JPS6081749A - Ion beam device - Google Patents
Ion beam deviceInfo
- Publication number
- JPS6081749A JPS6081749A JP19039683A JP19039683A JPS6081749A JP S6081749 A JPS6081749 A JP S6081749A JP 19039683 A JP19039683 A JP 19039683A JP 19039683 A JP19039683 A JP 19039683A JP S6081749 A JPS6081749 A JP S6081749A
- Authority
- JP
- Japan
- Prior art keywords
- voltage
- lens
- power supply
- focusing lenses
- auxiliary
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/24—Circuit arrangements not adapted to a particular application of the tube and not otherwise provided for
Landscapes
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Electron Beam Exposure (AREA)
- Electron Sources, Ion Sources (AREA)
Abstract
Description
【発明の詳細な説明】
本発明は、イオンビーム装置にお１ブる集束レンズとそ
の電源回路の改良に関りる。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to improvements in a focusing lens in an ion beam device and its power supply circuit.
高密１身の集積回路素子を製造する手段としてイオンビ
ームを用いた露光装置の開発が進められているが、第１
図はその一例を示Ｊ構成図である。Exposure equipment using ion beams is being developed as a means of manufacturing high-density integrated circuit elements, but the
The figure is a configuration diagram showing an example of this.
第１図において、１（よＥ Ｉ−Ｉ Ｄ （Ｅ １ｅｃ
ｔｏ ｌ−ｌ ｙｄｒ。In Figure 1, 1(yoE I-I D (E 1ec
to l-l ydr.
ｄｙｌｌａｍｉｃ ）型のイオン源を示してａ３す、該
イオン源はイオンビームを放出づるエミッタ２．イオン
ビームの放出を制御Ｊる引出し電極３．イオンビームを
順次加速りるための複数の加速電極４及び接地電極５か
ら４７．Ｌ成される。」−ミッタ２ど各）Ｊ１１速電極
４には加速電源６の出力又はその分圧電１士が供給され
、１ミツタ２と引出し電極３の間には引出し電圧電源７
の出力が印加される。イオン源１からのイオンビーム８
は、アインツ−［ル型の集束レンズ９，１０によって順
次集束され、シリコンウェハー等の露光拐料１１に集３
１シする。集束レンズ９，１０の間には電場と該電場に
直交り゛る磁場によって不要なイオンを除去りるＩこめ
のウィーンフィルター１２が設けられでＪ５す、集束レ
ンズ９によるイオンビームのクロスオーバａ１３の結像
位置がウィーンフィルターの中心ど一￥９． ＴＪるＪ
、うに集束レンズ９のレンズ電源１４の出力を調整した
とぎに、ウィーンフィルターにょるイオンビームの拡が
りを最も小さくりることかできる（詳細は特願昭５７−
１８６．９１９号参照）。従って、露光拐斜１１へのイ
オノビーム集東を制御刃る集束レンズ１０のレンズ電源
１５だりではなく、レンズ電源１４の出力電圧も連続的
に成るいは微小ステップでディジタル的にその出力を調
整できるように構成Ｊる必要がある。dyllamic) type ion source is shown in Fig. a3, which has an emitter 2. which emits an ion beam. Extraction electrode for controlling ion beam emission 3. A plurality of acceleration electrodes 4 and ground electrodes 5 to 47 for sequentially accelerating the ion beam. L will be completed. - Mitter 2, etc.) The output of the acceleration power source 6 or its partial voltage is supplied to the J11-speed electrode 4, and the output voltage power source 7 is connected between the 1-mitter 2 and the extraction electrode 3.
The output of is applied. Ion beam 8 from ion source 1
is sequentially focused by Einzle-type focusing lenses 9 and 10, and is focused on an exposure material 11 such as a silicon wafer.
1 shi. A Wien filter 12 is provided between the focusing lenses 9 and 10 to remove unnecessary ions using an electric field and a magnetic field perpendicular to the electric field. The imaging position is the center of the Wien filter.￥9. TJruJ
By adjusting the output of the lens power supply 14 of the focusing lens 9, the spread of the ion beam due to the Wien filter can be minimized (details can be found in Japanese Patent Application No. 1987-
186.919). Therefore, the output voltage of the lens power source 14, rather than the lens power source 15 of the focusing lens 10, which controls the concentration of the ion beam onto the exposure slope 11, can be adjusted continuously or digitally in minute steps. It is necessary to configure it as follows.
所で、第１図の装置においてイオンビームの加速電圧を
２００ＫＶ程度にすると、集束レンズ９と集束レンズ１
０に供給りるレンズ電圧としては夫々６０ＫＶと１００
ＫＶ程度が必要となり、加速電源６とは別にこのような
高電圧出力を右するレンズ電源１／１．．１５を設置ノ
ることは装置の大型化と費用の増大を（ＩＪ＜大さな原
因となっていた。By the way, when the accelerating voltage of the ion beam is set to about 200 KV in the apparatus shown in FIG.
The lens voltages supplied to 0 are 60KV and 100KV, respectively.
KV is required, and in addition to the acceleration power supply 6, a lens power supply 1/1. ．． Installing 15 was a major cause of increasing the size and cost of the equipment (IJ<).
本発明は、このような問題を解決して、高電圧電源の数
を減らしてイオンビーム装置の電源回路を簡略化するこ
とを目的とするもので、イオンビームを発生りるイオン
源と、該イオン源にイオンビームを加速するための加速
電圧を供給づる加速電圧電源と、前記イオン１Ｉｉｌｊ
からのイオンビームを集束するための静電型集束レンズ
を備えた装置において、予め定められ！ζ分圧比の内か
ら４ｆＤ、に選択された分圧比に基づ゛い−Ｃ前記加速
１［１川電源の出力電圧を分圧して前記集束レンズへ供
給づる電圧分圧手段と、前記集束レンズの近傍に設けら
れた静電型の補助集束レンズと、該補助集束レンズへ前
記電圧分圧手段にＪ、る分圧電圧Ｊ、リーし細かに調整
されるレンズ電圧を供給覆る補助レンズ電源を設けたこ
とを特徴とり゛るものである。The present invention aims to solve these problems and simplify the power supply circuit of an ion beam device by reducing the number of high-voltage power supplies. an accelerating voltage power supply for supplying an accelerating voltage for accelerating the ion beam to the ion source; and
In an apparatus equipped with an electrostatic focusing lens for focusing an ion beam from a predetermined! Based on the voltage division ratio selected as 4fD from among the voltage division ratios ζ, the an electrostatic type auxiliary focusing lens provided near the auxiliary focusing lens; and an auxiliary lens power source that supplies the auxiliary focusing lens with a divided voltage J, which is finely adjusted by applying a divided voltage J to the voltage dividing means. It is characterized by the fact that it has been established.
第２図は、本発明の一実施例装置を承りもので、第１図
と同一符号を付したものは同一（７’ｉ成要索を表わし
ている。第２図の装Ｄ゛の人ぎな１Ｓ徴は、集束レンズ
９，１０のレンズ電極に加速電め；；６の出力を分圧づ
るブリーダ抵ＩＡ １６の分圧端子からの分圧電圧が供
給されて、負′１１図にＪ３りるレンズ電源１４．１５
が省略されていることである。その反面、ブリーダ抵抗
１６をその抵抗器としてのｆ１能を落ηことなくに連続
的に抵抗（１０をＩＩＪ ｉ ”Ｑきるような抵抗器を
用いて構成Ｊることはｙ１１シいため、ブリーダ抵抗の
分圧端子は予め定められた個所にしか設定できず、レン
ズ９，１０へ供給する電圧を細かく調整づ゛ることがで
８°なくなる。この点を解決づるため、第２図の装置に
おいては集束レンズ９．１０の上側に補助の集束レンズ
１７．１８と、その出ツノが連続的又は微小ステップで
ディジタル的に可変されるレンズ電源１９．２０が新た
に設けられている。従つＣにつの集束レンズの焦点距典
の調整は、粗調整をブリーダ抵抗１Ｇの分圧９１１（了
の選択切換えにＪ、って行ない、微調整はレンズ電源１
９．２０の出力調整にｊ、って行なうことになる。この
Ｊ、うに構成りることにより、新たに設りられるレンズ
電源１９．２０１よその出力電圧が最大１０ＫＶ程度ぐ
あればよく、第１図にお（プるレンズ電Ｎ１１４．１５
に比較しＣ格段に電源回路を小型化づることができる。Fig. 2 shows a device according to an embodiment of the present invention, and the same reference numerals as those in Fig. 1 represent the same components (7'i). The Gina 1S characteristic is caused by the acceleration voltage being supplied to the lens electrodes of the focusing lenses 9 and 10 from the voltage dividing terminal of the bleeder resistor IA 16, which divides the output of the accelerating electric current; Ruru lens power supply 14.15
is omitted. On the other hand, it is difficult to configure the bleeder resistor 16 using a resistor that can continuously resist (10) without reducing its ability as a resistor. The voltage dividing terminals can only be set at predetermined locations, and the voltage supplied to the lenses 9 and 10 cannot be finely adjusted by 8 degrees.To solve this problem, the device shown in FIG. In this case, an auxiliary focusing lens 17.18 and a lens power source 19.20 whose output point can be digitally varied continuously or in minute steps are newly installed above the focusing lens 9.10.Accordingly, C To adjust the focal length of the second focusing lens, make coarse adjustments by pressing J to select the partial pressure 911 (end) of the bleeder resistor 1G, and fine adjustments by using the lens power supply 1.
9. The output adjustment of 20 will be done by j. By configuring this J, the output voltage of the newly installed lens power supply 19.201 only needs to be about 10KV at maximum, as shown in Figure 1 (Purulens power supply N114.15).
Compared to C, the power supply circuit can be made much smaller.
尚、本発明は第２図の実施例装置に限定されるものでは
なく、例えば第２図においては補助静電レンズの一部、
即ら外側の接地電極の一部を（主）静電レンズの接地電
極で兼ねられる程接近して補助レンズを設（）た例が示
されているが、（主）静電レンズの近傍であればもっと
離し′Ｃ人々の静電レンズ電極を全く別個に設けても芹
支えない。Note that the present invention is not limited to the embodiment device shown in FIG. 2; for example, in FIG. 2, a part of the auxiliary electrostatic lens,
In other words, an example is shown in which the auxiliary lens is installed close enough that a part of the outer ground electrode can also be used as the ground electrode of the (main) electrostatic lens. If it were possible to separate the electrostatic lens electrodes further apart, it would be no problem even if the electrostatic lens electrodes were provided completely separately.
以上のにうに、本発明にＪ、ればイオンビーム装置にＪ
５りる電源回路を簡−１１化りることか可能と（ｒるの
で、イオンビーム装置のＪ、り広い利用に大きな効果が
発揮される。According to the above, if the present invention is J, then the ion beam device is JJ.
Since it is possible to simplify the power supply circuit of 5 to 11, it will have a great effect on the wider use of ion beam devices.
【図面の簡単な説明】
第１図は従来のイオンビームー装口の構成を示り略図、
第２図（よ本発明の一実施例装置の４１１１成を示づ略
図である。
１：イオン源、２：エミッタ、３：引出し電極、／ｌ：
加速電極、５：接地電極、６：加速電源、７：引出し電
圧電源、８：イオンビーム、９，１０：静電レンズ、１
１：露光月利、１２：ウィーンフィルター、１３：り１
」スス−バー像、’１１，１５゜１９．２０：レンズ電
源、１６：ブリーダ抵抗、１７．１８：補助レンズ電源
。
／／
第２図[Brief explanation of the drawings] Figure 1 is a schematic diagram showing the configuration of a conventional ion beam loading port.
FIG. 2 is a schematic diagram showing the 4111 configuration of an apparatus according to an embodiment of the present invention. 1: ion source, 2: emitter, 3: extraction electrode, /l:
Acceleration electrode, 5: Ground electrode, 6: Acceleration power supply, 7: Extraction voltage power supply, 8: Ion beam, 9, 10: Electrostatic lens, 1
1: Monthly exposure rate, 12: Vienna filter, 13: Ri1
'11, 15° 19.20: Lens power supply, 16: Bleeder resistance, 17.18: Auxiliary lens power supply. // Figure 2
Claims (1)
オンビームを加速づるための加速電圧を供給覆る加速電
圧電源と、前記イオン源からのイオンビームを集束する
ための静電型集束レンズを侑えた装置において、予め定
められた分圧比の内から任意に選択された分圧比に基づ
いて前記加速電圧電源の出力電圧を分圧して前記すこ束
レンズへ供給りる電圧分圧手段と、前記集束レンズの近
傍に設けられた静電型の補助集束レンズと、該補助集束
レンズへ前記電圧分圧手段による分圧電圧よりも細かに
調整されるレンズ電圧を供給−りる補助レンズ電源を設
けたことを特徴どりるイオン源装ｕ。An ion source that generates an ion beam has an accelerating voltage power source that supplies an accelerating voltage for accelerating the ion beam to the ion source, and an electrostatic focusing lens that focuses the ion beam from the ion source. In the apparatus, the voltage dividing means divides the output voltage of the accelerating voltage power source based on a partial voltage ratio arbitrarily selected from predetermined voltage dividing ratios and supplies the divided voltage to the small bundle lens; An auxiliary electrostatic focusing lens is provided near the focusing lens, and an auxiliary lens power supply is provided for supplying the auxiliary focusing lens with a lens voltage that is adjusted more finely than the voltage divided by the voltage dividing means. The ion source equipment U is characterized by:
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP19039683A JPS6081749A (en) | 1983-10-12 | 1983-10-12 | Ion beam device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP19039683A JPS6081749A (en) | 1983-10-12 | 1983-10-12 | Ion beam device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS6081749A true JPS6081749A (en) | 1985-05-09 |
Family
ID=16257455
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP19039683A Pending JPS6081749A (en) | 1983-10-12 | 1983-10-12 | Ion beam device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6081749A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2005057275A (en) * | 2003-08-01 | 2005-03-03 | Leica Microsystems Lithography Ltd | Pattern writing apparatus |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS4988460A (en) * | 1972-12-25 | 1974-08-23 | ||
| JPS4998173A (en) * | 1973-01-19 | 1974-09-17 |
-
1983
- 1983-10-12 JP JP19039683A patent/JPS6081749A/en active Pending
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS4988460A (en) * | 1972-12-25 | 1974-08-23 | ||
| JPS4998173A (en) * | 1973-01-19 | 1974-09-17 |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2005057275A (en) * | 2003-08-01 | 2005-03-03 | Leica Microsystems Lithography Ltd | Pattern writing apparatus |
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