JPS61155999A - 高光度輻射を行なう装置 - Google Patents
高光度輻射を行なう装置Info
- Publication number
- JPS61155999A JPS61155999A JP60290304A JP29030485A JPS61155999A JP S61155999 A JPS61155999 A JP S61155999A JP 60290304 A JP60290304 A JP 60290304A JP 29030485 A JP29030485 A JP 29030485A JP S61155999 A JPS61155999 A JP S61155999A
- Authority
- JP
- Japan
- Prior art keywords
- liquid
- gas
- arc chamber
- electrode
- chamber
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 230000005855 radiation Effects 0.000 title claims description 16
- 239000007788 liquid Substances 0.000 claims description 63
- 238000001816 cooling Methods 0.000 claims description 6
- 230000007423 decrease Effects 0.000 claims description 3
- 239000012530 fluid Substances 0.000 claims description 3
- 238000002347 injection Methods 0.000 claims 3
- 239000007924 injection Substances 0.000 claims 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 7
- 238000000926 separation method Methods 0.000 description 6
- 239000002245 particle Substances 0.000 description 3
- 230000003993 interaction Effects 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 239000010453 quartz Substances 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 230000007704 transition Effects 0.000 description 2
- 230000008859 change Effects 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 230000001010 compromised effect Effects 0.000 description 1
- 239000002826 coolant Substances 0.000 description 1
- 239000000110 cooling liquid Substances 0.000 description 1
- 238000010891 electric arc Methods 0.000 description 1
- 238000009499 grossing Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 230000002250 progressing effect Effects 0.000 description 1
- 230000035939 shock Effects 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J61/00—Gas-discharge or vapour-discharge lamps
- H01J61/02—Details
- H01J61/24—Means for obtaining or maintaining the desired pressure within the vessel
- H01J61/28—Means for producing, introducing, or replenishing gas or vapour during operation of the lamp
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J61/00—Gas-discharge or vapour-discharge lamps
- H01J61/02—Details
- H01J61/52—Cooling arrangements; Heating arrangements; Means for circulating gas or vapour within the discharge space
Landscapes
- Plasma Technology (AREA)
- Discharge Lamps And Accessories Thereof (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CA000470997A CA1239437A (en) | 1984-12-24 | 1984-12-24 | High intensity radiation method and apparatus having improved liquid vortex flow |
| CA470997 | 1984-12-24 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS61155999A true JPS61155999A (ja) | 1986-07-15 |
| JPH0568825B2 JPH0568825B2 (enExample) | 1993-09-29 |
Family
ID=4129455
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP60290304A Granted JPS61155999A (ja) | 1984-12-24 | 1985-12-23 | 高光度輻射を行なう装置 |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US4700102A (enExample) |
| EP (1) | EP0186879B1 (enExample) |
| JP (1) | JPS61155999A (enExample) |
| CN (1) | CN1007561B (enExample) |
| CA (1) | CA1239437A (enExample) |
| DE (1) | DE3583497D1 (enExample) |
Families Citing this family (18)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4937490A (en) * | 1988-12-19 | 1990-06-26 | Vortek Industries Ltd. | High intensity radiation apparatus and fluid recirculating system therefor |
| US5561735A (en) * | 1994-08-30 | 1996-10-01 | Vortek Industries Ltd. | Rapid thermal processing apparatus and method |
| US5556791A (en) * | 1995-01-03 | 1996-09-17 | Texas Instruments Incorporated | Method of making optically fused semiconductor powder for solar cells |
| GB9506010D0 (en) * | 1995-03-23 | 1995-08-23 | Anderson John E | Electromagnetic energy directing method and apparatus |
| CA2310883A1 (en) | 1999-06-07 | 2000-12-07 | Norman L. Arrison | Method and apparatus for fracturing brittle materials by thermal stressing |
| US6912356B2 (en) * | 1999-06-07 | 2005-06-28 | Diversified Industries Ltd. | Method and apparatus for fracturing brittle materials by thermal stressing |
| US6621199B1 (en) | 2000-01-21 | 2003-09-16 | Vortek Industries Ltd. | High intensity electromagnetic radiation apparatus and method |
| CN101324470B (zh) | 2001-12-26 | 2011-03-30 | 加拿大马特森技术有限公司 | 测量温度和热处理的方法及系统 |
| KR101163682B1 (ko) | 2002-12-20 | 2012-07-09 | 맷슨 테크날러지 캐나다 인코퍼레이티드 | 피가공물 지지 장치 |
| JP5630935B2 (ja) | 2003-12-19 | 2014-11-26 | マトソン テクノロジー、インコーポレイテッド | 工作物の熱誘起運動を抑制する機器及び装置 |
| US7781947B2 (en) | 2004-02-12 | 2010-08-24 | Mattson Technology Canada, Inc. | Apparatus and methods for producing electromagnetic radiation |
| US20050180141A1 (en) * | 2004-02-13 | 2005-08-18 | Norman Arrison | Protection device for high intensity radiation sources |
| WO2008058397A1 (en) | 2006-11-15 | 2008-05-22 | Mattson Technology Canada, Inc. | Systems and methods for supporting a workpiece during heat-treating |
| WO2009137940A1 (en) | 2008-05-16 | 2009-11-19 | Mattson Technology Canada, Inc. | Workpiece breakage prevention method and apparatus |
| MX2013010300A (es) | 2011-03-10 | 2014-04-30 | Mesocoat Inc | Equipo y metodo para la fabricacion de productos con revestimiento metalico. |
| US9196760B2 (en) | 2011-04-08 | 2015-11-24 | Ut-Battelle, Llc | Methods for producing complex films, and films produced thereby |
| CA2864929C (en) * | 2012-02-24 | 2015-12-22 | Mattson Technology, Inc. | Apparatus and methods for generating electromagnetic radiation |
| KR20150127719A (ko) | 2013-03-15 | 2015-11-17 | 메소코트, 인코포레이티드 | 3원 세라믹 용사 분말 및 코팅 방법 |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5340274A (en) * | 1976-09-27 | 1978-04-12 | Stanley Electric Co Ltd | Apparatus for controlling vapour pressure in liquiddgrowth furnace for semiconductor |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3292028A (en) * | 1962-06-20 | 1966-12-13 | Giannini Scient Corp | Gas vortex-stabilized light source |
| US3405305A (en) * | 1964-12-28 | 1968-10-08 | Giannini Scient Corp | Vortex-stabilized radiation source with a hollowed-out electrode |
| US3366815A (en) * | 1965-12-29 | 1968-01-30 | Union Carbide Corp | High pressure arc cooled by a thin film of liquid on the wall of the envelope |
| US4027185A (en) * | 1974-06-13 | 1977-05-31 | Canadian Patents And Development Limited | High intensity radiation source |
-
1984
- 1984-12-24 CA CA000470997A patent/CA1239437A/en not_active Expired
-
1985
- 1985-12-20 DE DE8585116346T patent/DE3583497D1/de not_active Expired - Lifetime
- 1985-12-20 EP EP85116346A patent/EP0186879B1/en not_active Expired
- 1985-12-23 CN CN85109598.4A patent/CN1007561B/zh not_active Expired
- 1985-12-23 JP JP60290304A patent/JPS61155999A/ja active Granted
- 1985-12-24 US US06/812,977 patent/US4700102A/en not_active Expired - Lifetime
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5340274A (en) * | 1976-09-27 | 1978-04-12 | Stanley Electric Co Ltd | Apparatus for controlling vapour pressure in liquiddgrowth furnace for semiconductor |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0568825B2 (enExample) | 1993-09-29 |
| US4700102A (en) | 1987-10-13 |
| DE3583497D1 (de) | 1991-08-22 |
| CA1239437A (en) | 1988-07-19 |
| CN1007561B (zh) | 1990-04-11 |
| CN85109598A (zh) | 1986-07-16 |
| EP0186879A2 (en) | 1986-07-09 |
| EP0186879A3 (en) | 1988-11-17 |
| EP0186879B1 (en) | 1991-07-17 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| LAPS | Cancellation because of no payment of annual fees |