JPS6115072U - Resist coating equipment - Google Patents

Resist coating equipment

Info

Publication number
JPS6115072U
JPS6115072U JP9823884U JP9823884U JPS6115072U JP S6115072 U JPS6115072 U JP S6115072U JP 9823884 U JP9823884 U JP 9823884U JP 9823884 U JP9823884 U JP 9823884U JP S6115072 U JPS6115072 U JP S6115072U
Authority
JP
Japan
Prior art keywords
photosensitive resin
substrate
section
light
reflected
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP9823884U
Other languages
Japanese (ja)
Inventor
潔文 山田
洋一 山口
Original Assignee
ホ−ヤ株式会社
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by ホ−ヤ株式会社 filed Critical ホ−ヤ株式会社
Priority to JP9823884U priority Critical patent/JPS6115072U/en
Publication of JPS6115072U publication Critical patent/JPS6115072U/en
Pending legal-status Critical Current

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  • Coating Apparatus (AREA)

Abstract

(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。(57) [Abstract] This bulletin contains application data before electronic filing, so abstract data is not recorded.

Description

【図面の簡単な説明】[Brief explanation of the drawing]

第１図は従来の装置に係る回転数とレジストの膜厚との
関係を示す図、第２図は本考案の一実施例を示す概略構
成図、第３図は本考案によってレジストの膜厚を検出及
び算出する方法の原理を示す図であり、同図ａは検出す
る方法を示す図、同図ｂは算出する方法を示す図、第４
図は本実施例による回転時間とレジストの膜厚を示す図
である。 １・・・・・・保持台、２・・・・・・回転駆動部、３
・・・・・・ノズル、４・・・・・・発光部、５・・・
・・・レンズ、６・・・・・・受光部、７・・・・・・
監視部、８・・・・・・制御部。FIG. 1 is a diagram showing the relationship between the rotation speed and the resist film thickness in a conventional device, FIG. 2 is a schematic configuration diagram showing an embodiment of the present invention, and FIG. FIG. 4 is a diagram illustrating the principle of a method for detecting and calculating.
The figure is a diagram showing the rotation time and resist film thickness according to this example. 1... Holding stand, 2... Rotation drive unit, 3
... Nozzle, 4 ... Light emitting part, 5 ...
... Lens, 6... Light receiving section, 7...
Monitoring section, 8... Control section.

Claims (1)

【実用新案登録請求の範囲】[Scope of utility model registration request] 基板を保持する保持台と前記保持台を回転する回転駆動
部とからなる塗布部と、基板上の感光性樹脂の膜厚を検
出するための感光性樹脂を感光せず感光性樹脂の表面で
一部が反射し、他が感光性樹脂と基板と薄膜との界面で
反射する光を出射する発光部と、感光性樹脂の表面で反
射された光と感光性樹脂と基板の薄膜との界面で反射さ
れた光とを受光する受光部と、前記受光部に受光された
前記感光性樹脂の表面で反射された光と前記感光性樹脂
と基板の薄膜との界面で反射された光とから感光性樹脂
の膜厚を監視する監視部と、前記監視部からの伝達によ
り前記回転駆動部を停止するように制御する制御部とか
らなることを特徴とするレジスト塗布装置。A coating section consisting of a holder for holding the substrate and a rotation drive section for rotating the holder, and a coating section for detecting the film thickness of the photosensitive resin on the substrate without exposing the photosensitive resin to the surface of the photosensitive resin. A light emitting part that emits light that is partially reflected and the other part reflected at the interface between the photosensitive resin, the substrate, and the thin film, and the interface between the light reflected on the surface of the photosensitive resin and the thin film of the photosensitive resin and the substrate. a light receiving part that receives the light reflected by the light receiving part; and the light reflected by the surface of the photosensitive resin received by the light receiving part and the light reflected by the interface between the photosensitive resin and the thin film of the substrate. A resist coating apparatus comprising: a monitoring section that monitors the film thickness of a photosensitive resin; and a control section that controls the rotation drive section to stop based on transmission from the monitoring section.
JP9823884U 1984-06-29 1984-06-29 Resist coating equipment Pending JPS6115072U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP9823884U JPS6115072U (en) 1984-06-29 1984-06-29 Resist coating equipment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9823884U JPS6115072U (en) 1984-06-29 1984-06-29 Resist coating equipment

Publications (1)

Publication Number Publication Date
JPS6115072U true JPS6115072U (en) 1986-01-28

Family

ID=30657787

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9823884U Pending JPS6115072U (en) 1984-06-29 1984-06-29 Resist coating equipment

Country Status (1)

Country Link
JP (1) JPS6115072U (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01248620A (en) * 1988-03-30 1989-10-04 Tokyo Electron Ltd Coating method for resist
JPH02229577A (en) * 1989-03-02 1990-09-12 Mitsubishi Electric Corp Coater
JPH03211719A (en) * 1990-01-12 1991-09-17 Tokyo Electron Ltd Method of applying resist
JP2010060385A (en) * 2008-09-02 2010-03-18 Shibaura Mechatronics Corp Device and method for measuring liquid membrane thickness
WO2022138291A1 (en) * 2020-12-24 2022-06-30 東京エレクトロン株式会社 Substrate treatment apparatus, substrate treatment method, and storage medium

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS533260A (en) * 1976-06-29 1978-01-12 Mitsubishi Electric Corp Film thickness measuring device of transparent thin film
JPS5778140A (en) * 1980-10-31 1982-05-15 Hoya Corp Forming method for photoresist film

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS533260A (en) * 1976-06-29 1978-01-12 Mitsubishi Electric Corp Film thickness measuring device of transparent thin film
JPS5778140A (en) * 1980-10-31 1982-05-15 Hoya Corp Forming method for photoresist film

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01248620A (en) * 1988-03-30 1989-10-04 Tokyo Electron Ltd Coating method for resist
JPH02229577A (en) * 1989-03-02 1990-09-12 Mitsubishi Electric Corp Coater
JPH03211719A (en) * 1990-01-12 1991-09-17 Tokyo Electron Ltd Method of applying resist
JP2010060385A (en) * 2008-09-02 2010-03-18 Shibaura Mechatronics Corp Device and method for measuring liquid membrane thickness
WO2022138291A1 (en) * 2020-12-24 2022-06-30 東京エレクトロン株式会社 Substrate treatment apparatus, substrate treatment method, and storage medium

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