JPS6117146A - Mask for laser marking - Google Patents

Mask for laser marking

Info

Publication number
JPS6117146A
JPS6117146A JP59137822A JP13782284A JPS6117146A JP S6117146 A JPS6117146 A JP S6117146A JP 59137822 A JP59137822 A JP 59137822A JP 13782284 A JP13782284 A JP 13782284A JP S6117146 A JPS6117146 A JP S6117146A
Authority
JP
Japan
Prior art keywords
marked
mask
mask body
length
face
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP59137822A
Other languages
Japanese (ja)
Inventor
Noboru Morita
昇 森田
Yukitaka Nagano
長野　幸隆
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp filed Critical Toshiba Corp
Priority to JP59137822A priority Critical patent/JPS6117146A/en
Publication of JPS6117146A publication Critical patent/JPS6117146A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/24—Curved surfaces

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Thermal Transfer Or Thermal Recording In General (AREA)

Abstract

PURPOSE:To perform uniform marking even if a face to be marked has a curved surface shape, by bending a mask, through which a laser beam is transmitted, in accordance with the face to be marked having the curved surface shape and equalizing ratios of the length between a focusing optical system and the face to be marked to the length between the mask and the focusing optical system. CONSTITUTION:A mask body 11 is formed to an arc shape in accoreance with the curved surface shape of a face 6 to be marked, and ratios of the length between a condenser lens 5 and the face 6 to the length between the mask body 11 and the condenser lens 5 are equalized. That is, b/a=b1/a1=(a constant) where (a) and a1 are the length between the mask body 11 and the condenser lens 5 and (b) and b1 are the length between the condenser lens 5 and the face 6 to be marked. The shape of the mask body 11 satisfies relations of 1/a+1/b=1/f (f is the focal length of the lens). When this mask body 11 is used for marking, variance, blur, break, etc. of marks are prevented to perform uniform marking.

Description

【発明の詳細な説明】 〔発明の技術分野〕 この発明は文字や記号等をスリット状に配列し、このス
リン（・を透過するレーザビームによってマーキングす
るレーザマーキング用マスクに関する。DETAILED DESCRIPTION OF THE INVENTION [Technical Field of the Invention] The present invention relates to a laser marking mask in which characters, symbols, etc. are arranged in slits and marked with a laser beam that passes through the slits.

〔発明の技術的背景とその問題点〕[Technical background of the invention and its problems]

たとえば第２図に示すように電池などの円筒状物品の外
周面に社名、ロフト番号などをマーキングする場合、従
来のスタンプマーキングに代わってレーザビームによる
マーキング方法が知られている。このレーザマーキング
法は、第３図に示すようになっている。すなわち、１は
ＴＥＡＧＯ２レーザ発振器で、このレーザ発振器１から
発振されたレーザビーム２はマスク３に照射される。こ
のマスク３には文字や記号等がスリット状に穿設され、
前記レーザビーム２はこのスリット４を透過し、この透
過レーザビーム２は結像光学系である集光レンズ５を介
して電池などの円筒状物品の外周面からなる被マーキン
グ面６に照射される。For example, as shown in FIG. 2, when marking a company name, loft number, etc. on the outer peripheral surface of a cylindrical article such as a battery, a marking method using a laser beam is known as an alternative to conventional stamp marking. This laser marking method is shown in FIG. That is, 1 is a TEAGO2 laser oscillator, and a laser beam 2 oscillated from this laser oscillator 1 is irradiated onto a mask 3. This mask 3 has letters, symbols, etc. cut into slits,
The laser beam 2 is transmitted through this slit 4, and the transmitted laser beam 2 is irradiated onto a marking target surface 6, which is the outer peripheral surface of a cylindrical article such as a battery, through a condensing lens 5, which is an imaging optical system. .

したがって、被マーキング面６には前記マスク３に形成
されたスリット４からなる文字や記号がマーキングされ
る。ところで、この場合、マスク３と集光レンズ５、集
光レンズ５と被マーキング面６との距離をそれぞれａＳ
ｂとすると、縮小率ｎはｎ＝ｂ／ａとなる。したがって
、被マーキング面６が電池などのように円筒状をなして
いると、集光レンズ５を通過後のレーザビーム２に各部
によって光路差が生じる。このため、像のぼけや縮小率
ｎの変化が起り、適正なマーキングができないという欠
点がある。Therefore, the surface to be marked 6 is marked with characters or symbols formed by the slits 4 formed in the mask 3. By the way, in this case, the distances between the mask 3 and the condensing lens 5, and between the condensing lens 5 and the surface to be marked 6 are respectively aS.
If b, then the reduction rate n is n=b/a. Therefore, if the surface to be marked 6 is cylindrical like a battery, the laser beam 2 after passing through the condensing lens 5 will have an optical path difference at each part. For this reason, there is a drawback that the image becomes blurred and the reduction ratio n changes, making it impossible to perform proper marking.

〔発明の目的〕[Purpose of the invention]

この発明は、前記事情に着目してなされたもので、その
目的とするところは、被マーキング面が電池などのよう
に円筒状をなしていても、像のぼけや縮小率の変化がな
（均一にマーキングができるレーザマーキング用マスク
を提供しようとするものである。This invention was made in view of the above-mentioned circumstances, and its purpose is to prevent blurring of the image and change in reduction ratio even if the surface to be marked has a cylindrical shape such as a battery. The present invention aims to provide a laser marking mask that enables uniform marking.

〔発明の概要〕[Summary of the invention]

この発明は、前記目的を達成するために、レーザビーム
を透過させるマスクを曲面形状の被マーキング面に合せ
て曲成し、マスクと集光レンズ、集光レンズと被マーキ
ング面との距離の比率をそれぞれ一致させたことにある
。In order to achieve the above object, the present invention curves a mask that transmits a laser beam to match a curved surface to be marked, and the ratio of the distances between the mask and a condensing lens, and between the condensing lens and the surface to be marked. The reason is that they are made to match each other.

〔発明の実施例〕 以下、この発明の一実施例を図面にもとすいて説明する
。[Embodiment of the Invention] An embodiment of the present invention will be described below with reference to the drawings.

第１図中１１はレーザマーキング用のマスク本体である
。このマスク本体１１は薄肉の金属板によって形成され
、この板面にはスリット１２・・・によって文字、記号
等が配列されている。このマスク本体１１は被マーキン
グ面６の曲面形状に対応して円弧状に曲成されている。Reference numeral 11 in FIG. 1 is a mask body for laser marking. This mask body 11 is formed of a thin metal plate, and characters, symbols, etc. are arranged on the plate surface through slits 12 . This mask body 11 is curved into an arc shape corresponding to the curved shape of the surface to be marked 6.

そして、マスク本体１１と集光レンズ５、集光レンズ５
と被マーキング面との距離の比率を一致させている。す
なわち、マスク本体１１と集光レンズ５との間をａ（ａ
ｌ）、集光レンズ５と被マーキング面６との間をｂ（ｂ
ｌ）とすると、 ｂ　／　ａ　＝　ｂ　１／　ａ　１＝一定とする。Then, the mask body 11, the condensing lens 5, the condensing lens 5
The ratio of the distance between the marking surface and the surface to be marked is made to match. That is, the gap between the mask body 11 and the condensing lens 5 is a(a
l), b (b
l), then b/a=b1/a1=constant.

ただし１／ａ＋１／ｂ＝１／ｆ（ｆはレンズ焦点距離）
となる関係を満足する形状である。However, 1/a+1/b=1/f (f is lens focal length)
It is a shape that satisfies the relationship.

しかして、このように構成されたマスク本体１１を用い
てマーキングを行なうと、レーザビームはスリット１２
を透過して被マーキング面６に照射される。このとき、
マスク本体１１が被マーキング面６の曲面形状に合せて
円弧上に形成されているため、はぼ均一に被マーキング
面６に照射されるとともに縮小率にバラツキがなくマー
クのむら、かすれ、ぼけ等を生じることなく均一にマー
キングされる。Therefore, when marking is performed using the mask body 11 configured in this way, the laser beam is directed to the slit 12.
The light passes through and is irradiated onto the surface to be marked 6. At this time,
Since the mask body 11 is formed on an arc to match the curved shape of the surface to be marked 6, the surface to be marked 6 is irradiated almost uniformly, and there is no variation in the reduction ratio, preventing unevenness, fading, blurring, etc. of the mark. Marking is done evenly without any markings.

〔発明の効果〕〔Effect of the invention〕

以上説明したように、この発明によれば、レーザビーム
を透過させるマスクを曲面形状の被マーキング面に合せ
て曲成し、マスクと結像光学系、結像光学系と被マーキ
ング面との距離の比率をそれぞれ一致させたから、被マ
ーキング面が曲面形状であっても、均一なマーキングが
できるという効果がある。As explained above, according to the present invention, a mask that transmits a laser beam is curved to match the curved surface to be marked, and the distances between the mask and the imaging optical system, and between the imaging optical system and the surface to be marked are Since the ratios of the marks are made to match, even if the surface to be marked has a curved shape, uniform marking can be achieved.

【図面の簡単な説明】[Brief explanation of the drawing]

第１図はこの発明の一実施例を示す説明図、第２歯は被
マーキング面を示す斜視図、第３図は従来のレーザマー
キング法を示す構成図である。 ５・・・集光レンズ（結像光学系）、６・・・被マーキ
ング面、１１・・・マスク本体、１２・・・スリット。 出願人代理人　弁理士　鈴江武彦 第１図 第２図FIG. 1 is an explanatory diagram showing an embodiment of the present invention, a second tooth is a perspective view showing a surface to be marked, and FIG. 3 is a configuration diagram showing a conventional laser marking method. 5... Condensing lens (imaging optical system), 6... Surface to be marked, 11... Mask body, 12... Slit. Applicant's agent Patent attorney Takehiko Suzue Figure 1 Figure 2

Claims (1)

【特許請求の範囲】[Claims] マスク本体に文字や記号等をスリット状に配列し、マス
ク本体に照射されたレーザビームを前記スリットから透
過したのち結像光学系によって曲面形状の被マーキング
面に結像し、マーキングするレーザマーキング用マスク
において、前記マスク本体を曲面形状の被マーキング面
に合せて曲成し、マスク本体と前記結像光学系との間と
、結像光学系と被マーキング面との間の距離の比率を一
致させたことを特徴とするレーザマーキング用マスク。For laser marking, characters, symbols, etc. are arranged in slits on the mask body, and after the laser beam irradiated on the mask body passes through the slits, it is focused on a curved surface to be marked by an imaging optical system and marked. In the mask, the mask body is curved to match the curved surface to be marked, and the ratio of the distance between the mask body and the imaging optical system and the distance between the imaging optical system and the surface to be marked is made equal. A laser marking mask characterized by:
JP59137822A 1984-07-03 1984-07-03 Mask for laser marking Pending JPS6117146A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP59137822A JPS6117146A (en) 1984-07-03 1984-07-03 Mask for laser marking

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59137822A JPS6117146A (en) 1984-07-03 1984-07-03 Mask for laser marking

Publications (1)

Publication Number Publication Date
JPS6117146A true JPS6117146A (en) 1986-01-25

Family

ID=15207655

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59137822A Pending JPS6117146A (en) 1984-07-03 1984-07-03 Mask for laser marking

Country Status (1)

Country Link
JP (1) JPS6117146A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS649382A (en) * 1987-06-30 1989-01-12 Victor Company Of Japan Magnetic sensor
US6838701B2 (en) 2000-02-16 2005-01-04 Nichia Corporation Nitride semiconductor laser device

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS649382A (en) * 1987-06-30 1989-01-12 Victor Company Of Japan Magnetic sensor
US6838701B2 (en) 2000-02-16 2005-01-04 Nichia Corporation Nitride semiconductor laser device
US7167497B2 (en) * 2000-02-16 2007-01-23 Nichia Corporation Nitride semiconductor laser device

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