JPS61124139A - Manufacture of electronical element - Google Patents

Manufacture of electronical element

Info

Publication number
JPS61124139A
JPS61124139A JP24440884A JP24440884A JPS61124139A JP S61124139 A JPS61124139 A JP S61124139A JP 24440884 A JP24440884 A JP 24440884A JP 24440884 A JP24440884 A JP 24440884A JP S61124139 A JPS61124139 A JP S61124139A
Authority
JP
Japan
Prior art keywords
ring
film
resin
jig
shaped
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP24440884A
Other languages
Japanese (ja)
Inventor
Saburo Nobutoki
信時 三郎
Takaaki Kumochi
雲内 高明
Akira Fujita
藤田 昭
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP24440884A priority Critical patent/JPS61124139A/en
Publication of JPS61124139A publication Critical patent/JPS61124139A/en
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
    • H01L21/18Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/302Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
    • H01L21/304Mechanical treatment, e.g. grinding, polishing, cutting
    • H01L21/3046Mechanical treatment, e.g. grinding, polishing, cutting using blasting, e.g. sand-blasting

Abstract

PURPOSE:To readily and effectively remove an ultrafine foreign material by coating and drying resin paint on a position surrounded by a ring-shaped jig or an annular resin coating film,and then removing the solidified film simultaneously with removal of the jig. CONSTITUTION:Resin paint is coated on the peripheral edge of a transparent conductive film 2 at the center on a light transmission image sensing surface forming plate 1 in such a manner that the surface is a ring shape and the section is formed substantially in a semicircular shape to form a ring-shaped bank- shaped resin ring 5. A ring-shaped jig 6 having an upper open end 6a is contacted and disposed. The paint is coated on the surface 2a to be cleaned of the film 2 of cleaner surrounded by the jig 6 or the ring 5 to form the first resin coating film 7. Then, when the ring 5, the first film 7 and the second resin coating film 8 are dried and the jig 6 and the plate 1 are separated, no foreign materials such as contaminants, fine foreign material nor scratched chips of the film, residue remain on the surface 2a, and the scratching point of the film is not damaged, but entirely cleanly removed.

Description

【発明の詳細な説明】 〔発明の利用分野〕 本発明は電子素子の製造方法に係り、特に薄膜構造を有
する電子素子の製造過程における表面部材の洗浄法に関
するものでるる。
DETAILED DESCRIPTION OF THE INVENTION [Field of Application of the Invention] The present invention relates to a method of manufacturing an electronic device, and particularly to a method of cleaning surface members during the manufacturing process of an electronic device having a thin film structure.

「発明の背景〕 通常、薄膜積層構造を有し、薄膜に大きい電界が与えら
れるような電子素子には、例えば整流接合性を有する光
電変換素子あるいは薄膜蓄電池等がある。これらの薄膜
積層構造はスパッタリング、真空蒸着、CVD等の薄膜
形成プロセスによって順次積層形成される過程、特に2
種類の薄膜界面に異物粒子が付着すると、眩素子が局部
的に絶縁破壊、整流性異常るるいは整流性破壊を起し、
全体としての素子機能を害することがめる。例えば整流
性接触界面を有する光導電膜を用いた撮像管において、
光導電膜の整流界面に異物が付着した状態で次層を形成
すると、完成した撮像管による撮像画面の当該欠陥部は
異験による整流性破壊のために暗電流が過大に流れ、再
生画面に輝点傷を発生させることになる。通常、透明硝
子基板上に酸化イ/ジウム、酸化錫るるいはその複合体
薄膜を形成し、この上にSeを生成分とする光導電膜を
形成、あるいはさらにそれら両者の間に酸化ゲルマニウ
ム、酸化セリウム、弗化リチウムあるいはそれらの複合
膜を中間層として形成した光導電膜は、Se系光導電膜
をP層としたヘテロNP接合が形成されている。この場
合、どの層が厳密にN形牛導体であるかを定義すること
は不必要であるが、透明導電膜と中間層の界面および中
間層と光導電膜の界面のいずれも含めて整流性接合界面
と総称することとする。実質的見地からみると、透明導
電膜は、光導電膜蒸着とは異々るプロセスにより蒸着法
、スパッタリング法、CVD法るるいはPVD法により
形成されるCとが多く、次工程とは分離されている場合
が多い。このために膜形成後の異物付着の機会、確率が
大であり、またスパッタリング法はそれ自体異物を発生
しやすい。
"Background of the Invention" Electronic devices that usually have a thin film laminated structure and in which a large electric field is applied to the thin film include, for example, photoelectric conversion elements or thin film storage batteries that have rectifying junction properties. A process in which layers are sequentially formed by a thin film forming process such as sputtering, vacuum evaporation, or CVD, especially 2
When foreign particles adhere to the thin film interface of different types, the glare element may cause local dielectric breakdown, abnormal rectification, or rectification breakdown.
This may impair the overall device function. For example, in an image pickup tube using a photoconductive film with a rectifying contact interface,
If the next layer is formed with foreign matter attached to the rectifying interface of the photoconductive film, an excessive dark current will flow in the defective part of the imaging screen of the completed image pickup tube due to the accidental destruction of the rectifying property, and the reproduction screen will be affected. This will cause bright spot scratches. Usually, a thin film of i/dium oxide, tin oxide, or a composite thereof is formed on a transparent glass substrate, and a photoconductive film containing Se is formed on this, or between the two, germanium oxide or In a photoconductive film formed with cerium oxide, lithium fluoride, or a composite film thereof as an intermediate layer, a hetero-NP junction is formed with the Se-based photoconductive film as the P layer. In this case, it is unnecessary to define which layer is strictly an N-type conductor, but both the interface between the transparent conductive film and the intermediate layer and the interface between the intermediate layer and the photoconductive film have a rectifying property. This will be collectively referred to as the bonding interface. From a practical standpoint, transparent conductive films are often formed by vapor deposition, sputtering, CVD, or PVD using processes different from photoconductive film deposition, and are separated from the next process. It is often done. For this reason, the chance and probability of foreign matter adhering after film formation is high, and the sputtering method itself tends to generate foreign matter.

したがって次工程による被膜形成に先だって表面を清浄
にすることが必要かつ有効でるる。
Therefore, it is necessary and effective to clean the surface prior to coating formation in the next step.

従来では、液体中で超音波照射を行ない、蒸気浴から引
き上げ乾燥する方法あるいは付着した洗浄液全遠心力に
より液滴を振p+71ジ乾燥する方法(「塗料便覧」参
照)を行々うていたが、洗浄液中に異物が浮遊すること
は原理的に避けがたく、いかに洗浄液の81過清浄化を
行なっても洗浄液中の浮遊物は皆無とはならず、これが
再度洗浄面に付着したりあるいは極微細異物粒子は超音
波照射、ブラシング等の外力では離脱しない程度の引力
により基板面に付着したりしてるる程度以上の清浄化に
不可能とされていた。この限界は明確ではないが、粒径
が約0.1μmオーダないしそれ以下のものとみなされ
る。
Conventionally, the methods used were to irradiate ultrasonic waves in the liquid and then pull it out of the steam bath and dry it, or to shake and dry the droplets using the full centrifugal force of the attached cleaning liquid (see ``Paint Handbook''). In principle, it is unavoidable that foreign matter floats in the cleaning solution, and no matter how much you super-clean the cleaning solution, the floating matter in the cleaning solution will not be completely eliminated, and this may re-adhere to the cleaning surface or become extremely dangerous. It has been considered impossible to clean fine foreign particles beyond the level where they adhere to the substrate surface due to an attractive force that cannot be removed by external force such as ultrasonic irradiation or brushing. Although this limit is not clear, it is assumed that the particle size is on the order of about 0.1 μm or less.

このような基板面上の異物を除去するには、樹脂溶液を
被洗浄面に塗布し、乾燥後剥離して、その過程で乾燥し
た樹脂膜に異物を埋設せしめ、樹脂剥離とともに除去す
る方法が本願出願人により提案されている(特開昭52
−130810号公報)が、電子素子が例えば撮像管の
撮像面の如く小形で洗浄すべき面とその川辺の洗浄不要
部分の面との面積差が小でかつ洗浄しない部位も少なく
とも汚損が許されない場合には樹脂溶液の塗布およびそ
の乾燥樹脂膜の剥離を高い生産性をもって行なうことが
でき々かった。
To remove such foreign matter from the substrate surface, there is a method of applying a resin solution to the surface to be cleaned, peeling it off after drying, embedding the foreign matter in the dried resin film in the process, and removing it when the resin is peeled off. It has been proposed by the applicant (Japanese Unexamined Patent Publication No. 52
-130810 Publication), the electronic device is small, such as the imaging surface of an image pickup tube, and the area difference between the surface to be cleaned and the surface of the riverside portion that does not need cleaning is small, and at least the portion that is not cleaned is not allowed to be contaminated. In some cases, it has been difficult to apply the resin solution and peel off the dried resin film with high productivity.

〔発明の目的〕[Purpose of the invention]

したがって本発明は、前述した従来の問題に鑑みてなさ
れたものでメク、その目的とするところは、微小な異物
を容易かつ確実に除去して電子素子の品質および生産性
を向上させることができる電子素子の製造方法を提供す
ることにある。
Therefore, the present invention has been made in view of the above-mentioned conventional problems, and its purpose is to easily and reliably remove minute foreign matter and improve the quality and productivity of electronic devices. An object of the present invention is to provide a method for manufacturing an electronic device.

〔発明の概要〕[Summary of the invention]

このような目的を達成するために本発明による電子素子
の製造方法は、薄膜を積層形成する被洗浄体表面の該薄
膜形成領域周辺部のみに環状に樹脂塗料を塗布し、次い
でこの環状樹脂塗膜の形状に沿ったリング状治具を該環
状樹脂塗膜上に配置し、引き続き該リン状治具ないし環
状樹脂塗膜に囲まれた部位に樹脂塗料を塗布し乾燥後、
該リング状治具を取り去ると同時に固化した樹脂塗膜を
除去することによジ、被洗浄体表面に付着していた汚損
物質、微細異物を該塗膜に取り込んだ状態でかつ同時に
該塗膜の残漬も残すことなく完全に除去できるとともに
、該塗膜の引き剥し起点部の傷付け、塗膜のひぎちぎれ
残存部を発生することなく容易に剥離することができる
In order to achieve such an object, the method for manufacturing an electronic device according to the present invention involves applying a resin paint in a circular manner only to the peripheral area of the thin film forming area on the surface of the object to be cleaned on which a thin film is to be laminated, and then applying this circular resin coating. A ring-shaped jig that follows the shape of the film is placed on the annular resin coating, and then resin paint is applied to the area surrounded by the ring-shaped jig or the annular resin coating, and after drying,
By removing the solidified resin coating film at the same time as removing the ring-shaped jig, the coating film is removed at the same time as the contaminants and fine foreign matter adhering to the surface of the object to be cleaned are incorporated into the coating film. It can be completely removed without leaving any residue, and it can be easily peeled off without damaging the peeling starting point of the coating film or causing any torn remaining parts of the coating film.

[発明の実施例] 次に本発明の実施例を図面を用いて説明する。[Embodiments of the invention] Next, embodiments of the present invention will be described using the drawings.

第1図(a)〜(f)は本発明による電子素子の製造方
法を撮像管の撮像面形成に適用した場合の一例を説明す
るための断面工程図でろる。ここで本発明を説明する前
に撮像管の面板構体についてその構成の概略を説明する
。撮像管の面板構体は、例えば13mm形撮像管では第
2図に斜視図で示すように撮像面形成面板体1が@径約
13.5mmでその中央部分には透明導電膜2が形成さ
れ、ざらにその中央部分の直径約8.0 mmの部分が
撮像面形成有効部3で、その外周部4が電子銃部外管ガ
ラスとの封着に供する部位でるる。このようカ構成にお
いて、封着部となる外周部4も撮像面形成有効部3はど
の清浄度は要求されないが、汚損されていると、封着不
全による撮像管の真空度の不良全発生させたり、また有
機物破片が真空側の封着部以外に残ったりすると、やは
りガス発生による真空度不良を発生するので、汚損は許
されない。
FIGS. 1A to 1F are cross-sectional process diagrams for explaining an example of the case where the method for manufacturing an electronic device according to the present invention is applied to forming an image pickup surface of an image pickup tube. Before explaining the present invention, an outline of the configuration of the face plate structure of the image pickup tube will be explained. For example, in the case of a 13 mm type image pickup tube, as shown in a perspective view in FIG. 2, the face plate structure of the image pickup tube has an image pickup surface forming face plate 1 with a diameter of about 13.5 mm, and a transparent conductive film 2 formed in the center thereof. Roughly speaking, a central portion approximately 8.0 mm in diameter is an effective imaging surface forming portion 3, and its outer peripheral portion 4 is a portion for sealing with the electron gun outer tube glass. In such a structure, the outer circumferential portion 4 serving as the sealing portion and the imaging surface forming effective portion 3 are not required to have any degree of cleanliness, but if they are contaminated, the vacuum level of the image pickup tube may deteriorate due to poor sealing. If organic debris remains in areas other than the sealed portion on the vacuum side, contamination is not allowed, as this will also result in poor vacuum quality due to gas generation.

次に第1図によシ本発明の詳細な説明する。Next, the present invention will be explained in detail with reference to FIG.

まず同図(a)に示すように透光性の撮像面形成面板体
1上の中央部分に被着形成された透明導電膜2上の薄膜
形成面と々る被洗浄面2a上に微細な異物が付着してい
る場合、同図(b)に示すように透明導電膜2の周縁部
分に平面がリング状をなしかつ断面がほぼ半円状をなす
ように樹脂塗料を例えば吐出法により塗布し、リング状
にめぐらせた土手状樹脂リング5を形成する。この場合
、この樹脂塗料は適切な作業性を得るため、メチルエチ
ルケトン、メチルイソブチルケトンの単一またはその混
合溶剤るるいはトルエン添加溶剤が好ましく、また乾燥
後の膜強度、剥離力、残存物をなくすことを目的として
無可塑ないし高分子可塑剤または高沸点溶剤を可塑剤と
して添加した系が望ましい。
First, as shown in FIG. 2(a), fine particles are deposited on the surface to be cleaned 2a on the thin film-forming surface of the transparent conductive film 2 deposited on the central part of the light-transmitting imaging surface-forming face plate 1. If foreign matter is attached, a resin paint is applied to the peripheral edge of the transparent conductive film 2 by, for example, a jetting method so that the plane is ring-shaped and the cross-section is approximately semicircular, as shown in Figure (b). Then, a bank-like resin ring 5 is formed. In this case, in order to obtain appropriate workability for this resin coating, it is preferable to use a single or mixed solvent of methyl ethyl ketone, methyl isobutyl ketone, or a solvent with the addition of toluene. For this purpose, a system with no plasticizer or a polymer plasticizer or a high boiling point solvent added as a plasticizer is desirable.

次に同図(c)に示すように樹脂リング5の形状とほぼ
同等の開口端6aを有するリング状治具6を樹脂リング
5上に接触配置する。この場合、リング状治具6の開口
端6aは僅かであるが自重により樹脂リング5内に食い
込むことになる。また、ここで用いるリング状治具6は
、ステンレス製ないしは前述した樹脂塗料に侵されない
樹脂製リングで形成することが必要でるる。次に同図(
d)に示すようにリング状治具6ないし土手状の樹脂リ
ング5で囲繞された被洗浄体としての透明導電膜2の被
洗浄面2a上に前述と同様な樹脂塗料を塗布して第1の
樹脂塗膜アラ形成する。この場合、第1の樹脂塗膜7が
リング状治具6の内面側立上り部まで完全に覆い接着す
るように確認し、必要なら同図(e)に示すように前述
と同様な樹脂塗料全リング状治具6の内面側に達するま
で十分に追加塗布して第2の樹脂塗膜8を追加形成する
。次に樹脂リング5.第1の樹脂塗膜7および第2の樹
脂塗膜8を乾燥させ、リング状治具6に十分に接着され
た如き形状となつに後に同図(f)に示すようにリング
状治具6と撮像面形成面板体1とt引き剥すと、樹脂リ
ング5.第1の樹脂塗膜7および第2の樹脂塗膜8はリ
ング状治具6に付着し、被洗浄体としての透明導電膜2
の被洗浄面2a上には汚損物質、微細異物るるいは塗膜
のひきちぎれ残渣部等の異物を残すことなく完全にしか
も塗膜の引き剥し起点部を傷付けることなく、全く清浄
に除去することができた。
Next, as shown in FIG. 5C, a ring-shaped jig 6 having an open end 6a having substantially the same shape as the resin ring 5 is placed on the resin ring 5 in contact with it. In this case, the open end 6a of the ring-shaped jig 6 will dig into the resin ring 5 due to its own weight, albeit slightly. Further, the ring-shaped jig 6 used here needs to be made of stainless steel or a resin ring that is not corroded by the aforementioned resin paint. Next, the same figure (
As shown in d), the same resin paint as described above is applied onto the surface 2a to be cleaned of the transparent conductive film 2 as the object to be cleaned, which is surrounded by the ring-shaped jig 6 or bank-shaped resin ring 5. Forms a resin coating. In this case, make sure that the first resin coating 7 completely covers and adheres to the rising part of the inner surface of the ring-shaped jig 6, and if necessary, apply the same resin coating as above as shown in FIG. The second resin coating film 8 is additionally formed by applying sufficient additional coating until it reaches the inner surface of the ring-shaped jig 6. Next, resin ring 5. The first resin coating film 7 and the second resin coating film 8 are dried, and the ring-shaped jig 6 is shaped so that it is fully adhered to the ring-shaped jig 6 as shown in FIG. When the imaging surface forming face plate body 1 and t are peeled off, a resin ring 5. The first resin coating film 7 and the second resin coating film 8 are attached to a ring-shaped jig 6, and the transparent conductive film 2 as an object to be cleaned is
The surface 2a to be cleaned is completely and completely removed without leaving any foreign matter such as dirt, minute foreign matter, or residue from torn paint film, and without damaging the peeling starting point of the paint film. I was able to do that.

また、本発明の他の笑施例としては、第1図(b)に示
すように被洗浄体としての透明導電膜2の被洗浄面2a
上に土手状の樹脂リング5を形成した後、リング状治具
6を配置することなく、この樹脂リング5の乾燥後にこ
の樹脂リング5により囲繞された部位に前述と同様の樹
脂塗料を塗布し第1の樹脂塗膜7を形成し、さらに若干
の乾燥の後にリング状治具6を土手状樹脂リング5上に
接触配置する。次に第1図(e)に示す工程へ移行し、
リング状治具6の内面側立上り部に前述と同様な樹脂塗
料全塗布し第2の樹脂塗膜8全形成してリング状治具6
と樹脂リング5および第1の樹脂塗膜7との接着を強固
にした後に第1図(f)に示すようにリング状治具6を
引き剥す方法によっても前述と全く同様に良好な結果を
得ることができた。
In addition, as another embodiment of the present invention, as shown in FIG. 1(b), a cleaning surface 2a of a transparent conductive film 2 as a cleaning object is provided.
After forming the bank-shaped resin ring 5 on top, without placing the ring-shaped jig 6, after drying this resin ring 5, the same resin paint as described above is applied to the area surrounded by this resin ring 5. After forming the first resin coating 7 and drying it slightly, the ring-shaped jig 6 is placed in contact with the bank-shaped resin ring 5. Next, move to the step shown in FIG. 1(e),
The ring-shaped jig 6 is completely coated with the same resin paint as described above on the rising part of the inner surface of the ring-shaped jig 6, and the second resin coating 8 is completely formed.
A method in which the ring-shaped jig 6 is peeled off after strengthening the adhesion between the resin ring 5 and the first resin coating 7 as shown in FIG. I was able to get it.

また、本発明のさらに他の笑施例としては、第1図(c
)に示すように樹脂リング5上にリング状治具6を配置
した後に第1図(e)に示す工程へ移行し、リング状治
具6で囲繞された被洗浄体としての透明導電膜2の被洗
浄面2a およびリング状治具6の内面側型より部分に
達するまで前述と同様な樹脂塗料を塗布してそれぞれ第
1の樹脂塗膜7および第2の樹脂塗膜8を形成1−1乾
燥後に第1図(f)に示すようにリング状治具6’に引
き剥す方法によっても前述と全く同様に良好な結果を得
ることができた。
Further, as still another embodiment of the present invention, FIG.
), after placing the ring-shaped jig 6 on the resin ring 5, the process moves to the step shown in FIG. The same resin paint as described above is applied to the cleaning surface 2a and the inner surface of the ring-shaped jig 6 to form a first resin paint film 7 and a second resin paint film 8, respectively 1- A good result similar to that described above could also be obtained by peeling off the film into a ring-shaped jig 6' as shown in FIG. 1(f) after one drying period.

なお、前述した各種の笑柿例の笑施において、第1の樹
脂膜7を形成する樹脂塗料は樹脂リング5を形成する樹
脂塗料よりも塗布時に際して、粘度を小とし、塗布時の
樹脂液の拡ろが9を急峻にすることにより塗布作業性を
良好にすることも可能でろる。また、第2の樹脂塗膜8
を形成する樹脂塗料は樹脂リング5を形成する樹脂塗料
よりも塗布時に際して、粘度を大とすることにより、リ
ング状治具6の内面と樹脂塗膜7との間の被膜厚を厚く
し、被膜強度を犬として、樹脂塗膜γおよびリング状治
具6との接着全強固にすることができるため、リング状
治具6の引き剥しかさらに容易になり、良好々結果を得
ることができた。
In addition, in the application of the various types of persimmons described above, the resin paint forming the first resin film 7 has a lower viscosity than the resin paint forming the resin ring 5 during application, and the resin liquid at the time of application is It is also possible to improve the coating workability by making the spread 9 steeper. In addition, the second resin coating film 8
The resin paint forming the resin ring 5 is made to have a higher viscosity during application than the resin paint forming the resin ring 5, thereby increasing the film thickness between the inner surface of the ring-shaped jig 6 and the resin coating film 7. Since the coating strength can be maintained at a high level and the adhesion between the resin coating γ and the ring-shaped jig 6 can be completely strengthened, it becomes easier to peel off the ring-shaped jig 6, and good results can be obtained. Ta.

また、リング状治具6の内面側立上り部は、いずれの場
合においても透明導電膜2上に塗布された第1の樹脂塗
膜7に接着されていることが必要でろり、この立上り部
40.5〜2rnm程度の高さ以上リング状治具開口端
6aの全周にわたって一体に第1の樹脂塗料か塗布され
ていることが必要で、これが不十分でしると、リング状
治具6の引き剥し時にこの部分の第1の樹脂塗膜7か切
断して透明導電膜2上に残存してしまうことになる。
Further, in any case, the rising portion on the inner surface side of the ring-shaped jig 6 needs to be adhered to the first resin coating 7 applied on the transparent conductive film 2. It is necessary that the first resin paint is applied integrally over the entire circumference of the ring-shaped jig opening end 6a to a height of about 5 to 2 nm or more, and if this is insufficient, the ring-shaped jig 6 When the transparent conductive film 2 is peeled off, this portion of the first resin coating 7 is cut and remains on the transparent conductive film 2.

さらに本発明の他の実施例としては、リング状治具6を
透明導電膜2の被洗浄面2a土の樹脂リング5上に配置
するに際して第3図に示すようにリング状治具6の開口
端6a’z樹脂リング5に接触させたりあるいに埋設さ
せたp″′jることなく若干の間隔d乏おいて対向配置
させる方法が良好な場合がある。これは樹脂リング5の
乾燥状態、すなわち粘度によるものと思われるが、樹脂
リング5の乾燥が進んでいない場合にリング状治具6を
樹脂リング5上に配置すると、リング状治具6が埋没沈
下を起し、その部位の樹脂塗膜が過小となることによp
1引き剥し時にこの部分の塗膜が切れて残存してしまう
傾向を有する。したがって、樹脂リング5の乾燥進行の
程度によってリング状治具6を配置するときに間隔dを
設けるか否かを選択すべきもので、いずれの場合も本発
明の一応用形態となり得るものである。
Furthermore, as another embodiment of the present invention, when the ring-shaped jig 6 is placed on the resin ring 5 of the soil to be cleaned 2a of the transparent conductive film 2, the opening of the ring-shaped jig 6 is opened as shown in FIG. In some cases, it may be better to arrange the ends 6a'z facing the resin ring 5 with a slight distance d between them without contacting or burying the resin ring 5.This is because the resin ring 5 is in a dry state. In other words, this seems to be due to the viscosity, but if the ring-shaped jig 6 is placed on the resin ring 5 when the resin ring 5 has not dried, the ring-shaped jig 6 will sink and sink. p due to the resin coating becoming too small.
There is a tendency for the coating film in this area to break and remain when it is peeled off. Therefore, it is necessary to select whether or not to provide the interval d when arranging the ring-shaped jig 6 depending on the degree of drying of the resin ring 5, and either case can be an application of the present invention.

以上説明したような各実施例による透明導電膜2の被洗
浄面2aの洗浄方法によれば、この後にこの被洗浄面2
a上に形成される光導電膜のへテロn−p接合の部分釣
力欠陥発生率が激減し、暗電流を低減させ、電気的特性
の良好々高品質の撮像管を簡単な工程で低コストで得る
ことができる。
According to the method of cleaning the surface 2a to be cleaned of the transparent conductive film 2 according to each of the embodiments as explained above, after this, the surface 2a to be cleaned is
The incidence of partial force defects in the hetero n-p junction of the photoconductive film formed on the photoconductive film is drastically reduced, dark current is reduced, and high-quality image pickup tubes with good electrical characteristics can be produced with a simple process. can be obtained at a cost.

なお、前述した実施例においては、電子素子の製造方法
を撮像管の撮像面形成に適用した場合について説明した
が、本発8Aはこれに限定されるものではなく、半導体
素子のへテロ接合部、絶縁薄膜部等の形成に適用しても
前述と同様の効果が得られることは言うまでもない。
In addition, in the above-mentioned embodiment, a case was explained in which the method for manufacturing an electronic device was applied to forming an image pickup surface of an image pickup tube, but the present invention 8A is not limited to this, and is applicable to a heterojunction of a semiconductor device. It goes without saying that the same effects as described above can be obtained even when applied to the formation of insulating thin film parts, etc.

〔発明の効果〕〔Effect of the invention〕

以上説明したように本発明によれば、被洗浄体の洗浄面
に付着している汚損物質、微細異物等を除去できるとと
もに、塗膜の一部奮残存させることなく、容易かつ確笑
にしかも洗浄面表面を損傷させることなく完全に異物を
除去して表面の極めて清浄な被清浄面が得られるので、
信頼性の高い薄膜構造が生産性良く得られるなどの極め
て優れた効果を有する。
As explained above, according to the present invention, it is possible to remove contaminants, minute foreign substances, etc. adhering to the cleaning surface of the object to be cleaned, and to do so easily and reliably without leaving any part of the paint film. Since foreign substances are completely removed without damaging the surface of the cleaning surface, an extremely clean surface can be obtained.
It has extremely excellent effects such as a highly reliable thin film structure that can be obtained with good productivity.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図(a)〜(f)は本発明による電子素子の製造方
法全撮像管の撮像面形成方法に適用しf?:、実施例を
説明するための要部断面工程図、第2図は撮像管撮像面
の斜視図、第3図は本発明の他の実施例を説明するため
の要部断面工程図でめる。 1・・・・撮像面形成面板体、2・・・・透明導1膜、
2a ・・・・被洗浄面、3・・・・撮像面形成有効部
、4・・・・外周部、5・・・・樹脂リング、6・・・
・リング状治具、6a・・・・開口端、7・・・・第1
の樹脂塗膜、8・・・第1図 (Q) a (C) 第1図 (d) G □ 2o′     ラ (f) 牟 第2図 第3図
FIGS. 1(a) to 1(f) show the method of manufacturing an electronic device according to the present invention applied to the method of forming an image pickup surface of an entire image pickup tube. 2 is a perspective view of the image pickup surface of the image pickup tube. FIG. 3 is a sectional process diagram of the main parts for explaining another embodiment of the present invention. Ru. 1... Imaging surface forming face plate body, 2... Transparent conductive film 1,
2a...surface to be cleaned, 3...imaging surface forming effective part, 4...outer circumferential part, 5...resin ring, 6...
・Ring-shaped jig, 6a...opening end, 7...first
Resin coating film, 8...Figure 1 (Q) a (C) Figure 1 (d) G □ 2o' La (f) ㉟Figure 2 Figure 3

Claims (1)

【特許請求の範囲】[Claims]  被洗浄体の被洗浄面周辺を囲繞するように有機樹脂塗
料を環状に塗布し環状樹脂部を形成する工程と、前記環
状樹脂部の内側に有機樹脂塗布し第1の樹脂塗膜を形成
する工程と、前記環状樹脂部の上に環状治具を配置する
工程と、前記環状治具と第1の樹脂塗膜とに同質樹脂塗
料を塗布し第2の樹脂塗膜を形成する工程と、前記環状
樹脂部、第1の樹脂塗膜および第2の樹脂塗膜が乾燥し
た後にこれらを前記環状治具とともに一体で取り去る工
程とを含むことを特徴とした電子素子の製造方法。
A step of applying an organic resin paint in a ring shape to surround the surface to be cleaned of the object to be cleaned to form a ring-shaped resin part, and applying an organic resin to the inside of the ring-shaped resin part to form a first resin coating film. a step of arranging an annular jig on the annular resin portion; and a step of applying a homogeneous resin paint to the annular jig and the first resin coating to form a second resin coating; A method for manufacturing an electronic device, comprising the step of removing the annular resin portion, the first resin coating film, and the second resin coating together with the annular jig after drying.
JP24440884A 1984-11-21 1984-11-21 Manufacture of electronical element Pending JPS61124139A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP24440884A JPS61124139A (en) 1984-11-21 1984-11-21 Manufacture of electronical element

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP24440884A JPS61124139A (en) 1984-11-21 1984-11-21 Manufacture of electronical element

Publications (1)

Publication Number Publication Date
JPS61124139A true JPS61124139A (en) 1986-06-11

Family

ID=17118217

Family Applications (1)

Application Number Title Priority Date Filing Date
JP24440884A Pending JPS61124139A (en) 1984-11-21 1984-11-21 Manufacture of electronical element

Country Status (1)

Country Link
JP (1) JPS61124139A (en)

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0395951A (en) * 1989-09-08 1991-04-22 Toshiba Corp Substrate for cleaning semiconductor manufacturing device
JP2012523961A (en) * 2009-04-14 2012-10-11 インターナショナル テスト ソリューションズ, インコーポレイテッド Wafer manufacturing cleaning apparatus, process and method of use
JP2015008177A (en) * 2013-06-24 2015-01-15 株式会社Screenホールディングス Substrate processing apparatus and substrate processing method
US11155428B2 (en) 2018-02-23 2021-10-26 International Test Solutions, Llc Material and hardware to automatically clean flexible electronic web rolls
US11211242B2 (en) 2019-11-14 2021-12-28 International Test Solutions, Llc System and method for cleaning contact elements and support hardware using functionalized surface microfeatures
US11318550B2 (en) 2019-11-14 2022-05-03 International Test Solutions, Llc System and method for cleaning wire bonding machines using functionalized surface microfeatures
US11756811B2 (en) 2019-07-02 2023-09-12 International Test Solutions, Llc Pick and place machine cleaning system and method

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0395951A (en) * 1989-09-08 1991-04-22 Toshiba Corp Substrate for cleaning semiconductor manufacturing device
JP2012523961A (en) * 2009-04-14 2012-10-11 インターナショナル テスト ソリューションズ, インコーポレイテッド Wafer manufacturing cleaning apparatus, process and method of use
JP2015008177A (en) * 2013-06-24 2015-01-15 株式会社Screenホールディングス Substrate processing apparatus and substrate processing method
US11155428B2 (en) 2018-02-23 2021-10-26 International Test Solutions, Llc Material and hardware to automatically clean flexible electronic web rolls
US11434095B2 (en) 2018-02-23 2022-09-06 International Test Solutions, Llc Material and hardware to automatically clean flexible electronic web rolls
US11756811B2 (en) 2019-07-02 2023-09-12 International Test Solutions, Llc Pick and place machine cleaning system and method
US11211242B2 (en) 2019-11-14 2021-12-28 International Test Solutions, Llc System and method for cleaning contact elements and support hardware using functionalized surface microfeatures
US11318550B2 (en) 2019-11-14 2022-05-03 International Test Solutions, Llc System and method for cleaning wire bonding machines using functionalized surface microfeatures

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