JPS6083299A - Charge coupled semiconductor device - Google Patents

Charge coupled semiconductor device

Info

Publication number
JPS6083299A
JPS6083299A JP58191505A JP19150583A JPS6083299A JP S6083299 A JPS6083299 A JP S6083299A JP 58191505 A JP58191505 A JP 58191505A JP 19150583 A JP19150583 A JP 19150583A JP S6083299 A JPS6083299 A JP S6083299A
Authority
JP
Japan
Prior art keywords
shift register
electrodes
horizontal shift
horizontal
transfer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP58191505A
Other languages
Japanese (ja)
Other versions
JPH0443358B2 (en
Inventor
Hidetsugu Oda
織田 英嗣
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp, Nippon Electric Co Ltd filed Critical NEC Corp
Priority to JP58191505A priority Critical patent/JPS6083299A/en
Publication of JPS6083299A publication Critical patent/JPS6083299A/en
Publication of JPH0443358B2 publication Critical patent/JPH0443358B2/ja
Granted legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C27/00Electric analogue stores, e.g. for storing instantaneous values
    • G11C27/04Shift registers

Landscapes

  • Solid State Image Pick-Up Elements (AREA)
  • Transforming Light Signals Into Electric Signals (AREA)

Abstract

PURPOSE:To increase density by distributing charges from a vertical shift register to two horizontal shift registers. CONSTITUTION:Transfer electrodes 38-42 of a horizontal shift register operates as storage electrodes and electrodes 43-47 operate as barrier electrodes. Areas 52-59 are areas for generating a potential barrier at gap parts of the storage electrodes 38-42. Two transfer electrodes are arranged corresponding to one vertical shift register. Further, two transfer gate electrodes 50 and 51 are arranged between two horizontal shift registers 31 and 32. Areas 60 and 61 shown as shaded parts are channel stoppers. One vertical shift register is arranged for every two electrodes of the horizontal shift register, so the horizontal density is made twice as large as that obtained by arranging one vertical shift register for every four electrodes of the horizontal shift register as usual.

Description

【発明の詳細な説明】 本発明は電荷結合素子、とくに複数の垂直シフトレジス
タと水平シフトレジスタとを有する電荷結合素子に関す
る。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a charge-coupled device, and more particularly to a charge-coupled device having a plurality of vertical shift registers and horizontal shift registers.

電荷結合素子(以後CODと記す)は、従来からの高度
の集積回路技術を基盤とし、その発展とともに急速な開
発が進められ、近年固体撮像、アナログ遅延線、メモリ
等の各種の応用がなされるようになった。特にCODを
用いた固体撮像素子は、低消費電力、小型、軽量など多
くの特徴を有し近年その開発が盛んである。一般にCO
D固体撮]象素子はフレームトランスファ型とインタラ
イン型とに分類さhるが、いずitも現在、多画素。
Charge-coupled devices (hereinafter referred to as COD) are based on conventional advanced integrated circuit technology, and their development has progressed rapidly along with their development, and in recent years they have been used in various applications such as solid-state imaging, analog delay lines, and memory. It became so. In particular, solid-state imaging devices using COD have many features such as low power consumption, small size, and light weight, and their development has been active in recent years. Generally CO
Solid-state photography] Elements are classified into frame transfer type and interline type, but both types currently have a large number of pixels.

高密度化される傾向にある。これらの固体撮像素子は複
数の垂直シフトレジスタと水平シフトレジスタとを有す
るが、多画素、高密度化にともない水平シフトレジスタ
の素子ピッチが縮小化されろ。
There is a trend toward higher density. These solid-state image sensing devices have a plurality of vertical shift registers and horizontal shift registers, but as the number of pixels and density increases, the element pitch of the horizontal shift registers will be reduced.

このため水平方向の密度は、通常水平シフトレジスタの
最小の素子ピッチで制限さノする。
Therefore, the horizontal density is usually limited by the minimum element pitch of the horizontal shift register.

第1図は従来の固体撮像素子の垂直シフトレジスタと、
水平シフトレジスタとの接続部の平面図を示している。
Figure 1 shows the vertical shift register of a conventional solid-state image sensor,
A plan view of a connection part with a horizontal shift register is shown.

図において、1は水平シフトレ・ンスタの信号転送チャ
ネル、2〜4は垂直シフトレジスタの信号転送チャネル
、6〜15は水平シフトレジスタを構成する転送電極、
16は垂直シフトレジスタを構成する一転送電極、21
は垂直シフトレジスタの最終転送電極16および水平シ
フトレジスタ1の転送電極6〜10に隣接するトランス
ファゲート電極士ある。また本素子では水平シフトレジ
スタの駆動として二相駆動を仮定しておシ、水平シフト
レジスタの転送電極6〜10は蓄積電極、11〜15は
バリヤ電極として作用する。
In the figure, 1 is a signal transfer channel of a horizontal shift register, 2 to 4 is a signal transfer channel of a vertical shift register, 6 to 15 are transfer electrodes constituting a horizontal shift register,
16 is one transfer electrode constituting a vertical shift register; 21
is the transfer gate electrode adjacent to the final transfer electrode 16 of the vertical shift register and the transfer electrodes 6 to 10 of the horizontal shift register 1. Further, in this device, two-phase drive is assumed for driving the horizontal shift register, and transfer electrodes 6 to 10 of the horizontal shift register act as storage electrodes, and electrodes 11 to 15 act as barrier electrodes.

17〜18は蓄積電極6〜100間隙部に電位バリヤを
発生させるだめの領域である。図において、水平シフト
レジスタの一素子のピッチは、水平シフトレジスタの4
つの転送電極、例えば6,11゜7.12の水平方向の
電極長によって決定され、したがって垂直シフトレジス
タ2〜4の水平方向のピンチも水平シフトレジスタの一
素子のピッチによって決定されている。すなわち、垂直
シフトレジスタの密度は水平シフトレジスタの電極の最
小加工寸法によって決定されてしまう。このため多画素
、高密度世するためには従来の素子構造では不可能であ
る。
Reference numerals 17 to 18 indicate areas for generating a potential barrier in the gaps between the storage electrodes 6 to 100. In the figure, the pitch of one element of the horizontal shift register is 4
One transfer electrode, for example, the horizontal electrode length of 6.11° and 7.12° is determined, and therefore the horizontal pinch of the vertical shift registers 2 to 4 is also determined by the pitch of one element of the horizontal shift register. That is, the density of the vertical shift register is determined by the minimum processing size of the electrodes of the horizontal shift register. For this reason, it is impossible to achieve a large number of pixels and high density using conventional device structures.

本発明め目的は、このような従来の欠点を除去した新し
い電荷結合半導体装置を提供することにある。
An object of the present invention is to provide a new charge-coupled semiconductor device that eliminates such conventional drawbacks.

本発明によれば、電荷結合素子による複数列の垂直シフ
トレジスタ群と、該シフトレジスタ群の信号転送方向と
直角方向に配置さhたM行の水平シフトレジスタ群とを
有し、前記垂直シフトレジスタ群と前記水平シフトレジ
スタ群の第一の水平シフトレジスタとの間および前記M
行の水平シフトレジスタとの間および前記M行の水平シ
フトレジスタ間には該水平シフトレジスタの信号転送方
向と平行にトランスファゲート電極が配置されだ1捏荷
結合半導体装置において、前記M行の水平シフトレジス
タ間に配置されたトランスファゲート電極を複数の電極
によって構成せしめたこと全特徴とする↑]イ荷結合半
導体装置が得られる。
According to the present invention, the vertical shift register group includes a plurality of columns of vertical shift registers made of charge-coupled devices, and a horizontal shift register group of M rows arranged in a direction perpendicular to the signal transfer direction of the shift register group, and between the register group and the first horizontal shift register of the horizontal shift register group and the M
Transfer gate electrodes are arranged parallel to the signal transfer direction of the horizontal shift registers between the horizontal shift registers of the rows and between the horizontal shift registers of the M rows. A charge-coupled semiconductor device is obtained which is characterized in that the transfer gate electrodes arranged between the shift registers are constituted by a plurality of electrodes.

以下、図面を用いて本発明を説明する。The present invention will be explained below using the drawings.

第2図は本発明による一実施例を示し、垂直シフトレジ
スタと、水平シフトレジスタとの接続部の平面図を示し
ている。図において、31.32は第1および第2の水
平シフトレジスタの信号転送チャネル、33〜37は垂
直シフトレジスタの(=M転送チャネル、38〜47は
水平シフトレジスタの転送電極、48は垂直シフトレジ
スタの一転送電極、49〜51はそれぞれ、第1.第2
および第3のトランスファゲート電極である。本素子で
は2チヤネルの水平シフトレジスタの駆動として二相駆
動を仮定しておし、水平シフトレジスタの転送電極38
〜42は蓄積電極、43〜47はバリヤ電極として作用
する。52〜59は蓄積電極38〜42の間隙部に電位
バリヤを発生させるだめの領域である。本実施例では垂
直シフトレジスタから送られてくる信号電荷を2つの水
平シフトレジスタに振シ分けて転送する例について示し
てあり、1つの垂直シフトレジスタに2つの水平転送電
極が対応して配置されている。また2つの水平シフトレ
ジスタ31.32間には2つのトランスファゲート電極
50.51が配置されている。斜線部で示される領域6
0.61はチャネルストッパである。つぎに本素子の動
作を説明する。第3図は本素子葡駆動するだめの駆動波
形の一例を示す。時刻t、において垂直シフトレジスタ
の最終転送電極48(φv4)に蓄積されていた電荷は
、時刻t、においてφv4がオフすると同時に、第1の
トランスファゲート電極49(φLl)がオンすること
により、第1のトランスファゲート電極下へ移動する。
FIG. 2 shows an embodiment according to the present invention, and shows a plan view of a connecting portion between a vertical shift register and a horizontal shift register. In the figure, 31 and 32 are signal transfer channels of the first and second horizontal shift registers, 33 to 37 are (=M transfer channels) of the vertical shift register, 38 to 47 are transfer electrodes of the horizontal shift register, and 48 is a vertical shift register. One transfer electrode of the register, 49 to 51, is the first and second transfer electrode, respectively.
and a third transfer gate electrode. In this device, two-phase drive is assumed for driving a two-channel horizontal shift register, and the transfer electrode 38 of the horizontal shift register
42 act as storage electrodes, and 43 to 47 act as barrier electrodes. Reference numerals 52 to 59 are regions for generating a potential barrier in the gaps between the storage electrodes 38 to 42. This embodiment shows an example in which signal charges sent from a vertical shift register are distributed and transferred to two horizontal shift registers, and two horizontal transfer electrodes are arranged corresponding to one vertical shift register. ing. Further, two transfer gate electrodes 50, 51 are arranged between the two horizontal shift registers 31, 32. Area 6 indicated by diagonal lines
0.61 is the channel stopper. Next, the operation of this device will be explained. FIG. 3 shows an example of the drive waveform used to drive the present device. The charge accumulated in the final transfer electrode 48 (φv4) of the vertical shift register at time t is transferred to the first transfer electrode 49 (φLl) by turning on the first transfer gate electrode 49 (φLl) at the same time that φv4 turns off at time t. Move below the transfer gate electrode No. 1.

つぎに時刻t、で水平シフトレジスタの転送mi&38
,43゜40.45,42.47(φ、)がオンすると
、この電荷はパルスφ、が印加される前記転送電極の蓄
積電極38,40.42下へ移動する。このとき水平シ
フトレジスタを駆動する他方のパルスφ1 はオフ状態
を保つため、パルスφ1と対応する垂面シフトレジスタ
34.36中の第1のトランスファゲート電極49下の
電荷は移動せずにそのままの状態を保つ。つぎに時刻t
4でパルスφ、がオフして第2のトランスファゲート電
極50に印加されるパルスφLtがオンすると蓄積電極
38,40.42下の電荷は第2のトランスファゲート
電極50下へ移動する。これと同時にパルスφ、がオン
状態とな勺第1のトランス7アゲート箪極49下に残っ
ていた電智が、第1の水平シフトレジスタの蓄積電極3
9,4]下へと移動する(時刻ts)。この七きφ、は
オフ状態を保つ。つぎに時刻t6でMfJ記第2のトラ
ンス7アゲート電極下の電荷は、パルスφL、のオンに
よって第3のトランスノアゲート電極下へと移動する。
Next, at time t, horizontal shift register transfer mi&38
, 43° 40.45, 42.47 (φ,) are turned on, this charge moves below the storage electrodes 38, 40.42 of the transfer electrode to which the pulse φ, is applied. At this time, the other pulse φ1 that drives the horizontal shift register remains off, so the charges under the first transfer gate electrode 49 in the vertical shift registers 34 and 36 corresponding to the pulse φ1 do not move and remain as they are. maintain condition. Then time t
When the pulse φ is turned off at step 4 and the pulse φLt applied to the second transfer gate electrode 50 is turned on, the charges under the storage electrodes 38, 40, 42 move to under the second transfer gate electrode 50. At the same time, the pulse φ is turned on, and the electric wire remaining under the agate electrode 49 of the first transformer 7 is transferred to the storage electrode 3 of the first horizontal shift register.
9, 4] move downward (time ts). This seven φ remains off. Next, at time t6, the charge under the agate electrode of the second transformer 7 of MfJ moves to under the third transformer gate electrode by turning on the pulse φL.

さらにこの電荷は時刻t7においてφ、がオンすること
によシ、第2の水平シフトレジスタの蓄積電極38,4
0.42下へと移動する。このとき前記第1の水平シフ
トレジスタの蓄積電極39.41下に蓄積されていた信
号電荷は左方へ移動し、第1の水平シフトレジスタの蓄
積電極38.40へ蓄積゛されるようになる(時刻to
)。
Further, this charge is transferred to the storage electrodes 38 and 4 of the second horizontal shift register by turning on φ at time t7.
Move down by 0.42. At this time, the signal charges accumulated under the storage electrodes 39 and 41 of the first horizontal shift register move to the left and are stored in the storage electrodes 38 and 40 of the first horizontal shift register. (Time to
).

この状態で、垂直シフトレジスタ34.36から転送さ
れてきた信号1L荷は第1の水平シフトレジスタへ、垂
直シフトレジスタ33,35.37から転送されてきた
侶号亀σjは第2の水平シフトレジスタへ蓄積されたこ
とになる。結局、垂直シフトレジスタの縦方向の交互の
列毎eこ信号電荷が2つの水平シフトレジスタに振シ分
けられたことになる。
In this state, the signal 1L transferred from the vertical shift registers 34.36 is transferred to the first horizontal shift register, and the signal σj transferred from the vertical shift registers 33, 35.37 is transferred to the second horizontal shift register. This means that it is stored in the register. As a result, e signal charges are distributed to the two horizontal shift registers for each alternate column in the vertical direction of the vertical shift register.

したがって、本実施例に示されるような素子構成によシ
、水平シフトレジスタの2il!極毎に1垂直シフトレ
ジスタを配置できるため、従来素子のように水平シフト
レジスタの4電極毎に1垂直シフトレジスタを配置した
場合と比べ、水平方向の密度を2倍にできる。本実施例
においては、垂直シフトレジスタからの信号電荷を2つ
の水平シフトレジスタに振シ分けることによシ高密度化
をはかっているが、本発明の主旨を適用することにより
、3つ、あるいはそれ以上の複数の水平シフトレジスタ
に信号電荷を振シ分けることも可能である。
Therefore, with the element configuration shown in this embodiment, the horizontal shift register has 2il! Since one vertical shift register can be arranged for each pole, the density in the horizontal direction can be doubled compared to the conventional device in which one vertical shift register is arranged for every four electrodes of the horizontal shift register. In this embodiment, high density is achieved by distributing the signal charge from the vertical shift register to two horizontal shift registers, but by applying the gist of the present invention, it is possible to It is also possible to distribute the signal charges to a plurality of horizontal shift registers.

以上述べたように、本発明によれば水平方向に高密度の
電荷結合半導体装置が実現できる。
As described above, according to the present invention, a horizontally high-density charge-coupled semiconductor device can be realized.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は従来の電荷結合半導体装置の垂直シフトレジス
タと水平シフトレジスタとの接続部、第2図は本発明に
よる電荷結合半導体装置の垂直シフトレジスタと水平シ
フトレジスタとの接続部の一実施例、第3図は本発明に
よる電荷結合半導体装置の駆動波形の一例金示す。図に
おいて、1゜31.32は水平シフトレジスタの信号転
送チャネル、2〜4,33〜37は垂直シフトレジスタ
の信号転送チャネル、6〜15.38〜47 は水平シ
フトレジスタの転送電極、16.48は垂直シフトレジ
スタの転送電極、21.49 、50 、51はトラン
ス7アゲート電極である。 第1図 第2図
FIG. 1 shows a connection section between a vertical shift register and a horizontal shift register in a conventional charge-coupled semiconductor device, and FIG. 2 shows an embodiment of a connection section between a vertical shift register and a horizontal shift register in a charge-coupled semiconductor device according to the present invention. , and FIG. 3 shows an example of a driving waveform of a charge-coupled semiconductor device according to the present invention. In the figure, 1°31.32 are signal transfer channels of the horizontal shift register, 2-4, 33-37 are signal transfer channels of the vertical shift register, 6-15.38-47 are transfer electrodes of the horizontal shift register, 16. 48 is a transfer electrode of the vertical shift register, and 21, 49, 50, and 51 are transformer 7 agate electrodes. Figure 1 Figure 2

Claims (1)

【特許請求の範囲】[Claims] 電荷結合素子による複数列の垂直シフトレジスタ群と、
該シフトレジスタ群の信号転送方間と直角方向に配置さ
れたM行の水平シフトレジスタ群とを有し、前記垂直シ
フトレジスタ群と前記水平シフトレジスタ群の第一の水
平シフトレジスタとの間および前記M行の水平シフトレ
ジスタ間には該水平シフトレジスタの信号転送方向と平
行にトランスファゲート電極が配置された電荷結合半導
体装置において、前記M行の水平シフトレジスタ間に配
置されたトランスファゲート電極を複数の電極によって
構成せしめたことを特徴とする電荷結合半導体装置。
A group of vertical shift registers with multiple columns using charge-coupled devices,
a horizontal shift register group of M rows arranged perpendicularly to the signal transfer direction of the shift register group, and between the vertical shift register group and a first horizontal shift register of the horizontal shift register group; In the charge-coupled semiconductor device, transfer gate electrodes are arranged between the M rows of horizontal shift registers in parallel to the signal transfer direction of the horizontal shift registers, wherein the transfer gate electrodes are arranged between the M rows of horizontal shift registers. A charge-coupled semiconductor device comprising a plurality of electrodes.
JP58191505A 1983-10-13 1983-10-13 Charge coupled semiconductor device Granted JPS6083299A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP58191505A JPS6083299A (en) 1983-10-13 1983-10-13 Charge coupled semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58191505A JPS6083299A (en) 1983-10-13 1983-10-13 Charge coupled semiconductor device

Publications (2)

Publication Number Publication Date
JPS6083299A true JPS6083299A (en) 1985-05-11
JPH0443358B2 JPH0443358B2 (en) 1992-07-16

Family

ID=16275764

Family Applications (1)

Application Number Title Priority Date Filing Date
JP58191505A Granted JPS6083299A (en) 1983-10-13 1983-10-13 Charge coupled semiconductor device

Country Status (1)

Country Link
JP (1) JPS6083299A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0525744U (en) * 1991-09-12 1993-04-02 三洋電機株式会社 Solid-state image sensor

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58111491A (en) * 1981-12-25 1983-07-02 Nippon Kogaku Kk <Nikon> Solid-state image pickup device

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58111491A (en) * 1981-12-25 1983-07-02 Nippon Kogaku Kk <Nikon> Solid-state image pickup device

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0525744U (en) * 1991-09-12 1993-04-02 三洋電機株式会社 Solid-state image sensor

Also Published As

Publication number Publication date
JPH0443358B2 (en) 1992-07-16

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