JPS61123016A - Magnetic disk - Google Patents

Magnetic disk

Info

Publication number
JPS61123016A
JPS61123016A JP24563784A JP24563784A JPS61123016A JP S61123016 A JPS61123016 A JP S61123016A JP 24563784 A JP24563784 A JP 24563784A JP 24563784 A JP24563784 A JP 24563784A JP S61123016 A JPS61123016 A JP S61123016A
Authority
JP
Japan
Prior art keywords
plating
plating layer
layer
magnetic disk
fine particles
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP24563784A
Other languages
Japanese (ja)
Inventor
Satoshi Takaiwa
聡 高岩
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tokico Ltd
Original Assignee
Tokico Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokico Ltd filed Critical Tokico Ltd
Priority to JP24563784A priority Critical patent/JPS61123016A/en
Publication of JPS61123016A publication Critical patent/JPS61123016A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE:To improve the uniformity of the characteristics of a thin magnetic metallic film layer and to realize good durability by providing an activated plating layer into which fine particles are dispersed on an underlying plating layer. CONSTITUTION:A substrate 1 is subjected to underlying plating. The surface of the formed underlying plating layer 2 is then smoothed by polishing and is degreased and thereafter the surface is subjected to a pretreatment such as sensitizing and activating if necessary. The pretreated surface is subjected to Ni-P plating, etc. so that the activated plating layer 3 is formed thereon. The fine particles 4- are preliminarily dispersed into the plating bath, by which the particles 4- are incorporated into the layer 3. The surface is then subjected as quickly as possible to Co-Ni-P plating, etc. to form the thin magnetic metallic film layer 5.

Description

【発明の詳細な説明】 〔産業上の利用分野〕 この発明は、磁性金属薄膜層を記録媒体とする磁気ディ
スクに係り、磁性金網薄膜層の特性の均一性が向上され
、良好な電磁特性を有するよう忙し、さらに良好な耐久
性を実現させるようにしたものである。
[Detailed Description of the Invention] [Industrial Application Field] The present invention relates to a magnetic disk using a magnetic metal thin film layer as a recording medium, in which the uniformity of the characteristics of the magnetic wire mesh thin film layer is improved and good electromagnetic properties are achieved. It is designed to have a high durability and even better durability.

〔従来技術とその問題点〕[Prior art and its problems]

磁性金属薄膜層を記録媒体とする磁気ディスクとして、
アルミニウム合金等からなる基板上に東−Pメッキ等に
より下地メッキI−が形成され、この下地メッキ層上に
N i −Co −pメッキ等により磁性金属薄膜−が
形成されたものがある。このものは、基板上に下地メッ
キを施した後、この下地メッキ層を表面粗さが約Rm 
a x Q、 1μm以下になるように研磨仕上げし、
つhで、磁性金属簿膜層を形成することによって製造さ
れている。
As a magnetic disk that uses a magnetic metal thin film layer as a recording medium,
There is one in which a base plating I- is formed by Higashi-P plating or the like on a substrate made of an aluminum alloy or the like, and a magnetic metal thin film is formed on this base plating layer by Ni-Co-P plating or the like. After applying base plating on the substrate, this base plating layer has a surface roughness of approximately Rm.
a x Q, polished to 1 μm or less,
It is fabricated by forming a magnetic metal film layer.

ところで、このような従来の磁気ディスクにあっては、
研磨仕上げされた下地メッキ層に、研磨によって生じた
加工歪が残留する場合があった。
By the way, with such conventional magnetic disks,
Processing distortion caused by polishing sometimes remained on the polished base plating layer.

また、研磨後、大気と接触することにより表面に酸化膜
が形成されることがあった。このように加工歪や酸化物
被膜が残留すると、下地メッキ層は表面の活性が不均一
な状態となるので、このような下地メッキ層上に磁性金
属薄膜層を形成すると、この磁性金属薄膜層はその磁気
特性が不均一なものとなり、得られた磁気ディスクは、
信号のモジュレーションが大きいなど、電磁特性の劣っ
たものとなる。このため、従来の磁気ディスクにあって
は、電磁特性の優れたものを歩留り良く生産できない不
満があった。
Further, after polishing, an oxide film was sometimes formed on the surface due to contact with the atmosphere. If processing strain or oxide film remains in this way, the surface activity of the base plating layer will be non-uniform, so if a magnetic metal thin film layer is formed on such a base plating layer, this magnetic metal thin film layer has non-uniform magnetic properties, and the resulting magnetic disk is
This results in poor electromagnetic characteristics, such as large signal modulation. For this reason, conventional magnetic disks have been dissatisfied with the inability to produce disks with excellent electromagnetic properties at a high yield.

〔問題点を解決するための手段〕[Means for solving problems]

そこで、本発明でに、下地メッキ層上に微粒子を分散さ
せた活性化メッキ層を設けること蹟より、従来の磁気デ
ィスクの不都合を解決し、良好な電磁特性が得られるよ
うにした。
Therefore, in the present invention, the disadvantages of conventional magnetic disks are solved and good electromagnetic characteristics can be obtained by providing an activated plating layer in which fine particles are dispersed on the base plating layer.

〔実施例〕〔Example〕

第1図は、この発明の磁気ディスクの一例を示すもので
、図中符号1け基板である。この基板1は、アルミニウ
ム合金板やセラミックス板などからなり、表面のうねり
が少ないように加工されてなるものである。この基板1
上には下地メッキ層2が形成されている。この下地メツ
キー2は、基板1表面の微細な凹凸を平滑化するもので
、例えば無電解メッキ法によってN1−Pメッキなどが
厚み10〜30μm程度に設けられてなるものである。
FIG. 1 shows an example of a magnetic disk of the present invention, and the number 1 in the figure is a board. This substrate 1 is made of an aluminum alloy plate, a ceramic plate, or the like, and is processed to have less waviness on the surface. This board 1
A base plating layer 2 is formed on top. The base metal key 2 is for smoothing minute irregularities on the surface of the substrate 1, and is formed by applying N1-P plating or the like to a thickness of about 10 to 30 μm by electroless plating, for example.

この下地メッキ層20表面は、スーパーポリッシュなど
Kよって、表面粗ζ(Rmax)0.1μm程度Kまで
研磨仕上げされている。
The surface of this base plating layer 20 is polished to a surface roughness ζ (Rmax) of approximately 0.1 μm using K such as super polish.

この下地メッキ1−2上には、活性化メッキ層3が形成
されている。この活性化メッキ層3は、表面の活性を均
一化するためのものである。この活性化メッキ層3は、
膜厚α1μm〜1.0 p mのもので、N1−Pメッ
キなどが無電解メッキ法等のメッキ法により形成されて
なるものである。この活性化メッキ層3の膜厚がα1μ
m未満であると、表面の活性を充分均一化できず、また
、膜厚が1.0μmを越えると、下地メッキ層2を研磨
することKより得た表面の平滑度が悪化し、いずれの場
合も好ましくない。
An activated plating layer 3 is formed on this base plating 1-2. This activated plating layer 3 is for making the surface activity uniform. This activated plating layer 3 is
It has a film thickness α of 1 μm to 1.0 pm, and is formed by N1-P plating or the like by a plating method such as electroless plating. The film thickness of this activated plating layer 3 is α1μ
If it is less than m, the surface activity cannot be made uniform enough, and if the film thickness exceeds 1.0 μm, the surface smoothness obtained by polishing the base plating layer 2 will deteriorate, and any The case is also unfavorable.

また、この例の磁気ディスクにあっては、この活性化メ
ッキ層3に、微粒子4・・・が分散せしめられている。
Further, in the magnetic disk of this example, fine particles 4 are dispersed in the activated plating layer 3.

この微粒子4・・・は、ディスク表面を補強して磁気デ
ィスクのコンタクトスタートストップ(CSS)特性を
向上せしめるためのものである。この微粒子4には粒径
0.1〜2.0μm程度のものが好ましく用いられる。
These fine particles 4 are for reinforcing the disk surface and improving the contact start/stop (CSS) characteristics of the magnetic disk. The fine particles 4 preferably have a particle size of about 0.1 to 2.0 μm.

これは上記活性メッキ層3と後述する磁性金補薄膜1−
5の膜厚の和よりも小さいと充分な補強効果が得られな
いためである。また、この微粒子4には、アルミナ(A
^0.)、炭化ケイ素(SIC)、窒化ケイ素(s i
、N4)、シリカ(S1o、)、ダイアモンド(C)、
カーボン、T i C,WC’、 B4 C%MO2C
This consists of the active plating layer 3 and the magnetic gold supplementary thin film 1-, which will be described later.
This is because if the film thickness is smaller than the sum of the film thicknesses of 5 and 5, a sufficient reinforcing effect cannot be obtained. In addition, the fine particles 4 include alumina (A
^0. ), silicon carbide (SIC), silicon nitride (s i
, N4), silica (S1o, ), diamond (C),
Carbon, T i C, WC', B4 C%MO2C
.

Cr5C,、TtNs WSi、 、TtB、 、Cr
B、、Man、ZrQ、などの補強効果を有する高強度
材料の微粒子や、窒化ホウ素(BN)、二硫化モリブデ
ン(MoS、)、グラファイトなどの摩擦係数の小さい
潤滑効果を有する材料の微粒子が用いられる。これら微
粒子4は単独でもよく、2種以上任意の割合で混合して
もよく、さらに#−j補強効果のあるものと潤滑効果の
あるものとを混合して分散混入せしめてもよい。これら
微粒子4・・・は、第1図に示したように、その一部が
後述する磁性金属薄膜層5の表面から部分的に突出する
状態で分散せしめられている。また、微粒子4・・・の
活性化メッキ層3中への分散量(混入量)は、表面1−
当り1g1〜10”個程度と―れる。表面1−当りYO
”個未満では、十分な補強効果を得ることができず、ま
た10’個を越えると、活性化メッキ層3および磁性金
属薄膜層5が脆くなり、機械的強度が低下しまた、磁気
記録媒体としての媒体欠陥を増大せしめ不都合である。
Cr5C,, TtNs WSi, , TtB, , Cr
Fine particles of high-strength materials that have a reinforcing effect, such as B, Man, ZrQ, etc., and fine particles of materials that have a lubricating effect with a small friction coefficient, such as boron nitride (BN), molybdenum disulfide (MoS), and graphite, are used. It will be done. These fine particles 4 may be used alone, or two or more of them may be mixed in an arbitrary ratio, and further, particles having a #-j reinforcing effect and particles having a lubricating effect may be mixed and dispersed. As shown in FIG. 1, these fine particles 4 are dispersed so that some of them partially protrude from the surface of a magnetic metal thin film layer 5, which will be described later. Further, the amount of dispersion (mixing amount) of the fine particles 4 into the activated plating layer 3 is as follows:
Approximately 1 to 10" pieces per gram. YO per surface.
If the number is less than 10', a sufficient reinforcing effect cannot be obtained, and if the number exceeds 10', the activated plating layer 3 and the magnetic metal thin film layer 5 become brittle, the mechanical strength decreases, and the magnetic recording medium This is disadvantageous because it increases the number of media defects.

上記活性化メッキ層3上には、磁性金属薄膜層5が設け
られている。磁性金属薄膜層5は、磁気記録媒体となる
もので、例えば無電解メッキ法忙よって、Co −N 
i −Pメッキ、Co−Pメッキなどが厚みa05〜1
5μm程度に形成されてなるものである。
A magnetic metal thin film layer 5 is provided on the activated plating layer 3. The magnetic metal thin film layer 5 serves as a magnetic recording medium, and is made of Co-N by electroless plating, for example.
i-P plating, Co-P plating, etc. have a thickness of a05~1
It is formed to have a thickness of about 5 μm.

次に、この磁気ディスクを製造する方法を、第2図に沿
って説明する。
Next, a method for manufacturing this magnetic disk will be explained with reference to FIG.

この磁気ディスクを製造するには、まず基板IK下地メ
ッキを施す(SPl)。ついで、ここで形成された下地
メッキ層2の表面を研磨加工して平滑にする(SP2)
。次に、このものを洗浄(SPり[、、脱脂(SP4 
>l、た後、必要に応じて、センシタイジング(sps
)、アクチベーテイング(sp6)の前処理を行う。つ
いで、このものに、N1−Pメッキ等を施し、活性化メ
ッキ層3を形成する(SP7)。このとき、メッキ浴内
に微粒子4・・・を分散させておくことによって、活性
化メッキ層3に微粒子4・・・を混入せしめる。
To manufacture this magnetic disk, first, substrate IK underplating is applied (SPl). Next, the surface of the base plating layer 2 formed here is polished to make it smooth (SP2).
. Next, wash (SP) [, degrease (SP4)
> l, then perform sensitizing (sps
), pre-processing for activating (sp6) is performed. Next, N1-P plating or the like is applied to this material to form an activated plating layer 3 (SP7). At this time, by dispersing the fine particles 4 in the plating bath, the fine particles 4 are mixed into the activated plating layer 3.

次に、活性化メッキ工程(SF3)後できるだけすみや
かにこのものに、Co −N i−Pメッキ等を施して
磁性金属薄膜層5を形成しく8PB )、これにより目
的とする磁気ディスクが得られる。
Next, as soon as possible after the activation plating step (SF3), Co-Ni-P plating or the like is applied to this material to form a magnetic metal thin film layer 5 (8PB), thereby obtaining the intended magnetic disk. .

〔作用〕[Effect]

このような磁気ディスクにあっては、下地メッキ層2上
に活性化メッキI−3を設けたので、下地メッキ層2の
表面に研磨仕上げに伴う加工歪や酸化物被膜が残留し、
下地メッキ1−2の表面の活性が不均一な状態であって
も、下地メッキ層2上に設けられた活性化メッキ層3に
よって、表面の活性は均一化される。従って、この活性
化メッキ層3の上に、磁気特性や膜厚等の均一な磁性金
属薄膜715を容易に形成することができる。
In such a magnetic disk, since the activation plating I-3 is provided on the base plating layer 2, processing distortion and oxide film due to polishing finish remain on the surface of the base plating layer 2.
Even if the surface activity of the base plating 1-2 is non-uniform, the activation plating layer 3 provided on the base plating layer 2 makes the surface activity uniform. Therefore, it is possible to easily form a magnetic metal thin film 715 with uniform magnetic properties, film thickness, etc. on this activated plating layer 3.

また、この例の磁気ディスクにあっては、磁気ディスク
の表面に微粒子4・・・の一部が露出せしめられている
ので、磁気ディスク表面への磁気ヘッドの摺動や打撃に
対し、まず微粒子4・・・が衝突することとなる。従っ
て、この磁気ディスクは磁気ヘッドによる摩擦損傷が少
なくC8S性の優れたものとなる。
In addition, in the magnetic disk of this example, some of the particles 4 are exposed on the surface of the magnetic disk, so when the magnetic head slides or hits the surface of the magnetic disk, the particles first 4... will collide. Therefore, this magnetic disk has less frictional damage caused by the magnetic head and has excellent C8S properties.

さらに、この例の磁気ディスクにあっては、補強効果を
有する微粒子4・・・を、下地メッキ層2上にあってデ
ィスク表面から離間している活性化メッキ層3に混合分
散せしめたので、微粒子4にけ粒径の大きなものを用い
得ることとなる。従って、この磁気デタクに用いられる
微粒子40選定条件は緩やかなものとなり、微粒子4の
選定や、微粒子4の製造が容易となり、微粒子4の価格
の低減、性能向上を図って、磁気ディ2りの製造コスト
の低減や性能向上を図ることができる。
Furthermore, in the magnetic disk of this example, fine particles 4 having a reinforcing effect are mixed and dispersed in the activated plating layer 3 which is on the base plating layer 2 and is spaced from the disk surface. This means that fine particles 4 having a large particle size can be used. Therefore, the selection conditions for the fine particles 40 used in this magnetic detach are relaxed, making it easier to select the fine particles 4 and manufacturing the fine particles 4, reducing the price of the fine particles 4, improving the performance, and improving the magnetic disk 2. It is possible to reduce manufacturing costs and improve performance.

なお、この発明の磁気ディスクは上記実施例に限られる
ものではない。例えば、磁性金属薄膜層5の上には、磁
気ディスクのC8S性のより一層−向上せしめるために
、保護層や潤滑層を設けても良い。また、ディスク表面
を補強するための微粒子4・・・を分散せしめる位置は
、活性化メッキ層3に限られず、ざらに上記保護層など
に分散せし佇て臀良い。
Note that the magnetic disk of the present invention is not limited to the above embodiments. For example, a protective layer or a lubricating layer may be provided on the magnetic metal thin film layer 5 in order to further improve the C8S properties of the magnetic disk. Further, the position where the fine particles 4 for reinforcing the disk surface are dispersed is not limited to the activated plating layer 3, but may be roughly dispersed in the protective layer or the like.

〔実験例〕[Experiment example]

次の仕様の磁気ディスクを試作し、その電磁特性、C8
S性を検討した。
Prototype a magnetic disk with the following specifications, and its electromagnetic characteristics, C8
The S-character was examined.

基板l;アルミニウム合金、厚み1.9龍下地メッキ層
2;無電解N1−P  メッキ、厚ζ20μm1表面粗
さく Rmtx) 0、1 p m以下に研磨仕上げ 活性化メッキ層3;無電解N1−Pメッキ、厚さ05μ
m 微粒子4 ; Ae、01微粒子c粒径公称α4μm)
分散量は表面積1−当り600〜700個とした。
Substrate 1: Aluminum alloy, thickness 1.9 Undercoat plating layer 2: Electroless N1-P plating, thickness ζ 20 μm 1 Surface roughness Rmtx) Polished to 0,1 pm or less Activated plating layer 3: Electroless N1-P Plating, thickness 05μ
m fine particles 4; Ae, 01 fine particles c particle size nominal α4μm)
The amount of dispersion was 600 to 700 particles per 1 surface area.

磁性金属薄膜層5;Co−N1−Pメッキ、厚み平均1
1μm この磁気ディスクの磁性金属薄膜層5の膜厚を調べたと
ころ、平均r1.1μm、バラツキ±20%以下で、磁
性金属薄膜層5の膜厚の均一性が向上されていることが
確認できた。また、この磁気ディスクの電磁特性を調べ
たところ、信号のモジュレーションも小さく、電磁特性
の優れたものであることが確認できた。
Magnetic metal thin film layer 5; Co-N1-P plating, average thickness 1
1 μm When the film thickness of the magnetic metal thin film layer 5 of this magnetic disk was examined, it was confirmed that the average r was 1.1 μm with a variation of less than ±20%, and that the uniformity of the film thickness of the magnetic metal thin film layer 5 was improved. Ta. Furthermore, when we investigated the electromagnetic properties of this magnetic disk, we were able to confirm that the signal modulation was small and that it had excellent electromagnetic properties.

さらに、この磁気ディスクを4x1o’tiのC8Sテ
ストに供したところ、ヘッドクラッシュの発生もなく、
電磁特性の低下もなく、この磁気ディスクは耐久性にも
優れたものであることが確かめられた。
Furthermore, when this magnetic disk was subjected to a 4x1o'ti C8S test, no head crash occurred.
There was no deterioration in electromagnetic properties, and it was confirmed that this magnetic disk had excellent durability.

〔発明の効果〕〔Effect of the invention〕

この発明の磁気ディスクは、下地メッキ層上に活性化メ
ッキ層が設けられ、かつ前記活性化メッキ中に微粒子を
分散させたものであるので、下地メッキ層の表面に研暦
加工に伴う加工歪や酸化物被膜があっても活性化メッキ
I−により均一化され、・記録媒体となる磁性金属薄膜
11を形成する際に下地メッキ層の表面活性の不均一性
が影響することはない。従って、この磁気ディスクは磁
性金属薄膜層の磁気特性や膜厚等が均一で、優れた電磁
特性を有し、しかも歩留り良く生産でき、生産性の優れ
たものとなる。
In the magnetic disk of the present invention, an activated plating layer is provided on the base plating layer, and fine particles are dispersed in the activation plating. Even if there is an oxide film, it is made uniform by the activation plating I-, and the non-uniform surface activity of the underlying plating layer does not affect the formation of the magnetic metal thin film 11 that will become the recording medium. Therefore, this magnetic disk has uniform magnetic properties, film thickness, etc. of the magnetic metal thin film layer, has excellent electromagnetic properties, and can be produced at a high yield, resulting in excellent productivity.

また、補強効果を有する微粒子を下地メッキ層に混合分
散せしめたので、微粒子には粒径の太きなものを用いる
ことができる。従ってこの磁気ディスクに用いられる微
粒子の選定条件は緩やかなものとなり、また、微粒子の
製造が容易となり、微粒子の価格の低減、性能向上を図
って、磁気ディスクの製造コストの低減や性能向上を図
ることがで青る。
Further, since fine particles having a reinforcing effect are mixed and dispersed in the base plating layer, fine particles having a large particle size can be used. Therefore, the selection conditions for the particles used in this magnetic disk are relaxed, and the manufacturing of the particles becomes easier, reducing the price and improving the performance of the particles, thereby reducing the manufacturing cost and improving the performance of the magnetic disk. That makes me blue.

【図面の簡単な説明】[Brief explanation of drawings]

第1図はこの発明の磁気ディスクの一実施例を示す断面
図、食)2図1ゴ同磁気デイスクを製造する方法を示す
工程図である。 l・・・・・・基板、2・・・・・・下地メッキ1gj
13・・・・・・活性化メッキ1−15・・・・・・磁
性金属簿膜Ifd。
FIG. 1 is a sectional view showing an embodiment of the magnetic disk of the present invention, and FIG. 2 is a process diagram showing a method for manufacturing the same magnetic disk. l...Substrate, 2...Base plating 1gj
13...Activation plating 1-15...Magnetic metal film Ifd.

Claims (1)

【特許請求の範囲】 基板上に下地メッキ層を介して磁性金属薄膜層が形成さ
れてなる磁気ディスクにおいて、 上記下地メッキ層上に活性化メッキ層が設けられ、かつ
前記活性化メッキ層中に微粒子を分散させたことを特徴
とする磁気ディスク。
[Scope of Claims] A magnetic disk in which a magnetic metal thin film layer is formed on a substrate via a base plating layer, wherein an activated plating layer is provided on the base plating layer, and an activated plating layer is provided in the activated plating layer. A magnetic disk characterized by having fine particles dispersed therein.
JP24563784A 1984-11-20 1984-11-20 Magnetic disk Pending JPS61123016A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP24563784A JPS61123016A (en) 1984-11-20 1984-11-20 Magnetic disk

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP24563784A JPS61123016A (en) 1984-11-20 1984-11-20 Magnetic disk

Publications (1)

Publication Number Publication Date
JPS61123016A true JPS61123016A (en) 1986-06-10

Family

ID=17136617

Family Applications (1)

Application Number Title Priority Date Filing Date
JP24563784A Pending JPS61123016A (en) 1984-11-20 1984-11-20 Magnetic disk

Country Status (1)

Country Link
JP (1) JPS61123016A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5093173A (en) * 1989-01-13 1992-03-03 Hitachi, Ltd. Magnetic disc comprising a substrate of an amorphous glass continuous phase dispersed with crystal particles which produce a structurally defined surface on the substrate

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5093173A (en) * 1989-01-13 1992-03-03 Hitachi, Ltd. Magnetic disc comprising a substrate of an amorphous glass continuous phase dispersed with crystal particles which produce a structurally defined surface on the substrate

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