JPS6096439A - Poly-p-phenylenesulfide film for vertical magnetizing - Google Patents

Poly-p-phenylenesulfide film for vertical magnetizing

Info

Publication number
JPS6096439A
JPS6096439A JP20536483A JP20536483A JPS6096439A JP S6096439 A JPS6096439 A JP S6096439A JP 20536483 A JP20536483 A JP 20536483A JP 20536483 A JP20536483 A JP 20536483A JP S6096439 A JPS6096439 A JP S6096439A
Authority
JP
Japan
Prior art keywords
film
temperature
less
heat
polyp
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP20536483A
Other languages
Japanese (ja)
Inventor
Shoji Ueno
上野 捷二
Haruo Hayashida
林田 晴雄
Takao Ninomiya
二宮 高雄
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sumitomo Chemical Co Ltd
Original Assignee
Sumitomo Chemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sumitomo Chemical Co Ltd filed Critical Sumitomo Chemical Co Ltd
Priority to JP20536483A priority Critical patent/JPS6096439A/en
Publication of JPS6096439A publication Critical patent/JPS6096439A/en
Pending legal-status Critical Current

Links

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B29WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29CSHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C55/00Shaping by stretching, e.g. drawing through a die; Apparatus therefor
    • B29C55/005Shaping by stretching, e.g. drawing through a die; Apparatus therefor characterised by the choice of materials
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B29WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29CSHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C55/00Shaping by stretching, e.g. drawing through a die; Apparatus therefor
    • B29C55/02Shaping by stretching, e.g. drawing through a die; Apparatus therefor of plates or sheets
    • B29C55/18Shaping by stretching, e.g. drawing through a die; Apparatus therefor of plates or sheets by squeezing between surfaces, e.g. rollers
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B29WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29CSHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C71/00After-treatment of articles without altering their shape; Apparatus therefor
    • B29C71/0063After-treatment of articles without altering their shape; Apparatus therefor for changing crystallisation
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B29WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29KINDEXING SCHEME ASSOCIATED WITH SUBCLASSES B29B, B29C OR B29D, RELATING TO MOULDING MATERIALS OR TO MATERIALS FOR MOULDS, REINFORCEMENTS, FILLERS OR PREFORMED PARTS, e.g. INSERTS
    • B29K2081/00Use of polymers having sulfur, with or without nitrogen, oxygen or carbon only, in the main chain, as moulding material

Landscapes

  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Magnetic Record Carriers (AREA)
  • Manufacture Of Macromolecular Shaped Articles (AREA)
  • Shaping By String And By Release Of Stress In Plastics And The Like (AREA)
  • Other Surface Treatments For Metallic Materials (AREA)

Abstract

PURPOSE:To obtain a vertical magnetizing base film whose thermal resistance is high, moisture uptake is less than that of polyester, the coefficient of linear expansion is small and maximum surface roughness becomes less than 500Angstrom , by making molecular orientation and heat setting of poly-p-phenylenesulfide. CONSTITUTION:Rear tension of more than 80kg/cm<2> is given to a poly-p-phenylenesulfide film at least, and the film is rolled into 1.5-4 times by pressure rolls which makes a pair and is falling within a temperature range of more than 60 deg.C and less than 140 deg.C through linear pressure of more than 100kg/cm at least and fixed thermally at a temperature of more than 220 deg.C and less than the fusion point. In addition to the above, thinning of the film can be done, as the film whose molecule has oriented extermely high is obtained when the film is orientated in the direction of a film width and orientation is applied to a longitudinal direction of the film also as well as rolling of the film. In this case, the film is orientated 1.5-4 times in the direction of the film width and 1.1-2 times in a longitudianl direction respectively at a temperature of more than 80 deg.C and less than 130 deg.C.

Description

【発明の詳細な説明】 本発明は最大表面粗さが500X以下で、ポリP−7エ
ニレンスルフイドを分子配向およびヒートセットしてな
る垂直磁化用ベースフィルムに関するものである。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a base film for perpendicular magnetization, which has a maximum surface roughness of 500X or less and is made of polyP-7 enylene sulfide with molecular orientation and heat setting.

ここで最大表向粗さとはJ I S BO601に規定
されている表面粗さであり、触針法により測定できる。
The maximum surface roughness here is the surface roughness specified in JIS BO601, and can be measured by the stylus method.

現在、磁気記録は、テープレコーダー、VTRをはじめ
コンピューター分野でも外部メモリとして大きな役割を
果しており、特にオフィスオートメ−シーンやパソコン
にはフロッピーディスクがますます重要、になっている
Currently, magnetic recording plays a major role as external memory in tape recorders, VTRs, and other computers, and floppy disks are becoming increasingly important in office automation and personal computers in particular.

この様に磁気記録はテープやディスク状で使用され、ベ
ースフィルムとしてはポリエステルフィルムが主流をな
している。一方、最近では、記録密度を高めるために垂
直磁化方式が提案され業界では実用化にむけて開発が進
められている。しかし垂・電磁化用ベースフィルムとし
ては表面平滑、性、耐熱性、低吸湿性、線膨張係数が小
さいことなどが要求、され、現存する市販フィルムでは
いずれも問題があり、実用的でない。
In this way, magnetic recording is used in the form of tape or disk, and polyester film is the mainstream as the base film. On the other hand, recently, a perpendicular magnetization method has been proposed in order to increase recording density, and development is progressing in the industry toward practical use. However, base films for vertical electromagnetization are required to have a smooth surface, good properties, heat resistance, low moisture absorption, and a small coefficient of linear expansion, and the existing commercially available films all have problems and are not practical.

例工ばポリエステルフィルムでは磁性膜形成時の耐熱性
が不足しているため生産性が極めて悪く実用的でない。
For example, polyester film lacks heat resistance when forming a magnetic film, resulting in extremely poor productivity and impractical use.

また耐熱性良好なポリイミドフィルムの場合は吸湿した
水分の影響により磁性膜形成特番ζ高真空にできずフィ
ルムと磁性、膜。
In addition, in the case of polyimide film, which has good heat resistance, the magnetic film formation special number ζ cannot be applied to high vacuum due to the influence of absorbed moisture, and the film, magnetism, and film cannot be formed.

との密着強度が不十分であることおよび表−5が粗いこ
となどにより実用的でない。これに対−し、本発明の分
子配向およびヒートセットされたポリフェニレンスルフ
ィドフィルムはこれらの問題点を全(解決したものであ
り、融!−,285℃と耐熱性が高く吸湿性はポリエス
テル以下で−、線膨張係数も小さく、しかも分子配向に
伴なりで最大表面粗さが500 X以下となるため、垂
直磁化用ベースフィルムとして必要な特性を全て備えて
いる。
It is not practical due to insufficient adhesion strength and roughness of Table 5. On the other hand, the molecularly oriented and heat-set polyphenylene sulfide film of the present invention completely solves these problems; it has high heat resistance (melting temperature of -285°C) and hygroscopicity that is lower than that of polyester. -, the coefficient of linear expansion is small, and the maximum surface roughness is 500X or less due to molecular orientation, so it has all the characteristics necessary as a base film for perpendicular magnetization.

なお、最大表面粗さが500 Xを越えると磁性膜形成
後の表面1平滑性が不十分となり記録再生特番ζ主磁極
との接触によるトラブルを生じる。
If the maximum surface roughness exceeds 500X, the smoothness of the surface 1 after forming the magnetic film will be insufficient, causing troubles due to contact with the recording/reproduction special number ζ main magnetic pole.

従って最大表面粗さは500X以下でなければならない
Therefore, the maximum surface roughness must be less than 500X.

本発明者等は垂直磁化用ベースフィルムについて鋭東検
討した結果、前述の如(最大表面粗7さが500 X以
下で、ポリフェニレンスルフィドを分子配向およびヒー
トセットしたフィルムが極めて優れた適性を有すること
をつきとめ本発明に到達したものである。
As a result of extensive research on base films for perpendicular magnetization, the inventors of the present invention found that a film with a maximum surface roughness of 500X or less and made of molecularly oriented and heat-set polyphenylene sulfide has extremely excellent suitability, as described above. This is what led to the present invention.

本発明で使用するポリP−7エニレンスルフイドはその
90モルチ以上が構成単位、へ可トs −)−から成る
ポリマーである事が好ましく、90モルチより少ないと
結晶性が低下する上に耐熱性、機械的物性などの低下を
きたすのみならず、寸法変化特性にも悪影響を与える。
It is preferable that the polyP-7 enylene sulfide used in the present invention is a polymer in which 90 or more moles of the structural unit consists of the structural unit, s-)-, and if it is less than 90 moles, the crystallinity decreases and This not only causes a decrease in heat resistance and mechanical properties, but also has an adverse effect on dimensional change characteristics.

なお該ポリマーの構成単位のうち10モル−未満であれ
ば他の共重合体単位を含んでいても差し支えない。
Note that the polymer may contain other copolymer units as long as it is less than 10 moles of the structural units.

かかる共重合体位としては、例えば3官能単位(例 +
s−)、エーテル単位 (例:つ−〇会S−)、スルホン単位 (例: i−8o2()s −)、メタ結合単位また重
合したポリマーを加熱することによってわずかながらの
橋かけを起させる事も可能である。かかる構成単位から
なるポリp−7二二反応させる方法が好適である。この
場合、重合度を調整するために、力性アルカリ、カルボ
ン酸アルカリ金属塩などのいわゆる重合助剤添加するの
が好ましい。
Such copolymer positions include, for example, trifunctional units (e.g. +
s-), ether units (e.g. Tsu-〇kaiS-), sulfone units (e.g. i-8o2()s-), meta bond units, and slight cross-linking can be caused by heating the polymerized polymer. It is also possible to do so. A method of reacting polyp-722 consisting of such structural units is preferred. In this case, in order to adjust the degree of polymerization, it is preferable to add a so-called polymerization aid such as an alkali or an alkali metal salt of a carboxylic acid.

使用される触媒の種類や所望する重合度によって適宜決
定される。またかかる重合系に更にポリマーの膨潤剤、
劣化防止剤、添加剤などを配合する事は何んら差し支え
ない。
It is appropriately determined depending on the type of catalyst used and the desired degree of polymerization. In addition, a swelling agent for the polymer is added to the polymerization system.
There is no problem in adding deterioration inhibitors, additives, etc.

本発明のポリフェニレンスルフィドフィルムの分子配向
手段としては延伸およびロール圧延があげられる。
Stretching and roll rolling can be cited as molecular orientation means for the polyphenylene sulfide film of the present invention.

また、本発明者等は、垂直磁化用ベースフィルムとして
特に重要な表面平滑性の向上についてさらに検討を加え
た結果、ロール圧延法が極めて優れた手法であることを
見い出した。すなわち、延伸の場合はフィルム表面は自
由であるのに対し、ロール圧延では加圧ロールにより表
面が規制されるため、より表面平滑性の優れたフィルム
を製造できることを見い出した。なお圧延時に液状潤滑
液を使用すればさらに効果的であるが、必要9条件では
ない。但し、ロール圧延は基本的にはフィルム長褌方向
の分子配向手段であるため、テープ用途ではそのまま使
用することができるものの、フロッピーディスクの様に
等方性が要求される場合には、フィルム巾方向の分子配
向も行なう方が好ましく、その手段としては延伸が必要
である。また、テープ用途でもロール圧延だけでなく、
フィルム中方向に延伸し、長さ方向にも延伸を加えれば
、極めて高度に分子配向したフィルムが得られるため、
薄肉化することができる。
Further, the present inventors further investigated the improvement of surface smoothness, which is particularly important for a base film for perpendicular magnetization, and found that the roll rolling method is an extremely excellent method. That is, in the case of stretching, the surface of the film is free, whereas in roll rolling, the surface is regulated by pressure rolls, so it has been found that a film with better surface smoothness can be produced. Note that it would be more effective if a liquid lubricant was used during rolling, but this is not a necessary condition. However, since roll rolling is basically a means of orienting molecules in the direction of the film's length, it can be used as is for tape applications, but when isotropy is required, such as in floppy disks, the film width It is preferable to also carry out molecular orientation in the direction, and stretching is necessary as a means for this purpose. In addition, tape applications are not limited to roll rolling.
By stretching the film in the mid-direction and also stretching it in the longitudinal direction, a film with extremely high molecular orientation can be obtained.
Can be made thinner.

なお、いずれの場合でもロール圧延と延伸との順序はど
ちらが先でも良い。圧延を行なうに際しては加圧ロール
の入側で少なくとも80Kl!/C112以上の後方張
力を付与しなければならない。
In any case, the order of rolling and stretching may be carried out first. When rolling, the input side of the pressure roll must be at least 80Kl! /C112 or more rear tension must be applied.

ここで後方張力とは繰出張力とも呼ばれるがフィルムの
進行方向に対し、逆向きに作用する力のことであり、8
01’f/a12 より低ければ加圧ロールにおける中
立点(最高圧力点)がロール入側に移行してくいこみ不
良が発生しゃすくなり、安定加工が困難である。従って
後方張力は8゜即/2”以上付与することが必要である
Here, the backward tension, also called the extending force, is a force that acts in the opposite direction to the direction in which the film travels.
If it is lower than 01'f/a12, the neutral point (highest pressure point) of the pressure roll will shift to the roll entry side, making it more likely that defects will occur, making stable processing difficult. Therefore, it is necessary to apply a rear tension of 8°/2" or more.

欠に圧延温度に関しては、加圧ロールを60℃以上、1
40℃以下の温度範囲□で任意に設定することができる
。該温度域より低、ければ、所望の圧延倍率を得るため
に多数の加圧ロール群を要することや、ロール間の加圧
1こ非常に大きな力を必要とし、装置上問題を生ずると
共Gこ、設備的にも高価なものメなり、圧延の条件とし
て不適切である。逆に級温度域より高(1場合(ま、圧
延加工性は問題ないが垂直磁化で重要な表面平滑性がや
や悪くなるため好」ましくなも)。
Regarding the rolling temperature, the pressure roll should be set at 60℃ or higher for 1
It can be set arbitrarily within the temperature range □ of 40°C or less. If the temperature is lower than this range, a large number of pressure rolls will be required to obtain the desired rolling ratio, and a very large force will be required for applying pressure between the rolls, which will cause equipment problems. This is expensive equipment and is inappropriate for rolling conditions. On the other hand, if the temperature is higher than the grade temperature range (1) (well, rolling workability is not a problem, but surface smoothness, which is important due to perpendicular magnetization, is slightly deteriorated, so it is not preferable).

また線圧は100坪/、 以上が必要であり、100#
IP/cI+ より低ければ十分に配向させることカイ
できない。
In addition, the line pressure must be 100 tsubo/or more, and 100 #
If it is lower than IP/cI+, sufficient orientation cannot be achieved.

以上の条件で1.5〜4倍に圧延するが、1.5倍以下
の場合は配向効果が不十分であり、また4倍以上に圧延
すると破断が頻発し安定加工カイ困難となる。なお、こ
れらのことは延伸の場合も同様であり倍率としては1.
5〜4倍が良0゜また延伸、温度は80℃以上、130
℃以下の範vB4で行なうことが必要である。該温度域
より低ければ均一な延伸ができず、厚み精度の著しく悪
いフィルムとなり、逆に該温度域より高ければ結晶化が
進んで降伏応力が高くなり延伸が困難となる。
Rolling is carried out by a factor of 1.5 to 4 times under the above conditions, but if it is less than 1.5 times, the orientation effect will be insufficient, and if it is rolled more than 4 times, breakage will occur frequently and stable processing will be difficult. Note that these things are the same in the case of stretching, and the magnification is 1.
5 to 4 times is good 0° and stretching, temperature is 80°C or higher, 130°
It is necessary to carry out the test in the range vB4 below ℃. If the temperature is lower than this range, uniform stretching will not be possible, resulting in a film with extremely poor thickness accuracy.On the other hand, if the temperature is higher than this range, crystallization will proceed and the yield stress will increase, making stretching difficult.

なお、フィルム長さ方向について圧延だけでなく延伸を
併用する場合の延伸倍率は安定加工性および配向効果の
点から1.1〜2倍が適当である。さらに、ヒートセッ
トに関しては220°C以上融点以下で行なうが220
℃より低ければ十分な寸法安定性が得られない。
In addition, when not only rolling but also stretching is used in the longitudinal direction of the film, the appropriate stretching ratio is 1.1 to 2 times from the viewpoint of stable workability and orientation effect. Furthermore, heat setting is performed at temperatures above 220°C and below the melting point, but 220°C
If the temperature is lower than ℃, sufficient dimensional stability cannot be obtained.

以上により垂直磁化に適したベースフィルムが得られC
6−C9合金、酸化鉄、C0−P合金、Go−Ni合金
、CoP −Ni 合金等の磁性1体を薄膜形成するこ
とができる。薄膜形成手段としてはスパッタリング、真
空蒸着、イオンブレーティング、電気メッキ等が挙げら
れるが、本発明のベースフィルムはいずれにも適用でき
るものである。
Through the above steps, a base film suitable for perpendicular magnetization can be obtained.
A thin film of a magnetic substance such as 6-C9 alloy, iron oxide, C0-P alloy, Go-Ni alloy, CoP-Ni alloy, etc. can be formed. Thin film forming means include sputtering, vacuum evaporation, ion blating, electroplating, etc., and the base film of the present invention can be applied to any of them.

以下、実施例により本発明を具体的に示すが、本発明は
これらにより何んら限定されるものではない。
EXAMPLES Hereinafter, the present invention will be specifically illustrated by examples, but the present invention is not limited by these in any way.

実施例1〜2、比較例1〜3 オートクレーブに硫化ナトリウム32.6J’f(25
0モル、結、晶水4 Q wtチ)、水酸化ナトリウム
100g、酢酸リチウム16.5 Kf(250モル)
及びN−メチルピロリドン79.2 印を仕込みかくは
んしながら徐々に205℃まで昇温し、水6.9即を含
む留出液7.0/を除去した。残留混合物に1.4−ジ
クロルベンゼン37.511 (255モル)及びN−
メチルピロリドン20時を加え、240℃で8時間重合
した。
Examples 1-2, Comparative Examples 1-3 Sodium sulfide 32.6 J'f (25
0 mol, crystalline water 4 Q wt), sodium hydroxide 100 g, lithium acetate 16.5 Kf (250 mol)
and N-methylpyrrolidone (79.2 mm) were charged, and the temperature was gradually raised to 205°C while stirring, and 7.0 mm of distillate containing 6.9 mm of water was removed. The remaining mixture contains 37.511 (255 mol) of 1,4-dichlorobenzene and N-
Methylpyrrolidone was added at 20 hours, and polymerization was carried out at 240°C for 8 hours.

反応生成物を熱水洗4回、アセトン洗2回、塩化メチジ
21回洗陸し、真空乾燥機を用いて80℃、24時間乾
燥してPPS 224を得た。ポリマーの溶融粘度は高
化式フローテスター(島津製作所製)を用い、フロ一温
度300℃、せん断速度200(秒)−1の条件下で測
、定すると3200ポイズであった。
The reaction product was washed with hot water 4 times, acetone 2 times, and methidichloride 21 times, and dried in a vacuum dryer at 80° C. for 24 hours to obtain PPS 224. The melt viscosity of the polymer was measured using a Koka type flow tester (manufactured by Shimadzu Corporation) under the conditions of a flow temperature of 300° C. and a shear rate of 200 (sec) −1, and was found to be 3200 poise.

り 上記のPPSを300の2軸工官ストルーダ−でペレッ
ト化した。
The above PPS was pelletized using a 300 twin-screw Struder.

上記のポリP−フェニレンスルフイドペレフトを300
押出機を用いて、400 mm巾のTダイから押出すこ
とにより厚さ0.2tの原反フィルムを作成した。この
原反フィルムを直径2600、面長700 mmの1対
の加圧ロールにより圧延し、さらにヒートセットを施ル
た。
300% of the above polyP-phenylene sulfide pellets
Using an extruder, a raw film with a thickness of 0.2 t was created by extruding it from a T-die with a width of 400 mm. This raw film was rolled by a pair of pressure rolls having a diameter of 2600 mm and a surface length of 700 mm, and was further heat set.

した。加工条件および最大表面4粗さ測、定結果を表1
に示す。
did. Table 1 shows the processing conditions and maximum surface roughness measurements.
Shown below.

実施例3〜4、比較−例4〜5 実施例1と同様にして作成した原反フィルムを圧延もし
くはタテ延伸し、さらに横延伸、・を行なった後、ヒー
トセットを施した。得られたフィルムの最大表面粗さを
実施例1と同様の方法で測、定した。加工条件および最
大表面粗さ測定結果を表1に示す。
Examples 3 to 4, Comparative Examples 4 to 5 Raw films prepared in the same manner as in Example 1 were rolled or longitudinally stretched, and then laterally stretched, and then heat set. The maximum surface roughness of the obtained film was measured and determined in the same manner as in Example 1. Table 1 shows the processing conditions and maximum surface roughness measurement results.

実施例5 実施例1と同様にして作成した原反フィルムを圧延し、
さらに横延伸および縦風体Iを行なった後、ヒートセッ
トを、施した。得られたフィルムの最大表面粗さを実施
例1と同様゛の方法で測定した。加工条件および最大表
面粗さ測定結果を表1に示す。
Example 5 A raw film prepared in the same manner as in Example 1 was rolled,
Further, after transverse stretching and longitudinal winding I, heat setting was performed. The maximum surface roughness of the obtained film was measured in the same manner as in Example 1. Table 1 shows the processing conditions and maximum surface roughness measurement results.

実施例朱 実施例3で得られたフィルムの両面にスパッタリング法
により、軟磁性層として平均膜厚3000λのパーマロ
イを飛着させ、ついで同じくスパッタリング法により2
0%cr−c。
Example Vermilion Permalloy with an average thickness of 3000λ was deposited on both sides of the film obtained in Example 3 by sputtering as a soft magnetic layer, and then 2
0% cr-c.

合金を飛着させ、平均膜厚50005<の垂直磁化膜を
容易にかつ安定して形成することができた。
By flying the alloy, it was possible to easily and stably form a perpendicularly magnetized film with an average film thickness of 50,005 mm.

比、較例6 ポリP−フ二二しジスルフィドの50μの押出フィルム
を用いて実施例4と同様の方法にてパーマロイお、よび
2o%cr−co合金ノ飛着を試みたが、スパッタリン
グによりフィルムが変形し良好な製品は得られなかった
Comparative Example 6 An attempt was made to fly permalloy and 20% cr-co alloy using a 50 μm extruded film of polyP-phinyl disulfide in the same manner as in Example 4, but the sputtering failed. The film was deformed and a good product could not be obtained.

比較例7〜8 市販ポリエステルフィルム(東し、ルミラー■)50μ
品およびポリイミドフィルム(Dupont 、 Ka
pton■Hタイプ)50.a品を用いて各々実施例4
と同様の方法化でパーマロイおよび20 % Cr C
o合金の飛着を試みたが、ルミラー■は耐熱性力5低い
ため生産性は極めて悪く実用的ではなかっ°た。
Comparative Examples 7-8 Commercially available polyester film (Toshi, Lumirror ■) 50μ
product and polyimide film (Dupont, Ka
pton H type) 50. Example 4 using product a
Permalloy and 20% CrC with a similar methodology as
An attempt was made to fly the O alloy, but Lumirror ■ had a low heat resistance of 5, so the productivity was extremely poor and it was not practical.

またKaptOn■については吸湿した水分により高真
空が得られず磁性層とフィルムとの密着性が悪く容易に
剥離してしまった。また剥離前の状態でも平゛面平滑性
不良で良好な製品は得られなかった。
Regarding KaptOn■, a high vacuum could not be obtained due to the absorbed moisture, and the adhesion between the magnetic layer and the film was poor and the film easily peeled off. In addition, even before peeling, the flat surface smoothness was poor and a good product could not be obtained.

Claims (4)

【特許請求の範囲】[Claims] (1)ポリP−フェニレンスルフィドを分子配向および
ヒートセットしてなる最大表面粗さが500Å以下であ
る、≠尖書!チ妄=訟=士友念子ヂキ吻呵1拝P瞭ト枡
垂直磁化用ベースフィルム。
(1) PolyP-phenylene sulfide is molecularly oriented and heat set and has a maximum surface roughness of 500 Å or less. Base film for perpendicular magnetization.
(2) ポリP−フェニレンスルフィドフィルムに少く
とも80 kl//cs2以上の後方張力を付与し、6
0℃以上、140℃以下の温度範囲にある対をなす加圧
ロールにより、少くとも100KP/cI+1以上の線
圧にて1.5〜4倍にロール圧延し、220℃以上融点
以下の温度で熱固定することを特徴とする特粁請求の範
FIILti+項記載の垂直磁化用ベースフィルム。
(2) Applying a rear tension of at least 80 kl//cs2 to the polyP-phenylene sulfide film,
Using a pair of pressure rolls in a temperature range of 0°C or higher and 140°C or lower, the product is roll-rolled 1.5 to 4 times at a linear pressure of at least 100 KP/cI+1 and at a temperature of 220°C or higher and below the melting point. The base film for perpendicular magnetization according to claim FIILti+, characterized in that it is heat-set.
(3) ポリP−フェニレンスルフィドフィルムに少く
とも80#/am2以上の後方張力を付与し、60℃以
上140℃以下の温度範囲にある対をなす加圧ロールに
より少くとも100#/3以上の線圧にて1.5〜4倍
にロール圧延し、フィルム中方向に、80℃以上130
℃以下の温度で1.5〜4倍に延伸し、さらに220℃
以上融点以下の温度で熱固定することを特徴とする特肝
請求の範囲、(1)項記載の垂直磁化用ベースフィルム
(3) A backward tension of at least 80 #/am2 is applied to the polyP-phenylene sulfide film, and a tension of at least 100 #/3 is applied to the polyP-phenylene sulfide film by a pair of pressure rolls in a temperature range of 60°C to 140°C. Roll rolled to 1.5 to 4 times with linear pressure, and heat the film at 80°C or higher at 130°C in the direction of the film.
Stretched 1.5 to 4 times at a temperature below ℃, and further stretched at 220℃
The base film for perpendicular magnetization according to claim 1, characterized in that it is heat-set at a temperature above the melting point or below.
(4) ポリP−フェニレンスルフィドフィルムに少く
とも80hg/am2以上の後方張力を付与し、60℃
以上140℃以下の温度範囲にある対をなす加圧ロール
により、少くとも+00印/cm以上の線圧にて1.5
〜4倍にロール圧延し、80℃以上IIO℃以下の温度
でフィルム巾方向に1.5〜4倍、フィルム長を方向基
こ1.1〜2倍それぞれ延伸し、さらに220℃以上融
点以下の温度で熱固定することを特徴とする特杆請求の
範シ(1)項記載の垂直磁化用ベースフィルム。 +5)ホ!JP−7エニレンスルフイドフイルムをフィ
ルム長さ方向および/又はフィルム巾方向に80℃以上
130℃以下の温度で、それぞれ1.5〜4倍に風体・
し、さらに220℃以上融点、以下の温度で熱固定する
ことを特徴とする特許請求の範囲(1)項記載の垂直磁
化用ベースフィルム。
(4) Apply a rear tension of at least 80hg/am2 to the polyP-phenylene sulfide film and heat it at 60°C.
1.5 with a linear pressure of at least +00 marks/cm or more using a pair of pressure rolls in a temperature range of 140°C or more.
Roll rolled to ~4 times, stretched 1.5 to 4 times in the film width direction and 1.1 to 2 times in the film length in each direction at a temperature of 80 ° C or more and IIO ° C or less, and further stretched 220 ° C or more and below the melting point. The base film for perpendicular magnetization according to claim (1), wherein the base film is heat-set at a temperature of . +5) Ho! The JP-7 enylene sulfide film is heated to a temperature of 1.5 to 4 times in the film length direction and/or film width direction at a temperature of 80°C or higher and 130°C or lower, respectively.
The base film for perpendicular magnetization according to claim (1), which is further heat-set at a melting point of 220°C or higher and a temperature of 220°C or lower.
JP20536483A 1983-10-31 1983-10-31 Poly-p-phenylenesulfide film for vertical magnetizing Pending JPS6096439A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP20536483A JPS6096439A (en) 1983-10-31 1983-10-31 Poly-p-phenylenesulfide film for vertical magnetizing

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP20536483A JPS6096439A (en) 1983-10-31 1983-10-31 Poly-p-phenylenesulfide film for vertical magnetizing

Publications (1)

Publication Number Publication Date
JPS6096439A true JPS6096439A (en) 1985-05-30

Family

ID=16505628

Family Applications (1)

Application Number Title Priority Date Filing Date
JP20536483A Pending JPS6096439A (en) 1983-10-31 1983-10-31 Poly-p-phenylenesulfide film for vertical magnetizing

Country Status (1)

Country Link
JP (1) JPS6096439A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2592384A1 (en) * 1985-12-27 1987-07-03 Kureha Chemical Ind Co Ltd BIAXIALLY ORIENTED PARAPHENYLENE SULFIDE BLOCK COPOLYMER FILM AND MANUFACTURING METHOD THEREOF
EP0242165A2 (en) * 1986-04-14 1987-10-21 Kureha Kagaku Kogyo Kabushiki Kaisha Biaxially stretched polyparaphenylene sulfide film or sheet and process for producing the same
EP0323179A2 (en) * 1987-12-28 1989-07-05 Kureha Kagaku Kogyo Kabushiki Kaisha Poly(arylene sulfide) sheet and production process thereof
EP0355708A2 (en) * 1988-08-18 1990-02-28 Chisso Corporation Process for preparing rolled heat-treated films or sheets

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2592384A1 (en) * 1985-12-27 1987-07-03 Kureha Chemical Ind Co Ltd BIAXIALLY ORIENTED PARAPHENYLENE SULFIDE BLOCK COPOLYMER FILM AND MANUFACTURING METHOD THEREOF
EP0242165A2 (en) * 1986-04-14 1987-10-21 Kureha Kagaku Kogyo Kabushiki Kaisha Biaxially stretched polyparaphenylene sulfide film or sheet and process for producing the same
EP0323179A2 (en) * 1987-12-28 1989-07-05 Kureha Kagaku Kogyo Kabushiki Kaisha Poly(arylene sulfide) sheet and production process thereof
US4976908A (en) * 1987-12-28 1990-12-11 Kureha Kagaku Kogyo K. K. Poly(arylene sulfide) sheet production process
US5115092A (en) * 1987-12-28 1992-05-19 Kureha Kagaku Kogyo Poly(arylene sulfide) sheet
EP0355708A2 (en) * 1988-08-18 1990-02-28 Chisso Corporation Process for preparing rolled heat-treated films or sheets

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