JPS6116058B2 - - Google Patents

Info

Publication number
JPS6116058B2
JPS6116058B2 JP14499279A JP14499279A JPS6116058B2 JP S6116058 B2 JPS6116058 B2 JP S6116058B2 JP 14499279 A JP14499279 A JP 14499279A JP 14499279 A JP14499279 A JP 14499279A JP S6116058 B2 JPS6116058 B2 JP S6116058B2
Authority
JP
Japan
Prior art keywords
printing plate
developer
acid
lithographic printing
developer composition
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP14499279A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5669628A (en
Inventor
Shigeki Shimizu
Koji Ide
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Kasei Corp
Original Assignee
Mitsubishi Kasei Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Kasei Corp filed Critical Mitsubishi Kasei Corp
Priority to JP14499279A priority Critical patent/JPS5669628A/ja
Publication of JPS5669628A publication Critical patent/JPS5669628A/ja
Publication of JPS6116058B2 publication Critical patent/JPS6116058B2/ja
Granted legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26Processing photosensitive materials; Apparatus therefor
    • G03F7/30Imagewise removal using liquid means
    • G03F7/32Liquid compositions therefor, e.g. developers
    • G03F7/325Non-aqueous compositions

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
JP14499279A 1979-11-09 1979-11-09 Developer composition for lithographic plate Granted JPS5669628A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP14499279A JPS5669628A (en) 1979-11-09 1979-11-09 Developer composition for lithographic plate

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP14499279A JPS5669628A (en) 1979-11-09 1979-11-09 Developer composition for lithographic plate

Publications (2)

Publication Number Publication Date
JPS5669628A JPS5669628A (en) 1981-06-11
JPS6116058B2 true JPS6116058B2 (US20020051482A1-20020502-M00012.png) 1986-04-28

Family

ID=15374950

Family Applications (1)

Application Number Title Priority Date Filing Date
JP14499279A Granted JPS5669628A (en) 1979-11-09 1979-11-09 Developer composition for lithographic plate

Country Status (1)

Country Link
JP (1) JPS5669628A (US20020051482A1-20020502-M00012.png)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0377748U (US20020051482A1-20020502-M00012.png) * 1989-11-30 1991-08-06
JPH0546692Y2 (US20020051482A1-20020502-M00012.png) * 1990-07-31 1993-12-07

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0377748U (US20020051482A1-20020502-M00012.png) * 1989-11-30 1991-08-06
JPH0546692Y2 (US20020051482A1-20020502-M00012.png) * 1990-07-31 1993-12-07

Also Published As

Publication number Publication date
JPS5669628A (en) 1981-06-11

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