JPS6088541U - heat treatment equipment - Google Patents

heat treatment equipment

Info

Publication number
JPS6088541U
JPS6088541U JP18124983U JP18124983U JPS6088541U JP S6088541 U JPS6088541 U JP S6088541U JP 18124983 U JP18124983 U JP 18124983U JP 18124983 U JP18124983 U JP 18124983U JP S6088541 U JPS6088541 U JP S6088541U
Authority
JP
Japan
Prior art keywords
heat treatment
guide shaft
processed
substrate
drive device
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP18124983U
Other languages
Japanese (ja)
Other versions
JPS6348121Y2 (en
Inventor
健一 寺内
勉 武内
淳 安江
Original Assignee
大日本スクリーン製造株式会社
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 大日本スクリーン製造株式会社 filed Critical 大日本スクリーン製造株式会社
Priority to JP18124983U priority Critical patent/JPS6088541U/en
Publication of JPS6088541U publication Critical patent/JPS6088541U/en
Application granted granted Critical
Publication of JPS6348121Y2 publication Critical patent/JPS6348121Y2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Furnace Details (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)

Abstract

(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.

Description

【図面の簡単な説明】[Brief explanation of the drawing]

第１図は従来の熱処理装置を模式的に示す縦断面図、第
２図は本考案に係る熱処理装置の構造を模式的に示す縦
断面図、第３図は第２図の部分拡大図、第４図は別の実
施例を示す部分拡大図である。 １・・・半導体基板、２・・・支持器、３・・・ガイド
軸、４・・・熱処理炉、５・・・光源、１０・・・軸受
、１２・・・移動台、１３・・・駆動装置、１４・・・
第２のガイド軸、１６・・・気体噴出孔、１９・・・開
口。FIG. 1 is a longitudinal sectional view schematically showing a conventional heat treatment apparatus, FIG. 2 is a longitudinal sectional view schematically showing the structure of the heat treatment apparatus according to the present invention, and FIG. 3 is a partially enlarged view of FIG. FIG. 4 is a partially enlarged view showing another embodiment. DESCRIPTION OF SYMBOLS 1... Semiconductor substrate, 2... Supporter, 3... Guide shaft, 4... Heat treatment furnace, 5... Light source, 10... Bearing, 12... Moving table, 13...・Drive device, 14...
Second guide shaft, 16... gas jet hole, 19... opening.

Claims (2)

【実用新案登録請求の範囲】[Scope of utility model registration request] （１）被処理基板に対して光照射する光源と、前記被処
理基板を所定の雰囲気下で熱処理する前処−理炉と：前
記被処理基板を前記熱処理炉内で保持する支持部と：前
記支持器を所定ピッチで移動せしめる駆動装置を備えて
なり、前記熱処理炉内で被処理基板を、前記光源との平
行度を維持した状態で、所定ピッチで移動させることに
より熱処理を行なう熱処理装置において、前記熱処理炉
の壁面を形成する少なくとも一面に穿設され、かつ前記
支持器と前記駆動装置とを接続するガイド軸を非接触で
貫挿するに足る内径を有する開口と：前記開口の内壁面
に、前記ガイド軸の外周面に対向して配設された複数の
気体噴出孔とを設け、前記気体噴出孔から所定圧の気体
を前記ガイド軸外周面に吹きつけるようにしたことを特
徴とする熱処理装置。(1) A light source that irradiates light onto a substrate to be processed; a pretreatment furnace that heat-treats the substrate to be processed in a predetermined atmosphere; and a support that holds the substrate to be processed in the heat treatment furnace; A heat treatment apparatus comprising a drive device that moves the support at a predetermined pitch, and performs heat treatment by moving the substrate to be processed within the heat treatment furnace at a predetermined pitch while maintaining parallelism with the light source. an opening formed in at least one surface forming a wall surface of the heat treatment furnace and having an inner diameter sufficient to allow a guide shaft connecting the supporter and the drive device to penetrate without contact; A wall surface is provided with a plurality of gas ejection holes arranged to face the outer circumferential surface of the guide shaft, and gas at a predetermined pressure is blown onto the outer circumferential surface of the guide shaft from the gas ejection holes. Heat treatment equipment. （２）支持器と駆動装置とを接続するガイド軸に平行に
延び、かつ前記駆動装置に接続する第２のガイド軸と：
前記第２のガイド軸を摺動自在に支持する軸受とを有し
、前記第２のガイド軸と軸受とにより支持器を光源に対
して平行移動させるようにした実用新案登録請求の範囲
第１項′　記載の熱処理装置。(2) A second guide shaft extending parallel to the guide shaft connecting the support and the drive device and connected to the drive device:
and a bearing that slidably supports the second guide shaft, and the second guide shaft and the bearing move the support device in parallel with the light source.Claim 1 The heat treatment apparatus described in item '.
JP18124983U 1983-11-22 1983-11-22 heat treatment equipment Granted JPS6088541U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP18124983U JPS6088541U (en) 1983-11-22 1983-11-22 heat treatment equipment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP18124983U JPS6088541U (en) 1983-11-22 1983-11-22 heat treatment equipment

Publications (2)

Publication Number Publication Date
JPS6088541U true JPS6088541U (en) 1985-06-18
JPS6348121Y2 JPS6348121Y2 (en) 1988-12-12

Family

ID=30392799

Family Applications (1)

Application Number Title Priority Date Filing Date
JP18124983U Granted JPS6088541U (en) 1983-11-22 1983-11-22 heat treatment equipment

Country Status (1)

Country Link
JP (1) JPS6088541U (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010225731A (en) * 2009-03-23 2010-10-07 Nuflare Technology Inc Deposition device

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59211221A (en) * 1983-05-17 1984-11-30 Nippon Denso Co Ltd Heat treatment of ion implanted semiconductor

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59211221A (en) * 1983-05-17 1984-11-30 Nippon Denso Co Ltd Heat treatment of ion implanted semiconductor

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010225731A (en) * 2009-03-23 2010-10-07 Nuflare Technology Inc Deposition device

Also Published As

Publication number Publication date
JPS6348121Y2 (en) 1988-12-12

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