JPS61113762A - Vapor deposition apparatus - Google Patents

Abstract

(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.

Description

DETAILED DESCRIPTION OF THE INVENTION Field of Industrial Application This invention relates to a vapor deposition apparatus, and particularly to an apparatus for making the thickness of a vapor-deposited film uniform throughout.

[Prior Art] A vapor deposition apparatus is well known in which a vapor deposition material is placed in a crucible-shaped container and vapor-deposited onto the surface of a substrate. In this apparatus, the vapor deposition material is heated and evaporated using a suitable heating stage that heats and covers the crucible. The substrate to be deposited is placed on the inner surface of the hemispherical housing and is placed on a rotating support member at an equal distance from the front face of the crucible.

[Problems to be solved by the invention]
All assemblies are rotated, and this pile is used to ensure uniformity of the thickness of the deposited film, but rotating all assemblies would complicate the structure and increase equipment costs. There is a problem.
Further, it has been found that even in vapor deposition using such a method, there is a problem in that the uniformity of the vapor-deposited film cannot be improved by 1q.

[Means for Solving the Problems] The present invention provides an apparatus and a method as specific means for solving the above problems. According to the invention, the evaporation source is rotated without friction and the substrate is heated. A vapor deposited film with a more uniform thickness is formed on the surface.
Further, according to the present invention, there is no need to rotate the hemispherical housing in which the sides of the substrate are placed, which simplifies the mechanism of the device, prevents the generation of particles, and provides a film of uniform thickness.

In this invention, for example, calcium fluoride is used as a vapor deposition material for anti-reflection coating.
An example of a substrate for vapor deposition is a pellicle. Such a pellicle is a thin nitrocellulose sheet used as a light beam splitter or a dust cover in microlithography, and is manufactured by the applicant.

A thin film of calcium fluoride deposited on one or both sides of such a pellicle film acts as an anti-reflection coating. According to this invention, it is possible to form a calcium fluoride film of uniform thickness on a pellicle with a width of about 10 cm (4 inches), for example, but this invention can be applied to a pellicle with a width of approximately 10 cm (4 inches). It can be applied to the device.

Next, in order to explain the present invention in detail, an example will be described below, which is just one example.

[Example] Figures 1 and 2 show a vapor deposition apparatus (
evaporator device) is shown.

As shown in FIG. 1.2, a support 10, 11, 12 and other supports are housed in the hemispherical evaporator housing. Each of the supports 10 to 12 is
It supports a desired number of substrates on which a film is to be deposited. For example, in FIG. 1.2, the support 10 includes:
A total of four pellicles 20.21.22.23 are supported by suitable means. Similarly, pellicles 24, 25, 26, 27 are supported on the support 11.12, respectively.

The pellicles 20-27 (or other substrates) on which the coatings are deposited are preferably positioned perpendicular to and equidistant from the evaporator source 30. In this way, the support (support plate) 10.1
1.12 is the surface of the supporting pellicle and the evaporation source 3.
The arrangement is such that the distance between the two terminals is equal, and this distance can be adjusted in various ways.

In order to make the thickness of the film deposited on the surfaces of the substrates 20 to 27 (pellicles) uniform, each support is rotated about the axis passing through the evaporation source 30 as the rotation axis. therefore,
The support 10.11.12t rotates around the axis 40.41.42.

Further, the hemispherical housing in which the supports 10, 11, 12 and others (other supports are not shown) rotates around the main rotating shaft 453 (which includes the evaporator 30).

The mechanism for rotating this housing and individual supports has hitherto been extremely complex, but this invention
By simplifying such a complicated rotational d structure, evaporation! 3
0 is rotated around the axis 50 (FIG. 1), and the thickness of the deposited film is improved to be more uniform. According to the invention, uniformity of the thickness of the deposited film is ensured even if the concentration pattern of the evaporator output is slightly asymmetrical, as shown in FIG. 1a.

Figures 3 to 6 show the evaporation source (evaporator) shown in Figure 1.
In the illustrated example, calcium fluoride crystals are used as the vapor deposition material for the particle film to be deposited on the surfaces of the pellicles 20 to 27. The evaporator 11130 shown in Figures 3-6 consists of a crucible 60 made of a refractory material such as molybdenum. This crucible 60
is filled with calcium fluoride crystals or vapor depositable materials.

The crucible 60 is supported by a long rod 61 made of a refractory material such as tungsten. This rod is 1.3
．． As shown in FIG. 4, it is connected to a suitable rotation support mechanism for rotation in the direction of arrow 62.

To heat the crystal 63 inside the crucible 60, a heating tube 65 made of a thin sheet of tantalum surrounds the crucible 60. An example of this heating cylinder is as follows:
It is constructed by rolling flat sheets of material and spot-welding the seams.

The diameter of the heating cylinder is approximately 1.58 cm (5/8 inch), and the wall thickness of the cylinder is approximately 0.00762 cm (3 mil).
), the length is approximately 2.667co+ (1.5 inches), but it is not limited to this dimension; for example, the wall thickness may be approximately L007G2cm (3mil) or thicker. good.

The top plate 70 and the bottom plate 71 are also made of tantalum sheets, and the thickness of each is approximately 0.00762 cm (311 cm).
1i11 to 0.0127 cm (5 mil), and is spot welded to the heating cylinder 65. Top plate 7o
and the bottom plate 71 are each provided with a center lower portion 2.73. The middle-east lower part 3 of the bottom plate 71 has a large diameter, for example, about 1.58 cm (5/8 inch),
When the crucible 60 moves in the axial direction inside the heating cylinder, the size is such that the crucible 60 can easily pass through the heating cylinder.
Fixed to the evaporator device. Such axial movement of the crucible 60 is necessary for taking out the crucible, refilling with vapor deposition material, and re-leaning. The diameter of the lower part 2 between the centers of the top plate 70 is narrow, for example, about 0.635 cm (1/4 inch). The top plate 70 is provided with ears 81 and 83 for easy connection of electrical terminals.

Outer cylinder 8 made of a suitable fire-resistant material (e.g. tantalum)
5 is spot welded to the bottom plate 71. The upper edge of this outer cylinder is not in contact with the top plate 70.

In order to generate heat from the heating tube 65 as a heating source, the top plate 70
energizes the bottom plate 71 and causes the current to flow through the heating cylinder. The voltage of the current flowing through the top plate 70 and the bottom plate 71 is 2 to 4 volts, and the current flowing through the heating cylinder is 150 to 250 volts.
amperage, which causes the heating tube to generate heat at a temperature sufficient to heat the crucible 60 and the crystals therein.

This invention is used, for example, when a calcium fluoride film is applied to the surface of a nitrocellulose pellicle, and the surface of the pellicle is approximately 63 mm from the top surface of the top plate 70.
They are spaced from 5 cm (25 inches) to about 76.2 am (30 inches) apart.

There is. The heating tube is preheated to approximately 1200℃ by resistance heating.
is heated to. When the temperature of the heating tube reaches this temperature, the top plate 70 becomes incandescent. As a result, the surface of the pellicle is preheated, and this serves as a pretreatment.
A film of calcium fluoride can be deposited on the surface of the pellicle. Next, as shown in FIG. 4, a crucible 60 is inserted into a predetermined position, and a film of calcium fluoride is deposited on each surface of each pellicle at a rate of 5 to 10 angstroms per second, with a total film thickness of It was approximately 400 angstroms. During such a deposition operation,
The ruppo 60 and the rod 61 are rotated at a rate of about 10 rpa+. In both of these rotations, the rotation of the crucible is preferably faster than about 2 ppm.

It was confirmed that the deposited film formed on the surface of each pellicle by such a vaporization operation had an extremely uniform film thickness over the entire surface.

The embodiments described above are merely examples for explaining the present invention, and the present invention is not limited thereto. Modifications within the technical scope of the claims may also be made to the present invention. It is included in the technical scope.

[Effects of the Invention] According to the present invention, when vaporizing a coating material such as calcium fluoride on the surface of a substrate, for example, a pellicle, a uniform thickness can be deposited on the surface of the substrate by rotating the evaporation source. The present invention provides an apparatus capable of forming a film, and the apparatus has excellent effects as a vapor deposition apparatus, such as a simple structure and low manufacturing cost.

[Brief explanation of drawings]

FIG. 1 is an explanatory diagram showing an example of a vapor deposition apparatus according to the present invention, FIG. 1a is a graph showing a vapor concentration distribution regarding the center axis of the vapor deposition apparatus of FIG. 1, and FIG. 2 is a graph showing the vapor concentration distribution of the vapor deposition apparatus of FIG. 3 is a side view of the heating device, FIG. 4 is a sectional view taken along the line 4-4 in FIG. 3, and FIG. 5 is a side view of the heating device.
A plan view of the heating device. FIG. 6 is a sectional view taken along the line 6-6 in FIG. 10, 11.12... Support bodies 20 to 21... Pellicle 30... Black light source 60... Crucible 61... Supporting the crucible 1985 Patent Application No. 205147, Name of Invention Vapor Deposition Apparatus, 1m Relationship with the person who makes the case

Claims (1)

[Claims] (1) The center of the bottom of a container containing the material to be vapor-deposited is supported by a support shaft, and heating means is arranged around the outer periphery of the container,
an evaporation source equipped with a mechanism for rotating the container within the heating means; and a support mechanism for the substrate that allows the surface of the substrate to be vapor-deposited to face the evaporation source so as to be substantially perpendicular to the evaporation source. Vapor deposition equipment. (2) The vapor deposition apparatus according to claim 1, wherein the heating means is a heating cylinder surrounding the peripheral side of the container. (3) The container is a crucible made of a fire-resistant material (4)
3. The vapor deposition apparatus according to claim 2, wherein the container is a crucible made of a refractory material. (5) The heating cylinder is made of pure tantalum, has a thickness of about 0.00762 cm (3 mils) or more, and is configured to heat and evaporate the vapor deposition material in the container by resistive heat generation when energized. 2. Vapor deposition apparatus according to item 2. (6) The heating cylinder is made of pure tantalum, has a thickness of about 0.00762 cm (3 mils) or more, and is configured to heat and evaporate the vapor deposition material in the container by resistive heat generation by energization. The vapor deposition apparatus according to item 3. (7) The vapor deposition apparatus according to claim 6, wherein the means for rotating the container is a refractory rod rotated by a motor and coaxial with the axis of the container to support it. (8) The vapor deposition apparatus according to claim 1, wherein the vapor deposition material is calcium fluoride. (9) The vapor deposition apparatus according to claim 3, wherein the vapor deposition material is calcium fluoride. (10) The vapor deposition apparatus according to claim 4, wherein the vapor deposition material is calcium fluoride. (11) The vapor deposition apparatus according to claim 5, wherein the vapor deposition material is calcium fluoride. (12) The vapor deposition apparatus according to claim 6, wherein the vapor deposition material is calcium fluoride. (13) The vapor deposition apparatus according to claim 7, wherein the vapor deposition material is calcium fluoride. (14) Evaporating and vaporizing the vapor deposition material stored in a container heated from the outside by heating, and depositing the vaporized and vaporized material on the surface of the substrate placed at a predetermined distance from the container. . A vapor deposition method for vapor deposition on a substrate, characterized in that the container is heated while being rotated.