JPS61138240U - - Google Patents
Info
- Publication number
- JPS61138240U JPS61138240U JP2245085U JP2245085U JPS61138240U JP S61138240 U JPS61138240 U JP S61138240U JP 2245085 U JP2245085 U JP 2245085U JP 2245085 U JP2245085 U JP 2245085U JP S61138240 U JPS61138240 U JP S61138240U
- Authority
- JP
- Japan
- Prior art keywords
- valve
- leak valve
- electron beam
- beam lithography
- vacuum evacuation
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000000609 electron-beam lithography Methods 0.000 claims 3
- 238000010586 diagram Methods 0.000 description 2
Landscapes
- Electron Beam Exposure (AREA)
- Details Of Valves (AREA)
- Electron Sources, Ion Sources (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2245085U JPS61138240U (enExample) | 1985-02-19 | 1985-02-19 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2245085U JPS61138240U (enExample) | 1985-02-19 | 1985-02-19 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS61138240U true JPS61138240U (enExample) | 1986-08-27 |
Family
ID=30514753
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2245085U Pending JPS61138240U (enExample) | 1985-02-19 | 1985-02-19 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS61138240U (enExample) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2001108130A (ja) * | 1999-05-25 | 2001-04-20 | Applied Materials Inc | 半導体ウェーハ処理装置用クラスタバルブ |
-
1985
- 1985-02-19 JP JP2245085U patent/JPS61138240U/ja active Pending
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2001108130A (ja) * | 1999-05-25 | 2001-04-20 | Applied Materials Inc | 半導体ウェーハ処理装置用クラスタバルブ |
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