリル系化合物に有機過酸化物、アゾ化
合物等のラジカル開始剤を配合し、加熱硬化する方法及
び光増感剤を配合し、紫外線、電子線、放射線等を照射
し硬化する方法等によりラジカル重合することができる
For example, methods include adding a radical initiator such as an organic peroxide or an azo compound to the acrylic compound and curing it by heating, or adding a photosensitizer and curing it by irradiating it with ultraviolet rays, electron beams, radiation, etc. Radical polymerization can be carried out by

又、その際に使用されるラジカル開始剤は特に限定され
ず、例えば過酸化ベンゾイル、ジイソプロピルパーオキ
サイド、ターシャリープチルノく−オキシピバレート、
ラウロイルパーオキサイド等有機過酸化物、アゾイソブ
チロニトリル等アゾ化合物;ベンゾフェノン、ベンゾイ
ンエチルエーテル、ベンジル、アセトフェノン、アント
ラキノン等光増感剤、ジフェニルスルフイツト、チオカ
ーバメート等硫黄化合物などラジカル開始剤が使用でき
る。ラジカル開始剤の使用量は前記一般式で表わされる
アクリル系化合物100部に対して0.01〜20部、
更に好ましくは0.01〜10部の範囲である。
Further, the radical initiator used at that time is not particularly limited, and examples include benzoyl peroxide, diisopropyl peroxide, tert-butyloxypivalate,
Organic peroxides such as lauroyl peroxide, azo compounds such as azoisobutyronitrile; photosensitizers such as benzophenone, benzoin ethyl ether, benzyl, acetophenone, and anthraquinone; radical initiators such as sulfur compounds such as diphenyl sulfite and thiocarbamate. Can be used. The amount of the radical initiator used is 0.01 to 20 parts per 100 parts of the acrylic compound represented by the above general formula,
More preferably, it is in the range of 0.01 to 10 parts.

更に、前記一般式(I)で表わされるアクリル系化合物
に加えて、公知のディスク成形材料として用いられるラ
ジカル重合性モノマー、具体的にはジエチレングリコー
ルビスアリルカーボネート、シフ1Jルフタレート、4
.4’−ビス(β−メタアクロイルエトキシ)ジフェニ
ルプロパン等を本発明の優れた特性を低下させない範囲
で併用することも可能である。
Furthermore, in addition to the acrylic compound represented by the general formula (I), radically polymerizable monomers used as known disc molding materials, specifically diethylene glycol bisallyl carbonate, Schiff 1J ruphthalate, 4
.. It is also possible to use 4'-bis(β-methacroylethoxy)diphenylpropane or the like in combination without deteriorating the excellent properties of the present invention.

本発明のラジカル重合反応は、大気中、10〜150℃
の温度で行うのが好ましい。
The radical polymerization reaction of the present invention is carried out at 10 to 150°C in the atmosphere.
It is preferable to carry out the reaction at a temperature of .

このようにして得た樹脂は、光透過率が85%以上で、
複屈折率がI X 10”−5以下、200℃以上の耐
熱性、鉛筆硬度が2部以上のものである。
The resin thus obtained has a light transmittance of 85% or more,
It has a birefringence index of I x 10''-5 or less, a heat resistance of 200° C. or more, and a pencil hardness of 2 parts or more.

以下、実施例を示す。なお、例中の部は重量部、%は重
量基準である。
Examples are shown below. In addition, parts in the examples are parts by weight, and percentages are based on weight.

又、実施例において得られる諸物性は下記の試験法によ
り測定した。
In addition, various physical properties obtained in the examples were measured by the following test methods.

(1)光透過率二分光光度計にてs o o nmの光
透過率を測定。
(1) Light transmittance Measure the light transmittance at so nm using a two-spectrophotometer.

(2)複屈折率:偏光顕微鏡にて測定。(2) Birefringence: Measured using a polarizing microscope.

(3)耐熱性: ASTM−D−648に従い熱変形試
験装置にて測定。
(3) Heat resistance: Measured using a heat deformation tester according to ASTM-D-648.

(4)硬  度:JIS−に−6911に従い鉛筆硬度
試験機にて測定。
(4) Hardness: Measured using a pencil hardness tester according to JIS-6911.

(5)吸水率: JI S−に−6911に従い測定。(5) Water absorption rate: Measured according to JI S-6911.

実施例1 1.4−ビス(メタクロイルオキシメチル)シクロヘキ
サン100部に対して、ベンゾイルパーオキサイド0.
5部加え、60℃に加熱し、均一に攪拌混合した後、脱
泡し、この液を直径12(1mのガラス板とシリコーン
ゴムのスペーサーで構成された鋳型の中へ注入し、60
℃で24時間、80℃で2時間、100℃で2時間保持
して重合を行なった。
Example 1 0.0 parts of benzoyl peroxide was added to 100 parts of 1.4-bis(methacroyloxymethyl)cyclohexane.
After adding 5 parts and heating to 60°C, stirring and mixing uniformly, defoaming, pouring this liquid into a mold consisting of a glass plate with a diameter of 12 (1 m) and a silicone rubber spacer,
Polymerization was carried out by holding at 100°C for 24 hours, 80°C for 2 hours, and 100°C for 2 hours.

鋳型より硬化物を取り出して直径120■のディスク基
板を得た。そのディスク基板の諸物性の評価結果を表−
1に示す。また、硬化物の赤外線吸収スペクトル図を第
1図に示す。
The cured product was taken out from the mold to obtain a disk substrate with a diameter of 120 cm. The evaluation results of various physical properties of the disk substrate are shown below.
Shown in 1. Furthermore, an infrared absorption spectrum diagram of the cured product is shown in FIG.

実施例2 1.4−ビス(アクロイルオキシメチル)シクロヘキサ
ン100部に対して、ベンゾインエチルエーテル3部加
え、60℃に加熱し均一に攪拌混合した後、脱泡し、こ
の液をガラス板とシリコーンゴムのスペーサーで構成さ
れた鋳型の中へ注入し、出力80 W / cmの高圧
水銀灯で1分間紫外線を照射し、重合を行なった。
Example 2 3 parts of benzoin ethyl ether was added to 100 parts of 1.4-bis(acroyloxymethyl)cyclohexane, heated to 60°C, stirred and mixed uniformly, defoamed, and poured the liquid onto a glass plate. The mixture was poured into a mold made of a silicone rubber spacer and irradiated with ultraviolet rays for 1 minute using a high-pressure mercury lamp with an output of 80 W/cm to perform polymerization.

鋳型より硬化物を取り出し、直径120fiのディスク
基板を得た。そのディスク基板の諸物性評価結果を表−
1に示す。
The cured product was taken out from the mold to obtain a disk substrate with a diameter of 120fi. The results of evaluating the physical properties of the disk substrate are shown below.
Shown in 1.

比較例1 実施例1の1.4−ビス(メタクロイルオキシメチル)
シクロヘキサンの代りにメチルメタアクリレート100
部とベンゾイルパーオキサイド0.5部用いて、実施例
1と同様の手法により直径120嘗のディスク基板を得
た。そのディスク基板の諸物性評価結果を表−1に示し
た。
Comparative Example 1 1,4-bis(methacroyloxymethyl) of Example 1
Methyl methacrylate 100 instead of cyclohexane
A disk substrate having a diameter of 120 mm was obtained in the same manner as in Example 1 using 0.5 parts of benzoyl peroxide and 0.5 parts of benzoyl peroxide. Table 1 shows the evaluation results of various physical properties of the disk substrate.

比較例2 比較例1のメチルメタアクリレートの代りに4゜4′−
ビス(β−メタアクロイルオキシエトキシ)ジフェニル
プロパン100部とベンゾイルパーオキサイド0.5部
用いて、実施例1と同様の手法により直径120mmの
ディスク基板を得た。そのディスク基板の諸物性評価結
果を表−1に示した。
Comparative Example 2 Instead of methyl methacrylate in Comparative Example 1, 4゜4'-
A disk substrate having a diameter of 120 mm was obtained in the same manner as in Example 1 using 100 parts of bis(β-methacroyloxyethoxy)diphenylpropane and 0.5 parts of benzoyl peroxide. Table 1 shows the evaluation results of various physical properties of the disk substrate.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は実施例1で得た硬化物の赤外線吸収スペクトル
図である。
FIG. 1 is an infrared absorption spectrum diagram of the cured product obtained in Example 1.

Claims (1)

【特許請求の範囲】 一般式 ▲数式、化学式、表等があります▼ 〔式中、RはHまたはCH_3である。〕 で表わされる化合物をラジカル重合することを特徴とす
る光ディスク基板成形材料用樹脂の製造方法。
[Claims] General formula ▲ Numerical formula, chemical formula, table, etc. ▼ [In the formula, R is H or CH_3. ] A method for producing a resin for optical disc substrate molding material, which comprises radically polymerizing a compound represented by:
JP60016607A 1985-02-01 1985-02-01 Production of resin for molding material of optical disk substrate Pending JPS61176618A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP60016607A JPS61176618A (en) 1985-02-01 1985-02-01 Production of resin for molding material of optical disk substrate

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP60016607A JPS61176618A (en) 1985-02-01 1985-02-01 Production of resin for molding material of optical disk substrate

Publications (1)

Publication Number Publication Date
JPS61176618A true JPS61176618A (en) 1986-08-08

Family

ID=11920989

Family Applications (1)

Application Number Title Priority Date Filing Date
JP60016607A Pending JPS61176618A (en) 1985-02-01 1985-02-01 Production of resin for molding material of optical disk substrate

Country Status (1)

Country Link
JP (1) JPS61176618A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2014159428A (en) * 2006-11-24 2014-09-04 Merck Patent Gmbh Cyclohexylene reactive mesogens and their applications

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2014159428A (en) * 2006-11-24 2014-09-04 Merck Patent Gmbh Cyclohexylene reactive mesogens and their applications

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