JPS61155999A - 高光度輻射を行なう装置 - Google Patents

高光度輻射を行なう装置

Info

Publication number
JPS61155999A
JPS61155999A JP60290304A JP29030485A JPS61155999A JP S61155999 A JPS61155999 A JP S61155999A JP 60290304 A JP60290304 A JP 60290304A JP 29030485 A JP29030485 A JP 29030485A JP S61155999 A JPS61155999 A JP S61155999A
Authority
JP
Japan
Prior art keywords
liquid
gas
arc chamber
electrode
chamber
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP60290304A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0568825B2 (enExample
Inventor
アーン・ジヨーベル
デイビツド・エム・カム
アンソニー・ジエイ・デイー・ホースデン
ニコラス・ピー・ハルピン
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
BOOTEC IND Ltd
Original Assignee
BOOTEC IND Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by BOOTEC IND Ltd filed Critical BOOTEC IND Ltd
Publication of JPS61155999A publication Critical patent/JPS61155999A/ja
Publication of JPH0568825B2 publication Critical patent/JPH0568825B2/ja
Granted legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J61/00Gas-discharge or vapour-discharge lamps
    • H01J61/02Details
    • H01J61/24Means for obtaining or maintaining the desired pressure within the vessel
    • H01J61/28Means for producing, introducing, or replenishing gas or vapour during operation of the lamp
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J61/00Gas-discharge or vapour-discharge lamps
    • H01J61/02Details
    • H01J61/52Cooling arrangements; Heating arrangements; Means for circulating gas or vapour within the discharge space

Landscapes

  • Plasma Technology (AREA)
  • Discharge Lamps And Accessories Thereof (AREA)
JP60290304A 1984-12-24 1985-12-23 高光度輻射を行なう装置 Granted JPS61155999A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
CA000470997A CA1239437A (en) 1984-12-24 1984-12-24 High intensity radiation method and apparatus having improved liquid vortex flow
CA470997 1984-12-24

Publications (2)

Publication Number Publication Date
JPS61155999A true JPS61155999A (ja) 1986-07-15
JPH0568825B2 JPH0568825B2 (enExample) 1993-09-29

Family

ID=4129455

Family Applications (1)

Application Number Title Priority Date Filing Date
JP60290304A Granted JPS61155999A (ja) 1984-12-24 1985-12-23 高光度輻射を行なう装置

Country Status (6)

Country Link
US (1) US4700102A (enExample)
EP (1) EP0186879B1 (enExample)
JP (1) JPS61155999A (enExample)
CN (1) CN1007561B (enExample)
CA (1) CA1239437A (enExample)
DE (1) DE3583497D1 (enExample)

Families Citing this family (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4937490A (en) * 1988-12-19 1990-06-26 Vortek Industries Ltd. High intensity radiation apparatus and fluid recirculating system therefor
US5561735A (en) * 1994-08-30 1996-10-01 Vortek Industries Ltd. Rapid thermal processing apparatus and method
US5556791A (en) * 1995-01-03 1996-09-17 Texas Instruments Incorporated Method of making optically fused semiconductor powder for solar cells
GB9506010D0 (en) * 1995-03-23 1995-08-23 Anderson John E Electromagnetic energy directing method and apparatus
CA2310883A1 (en) 1999-06-07 2000-12-07 Norman L. Arrison Method and apparatus for fracturing brittle materials by thermal stressing
US6912356B2 (en) * 1999-06-07 2005-06-28 Diversified Industries Ltd. Method and apparatus for fracturing brittle materials by thermal stressing
US6621199B1 (en) 2000-01-21 2003-09-16 Vortek Industries Ltd. High intensity electromagnetic radiation apparatus and method
CN101324470B (zh) 2001-12-26 2011-03-30 加拿大马特森技术有限公司 测量温度和热处理的方法及系统
KR101163682B1 (ko) 2002-12-20 2012-07-09 맷슨 테크날러지 캐나다 인코퍼레이티드 피가공물 지지 장치
JP5630935B2 (ja) 2003-12-19 2014-11-26 マトソン テクノロジー、インコーポレイテッド 工作物の熱誘起運動を抑制する機器及び装置
US7781947B2 (en) 2004-02-12 2010-08-24 Mattson Technology Canada, Inc. Apparatus and methods for producing electromagnetic radiation
US20050180141A1 (en) * 2004-02-13 2005-08-18 Norman Arrison Protection device for high intensity radiation sources
WO2008058397A1 (en) 2006-11-15 2008-05-22 Mattson Technology Canada, Inc. Systems and methods for supporting a workpiece during heat-treating
WO2009137940A1 (en) 2008-05-16 2009-11-19 Mattson Technology Canada, Inc. Workpiece breakage prevention method and apparatus
MX2013010300A (es) 2011-03-10 2014-04-30 Mesocoat Inc Equipo y metodo para la fabricacion de productos con revestimiento metalico.
US9196760B2 (en) 2011-04-08 2015-11-24 Ut-Battelle, Llc Methods for producing complex films, and films produced thereby
CA2864929C (en) * 2012-02-24 2015-12-22 Mattson Technology, Inc. Apparatus and methods for generating electromagnetic radiation
KR20150127719A (ko) 2013-03-15 2015-11-17 메소코트, 인코포레이티드 3원 세라믹 용사 분말 및 코팅 방법

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5340274A (en) * 1976-09-27 1978-04-12 Stanley Electric Co Ltd Apparatus for controlling vapour pressure in liquiddgrowth furnace for semiconductor

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3292028A (en) * 1962-06-20 1966-12-13 Giannini Scient Corp Gas vortex-stabilized light source
US3405305A (en) * 1964-12-28 1968-10-08 Giannini Scient Corp Vortex-stabilized radiation source with a hollowed-out electrode
US3366815A (en) * 1965-12-29 1968-01-30 Union Carbide Corp High pressure arc cooled by a thin film of liquid on the wall of the envelope
US4027185A (en) * 1974-06-13 1977-05-31 Canadian Patents And Development Limited High intensity radiation source

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5340274A (en) * 1976-09-27 1978-04-12 Stanley Electric Co Ltd Apparatus for controlling vapour pressure in liquiddgrowth furnace for semiconductor

Also Published As

Publication number Publication date
JPH0568825B2 (enExample) 1993-09-29
US4700102A (en) 1987-10-13
DE3583497D1 (de) 1991-08-22
CA1239437A (en) 1988-07-19
CN1007561B (zh) 1990-04-11
CN85109598A (zh) 1986-07-16
EP0186879A2 (en) 1986-07-09
EP0186879A3 (en) 1988-11-17
EP0186879B1 (en) 1991-07-17

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