JPS6098631A - 終点検出装置 - Google Patents
終点検出装置Info
- Publication number
- JPS6098631A JPS6098631A JP58204816A JP20481683A JPS6098631A JP S6098631 A JPS6098631 A JP S6098631A JP 58204816 A JP58204816 A JP 58204816A JP 20481683 A JP20481683 A JP 20481683A JP S6098631 A JPS6098631 A JP S6098631A
- Authority
- JP
- Japan
- Prior art keywords
- end point
- intensity
- change
- circuit
- detected
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H10P50/00—
Landscapes
- Drying Of Semiconductors (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP58204816A JPS6098631A (ja) | 1983-11-02 | 1983-11-02 | 終点検出装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP58204816A JPS6098631A (ja) | 1983-11-02 | 1983-11-02 | 終点検出装置 |
Related Child Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP5284596A Division JP2790111B2 (ja) | 1996-03-11 | 1996-03-11 | プラズマ処理方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6098631A true JPS6098631A (ja) | 1985-06-01 |
| JPH0564455B2 JPH0564455B2 (show.php) | 1993-09-14 |
Family
ID=16496850
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP58204816A Granted JPS6098631A (ja) | 1983-11-02 | 1983-11-02 | 終点検出装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6098631A (show.php) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS63239819A (ja) * | 1987-03-27 | 1988-10-05 | Hitachi Ltd | プラズマ処理終点判定方法及び装置 |
| JPS6448420A (en) * | 1987-08-19 | 1989-02-22 | Hitachi Ltd | Plasma treater and decision method of end point of plasma treatment |
| JP2001007084A (ja) * | 1999-06-21 | 2001-01-12 | Nec Corp | エッチング終点判定方法 |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4208240A (en) * | 1979-01-26 | 1980-06-17 | Gould Inc. | Method and apparatus for controlling plasma etching |
| JPS56114329A (en) * | 1980-02-15 | 1981-09-08 | Chiyou Lsi Gijutsu Kenkyu Kumiai | Method for sensing time of completion of dry etching |
-
1983
- 1983-11-02 JP JP58204816A patent/JPS6098631A/ja active Granted
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4208240A (en) * | 1979-01-26 | 1980-06-17 | Gould Inc. | Method and apparatus for controlling plasma etching |
| JPS56114329A (en) * | 1980-02-15 | 1981-09-08 | Chiyou Lsi Gijutsu Kenkyu Kumiai | Method for sensing time of completion of dry etching |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS63239819A (ja) * | 1987-03-27 | 1988-10-05 | Hitachi Ltd | プラズマ処理終点判定方法及び装置 |
| JPS6448420A (en) * | 1987-08-19 | 1989-02-22 | Hitachi Ltd | Plasma treater and decision method of end point of plasma treatment |
| JP2001007084A (ja) * | 1999-06-21 | 2001-01-12 | Nec Corp | エッチング終点判定方法 |
| US6537460B1 (en) | 1999-06-21 | 2003-03-25 | Nec Corporation | Method for detecting an end point of etching in a plasma-enhanced etching process |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0564455B2 (show.php) | 1993-09-14 |
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