JPS61162822A - Production of magnetic disk - Google Patents
Production of magnetic diskInfo
- Publication number
- JPS61162822A JPS61162822A JP244285A JP244285A JPS61162822A JP S61162822 A JPS61162822 A JP S61162822A JP 244285 A JP244285 A JP 244285A JP 244285 A JP244285 A JP 244285A JP S61162822 A JPS61162822 A JP S61162822A
- Authority
- JP
- Japan
- Prior art keywords
- recording medium
- magnetic
- film
- magnetic disk
- disk
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Manufacturing Of Magnetic Record Carriers (AREA)
- Magnetic Record Carriers (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
この発BAt:f磁気ディスク装置に使用される磁気デ
ィスクの製造方法に関するものである。DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a method of manufacturing a magnetic disk used in this BAt:f magnetic disk device.
磁気ディスクの磁気記録媒体として金属薄膜が用いられ
ているが、空気中の酸素による酸化を防ぎ、磁気ヘッド
と磁気記録媒体との接触摩擦、接触摩耗および接触破壊
から磁気記録媒体を保獲するために、磁気記録媒体の表
面に保護膜を設ける必要がある。A thin metal film is used as the magnetic recording medium of a magnetic disk, but in order to prevent oxidation due to oxygen in the air and protect the magnetic recording medium from contact friction, contact wear, and contact destruction between the magnetic head and the magnetic recording medium. In addition, it is necessary to provide a protective film on the surface of the magnetic recording medium.
従来、この保護膜は無機酸化物が用いられ、これは石英
ガラス、ケイ酸基ガラス、ホウケイ酸ガラス、リン酸塩
ガラス、非晶質アルミナなど一般にガラス状物質と呼ば
れる非晶質の半金N&化物およびテトジヒドロキシシラ
ンなどの縮合重合物であるポリケイ酸を示している。前
者は主にスパッタ法により被覆され、後者は主に塗液塗
布法によって被覆されるし特願昭BP48112号明細
書、特開昭54−15704号公報、特開昭53−78
013号公報、特開昭53−10610号公報など)。Conventionally, inorganic oxides have been used for this protective film, and these include amorphous metalloids commonly called glassy materials such as quartz glass, silicate glass, borosilicate glass, phosphate glass, and amorphous alumina. It shows polysilicic acid, which is a condensation polymer such as compound and tetodihydroxysilane. The former is mainly coated by a sputtering method, and the latter is mainly coated by a liquid coating method.
013, JP-A-53-10610, etc.).
従来のスパッタ法による保l膜は表面精度が非常に良く
鏡面になっている九め、磁気ヘッドが磁気ディスクの表
面に吸着し、磁気ディスクが回転を始めでも磁気へツ・
ドが浮上できず、磁気ヘッドなどが破損するなどの問題
点があった( 1.M、Ros+siら、ジャーナル・
オプ・アプライド・フィジックス(J、Appl、Ph
ys、)、 55巻、6号、 2254頁)。The lubricating film made by conventional sputtering has a very good surface precision and has a mirror surface.9) The magnetic head is attracted to the surface of the magnetic disk, and even when the magnetic disk starts rotating, it does not stick to the magnetic head.
There were problems such as the card not being able to levitate and the magnetic head etc. being damaged (1.M, Ros+si et al., Journal
Op Applied Physics (J, Appl, Ph
ys, ), Vol. 55, No. 6, p. 2254).
また、保@止冑上に潤滑膜などを設ける場合においても
、保護膜の表面精度が良いため潤滑膜がはく離しやすく
、磁気ディスクの信頼性を表すコンタクトスタートスト
ップ(CSS)回数が少なくなるという問題点が生じた
。In addition, even when a lubricating film is provided on the protective film, the surface precision of the protective film is good, so the lubricating film is easily peeled off, and the number of contact start/stop (CSS) times, which indicates the reliability of the magnetic disk, is reduced. A problem arose.
また、従来の塗液塗布法による保護膜は、例えば、特開
昭5j−76013号公報、特開昭53−4061(N
゛号公報、特開昭54−15704号公報に記されて
い 、るように、金、嘱アルコキシドやテトラヒドロ
キシシランなどのシランカップリング剤を原料とし、ア
ルコールなどを溶媒にして溶液を磁気ディスク表面に塗
布し熱処理することによって得られる。In addition, protective films formed by conventional coating liquid coating methods are disclosed in, for example, Japanese Patent Laid-Open No. 5J-76013 and Japanese Patent Laid-Open No. 53-4061 (N.
As described in Japanese Patent Application Laid-Open No. 54-15704, a solution is prepared using gold, silane coupling agents such as alkoxide, and tetrahydroxysilane as raw materials and alcohol as a solvent, and then applied to the surface of a magnetic disk. It is obtained by coating and heat-treating.
この方法では原料が非常に高価になるという問題点があ
った。また、磁気記録媒体が金属の場合、基板や下地層
からの制約のため熱処理温度を200℃以下にしなけれ
ばならず、上記公開特許公報に明記されているように保
護膜は上記原料の単なる分解重合物であるポリケイ酸か
ら成っている。ところが、たとえば峡近よく研究されて
いる金属アルコキシドからガラスを合成するゾルゲル法
では、金属アルコキシドを加水分解させたゲルをガラス
化させるのに必要な熱処理温度は600〜1000℃で
あり、溶融法によるシリカガラスと同一の性質を示すの
は900〜1000℃の熱処理をした場合であると言わ
れており(作花済夫「ガラス非晶質の科学」、内田老鶴
圃(1983)、147〜164頁)、200℃程度の
低錦の熱処理ではガラス化はまったく望めない。すなわ
ち1分解重合物であるポリケイ酸はいわゆる5102膜
に比べて硬度、強度などがかなり劣り、従来法によるポ
リケイ酸の保護膜は弱く剥離しやすいなどの問題点があ
った。This method had the problem that the raw materials were very expensive. In addition, when the magnetic recording medium is metal, the heat treatment temperature must be kept below 200°C due to restrictions from the substrate and underlayer, and as specified in the above-mentioned patent publication, the protective film is simply a decomposition of the above-mentioned raw material. It is made of polysilicic acid, which is a polymer. However, for example, in the sol-gel method of synthesizing glass from metal alkoxides, which has been extensively studied, the heat treatment temperature required to vitrify the gel obtained by hydrolyzing metal alkoxides is 600 to 1000 °C, and the melting method It is said that the same properties as silica glass can be obtained when heat treated at 900 to 1000°C (Sakuhana Masao, "Science of Glass Amorphous", Uchida Rokaku (1983), 147- (p. 164), vitrification cannot be expected at all with low brocade heat treatment at about 200°C. That is, polysilicic acid, which is a monolytic polymer, is considerably inferior in hardness and strength to the so-called 5102 film, and the protective film of polysilicic acid formed by conventional methods is weak and easily peeled off.
この発明は上記のような問題点を解消するためになされ
たもので、磁気ヘッドの吸着を防止し潤滑膜を用いる場
合轢、それのはく離を防止して、信頼性の高い磁気ディ
スクの製造方法を得ることを目的とする。This invention was made in order to solve the above-mentioned problems, and provides a highly reliable magnetic disk manufacturing method that prevents magnetic heads from adhering to each other and prevents the lubricating film from peeling off due to running over. The purpose is to obtain.
〔問題点を解決するための手段〕 −゛ この発明
の磁気ディスクの製造方法は、基材に設けられた金属磁
気記録媒体に”102Liをケイ紅アンモニウムの分解
重合物で形成したものである。[Means for Solving the Problems] - In the method for manufacturing a magnetic disk of the present invention, 102Li is formed on a metal magnetic recording medium provided on a base material using a decomposed polymer of ammonium diammonium.
この発明に係るケイ酸アンモニウムの分解重合物から成
る$102膜は、表面精度がスパッタ膜に比べると悪く
磁気ヘッドの吸着を防とできると共に、低温熱処理でS
iO2膜に変化するため、強固な保wf!膜を形成でき
、潤滑膜を用いた場合のそれの剥離が防止される。The $102 film made of a decomposed polymer of ammonium silicate according to the present invention has a surface precision that is lower than that of a sputtered film, and can prevent magnetic heads from being attracted to it, and can also be made of S
Strong retention wf as it changes to iO2 film! A film can be formed, and peeling of a lubricating film is prevented when a lubricating film is used.
ここで用いるケイ酸アンモニウムは市販試薬としては存
在しないが、先行技術(特願昭Apm6611号明細書
、特願昭ape4729号明細書)によるケイ酸アンモ
ニウムの製造方法により容品に合成できる。原料はケイ
酸ナトリウムなどであり金属アルコキシド、シランカッ
プリング剤に比較して非常に安価である。Although the ammonium silicate used here does not exist as a commercially available reagent, it can be synthesized into a container by a method for producing ammonium silicate according to the prior art (Japanese Patent Application No. 6611, Japanese Patent Application No. 4729). The raw material is sodium silicate, etc., which is very cheap compared to metal alkoxides and silane coupling agents.
図面は、この発明の一実施例により得られた磁気ディス
クの断面図で、図において;1ンはアルミニウム合金基
材、(2)は下地層、(3)は金属磁気記録媒体、(4
)は5102膜、(5)蝶潤滑膜である。The drawing is a cross-sectional view of a magnetic disk obtained according to an embodiment of the present invention.
) is a 5102 film, and (5) is a butterfly lubricant film.
以下、実施例によりこの発明をより詳細に説明するが、
この発明はこれに限定されるものではない。Hereinafter, this invention will be explained in more detail with reference to Examples.
This invention is not limited to this.
実施例
ディスク状アルミニウム合金基材11J上に下地層(2
)としてニッケルーリン合金を約50μmの厚さにめっ
きした。その上に金属磁気記録媒体(3)としてコバル
ト−ニッケルーリン合金を約5OAの厚さにめっきした
。さらに、この記録媒体上に約10チケイ酸アンモニウ
ム#液を回転塗布法(回転数200 rpm )により
500 Aの膜厚に塗布したディスク状円盤を2000
の温度で3時間電気炉中で焼成した。この保護膜のX線
回折図によると、2θ−5e以下に顕著な小角散乱は認
められず、シリカガラスに類似した構造の5102膜に
なっていることが判明した。Example A base layer (2
) was plated with a nickel-phosphorus alloy to a thickness of about 50 μm. A cobalt-nickel-phosphorus alloy was plated thereon to a thickness of about 5 OA as a metal magnetic recording medium (3). Furthermore, a disk-shaped disc with a film thickness of 500 A coated with approximately 10 # of ammonium tissilicate liquid by a spin coating method (rotation speed 200 rpm) was coated on this recording medium for 2000 mm.
It was fired in an electric furnace at a temperature of 3 hours. According to the X-ray diffraction diagram of this protective film, no remarkable small-angle scattering was observed below 2θ-5e, and it was found that the film was a 5102 film with a structure similar to silica glass.
なお、この保護膜は潤滑的役割をも有しているが、さら
に潤滑効果の優れた潤滑膜(5)を設けても良い。潤滑
膜(5)としては例えばパイダツクス(商品名、デュポ
ン製)やクライトツクス(商品名、デュポン製)などを
使用する。Although this protective film also has a lubricating role, a lubricating film (5) having an excellent lubricating effect may be provided. As the lubricating film (5), for example, PIDAX (trade name, manufactured by DuPont), Krytox (trade name, manufactured by DuPont), etc. are used.
以上のようにして得られた磁気ディスクは、磁気ヘッド
の吸着という現象も観察されず、潤滑膜を用いたときは
その剥離が減少した。C8Bテストでは088回数が従
来の製法による保護膜をつけた場合に比べで、約2倍に
なった。又潤滑膜を用いたときも、C88回数が従来の
約2倍になった。In the magnetic disk obtained as described above, no phenomenon of magnetic head adsorption was observed, and when a lubricant film was used, the peeling was reduced. In the C8B test, the number of 088 cycles was approximately twice that of the case with a protective film made using the conventional manufacturing method. Also, when a lubricating film was used, the number of C88 cycles was approximately twice that of the conventional method.
なお、上記′)、″:施例では回転塗布法の場合につい
て説明したが、浸漬法など他の方法であってもよく、上
記実施例と同様の効果を奏する。In addition, although the case of the spin coating method was explained in the above-mentioned ′), ″ example, other methods such as a dipping method may be used, and the same effects as in the above-mentioned example can be obtained.
以上のように、この発明によれば、基材に設けられた金
属磁気記録媒体にSiO□膜をケイ酸アンモニウムの分
解重合物で形成するようにしたので、低温熱処理でSi
O2膜が形成でき、磁気ヘッドが磁気ディスクの表面に
吸着することが無くなり、O88回数が増大し、ヘッド
クラッシュによる故障が減少し、安価な原料を用いてコ
ストダウンができる信頼性の高い磁気ディスクの製造方
法が得られる効果がある。As described above, according to the present invention, since the SiO□ film is formed on the metal magnetic recording medium provided on the base material using a decomposed polymer of ammonium silicate, Si
A highly reliable magnetic disk that can form an O2 film, prevent the magnetic head from adhering to the surface of the magnetic disk, increase the number of O88s, reduce failures due to head crashes, and reduce costs by using inexpensive raw materials. This has the effect of providing a manufacturing method.
図面けこの発明の一実施例により得られた磁気ディスク
を示す断面図である。FIG. 1 is a sectional view showing a magnetic disk obtained according to an embodiment of the present invention.
Claims (1)
イ酸アンモニウムの分解重合物で形成したことを特徴と
する磁気ディスクの製造方法。A method for manufacturing a magnetic disk, characterized in that a SiO_2 film is formed from a decomposed polymer of ammonium silicate on a metal magnetic recording medium provided on a base material.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP244285A JPS61162822A (en) | 1985-01-10 | 1985-01-10 | Production of magnetic disk |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP244285A JPS61162822A (en) | 1985-01-10 | 1985-01-10 | Production of magnetic disk |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS61162822A true JPS61162822A (en) | 1986-07-23 |
Family
ID=11529386
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP244285A Pending JPS61162822A (en) | 1985-01-10 | 1985-01-10 | Production of magnetic disk |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS61162822A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP1293488A1 (en) * | 2001-09-12 | 2003-03-19 | Toyo Gosei Kogyo Co., Ltd. | Coating solution and method for forming transparent coating film |
-
1985
- 1985-01-10 JP JP244285A patent/JPS61162822A/en active Pending
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP1293488A1 (en) * | 2001-09-12 | 2003-03-19 | Toyo Gosei Kogyo Co., Ltd. | Coating solution and method for forming transparent coating film |
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