JPS61138238U - - Google Patents
Info
- Publication number
- JPS61138238U JPS61138238U JP2024785U JP2024785U JPS61138238U JP S61138238 U JPS61138238 U JP S61138238U JP 2024785 U JP2024785 U JP 2024785U JP 2024785 U JP2024785 U JP 2024785U JP S61138238 U JPS61138238 U JP S61138238U
- Authority
- JP
- Japan
- Prior art keywords
- boat
- lid
- processing tube
- opening
- semiconductor articles
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000010438 heat treatment Methods 0.000 claims description 2
- 239000004065 semiconductor Substances 0.000 claims 2
- 238000009792 diffusion process Methods 0.000 description 3
- 235000012431 wafers Nutrition 0.000 description 3
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- 239000011810 insulating material Substances 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2024785U JPH0220826Y2 (US07943777-20110517-C00090.png) | 1985-02-15 | 1985-02-15 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2024785U JPH0220826Y2 (US07943777-20110517-C00090.png) | 1985-02-15 | 1985-02-15 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS61138238U true JPS61138238U (US07943777-20110517-C00090.png) | 1986-08-27 |
| JPH0220826Y2 JPH0220826Y2 (US07943777-20110517-C00090.png) | 1990-06-06 |
Family
ID=30510557
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2024785U Expired JPH0220826Y2 (US07943777-20110517-C00090.png) | 1985-02-15 | 1985-02-15 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0220826Y2 (US07943777-20110517-C00090.png) |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS63201325U (US07943777-20110517-C00090.png) * | 1987-06-17 | 1988-12-26 | ||
| JPH0193112A (ja) * | 1987-10-05 | 1989-04-12 | Tel Sagami Ltd | 加熱装置 |
| JPH01175228A (ja) * | 1987-12-29 | 1989-07-11 | Tel Sagami Ltd | 縦型熱処理炉 |
| JP2003297770A (ja) * | 2002-03-29 | 2003-10-17 | Toshiba Ceramics Co Ltd | 半導体熱処理用反射板およびこの半導体熱処理用反射板の製造方法 |
| WO2004070814A1 (ja) * | 2003-02-06 | 2004-08-19 | Tokyo Electron Limited | リッド付の処理容器を備えた減圧処理装置 |
-
1985
- 1985-02-15 JP JP2024785U patent/JPH0220826Y2/ja not_active Expired
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS63201325U (US07943777-20110517-C00090.png) * | 1987-06-17 | 1988-12-26 | ||
| JPH0193112A (ja) * | 1987-10-05 | 1989-04-12 | Tel Sagami Ltd | 加熱装置 |
| JPH01175228A (ja) * | 1987-12-29 | 1989-07-11 | Tel Sagami Ltd | 縦型熱処理炉 |
| JP2003297770A (ja) * | 2002-03-29 | 2003-10-17 | Toshiba Ceramics Co Ltd | 半導体熱処理用反射板およびこの半導体熱処理用反射板の製造方法 |
| WO2004070814A1 (ja) * | 2003-02-06 | 2004-08-19 | Tokyo Electron Limited | リッド付の処理容器を備えた減圧処理装置 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0220826Y2 (US07943777-20110517-C00090.png) | 1990-06-06 |
