JPS61142867U - - Google Patents
Info
- Publication number
- JPS61142867U JPS61142867U JP2409385U JP2409385U JPS61142867U JP S61142867 U JPS61142867 U JP S61142867U JP 2409385 U JP2409385 U JP 2409385U JP 2409385 U JP2409385 U JP 2409385U JP S61142867 U JPS61142867 U JP S61142867U
- Authority
- JP
- Japan
- Prior art keywords
- rotating shaft
- shutter
- guide groove
- sputtering
- etching
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000004544 sputter deposition Methods 0.000 claims description 6
- 238000005530 etching Methods 0.000 claims description 4
- 238000010586 diagram Methods 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 239000013077 target material Substances 0.000 description 1
Description
第１図ａは本考案に係るスパツタリング装置の
概略断面図、同図ｂは第２の回転軸に設けられる
突起部分の斜視図、第２図ａは成膜スパツタにお
ける場合の両シヤツタの位置関係、第２図ｂはプ
レスパツタ及びエツチングの場合の両シヤツタの
位置関係を示す説明図である。
２０……基板、３０……ターゲツト材、４０…
…プレスパツタ用シヤツタ、４１……開口、４２
……第２の回転軸、４３……突起、５０……エツ
チング用シヤツタ、５１……開口、５２……第１
の回転軸、５３……案内溝。
Fig. 1a is a schematic cross-sectional view of the sputtering device according to the present invention, Fig. 1b is a perspective view of the protrusion provided on the second rotating shaft, and Fig. 2a is the positional relationship between the two shutters in the case of a film-forming sputter. , FIG. 2b is an explanatory diagram showing the positional relationship of both shutters in the case of press sputtering and etching. 20...Substrate, 30...Target material, 40...
...Shutter for press sputter, 41...Opening, 42
...Second rotating shaft, 43...Protrusion, 50...Etching shutter, 51...Opening, 52...First
rotation axis, 53... guide groove.
Claims (1)
ングシヤツタを回転するシリンダ状の第１の回転
軸と、開口を有するプレスパツタ用シヤツタと、
プレスパツタ用シヤツタを回転する第２の回転軸
と、第２の回転軸を回転駆動する駆動系とを具備
するスパツタリング装置であつて、前記第１の回
転軸と第２の回転軸を同軸状に配置すると共に、
第１の回転軸には所定長さの案内溝が周方向に沿
つて設けられ、第２の回転軸には前記案内溝に遊
嵌する突起が形成してあり、前記突起が前記案内
溝の一方の端縁に当接した場合に前記各シヤツタ
の両開口が重なり合わないようにすると共に、前
記突起が前記案内溝の他方の端縁に当接した場合
に前記両開口が対向するように構成したことを特
徴とするスパツタリング装置。 An etching shutter having an opening, a cylindrical first rotating shaft for rotating the etching shutter, and a press sputtering shutter having an opening;
A sputtering device comprising a second rotating shaft that rotates a shutter for press sputtering and a drive system that rotationally drives the second rotating shaft, the first rotating shaft and the second rotating shaft being coaxial. Along with placing
The first rotating shaft is provided with a guide groove of a predetermined length along the circumferential direction, and the second rotating shaft is provided with a protrusion that loosely fits into the guide groove. The openings of each shutter are arranged so that they do not overlap when they come into contact with one end edge, and the openings are made to face each other when the projection comes into contact with the other end edge of the guide groove. A sputtering device characterized by the following configurations.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2409385U JPS61142867U (en) | 1985-02-20 | 1985-02-20 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2409385U JPS61142867U (en) | 1985-02-20 | 1985-02-20 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS61142867U true JPS61142867U (en) | 1986-09-03 |
Family
ID=30517926
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2409385U Pending JPS61142867U (en) | 1985-02-20 | 1985-02-20 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS61142867U (en) |
-
1985
- 1985-02-20 JP JP2409385U patent/JPS61142867U/ja active Pending
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