JPS6115980A - Surface treatment of copper - Google Patents

Surface treatment of copper

Info

Publication number
JPS6115980A
JPS6115980A JP59135561A JP13556184A JPS6115980A JP S6115980 A JPS6115980 A JP S6115980A JP 59135561 A JP59135561 A JP 59135561A JP 13556184 A JP13556184 A JP 13556184A JP S6115980 A JPS6115980 A JP S6115980A
Authority
JP
Japan
Prior art keywords
copper
inner layer
treatment
prepreg
copper surface
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP59135561A
Other languages
Japanese (ja)
Other versions
JPH0419306B2 (en
Inventor
Akishi Nakaso
昭士 中祖
Yoichi Kaneko
陽一 金子
Toshiro Okamura
岡村 寿郎
Kiyoshi Yamanoi
清 山野井
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Resonac Corp
Original Assignee
Hitachi Chemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Chemical Co Ltd filed Critical Hitachi Chemical Co Ltd
Priority to JP59135561A priority Critical patent/JPS6115980A/en
Priority to KR1019850004563A priority patent/KR890004583B1/en
Priority to EP85304636A priority patent/EP0170414B1/en
Priority to DE8585304636T priority patent/DE3582531D1/en
Priority to US06/750,780 priority patent/US4643793A/en
Publication of JPS6115980A publication Critical patent/JPS6115980A/en
Publication of JPH0419306B2 publication Critical patent/JPH0419306B2/ja
Granted legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/38Improvement of the adhesion between the insulating substrate and the metal
    • H05K3/382Improvement of the adhesion between the insulating substrate and the metal by special treatment of the metal
    • H05K3/384Improvement of the adhesion between the insulating substrate and the metal by special treatment of the metal by plating
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/31Coating with metals
    • C23C18/38Coating with copper
    • C23C18/40Coating with copper using reducing agents
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/03Metal processing
    • H05K2203/0307Providing micro- or nanometer scale roughness on a metal surface, e.g. by plating of nodules or dendrites
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/07Treatments involving liquids, e.g. plating, rinsing
    • H05K2203/0703Plating
    • H05K2203/072Electroless plating, e.g. finish plating or initial plating
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/46Manufacturing multilayer circuits
    • H05K3/4611Manufacturing multilayer circuits by laminating two or more circuit boards

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Manufacturing & Machinery (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemically Coating (AREA)
  • Production Of Multi-Layered Print Wiring Board (AREA)
  • Manufacturing Of Printed Wiring (AREA)

Abstract

PURPOSE:To improve the adhesive property of the copper surface of a copper- lined laminated board or the like to a resin-base material such as prepreg by treating the copper surface with a soln. having a prescribed composition contg. a heterocyclic compound contg. nitrogen. CONSTITUTION:When a printed circuit board for an inner layer or the like is manufactured, the copper surface of a copper-lined laminated board or the like is roughened and immersed in a treating soln. prepd. by adding about 1-500mg/ lheterocyclic compound contg. nitrogen such as 4,7-dimethyl-1,10-phenanthroline to copper ions, a complexing agent, a reducing agent, hydroxyl ions and water as essential components. By the treatment, the copper surface is colored, in a color other than the colors of metallic copper and lustrous metallic copper. The adhesive property of the copper surface to a resin-based material such as prepreg is improved, and a printed circuit board for an inner layer giving an inner layer circuit with superior line accuracy is obtd.

Description

【発明の詳細な説明】 (産業上の利用分野) 本発明は、多層プリント配線板の製造に於て、プリプレ
グを介して多層化接着される内層回路板の導体回路の前
処理等として使用される銅の表面処理法に関する。
Detailed Description of the Invention (Industrial Application Field) The present invention is used in the production of multilayer printed wiring boards as a pretreatment for conductor circuits on inner layer circuit boards that are bonded in multiple layers through prepreg. This paper relates to surface treatment methods for copper.

(従来の技術) 多層プリント配線板は、次のようにして製造される。す
なわち、 A6通常の銅張積層板の銅箔を加工してプリント配線を
形成することにより内層用銅張積層板をつくり、との銅
箔な過硫酸アンモニウム、塩化第2銅、酢酸銅等の薬液
で処理して銅箔表面を粗面化したのち、この内層用銅張
積層板に熱硬化性樹脂含浸基材(プリプレグ)を介して
外層用銅張積層板を積層接着する。また B、銅箔の両面を粗化して接着性等を向上した銅箔(両
面粗化銅箔)を用いた銅張積層板をAと同様の方法で内
層用鋼張積層板をつくり、との銅箔表面の粗面化はおこ
なわないで、この内層用鋼張積層板にプリプレグを介し
て外要用鋼張積層板を積層接着する。*にはC0〃と同
様の方法で内層用銅張積層板をつくり、Aと同様の薬液
で処理して銅箔表面な粗面化し、更に亜塩素酸ナトリウ
ム系処理液で処理したのち、この内層用鋼張積層板にブ
リプレグを介して外層用銅張積層板を積層接着すること
によつて製造していた。
(Prior Art) A multilayer printed wiring board is manufactured as follows. In other words, a copper clad laminate for the inner layer is made by processing the copper foil of an ordinary A6 copper clad laminate to form printed wiring, and the copper foil is treated with a chemical solution such as ammonium persulfate, cupric chloride, or copper acetate. After the surface of the copper foil is roughened, the copper-clad laminate for the outer layer is laminated and bonded to the copper-clad laminate for the inner layer via a thermosetting resin-impregnated base material (prepreg). In addition, in B, a steel-clad laminate for the inner layer is made by using a copper clad laminate using copper foil whose adhesion has been improved by roughening both sides of the copper foil (double-sided roughened copper foil) in the same manner as in A. Without roughening the surface of the copper foil, a steel clad laminate for external use is laminated and bonded to this steel clad laminate for inner layer via a prepreg. For *, a copper-clad laminate for the inner layer was made in the same manner as C0, and treated with the same chemical solution as A to roughen the surface of the copper foil, and then treated with a sodium chlorite-based treatment solution. It was manufactured by laminating and bonding a copper-clad laminate for the outer layer to a steel-clad laminate for the inner layer via a buripreg.

これらの方法には次のような問題があった。These methods had the following problems.

A、の方法で製造した多層配線板は、内j−銅箔とプリ
プレグを硬化させた與脂層との接漸強明が不十分である
。また、完成した多層印刷回路板に各秘の電子部品を半
田で固定する工程において、回路銅箔と積層板との間で
剥離を生じたり、場合によりてはこの剥離が外部から肉
眼で確認される程の板のふくれとなって現われることが
あった。
In the multilayer wiring board manufactured by method A, the contact strength between the inner copper foil and the resin layer made of hardened prepreg is insufficient. In addition, during the process of soldering various electronic components to the completed multilayer printed circuit board, peeling may occur between the circuit copper foil and the laminate, and in some cases, this peeling may be visible to the naked eye from the outside. In some cases, it appeared as a bulge on the board.

B、の方法では、両面粗化銅箔を使用するので、内ノー
用銅帳積層板のプリント配線を形成するまでの工程で、
粗化表面なきずっけることがあり、その場合、きすつけ
た部分では接着力が低下する、また、プリント配線形成
に使用する印刷エツチングレジストやUV写真焼き付は
方法によるエツチングレジストのパターン精度が、銅箔
表面が粗面であるために劣っていた。
In method B, since double-sided roughened copper foil is used, in the process up to forming the printed wiring of the inner copper foil laminate,
The roughened surface may be scratched, and in that case, the adhesion strength will be reduced in the scratched area.Also, the pattern accuracy of the etching resist may be affected by the printing etching resist used for forming printed wiring or the UV photo printing method. , the copper foil surface was inferior due to its rough surface.

C0の方法では、内層用銅箔積層板の銅箔な表面処理し
たあと、プリプレグを介して外層用銅張積層板と接着力
が低下せずに積層接着できる可使時間が短い。
In the C0 method, after the copper foil laminate for the inner layer is subjected to a copper foil surface treatment, the pot life is short during which lamination can be bonded to the copper clad laminate for the outer layer via the prepreg without decreasing the adhesive strength.

(発明の目的) 本発明の目的は、プリプレグ等の樹脂材料との接着力が
向上した銅の表面処理法を提供するものである。
(Object of the Invention) An object of the present invention is to provide a method for surface treatment of copper that improves adhesive strength with resin materials such as prepreg.

(発明の桐成) 本発明は銅表面を、 (a)  銅イオン、錯化剤、還元剤、水酸イオン、水
、 (b)  (a)液に添加することによって、銅の処理
表面を金属銅色および金属銅光沢以外に着色させること
ができる窒素を含有する複素環式化合物、 を含む液で処理することを特徴とする鉤の表面処理法で
ある。
(Kirinari of the Invention) The present invention provides a treatment surface of copper by adding (a) copper ions, complexing agents, reducing agents, hydroxide ions, water, (b) (a) liquid. This is a method for surface treatment of hooks, which is characterized by treating with a liquid containing a nitrogen-containing heterocyclic compound capable of imparting a color other than metallic copper color and metallic copper luster.

本発明において処理される銅である内層配線付積層板の
配線パターンの導体は銅張積J−板をエツチングして得
たもの、銅電気めっき、無電解鋼めっきおよびこれらを
組み合せて得たもののいずれであっても良い。上記の銅
の表面処理の前工程として、内層配線付積層板の配線パ
ターン等の表面の1粗し、を目的として水、塩酸、硫酸
、硝酸、リン酸、さく酸、塩化第2銅、硫酸銅などの銅
化合物、塩化第2鉄、硫酸第2鉄などの鉄化合物、アル
カリ金属塩化物、過硫酸アンモンなどから選ばれる化合
物の組み合せからなる水溶液で処理しても良い。またこ
れらの化学的な方法の1粗し、ではなく、液体ホーニン
グ、研磨などの機械的な方法でおこなっても良い。
The conductor of the wiring pattern of the copper inner-layer wiring laminated board processed in the present invention may be obtained by etching a copper-clad J-board, copper electroplating, electroless steel plating, or a combination thereof. Either one is fine. As a pre-process for the above copper surface treatment, water, hydrochloric acid, sulfuric acid, nitric acid, phosphoric acid, citric acid, cupric chloride, sulfuric acid, etc. The treatment may be performed with an aqueous solution consisting of a combination of compounds selected from copper compounds such as copper, iron compounds such as ferric chloride and ferric sulfate, alkali metal chlorides, and ammonium persulfate. Further, instead of roughening, which is one of these chemical methods, mechanical methods such as liquid honing and polishing may be used.

本発明の処理液において、銅イオンは銅イオン源として
硫酸鋼、硝酸銅、塩化第2銅など通常の銅塩が用いられ
る。錯化剤としては上記の銅イオンと錯体な形成しアル
カリ水溶液に可溶とするものでエチレンジアミン四酢酸
、クアドロール(アデカ製商品名)、酒石酸などが用い
られる。還元剤としては、ホルマリン、次亜リン酸塩な
どがある。また水酸イオンはこの処理液の田を調整する
目的で添加するもので水酸化ナトリウム、水酸化カリウ
ムなどが使用できる。
In the treatment solution of the present invention, common copper salts such as steel sulfate, copper nitrate, and cupric chloride are used as copper ion sources. The complexing agent is one that forms a complex with the above-mentioned copper ion and becomes soluble in an alkaline aqueous solution, such as ethylenediaminetetraacetic acid, Quadrol (trade name, manufactured by Adeka), tartaric acid, and the like. Examples of reducing agents include formalin and hypophosphite. Further, hydroxide ions are added for the purpose of adjusting the quality of this treatment solution, and sodium hydroxide, potassium hydroxide, etc. can be used.

水としてはイオン交換水が望ましい。これらの成分から
成る処理液の基本組成としては、例えば硫酸銅2g/l
〜20 g/l、処理液の…11.0〜1&5、錯化剤
としてエチレンジアミン四酢酸の場合では硫酸銅濃度の
1.0〜5.0倍モル濃度、また還元剤としての37%
ホルマリンは2m1/l 〜2 [1ml/Jが好まし
い。
Ion-exchanged water is preferable as water. The basic composition of the treatment liquid consisting of these components is, for example, copper sulfate 2g/l.
~20 g/l, 11.0 to 1&5 of the processing solution, 1.0 to 5.0 times the molar concentration of copper sulfate in the case of ethylenediaminetetraacetic acid as a complexing agent, and 37% as a reducing agent.
Formalin has a concentration of 2 ml/l to 2 [1 ml/J is preferred.

外、例えば、茶褐色、灰褐色、青紫色、青黒色、黒褐色
など着色させることのできる窒素を含有する複素環式化
合物としては2.4.6−トリス(2−ピリジル)−s
−トリアジン、α、d、/−トリピリジル、i、io−
フェナンスロリン、4.7−ジフェニル−1,10−フ
ェナンスロリン、4゜7−シメチルー1.10−フェナ
ンスロリン、4゜7−ジフェニル−1,10−7エナン
スロリン、2硫酸2ナトリウム塩、3−(2−ピヌジル
)−5,5−ジフェニル−1,2,4−)リアジベαd
−ジピリジル、rγ′−ジピリジル、塩素化銅フタロシ
アニン、2.4−ジメチルイミダゾール、及びこれらの
混合物などがある。
In addition, nitrogen-containing heterocyclic compounds that can be colored, for example, brownish-brown, grayish-brown, bluish-purple, blue-black, and blackish-brown, include 2.4.6-tris(2-pyridyl)-s.
-triazine, α, d,/-tripyridyl, i, io-
Phenanthroline, 4.7-diphenyl-1,10-phenanthroline, 4゜7-dimethyl-1.10-phenanthroline, 4゜7-diphenyl-1,10-7 enanthroline, disodium salt of disulfate, 3-(2-pinudyl)-5,5-diphenyl-1,2,4-)riazibe αd
-dipyridyl, rγ'-dipyridyl, chlorinated copper phthalocyanine, 2,4-dimethylimidazole, and mixtures thereof.

但し、ここに記載したものが全てではなく類似の構造の
もので、添加することによって、銅の処理表面を金属銅
色および金属銅光沢以外に着色させることができる窒素
を含有する複素環式化合物も使用出来る。添加量として
はQ、1rr@/1以上で良い。これらの薬品は比較的
高価なものが多いため、多量に添加することはコストの
点から好ましくはない。一般的には1ffIg/lから
500mg/Jの範囲が好ましい。
However, the compounds listed here are not all nitrogen-containing heterocyclic compounds that have a similar structure and can be added to color the treated surface of copper in a color other than metallic copper color and metallic copper luster. can also be used. The addition amount may be Q, 1rr@/1 or more. Since many of these chemicals are relatively expensive, it is not preferable to add them in large amounts from the viewpoint of cost. Generally, a range of 1ffIg/l to 500mg/J is preferred.

これらの薬品類は一同仁化学研究所や東京化成工業−な
どから市販薬品として入手できる。
All of these chemicals are commercially available from companies such as Jin Kagaku Kenkyusho and Tokyo Kasei Kogyo.

処理液の温度は処理液の…や還元剤の濃度と主に関係し
ており、田や還元剤濃度が高い場合には低温でも処理可
能になる。したがって、処理液の組成によって室温から
90℃までの範囲で選ぶことができる。
The temperature of the processing solution is mainly related to the concentration of the processing solution and the reducing agent, and if the concentration of the reducing agent is high, processing can be performed even at low temperatures. Therefore, the temperature can be selected from room temperature to 90°C depending on the composition of the processing liquid.

この処理液は無電解銅めっき液に属するものであり処理
液の組成が一定に保持される場合、処理時間と共にめっ
き析出によって重量が増加する。従来のこの種処理液は
逆に重量か減少するので、この点は従来の処理液と異な
る。
This processing solution belongs to the electroless copper plating solution, and if the composition of the processing solution is kept constant, the weight increases with the processing time due to plating precipitation. This point differs from conventional processing liquids because the weight of conventional processing liquids decreases.

処理時間は処理液のめっき析出速度と関係する。又処理
工程は短い方が好ましいので、一般的には処理液への浸
漬時間は2分間〜60分間である。
The processing time is related to the plating deposition rate of the processing solution. Further, since it is preferable that the treatment step be short, the immersion time in the treatment liquid is generally 2 minutes to 60 minutes.

以上本発明を、内層配線付積層板の配線パターンの導体
の処理について説明したが、本発明の処理液は銅張積層
板のエツチングやめっきのためのレジスト形成において
銅とレジストとの接着力の増強やプリント配線板の半田
レジスト形成において、銅と半田レジストとの接着力の
増強のための銅の表面処理にも使用できる。
The present invention has been described above with respect to the treatment of the conductor of the wiring pattern of a laminate with inner layer wiring, but the treatment liquid of the present invention improves the adhesive strength between copper and resist when forming a resist for etching or plating of a copper-clad laminate. It can also be used for surface treatment of copper to strengthen the adhesive strength between copper and solder resist in reinforcement and solder resist formation for printed wiring boards.

すなわち、内層回路をエツチング法やアディティブ法で
形成したのち、本発明の処理を行い、スクリーン印刷カ
ーテンコート法やホットロールラミネート法で絶縁性樹
脂例えばレジストインクや接着剤を塗布または付着させ
ることKより銅回路を上記材料との間の密着力を確保す
ることができる。このようにして得られたものの外層に
従来法で導体を形成すれば多層板をプレス工程なしで製
造することができる。
That is, after forming the inner layer circuit by an etching method or an additive method, the process of the present invention is performed, and an insulating resin such as a resist ink or an adhesive is applied or attached by a screen printing curtain coating method or a hot roll laminating method. Adhesion between the copper circuit and the above material can be ensured. If a conductor is formed on the outer layer of the product thus obtained by a conventional method, a multilayer board can be manufactured without a pressing process.

また、銅箔とプリプレグを積層接着して銅張り積層板を
製造する際の銅箔のプリプレグに接する面の処理、銅箔
とフレキシブルフィルムを接着してフレキシブル配線板
用基板を製造する際の銅箔のフィルムに接する面の処理
にも使用出来る。
In addition, we also deal with the treatment of the surface of copper foil that comes into contact with prepreg when manufacturing copper-clad laminates by laminating and bonding copper foil and prepreg, and the treatment of copper foil and prepreg when manufacturing substrates for flexible wiring boards by bonding copper foil and flexible film. It can also be used to treat the surface of foil that comes into contact with the film.

実施例1゜ エポキシ樹脂を使用した銅張積層板をあらかじめ過硫酸
アンモニウムで粗化処理した。次処基本浴組成(2)に
4,7−シメチルー1,1o−7エナンスリン3■/j
添加した処理液(70±2℃)に10分間浸漬した。
Example 1 A copper-clad laminate using an epoxy resin was roughened in advance with ammonium persulfate. Next step basic bath composition (2) is 4,7-dimethyl-1,1o-7 enanthrine 3■/j
It was immersed in the added treatment liquid (70±2°C) for 10 minutes.

基本浴組成図 Cu5O<’ 5H20: 10 g / 1EDTA
e2Na  : 40 g/IF4((室温):12.
0 37%HCHO: 5 rnl/ 1 純 水   :総量で11になる端 処理して得た銅の表面の色、処理面の接着力テストであ
るテープテストおよび処理後、接着力が低下しないで積
層接着できる可使時間の長さを示す保存性の試験結果を
表1に示す。テープテス)+2.10mm幅の粘着剤付
きマイラーテープ(日東電工製)を処理表面に貼り付け
、貼り付けたテープが透明になるまでテープを処理面に
密着させ、その後ゆりくりとひきはがし、粘着剤の処理
表面への残り量を調べる方法である。
Basic bath composition diagram Cu5O<'5H20: 10 g/1EDTA
e2Na: 40 g/IF4 ((room temperature): 12.
0 37% HCHO: 5 rnl/1 Pure water: total amount of 11 The color of the copper surface obtained by edge treatment, the tape test which is an adhesion test of the treated surface, and the lamination with no decrease in adhesion after treatment. Table 1 shows the preservability test results indicating the length of pot life that can be bonded. Tape Test) + 2. Attach a 10 mm wide Mylar tape with adhesive (manufactured by Nitto Denko) to the treated surface, keep the tape in close contact with the treated surface until the pasted tape becomes transparent, then gently peel it off and remove the adhesive. This is a method to check the amount remaining on the treated surface.

残り量が多い処理面はど、多層プリント配線板を製造し
た時の接着力が高い。゛判定基準は粘着剤の残らなかっ
たものを×、わずかに残ったものをへ半分ぐらい残った
ものをO1全面にわたって残ったものを◎とした。
Treated surfaces with a large amount of residual material have high adhesive strength when manufacturing multilayer printed wiring boards.゛The evaluation criteria were as follows: No adhesive remained: ×; A little adhesive remained; ◎: About half remained over the entire surface of O1.

保存性は、常温、常湿で7日間放置後、前記のテープテ
ストを行い、粘着剤の処理表面への残り量をテープテス
トと同様の評価で調べること罠より行った。
Storage stability was determined by performing the tape test described above after leaving the product at room temperature and humidity for 7 days, and examining the amount of adhesive remaining on the treated surface using the same evaluation method as the tape test.

実施例2゜ 実施例1と同様の基本浴組成(5)に、i、1o−フェ
ナンスロリンを10011g/J添加した処理液に30
分浸漬する以外は実施例1と同様圧して銅張り積層板を
処理した。処理して得た鉤の表面の色、テープテスト、
保存性の試験結果を表1に示す。
Example 2゜To the same basic bath composition (5) as in Example 1, 10011 g/J of i,1o-phenanthroline was added to the treatment solution.
A copper-clad laminate was treated by pressing in the same manner as in Example 1, except that it was immersed in portions. Color of the surface of the treated hook, tape test,
Table 1 shows the storage stability test results.

実施例& 実施例1と同様の基本浴組成(4)に、α、l−ジピリ
ジルを10■/l添加した処理液に10分間浸漬する以
外は実施例1と同様にして銅張り積層板を処理した。処
理して得た銅の表面の色、テープテスト、保存性の試験
結果を表1に示す。
Examples & Copper-clad laminates were prepared in the same manner as in Example 1, except that they were immersed for 10 minutes in a treatment solution in which α,l-dipyridyl was added at 10 μ/l to the same basic bath composition (4) as in Example 1. Processed. Table 1 shows the surface color, tape test, and preservability test results of the treated copper.

実施例4゜ 実施例1と同様の基本浴組成(8)に、2.4.6−ト
リス(2−ピリジル)−5−)リアジンを20■/l添
加した処理液に5分間浸漬する以外は実施例1と同様に
して銅張り積層機を処理した。処理して得た銅の表面の
色、テープテスト、保存性の試験結果を表IK示す。
Example 4゜The same basic bath composition (8) as in Example 1 except that 2.4.6-tris(2-pyridyl)-5-)riazine was added at 20 μ/l to the treatment solution for 5 minutes. A copper clad laminator was processed in the same manner as in Example 1. Table IK shows the surface color, tape test, and storage stability test results of the treated copper.

実施例5゜ 実施例1と同様の基本浴組成(2)に、6−(2−ピリ
ジル) −5,6−ジフヱニルー1.2.4− )リア
ジンを10■/e添加した処理液に30分間浸漬する以
外は実施例1と同様にして銅張り積層機を処理した。処
理して得た銅の表面の色、テープテスト、保存性の試験
結果を表1に、示す。
Example 5 To the same basic bath composition (2) as in Example 1, 10 μ/e of 6-(2-pyridyl)-5,6-diphenyl-1.2.4-) riazine was added to the treatment solution. A copper clad laminator was treated in the same manner as in Example 1, except for soaking for a minute. Table 1 shows the surface color, tape test, and storage stability test results of the treated copper.

比較例1 エポキシ樹脂を使用した銅張積層板を過硫酸アンモニウ
ムで粗化処理した。この銅の表面の色、テープテストお
よび保存性を調べた結果を表1に示す。
Comparative Example 1 A copper-clad laminate using an epoxy resin was roughened with ammonium persulfate. Table 1 shows the results of examining the surface color, tape test, and storage stability of this copper.

以下j、臼 表1 実施例6 エポキシ樹脂を使用した銅張積層板(両面板9に内層回
路を形成し印刷回路としたものを次の方法によって処理
した。
Table 1 below. Example 6 A copper-clad laminate using epoxy resin (a double-sided board 9 with an inner layer circuit formed to form a printed circuit) was treated by the following method.

脱脂→過硫酸アンモニウム粗化→水洗→基本浴組成(A
)K4,7−シメチルー1,10−フェナンスロリン1
0■/l添加した70℃の浴に10分間浸漬→水洗→乾
燥(100℃30分間)この印刷回路板を図面に示す構
成によって加熱加圧(圧力60kg/m、温度170℃
、時間120分)をおこない多層化接着し多層プリント
配線板を作成した。得られた多層プリント配線板の特性
を表2に示す。
Degreasing → ammonium persulfate roughening → water washing → basic bath composition (A
) K4,7-dimethyl-1,10-phenanthroline 1
Immerse for 10 minutes in a bath at 70°C containing 0 ■/l → Wash with water → Dry (30 minutes at 100°C) This printed circuit board was heated and pressurized (pressure: 60 kg/m, temperature: 170°C) using the configuration shown in the drawing.
, time 120 minutes) to create a multilayer printed wiring board. Table 2 shows the properties of the obtained multilayer printed wiring board.

比較例2 エポキシ樹脂を使用した銅張積層板(両面板)罠内層回
路を形成し印刷回路としたものを次の方法によって処理
した。
Comparative Example 2 A copper-clad laminate (double-sided board) using epoxy resin with a trap inner layer circuit formed thereon to form a printed circuit was treated by the following method.

脱脂→過硫酸アンモニウム粗化→水洗→乾燥(100℃
50分)。この印刷回路板を用いて実施例6と同様に多
層化接着して多層プリント配線板を作成した。このもの
の特性を表2に示す。
Degreasing → roughening with ammonium persulfate → washing with water → drying (100℃)
50 minutes). Using this printed circuit board, a multilayer printed wiring board was produced by bonding the layers in the same manner as in Example 6. The properties of this product are shown in Table 2.

比較例3 エポキシ樹脂を使用した銅張積層板(両面板)に内層回
路を形成し印刷回路としたものを次の方法によって処理
した。脱脂→粗化→水洗→(水酸化ナトリウム05%士
リン酸三ナトリウム1%十亜塩素酸ナトリウム5%)水
溶液70℃、1分間浸漬→水洗→乾燥(100℃で30
分間)この印刷回路板を用いて実施例6と同様罠多層化
接着し工多層プリント配触板を作成した。このものの特
性を表2に示す。
Comparative Example 3 A printed circuit in which an inner layer circuit was formed on a copper-clad laminate (double-sided board) using an epoxy resin was treated by the following method. Degreasing → roughening → washing with water → (sodium hydroxide 05% trisodium phosphate 1% sodium decachlorite 5%) immersion in aqueous solution at 70°C for 1 minute → washing with water → drying (30% at 100°C)
Using this printed circuit board, a multilayer printed contact board was fabricated using the same method as in Example 6, with multilayer adhesive bonding. The properties of this product are shown in Table 2.

比較例4 両面粗化銅箔を使用したエポキシ樹脂鋼張積層板(両面
板)K内層回路を形成し、印刷回路としたものを実施例
6と同様に多層化接着して多層プリント配線板を作成し
た。このものの特性を表2に示す。
Comparative Example 4 An epoxy resin steel-clad laminate (double-sided board) using double-sided roughened copper foil with an inner layer circuit formed and a printed circuit was bonded in multiple layers in the same manner as in Example 6 to form a multilayer printed wiring board. Created. The properties of this product are shown in Table 2.

表2 (発明の効果) 以上説明したように、本発明に於てはプリプレグ等の樹
脂材料と銅との密着性が向上し、多層プリント板に於て
は、内層回路のライン精度が優れ、接着強度と保存性に
優れた内層用印刷回路板を得ることができる。
Table 2 (Effects of the invention) As explained above, in the present invention, the adhesion between resin materials such as prepreg and copper is improved, and in multilayer printed boards, the line precision of inner layer circuits is excellent, A printed circuit board for inner layer with excellent adhesive strength and storage stability can be obtained.

【図面の簡単な説明】[Brief explanation of the drawing]

図面は多層板の製造法を示す断面図である。 ・符号の説明 1 内層回路基板  2 内層回路基板上の回路鋼箔 3 プリプレグ   4 銅箔 FA面の浄書(内容に変更なし) 才l(刃 手続補正書坊弐) 昭和59年11月7日 The drawing is a cross-sectional view showing a method of manufacturing a multilayer board. ・Explanation of symbols 1. Inner layer circuit board 2. Circuit steel foil on the inner layer circuit board 3 Prepreg 4 Copper foil Engraving of FA side (no change in content) talent (blade) Procedural amendment book 2) November 7, 1980

Claims (1)

【特許請求の範囲】 1、銅表面を (a)銅イオン、錯化剤、還元剤、水酸イオン、水、 (b)(a)液に添加することによって、銅の処理表面
を金属銅色および金属銅光沢以外に着 色させることができる窒素を含有する複素 環式化合物、 を含む液で処理することを特徴とする銅の表面処理法。
[Claims] 1. The copper surface is treated by adding (a) copper ions, a complexing agent, a reducing agent, a hydroxide ion, water, and (b) (a) to the treated surface of the copper. A method for surface treatment of copper, characterized by treating with a liquid containing a nitrogen-containing heterocyclic compound capable of imparting color other than metallic copper luster.
JP59135561A 1984-06-29 1984-06-29 Surface treatment of copper Granted JPS6115980A (en)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP59135561A JPS6115980A (en) 1984-06-29 1984-06-29 Surface treatment of copper
KR1019850004563A KR890004583B1 (en) 1984-06-29 1985-06-26 Process for treating metal surface
EP85304636A EP0170414B1 (en) 1984-06-29 1985-06-28 Process for treating metal surface
DE8585304636T DE3582531D1 (en) 1984-06-29 1985-06-28 METHOD FOR TREATING METAL SURFACES.
US06/750,780 US4643793A (en) 1984-06-29 1985-07-01 Process for treating metal surface

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59135561A JPS6115980A (en) 1984-06-29 1984-06-29 Surface treatment of copper

Publications (2)

Publication Number Publication Date
JPS6115980A true JPS6115980A (en) 1986-01-24
JPH0419306B2 JPH0419306B2 (en) 1992-03-30

Family

ID=15154686

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59135561A Granted JPS6115980A (en) 1984-06-29 1984-06-29 Surface treatment of copper

Country Status (1)

Country Link
JP (1) JPS6115980A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR19980033027A (en) * 1996-10-21 1998-07-25 후지이 히로시 Acrylic resin-containing metal surface treatment composition, treatment method and treated metal material containing Y hetero ring
CN112969819A (en) * 2018-11-14 2021-06-15 Ymt股份有限公司 Electroplating laminate and printed wiring board

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR19980033027A (en) * 1996-10-21 1998-07-25 후지이 히로시 Acrylic resin-containing metal surface treatment composition, treatment method and treated metal material containing Y hetero ring
CN112969819A (en) * 2018-11-14 2021-06-15 Ymt股份有限公司 Electroplating laminate and printed wiring board
JP2021517933A (en) * 2018-11-14 2021-07-29 ワイエムティー カンパニー リミテッド Plated laminate and printed circuit board

Also Published As

Publication number Publication date
JPH0419306B2 (en) 1992-03-30

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