JPS61174208A - Production of resin for molding optical disc - Google Patents

Production of resin for molding optical disc

Info

Publication number
JPS61174208A
JPS61174208A JP60012686A JP1268685A JPS61174208A JP S61174208 A JPS61174208 A JP S61174208A JP 60012686 A JP60012686 A JP 60012686A JP 1268685 A JP1268685 A JP 1268685A JP S61174208 A JPS61174208 A JP S61174208A
Authority
JP
Japan
Prior art keywords
formula
resin
radical
optical disc
compound
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP60012686A
Other languages
Japanese (ja)
Inventor
Mitsutoshi Aritomi
有富 充利
Tadao Takeyama
武山 忠夫
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Petrochemical Co Ltd
Original Assignee
Mitsubishi Petrochemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Petrochemical Co Ltd filed Critical Mitsubishi Petrochemical Co Ltd
Priority to JP60012686A priority Critical patent/JPS61174208A/en
Publication of JPS61174208A publication Critical patent/JPS61174208A/en
Pending legal-status Critical Current

Links

Landscapes

  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Optical Record Carriers And Manufacture Thereof (AREA)

Abstract

PURPOSE:To produce a resin for molding an optical disc enhanced in heat resistance and hardness and decreased in water absorptivity, by radical- polymerizing a specified acrylic compound. CONSTITUTION:A compound of the formula (wherein R is H or CH3) is subjected to radical polymerization carried out either by adding a radical initiator such as an organic peroxide or an azo compound to an acrylic compound of the formula and curing the mixture by heating, or by adding a photosensitizer thereto and curing the mixture by irradiation with ultraviolet rays, electron beams, radiations or the like. Examples of said radical initiators include benzoyl peroxide and azobisisobutyronitrile, which is used preferably in an amount of 0.01-10pts.wt. per 100pts.wt. acrylic compound of the formula.

Description

【発明の詳細な説明】 (産業上の利用分野) 本発明は、光で読みだしを行う方式のディスク(ビデオ
ディスク、メモリーディスク、デジタルオーディオディ
スク等)の成形材料用樹脂の製造方法に関する。
DETAILED DESCRIPTION OF THE INVENTION (Field of Industrial Application) The present invention relates to a method for producing a resin for a molding material for optically readable discs (video discs, memory discs, digital audio discs, etc.).

(従来技術) 光ディスクは、記録密度が著しく高く、又、それから再
生される画質、音質が優れることなど多くの特徴を有す
ることから、画像や音声の記録再生、多量の情報の記憶
再生等に広く実用されることが期待されている。
(Prior art) Optical discs have many characteristics such as extremely high recording density and excellent image and sound quality reproduced from them, so they are widely used for recording and reproducing images and audio, storing and reproducing large amounts of information, etc. It is hoped that this will be put into practical use.

メモリーディスクを例にとると、ディスク材料としては
、無機ガラス、ポリメチルメタアクリレート樹脂が実用
されている。しかし、ディスク材料としての無機ガラス
の場合、透湿性がないために記録層への悪影響は少ない
が、重量が重く、割れやすい。又、ガラスの精密加工が
高価である等の欠点がある。一方、ポリメチルメタアク
リレート樹脂の場合、ガラスに比べて割れにくい及び価
格が安い等の長所があるが、傷がつき易いことから光学
的安定性に欠ける。また、耐熱性が低い、及び吸湿性が
高いことによりディスクがそシやすく、そのそりのため
に記録再生光学系における絞り込みレンズの焦点が合わ
なくなり、誤動作が起こるという致命的欠陥を有してお
り、かかる欠点の改良が強く望まれている。
Taking a memory disk as an example, inorganic glass and polymethyl methacrylate resin are used as disk materials. However, when inorganic glass is used as a disc material, it has no moisture permeability and therefore has little adverse effect on the recording layer, but it is heavy and easy to break. Further, there are drawbacks such as the high precision processing of the glass. On the other hand, polymethyl methacrylate resin has advantages such as being less likely to break and being cheaper than glass, but it is easily scratched and lacks optical stability. In addition, due to its low heat resistance and high moisture absorption, the disc is easily warped, which causes the aperture lens in the recording and reproducing optical system to become out of focus, causing malfunctions, which is a fatal flaw. However, there is a strong desire to improve these drawbacks.

(発明が解決しようとする問題点) 本発明は、前記した状況に鑑み、高耐熱性、高硬度、低
吸水性を有するディスク成形材料を提供することにある
(Problems to be Solved by the Invention) In view of the above-described circumstances, the present invention is to provide a disk molding material having high heat resistance, high hardness, and low water absorption.

(問題点全解決する具体的手段) 本発明は一般式 〔式中、RはHまたはCI(3である。〕で表わされる
化合物をラジカル重合することを特徴とする光デイスク
成形材料用樹脂の製造方法を提供するものである。
(Specific Means for Solving All Problems) The present invention provides a resin for optical disk molding material which is characterized by radically polymerizing a compound represented by the general formula [wherein R is H or CI (3)]. A manufacturing method is provided.

光デイスク用樹脂は前記一般式で表わされるアクリル系
化合物を、一般的に用いられるラジカル重合法と同様に
して硬化させることにより得ることができる。例えば、
このアクリル系化合物に有機過酸化物、アゾ化合物等の
ラジカル開始剤を配合し、加熱硬化する方法及び光増感
剤を配合し、紫外線、電子線、放射線等を照射し硬化す
る方法等によりラジカル重合することができる。又、そ
の際に使用されるラジカル開始剤は特に限定されず、例
えば過酸化ベンゾイル、ジイソプロピルパーオキサイド
、ターシャリ−ブチルパーオキシビバレート、ラウロイ
ルパーオキサイド等有機過酸化物、アゾイソブチロニト
リル等アゾ化合物;ベンゾフェノン、ベンゾインエチル
エーテル、ベンジル、アセトフェノン、アントラキノン
等光増感剤、ジフェニルスルフイツト、チオカーバメー
ト等硫黄化合物などラジカル開始剤が使用できる。
The resin for optical discs can be obtained by curing the acrylic compound represented by the above general formula in the same manner as the commonly used radical polymerization method. for example,
A radical initiator such as an organic peroxide or an azo compound is blended into this acrylic compound and cured by heating, or a photosensitizer is blended and the radical is cured by irradiation with ultraviolet rays, electron beams, radiation, etc. Can be polymerized. In addition, the radical initiator used at that time is not particularly limited, and examples thereof include organic peroxides such as benzoyl peroxide, diisopropyl peroxide, tertiary-butyl peroxyvivalate, and lauroyl peroxide; Compounds: Radical initiators such as photosensitizers such as benzophenone, benzoin ethyl ether, benzyl, acetophenone and anthraquinone, and sulfur compounds such as diphenyl sulfite and thiocarbamate can be used.

ラジカル開始剤の使用量は前記一般式で表わされるアク
リル系化合物100部に対して0.01〜20部、更に
好ましくは0.0工〜10部の範囲である。
The amount of the radical initiator used is in the range of 0.01 to 20 parts, more preferably 0.0 parts to 10 parts, based on 100 parts of the acrylic compound represented by the above general formula.

更に、前記一般式で表わされるアクリル系化合物に加え
て、公知のディスク成形材料として用いられるラジカル
重合性モノマー、具体的にはジエチレングリコールビス
アリルカーボネート、ジアリルフタレート、4.4’−
ビス(β−メタアクロイルエトキシ)ジフェニルプロパ
ン等を本発明の優れた特性を低下させない範囲で併用す
ることも可能である。
Furthermore, in addition to the acrylic compound represented by the above general formula, radically polymerizable monomers used as known disc molding materials, specifically diethylene glycol bisallyl carbonate, diallyl phthalate, 4.4'-
It is also possible to use bis(β-methacroylethoxy)diphenylpropane or the like in combination without deteriorating the excellent properties of the present invention.

本発明のラジカル重合は、大気中、10〜150℃の温
度で行うのが好ましい。
The radical polymerization of the present invention is preferably carried out in the atmosphere at a temperature of 10 to 150°C.

このよ?にして得た樹脂は、光透過率が8.5%以上で
、複屈折率がI X 10”−5以下、200℃以ド( 上の耐熱性、鉛筆強度が2部以上のものである。
This? The resin obtained has a light transmittance of 8.5% or more, a birefringence of I x 10"-5 or less, and a heat resistance of 200°C or more (with a pencil strength of 2 parts or more). .

以下、実施例を示す。なお、例中の部は重量部、%は重
量基準である。
Examples are shown below. In addition, parts in the examples are parts by weight, and percentages are based on weight.

又、実施例において得られる諸物性は下記の試験法によ
り測定した。
In addition, various physical properties obtained in the examples were measured by the following test methods.

(1)光透過率:分光光度計にて500℃mの光透過率
を測定。
(1) Light transmittance: Measure the light transmittance at 500°C using a spectrophotometer.

(2)複屈折率:偏光顕微鏡にて測定。(2) Birefringence: Measured using a polarizing microscope.

(3)耐熱性: ASTM−D−648に従い熱変形試
験装置にて測定。
(3) Heat resistance: Measured using a heat deformation tester according to ASTM-D-648.

(4)硬  度:JIS−に−6911に従い鉛筆硬度
試験機にて測定。
(4) Hardness: Measured using a pencil hardness tester according to JIS-6911.

(5)吸水率: JI S−に−6911に従い測定。(5) Water absorption rate: Measured according to JI S-6911.

実施例1 ビス(オキシメチル)トリシクロ(s、2.x、o2I
5〕デカンジメタアクリレ〜ト100部に対してベンゾ
イルパーオキサイド0.5部加え、60℃に加熱し、均
一に攪拌混合した後、脱泡し、この液を直径120vw
のガラス板とシリコーンゴムのスペーサーで構成された
鋳型の中へ注入し、60℃で24時間、80℃で2時間
、100℃で2時間保持して重合を行なった。
Example 1 Bis(oxymethyl)tricyclo(s,2.x,o2I
5] Add 0.5 parts of benzoyl peroxide to 100 parts of decane dimethacrylate, heat to 60°C, stir and mix uniformly, defoamer, and pour this liquid into a tube with a diameter of 120 vw.
The mixture was poured into a mold consisting of a glass plate and a silicone rubber spacer, and polymerization was carried out by holding the mixture at 60°C for 24 hours, at 80°C for 2 hours, and at 100°C for 2 hours.

鋳型より硬化物を取り出して直径120mのディスク基
板を得た。そのディスク基板の諸物性の評価結果を表−
1に示す。
The cured product was taken out from the mold to obtain a disk substrate with a diameter of 120 m. The evaluation results of various physical properties of the disk substrate are shown below.
Shown in 1.

実施例2 ビス(オキシメチル)トリシクロ(5,2,1,02・
5〕デ力ンジアクリレート100部、に対して、ベンゾ
インエチルエーテル3部加え、60℃に加熱し均一に攪
拌混合した後、脱泡し、この液をガラス板トシリコーン
ゴムのスペーサーで構成された鋳型の中へ注入し、出力
80 W / tmの高圧水銀灯で1分間紫外線を照射
し、重合を行なった。
Example 2 Bis(oxymethyl)tricyclo(5,2,1,02・
5] Add 3 parts of benzoin ethyl ether to 100 parts of decarbonized diacrylate, heat to 60°C, stir and mix uniformly, defoamer, and mix the liquid with a glass plate and a silicone rubber spacer. It was poured into a mold and irradiated with ultraviolet rays for 1 minute using a high-pressure mercury lamp with an output of 80 W/tm to perform polymerization.

鋳型より硬化物を取り出し、直径120論のディスク基
板を得た。そのディスク基板の諸物性評価結果を表−1
に示す。
The cured product was taken out from the mold to obtain a disk substrate with a diameter of 120 mm. Table 1 shows the evaluation results of various physical properties of the disk substrate.
Shown below.

比較例1 実殉例1のビス(オキシメチル)トリシクロ(5,2,
1,02″5〕デカンジメタアクリレートの代りにメチ
ルメタアクリレート100部とベンゾイルパーオキサイ
ド0.5部用いて、実施例1と同様の手法により直径1
20朔のディスク基板を得た。
Comparative Example 1 Bis(oxymethyl)tricyclo(5,2,
1,02"5] Using 100 parts of methyl methacrylate and 0.5 parts of benzoyl peroxide instead of decane dimethacrylate, a diameter of 1
A disk substrate of 20 cm was obtained.

そのディスク基板の諸物性評価結果を表−1に示した。Table 1 shows the evaluation results of various physical properties of the disk substrate.

比較例2 比較例1のメチルメタアクリレートの代りに4゜4′−
ビス(β−メタアクロイルオキシエトキシ)ジフェニル
プロパンi o o部とペンソイルパーオキサイド0.
5部用いて、実施例1と同様の手法により直径120w
nのディスク基板を得た。そのディスク基板の諸物性評
価結果を表−1に示した。
Comparative Example 2 Instead of methyl methacrylate in Comparative Example 1, 4゜4'-
Bis(β-methacroyloxyethoxy) diphenylpropane i o o parts and pensoyl peroxide 0.
Using 5 parts, the diameter was 120w using the same method as in Example 1.
n disk substrates were obtained. Table 1 shows the evaluation results of various physical properties of the disk substrate.

(以下余白)(Margin below)

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は実施例1で得た硬化物の赤外線吸収スペクトル
図である。
FIG. 1 is an infrared absorption spectrum diagram of the cured product obtained in Example 1.

Claims (1)

【特許請求の範囲】 一般式 ▲数式、化学式、表等があります▼ 〔式中、RはHまたはCH_3である。〕 で表わされる化合物をラジカル重合することを特徴とす
る光ディスク成形材料用樹脂の製造方法。
[Claims] General formula ▲ Numerical formula, chemical formula, table, etc. ▼ [In the formula, R is H or CH_3. ] A method for producing a resin for optical disc molding material, which comprises radically polymerizing a compound represented by:
JP60012686A 1985-01-28 1985-01-28 Production of resin for molding optical disc Pending JPS61174208A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP60012686A JPS61174208A (en) 1985-01-28 1985-01-28 Production of resin for molding optical disc

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP60012686A JPS61174208A (en) 1985-01-28 1985-01-28 Production of resin for molding optical disc

Publications (1)

Publication Number Publication Date
JPS61174208A true JPS61174208A (en) 1986-08-05

Family

ID=11812258

Family Applications (1)

Application Number Title Priority Date Filing Date
JP60012686A Pending JPS61174208A (en) 1985-01-28 1985-01-28 Production of resin for molding optical disc

Country Status (1)

Country Link
JP (1) JPS61174208A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0312837A (en) * 1989-06-09 1991-01-21 Mitsubishi Petrochem Co Ltd Production of optical disk substrate
WO2011030792A1 (en) 2009-09-08 2011-03-17 Jx日鉱日石エネルギー株式会社 Vinyl ether compound, vinyl ether polymer, and method for producing vinyl ether compound

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0312837A (en) * 1989-06-09 1991-01-21 Mitsubishi Petrochem Co Ltd Production of optical disk substrate
WO2011030792A1 (en) 2009-09-08 2011-03-17 Jx日鉱日石エネルギー株式会社 Vinyl ether compound, vinyl ether polymer, and method for producing vinyl ether compound
US8410234B2 (en) 2009-09-08 2013-04-02 Jx Nippon Oil & Energy Corporation Vinyl ether compound, vinyl ether polymer, and method for producing vinyl ether compound

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