JPS6081049A - Manufacture of heat-ray reflecting film - Google Patents

Abstract

PURPOSE:To obtain a heat-ray reflecting film having high spectral characteristics at a low cost by forming a transparent metallic film of a specified metal on a transparent substrate by electroless plating and by laminating a dielectric layer by coating. CONSTITUTION:The surface of a transparent substrate such as a glass plate is washed, and the substrate is dipped in a sensitivity providing liq. It is activated and immersed in an electroless plating bath contg. one or more among Ni, Cu, Ag and Co or an alloy thereof to form a thin transparent metallic film. After drying the substrate, a dielectric layer contg. one or more among TiO2, Ta2O5 and Nb2O5 as the principal component is formed on the metallic layer by coating with a soln. or dipping in it, and heat treatment is carried out. By this method a heat-ray reflecting film having superior characteristics can be uniformly formed on a glass plate, an electric bulb or a discharge lamp with high reproducibility.

Description

[Detailed description of the invention] [Technical field to which the invention pertains] The present invention is applicable to glass plates for construction, lighting bulbs, discharge lamps such as halogen lamps used in copying machines, high-pressure sodium lamps, etc. The present invention relates to a method of manufacturing a heat ray reflective film.

[Technical background of the invention]

Architectural glass plates are equipped with a heat ray reflective film because
This is well known. The purpose of this is to save energy in the cooling load during the summer, and the visible light band (0.3 μm to
07 μm) and reflects unnecessary infrared light. In the figure, m-0, m=l, and m=2 indicate air masses of 0, 1, and 2, respectively. The ideal spectral characteristics of the heat ray reflective film are shown in FIG.

Further, the reason why a heat treatment 'AM is provided in a light bulb or a discharge lamp is as follows. For example, halogen as shown in Figure 3.
As shown in FIG. 4, the radiant energy intensity spectrum from the filament (2) of the lamp (1) widely extends not only to visible light but also to the infrared region, and its maximum value is in the infrared region. The infrared rays emitted from the Norogen lamp become heat rays. For example, when used in a copying machine, infrared rays are originally unnecessary, and the heat generated thereby is a cause of hindering miniaturization of the copying machine. Furthermore, even in light bulbs for general lighting, it is desirable to cut heat rays when used in projectors and studios. Tube envelope (3
) If a heat ray reflective film is formed on the filament (
Returning to 2), the filament itself will be heated,
It reduces the effect of energy saving.

[Problems with background technology]

The heat ray reflective film provided on the glass plate is a semi-transparent metal film or oxide formed by vapor deposition, spraying, etc. Since it is a single layer film of metal or oxide, it does not transmit visible light. It is not particularly expensive, and those actually on the market usually cost between 50 and 60 inches. Furthermore, the reflectance in the infrared region is not high, and commercially available products are usually about 10%.

Further, in the case where a heat ray reflecting film is provided on the envelope of the bulb, the heat ray reflecting film is formed by a thin film forming method using a vacuum device such as RF sputtering method, and the heat ray reflecting film is formed by a thin film forming method using a vacuum device such as an RF sputtering method.

(a) When forming a thin film on a cylindrical or spherical envelope using a vacuum device using an RF sputtering method, it is not easy to uniformly form a thin film over the entire area of the envelope. The optical properties of a heat ray reflective film are sensitive to film thickness, and it is difficult to form a heat ray reflective film with uniform properties and good reproducibility.

(b) Formation of a heat ray reflective film using a vacuum device requires steps such as vacuum evacuation and substrate heating, resulting in a long process. Furthermore, there is a limit to the number of substrates that can be set in a vacuum device, and mass production is not easy.

Moreover, the vacuum equipment is also expensive. " [Objective of the Invention] The present invention provides a method for manufacturing a heat ray reflective film with good characteristics.

[Summary of the invention]

The present invention provides a transparent metal film made of one metal selected from nickel, copper, silver, or cobalt, or an alloy mainly composed of nickel, copper, silver, or cobalt, on a transparent substrate, and titanium dioxide, tantalum pentoxide, or tantalum pentoxide. In the method for producing a heat ray reflective film formed by laminating a dielectric film made of one selected from niobium or a mixture mainly composed of niobium, the opaque metal film is formed by an electroless plating method, and The method of manufacturing a heat ray reflective film is characterized in that the dielectric film is formed by a coating method from a solution.

[Embodiments of the invention]

(Example 1) This example relates to a heat ray reflective film formed by sequentially providing a transparent metal film and a dielectric film on a glass plate. As the glass plate, ordinary architectural glass is used. The wall thickness is, for example, 5 mm.

Since it is made of plate glass, it has a large area, and electroless plating is used to form a metal film at low cost.

Metal films that can be formed by electroless plating include nickel, silver, copper, cobalt, etc. In this embodiment, the case of nickel will be explained in detail.

The dielectric thin film formed on the metal film is preferably a high refractive index material. In order to form a dielectric film on a large area of plate glass at low cost, a coating method from a solution is easier than a method such as evaporation. High refractive index dielectric thin films that can be formed by a solution coating method include titanium dioxide, tantalum pentoxide, and niobium pentoxide, and the refractive index of these three types of substances is almost the same, with a value of about 2.2. It is. Therefore, a mixed dielectric film selected from among the three types may be used.

In the following, in this embodiment, a case in which titanium dioxide is used as the dielectric thin film will be described in detail.

FIG. 5 shows a flowchart of the method for manufacturing a heat ray reflective film on a glass plate according to this embodiment. Accordingly, this embodiment will be described in detail. In the laboratory, cleaning is performed for alkaline degreasing, etc. Further, in the actual glass manufacturing process using the duplex method, etc., there are washing and drying steps.

Next, add about 30% to the sensitivity transfer liquid (sensitizer) at room temperature.
Soak for minutes. As the sensitizer, for example, a solution having the following composition was used.

Stannic chloride (5nC12+ 2H20) 11. ---
-2 g Hydrochloric acid (I(Cz)) -0.5 ml Pure water (H2O) -11 Next, after washing with pure water, it is immersed in an activation treatment solution (activator) at about 40°C for about 30 seconds. As the actipator, for example, a solution having the following composition was used.

Halacium chloride (PdC4) -0.25g Hydrochloric acid (HC
J) 2. -2.5 ml pure water (H, O)...
...111 Next, after washing with pure water, it is immersed in an electroless nickel plating solution heated to about 55° C. for about 10 seconds.

The composition of lPk electrolytic nickel plating solution is as follows:
It is as follows.

Nickel chloride (NiC4) -...45g Sodium hypophosphate (NaPH20□・H2O)...11g Sodium citrate (C3H4(OH) (C02Na)
3.2l-i2o)...100g Ammonium chloride (NH4Cl)...50g Pure water (H,0)...11 The pH of this liquid is 8.5 to 9.0. Note that the pH of the plating solution is controlled using ammonia. Through the above steps, a transparent nickel thin film with a thickness of 80A is formed on both sides of the glass plate.

Next, wash with hot water at about 60°C and dry. Next, a thin film of titanium oxide is formed by dipping on the nickel film of the glass plate (5) on which the thin film of nickel has been formed.
FIG. 6 shows the concept 1Σ1 of the dipping method. As a solute, the titanium dioxide thin film forming solution (6) includes:
The ratio of titanium isoprokoxide was 9:1). The required thickness of titanium dioxide is approximately 25
The film thickness is controlled by the rate of withdrawal from the solution.

FIG. 7 shows the relationship between the film thickness after heat treatment in the air at 500° C. and the pulling speed. From this, it can be seen that it is sufficient to pull at a pulling speed of 2.5 ll1rLVsec. After forming a thin film of titanium dioxide by dipping, as described above,
Apply heat treatment. The conditions are 500° C. for 20 minutes in an oxidizing atmosphere, for example, in the air. According to this dipping method, a thin film of titanium dioxide with a uniform thickness is formed on a large glass plate.

Through the above steps, the glass plate (
A heat ray reflecting film consisting of a strong nickel film (7) and a titanium dioxide film (8) is completed on both sides of the film 5). The measurement results of the spectral characteristics are shown in FIG. Here, the spectral characteristics were measured using two types of spectrometers with a boundary of 2.5 μm.

In this example, the heat treatment was carried out at 500°C in the atmosphere in a laboratory.
Although the case in which this is carried out has been described in detail, it can also be carried out in the actual glass plate manufacturing process, also serving as the strengthening treatment process in the tempered glass manufacturing process. That is, after applying a dielectric film such as titanium dioxide, it is heated to, for example, 680° C., and then rapidly cooled. Then, the glass itself undergoes a strengthening process, and as its strength increases, the heat ray reflective film made of a metal film and a dielectric film also becomes a strong film. Although nickel has been described in detail as an example of the metal film, other metals that can be electrolessly plated include silver, copper, cobalt, and the like. Although the infrared reflectances are in this order, there is no major difference in the optical properties of the heat ray reflective film according to the present invention using them, and they can be adjusted sufficiently.

In addition, in this example, titanium dioxide is used as an example of the dielectric thin film. For example, a mixed film of silicon dioxide or the like may be used.

In addition, in this example, the case where the nickel film thickness is 80A and the titanium dioxide film thickness is 250A is described in detail, but the range of the metal film thickness is 50A to 400A. If the range and the film thickness of the dielectric film are within the range of 50A to 800A, good spectral characteristics as a heat ray reflective glass can be obtained and the same effects can be obtained.

In addition, in the case of forming the dielectric thin film in this example, the dielectric thin film was formed using a dipping method as a coating method from a solution, but other coating methods such as a spraying method may also be used. Of course. When forming a dielectric film using the spray method, as shown in Figure 10, even if the dielectric film is formed only on one side, good spectral characteristics as a heat-reflecting glass plate can be obtained, and the same effect can be obtained. be. In this case, if the two-layer structure side covered with the dielectric film is used outdoors, it will be more durable.

As described above, the heat ray reflective film according to this example has a two-layer structure of a metal film and a dielectric film, and is formed by electroless plating and coating from a solution, so it has high-performance spectral characteristics.
Moreover, it is possible to provide durable products uniformly and with good reproducibility at low cost. In addition, the heat ray reflective glass plate according to this example has a characteristic of high reflectance in the infrared region, and has a metal film on the indoor side that plays an essential role in the reflectance in the infrared region. It can sufficiently reflect the "radiation caused by heat generation" as shown in Fig. 1, and can be used not only to reduce the cooling load in the summer, but also to reduce the heating load in the winter.

(Example 2) Similar to Example 1, a heat ray reflective film was provided on a glass plate, and a heat ray reflective film was formed by sequentially forming 9 m of a dielectric film, a transparent metal film, and a dielectric film on a glass plate. It is something. The first and third dielectric films are preferably made of high refractive index materials.

The method for manufacturing the heat ray reflective film in this example will be described in detail according to the flowchart shown in FIG.

First, as in Example 1, an architectural glass plate with a wall thickness of 5 mm is prepared, and a thin film of titanium oxide is formed on both sides of the glass plate by a dipping method. As in Example 1, the solution for forming a thin film of titanium dioxide includes titanium isoprokoxide (T ++ -(0C3H)),
), and the solvent is ethanol and ethyl acetate (the ratio of ethanol to ethyl acetate is 9:1). The required thickness of titanium dioxide is approximately 250
8, and is pulled up at a pulling speed of 25 mm/sec. After forming a thin film of titanium dioxide by dipping, heat treatment is performed. The conditions are 5% in an oxidizing atmosphere, for example in the atmosphere.
00°C for 20 minutes. This dipping method and it (
Two successive heat treatments form a strong titanium dioxide thin film with a uniform thickness on both sides of the large glass plate.

Next, proceed to the electroless plating process. First, in the laboratory, cleaning is performed for alkaline degreasing, etc., but if the aforementioned titanium dioxide film is formed in a clean state, the cleaning step can be omitted. Next, it is immersed in a sensitizing solution (sensitizer) for about 3 minutes at room temperature. As the sensitizer, for example, a solution having the following composition was used.

Stannic chloride (SnCJ, 2H, O) ・・・・・・
2g hydrochloric acid (H(4) ---0.5ml pure water (a2o) ---.11 Next, after washing with pure water, it is immersed in an activation treatment liquid (actipator) at about 40°C for about 30 seconds. As the actipator, for example, a solution having the following composition was used.

Palladium chloride (Pd(J2)...0.2
5g hydrochloric acid (H(Jri...2.5g pure water CH2O)...11 Next, after washing with pure water, immerse it in an electroless nickel plating solution heated to about 55℃ for about 15 seconds. do.

The composition of the solution for electroless nickel plating is as follows.

Nickel chloride (N r C132)...45g Sodium hypophosphite +7 (NaPH, O, -H2O)
11g Sodium citrate (C,H,(OH)(Co□
Na) 3-2H! O)... 100g Ammonium chloride (N) I, CI! )...50g
Pure water (H2O)...11 The pH of this liquid is 8.5 to 9.0. In addition, the pH of the Metsuki liquid can be controlled to 1 with ammonia water! do. Through the above steps, a transparent nickel thin film with a thickness of 80A is formed on the titanium dioxide film. Next, the glass plate is washed with hot water at about 60°C, dried, and then the titanium dioxide film and the nickel film are formed on the same dipping method and subsequent heat treatment as in the formation of the first layer of bipartite titanium oxide film. According to the third
A thin film of titanium dioxide of about 250 mm is formed as a layer.

Through the above steps, a glass plate (
Titanium dioxide film (11), nickel film σ on both sides of the
A strong heat-reflecting film consisting of (2) and titanium dioxide film ((3) is completed.The measurement results of its spectral characteristics are reported in the 131st
Shown in Figure 1. Here, the spectroscopic measurements were performed using two types of spectrometers with a boundary of 2.5 μm.

In this example, the thickness of the nickel film is 808,
Although the thickness of the titanium dioxide film is in the range of 250 to 400, the thickness of the metal film is in the range of 50 to 400. Film thickness range is 50
If it is in the range of A to 800, good spectral properties as a heat ray reflective glass can be obtained and the same effects can be obtained.

As described above, the heat ray reflective film according to this example has a three-layer structure of dielectric film/metal film/dielectric film, and is formed by dipping with a coating liquid and electroless plating, so it can achieve high performance spectroscopy. It is possible to uniformly and reproducibly provide products that have characteristics, are low-cost, and durable.

(Example 3) In this example, a heat ray reflecting film is formed on a tube. The tube will be described in detail by taking a halogen lamp as shown in FIG. 3 as an example. The envelope of the tube is cylindrical and made of, for example, hard glass.

In this embodiment, a case will be described in which films are formed on both the inner and outer surfaces of the envelope, and a transparent metal film is formed as the first layer and a dielectric film is formed as the second layer.

The flowchart of the method for manufacturing a heat ray reflective film according to this example is shown in the 14th
As shown in the figure. Accordingly, this embodiment will be described in detail. In the laboratory, cleaning is performed for alkaline degreasing, etc. However, in industrial tube production, the cleaning process can be omitted.

Next, the sample was immersed in a sensitizer solution (-1) for about 3 minutes at room temperature. For example, a solution having the following composition was used as the sensitizer.

Stannic chloride (5nC7!, 62H, O) ...-2
g Hydrochloric acid (HCl) --= 0.5 m7 Pure water (H2O
)...1j Next, after washing with pure water, immerse in an activation treatment solution (actipator) (= about 30 seconds) at about 40°C.For example, as an activator, use a solution with the following composition. Using.

Palladium chloride (PdC12)...0.25g
Hydrochloric acid (H(J) -2,5n11 Pure water (H2O)...11 Next, after washing with pure water, soak it in an electroless nickel plating solution heated to about 55°C for about 10 seconds. Soak.

The composition of the solution for electroless nickel plating is as follows.

Nickel chloride (Ni (J2)...45g Sodium hypophosphite (NaPH202・a, o) ++
・11 g Sodium citrate (C, H, (OH) <
cosa)s-zHto)...100g Ammonium chloride (NH, Cl)...50g
Pure water (a2O)...11 The pH of this liquid is 8.5-90. Note that the pH of the plating solution is controlled using ammonia water. Through the above process,
A transparent nickel thin film with a thickness of 80 mm is formed on both the inner and outer surfaces of the glass tube. Next, wash with hot water at about 60°C and dry. Next, a glass tube (1
! A thin film of titanium oxide is formed on the nickel film No. 9 by a dipping method. FIG. 15 shows a conceptual diagram of the dipping method. As the titanium dioxide thin film forming solution a0, titanium in procoxide (Ti-i-(QC8H,) number) was used as the solute in the same manner as in Example 1.
The solvent is ethanol and ethyl acetate (the ratio of ethanol to ethyl acetate is 9:1). The required thickness of titanium dioxide is approximately 250 mm,
This film thickness is controlled by the rate of withdrawal from the solution.

As in Example 1, it was pulled up at a pulling speed of 2.5 mm' sec. After forming a thin film of titanium dioxide by dipping, heat treatment is performed. The conditions are 500'0.20 minutes in an oxidizing atmosphere, for example in the air.

Through the above steps, as shown in No. 161211, envelope a! A strong heat-reflecting film is formed on both sides of the film 51, which is made of a nickel mark α and a titanium dioxide film θ with a uniform film thickness. The measurement results of the spectral characteristics are shown in FIG.

Here, the spectroscopic measurements were performed using two types of spectrometers with a boundary of 2.5 μm.

The heat ray reflecting film formed on both sides of the envelope a according to this example sufficiently cuts the infrared part of the radiant energy intensity distribution shown in FIG. 4, and has good spectral characteristics.

After forming the heat ray reflecting film on the envelope α9, the envelope α9 is made into a halogen lamp bulb through a normal assembly process.

That is, a tube is manufactured by inserting an electrode, enlarging the halogen gas while evacuating it, and sealing it.

In this embodiment, a case where the heat ray reflective film is formed on both the inside and outside of the envelope (1) is described in detail, but the heat ray reflective film may be formed only on one side. To form on only one side, for example, mask one side with photoresist or the like, form on both sides, wash off the photoresist with an organic solvent such as acetone, and then perform heat treatment. The optimal configuration and M thickness when forming only on one side are as follows.

Envelope I Ni (130 people) l TIo, (5oo
Furthermore, even if it is formed only on the outside of the envelope of a halogen lamp, it can satisfy the characteristics as a heat ray reflecting film. In this case, from the beginning, the halogen
Of course, the heat ray reflecting film may be formed using the lamp bulb itself.

In addition, in this example, the case where a cylindrical envelope was used was described in detail, but since a coating method such as a dipping method and an electroless plating method were used as a film forming method, a spherical envelope was used. It is possible to form a heat ray reflective film on an envelope having a complicated shape as well as an ellipse shape.

In addition, in this example, the case where the nickel film thickness is 80.8 mm and the titanium dioxide film thickness is 250 mm is described in detail, but the metal film thickness range is from 50.8 mm to 400 mm. If the range of the film thickness of the dielectric film is within the range of 50A to 800A, good spectral characteristics as a heat ray reflecting film can be obtained, and the same effects can be obtained.

As mentioned above, the heat ray reflective film according to this example is formed by a coating method from a solution and an electroless plating method, so that the heat ray reflective film has a two-layer structure of metal film/dielectric film. It is a dipping process in which a heat-reflecting film can be formed by heat treatment, making it possible to produce tubes with a heat-reflecting film that is extremely low cost, durable, and has high-performance spectral characteristics with good reproducibility. It is possible to provide

(Example 4) In this example, similarly to Example 3, a heat ray reflecting film is provided on the tube. Additionally, in this embodiment, a dielectric film is provided on the envelope.
A transparent metal film and a dielectric layer are sequentially formed.

The flowchart of the method for manufacturing a heat ray reflective film according to this example is shown in the 18th
As shown in the figure. Accordingly, this embodiment will be described in detail.

First, as the envelope of the halogen lamp shown in Fig. 3,
Prepare a cylindrical piece of hard glass.

A thin film of titanium oxide is formed on this envelope by a dipping method. As a solution for forming a thin film of titanium dioxide, titanium isoprokoxide (Ti -
1-(OC3H?)4), and the solvent was ethanol and ethyl acetate (the ratio of ethanol to ethyl acetate was 9:1).

The required titanium dioxide film thickness is approximately 25 OA and is pulled at a pulling rate of 2.5 mu/sec. After forming a thin film of titanium dioxide by dipping method,
Apply heat treatment. The conditions are 500° C. for 20 minutes in an oxidizing atmosphere, for example, in the air. By this dipping method and subsequent heat treatment, a strong titanium dioxide thin film with a uniform thickness is formed on both sides of the envelope.

Next, the process moves to the electroless M'4 plating process. First, in the laboratory, cleaning is performed for alkaline degreasing, etc., but if the aforementioned titanium dioxide particles are formed in a clean state, the cleaning step can be omitted. Next, it is immersed in a sensitizing solution (sensitizer) for about 3 minutes at room temperature. As the sensitizer, for example, a solution having the following composition was used.

Stannic chloride (SnC7?t2H,O) -2g hydrochloric acid (
HO2) ,---0.5m4 Pure water (H2O) ・
...11 Next, after washing with pure water, it is immersed in an activation treatment liquid (actipator) at about 40° C. for about 15 seconds. As the actipator, for example, a solution having the following composition was used.

Palladium chloride (PdCA, )...025g Hydrochloric acid (H(J) ・2.5 +J Pure water (ago)...11 Next, after washing with pure water, it was heated to about 55°C. Dip into electroless nickel plating solution for approximately 15 seconds.

The composition of the solution for electroless nickel plating is as follows.

Nickel chloride (NtcA't) 45g Sodium hypophosphite A (NaPH10z・HzO) ・
・・11 g Sodium citrate (C, H, (OH)
(Co□N)3.2H,O)・・・100g Ammonium chloride (NH,C/ )・・・・・・・・・
50g Pure water (H, O) 11 The pH of this liquid is 8.5-90. Note that the pH of the plating solution is controlled using ammonia water. Through the above steps, a transparent thin film of nickel (an alloy containing nickel as a main component and containing phosphorus) having a thickness of 80 mm is formed on the titanium dioxide film. Next, the glass tube was washed with a vortex at about 60°C, dried, and a titanium dioxide film and a nickel film were formed on the glass tube. The same dipping method and subsequent heat treatment as in the formation of the first layer of titanium dioxide film were applied to the glass tube. A third layer of about 2,500 ml of titanium dioxide is formed.

Through the above steps, a strong heat ray reflecting film consisting of a titanium dioxide film (2D) and a nickel film (2D and titanium dioxide film gradient) is formed on both sides of the envelope (a) as shown in FIG. The measurement results of the spectral characteristics are shown in FIG.

Here, the spectroscopic measurements were performed using two types of spectrometers with a boundary of 2.5 μm.

According to this embodiment. The heat ray reflecting film formed on both sides of the envelope (1) sufficiently cuts the infrared part of the radiant energy intensity distribution shown in FIG. 4, and has good spectral characteristics.

After the heat ray reflecting film is formed on the envelope (2), it is made into a halogen lamp bulb through a normal assembly process.

That is, a tube is manufactured by inserting an electrode, introducing halogen gas while evacuation, and sealing.

In this embodiment, nickel has been described in detail as an example of a metal film that can be electrolessly plated, but other metals that can be electrolessly plated include silver, copper, cobalt, and the like. Although the infrared reflectance is high in this order, there is no major difference in the optical properties of the heat ray reflective film according to the present invention using these and alloys containing these as main components, and they are fully satisfactory.

In addition, in this example, titanium dioxide was used as the dielectric a film for detailed explanation, but other materials include niobium pentoxide, tantalum pentoxide, etc., and with these as the main components, other solutions For example, a mixed film of silicon dioxide or the like may be used.

Further, in this example, the case in which the thickness of the nickel film is 80A and the thickness of the titanium dioxide is 250A is described in detail. Good spectral characteristics can be obtained, and the same effects can be obtained.

In this embodiment, the case where the heat ray reflective film is formed on both the inner and outer surfaces of the envelope has been described in detail, but the heat ray reflective film may be formed only on one side. The optimal configuration and film thickness when forming on only one side are as follows.

Envelope 1 'I'+02 (500A) I N+ (1
30 people) l Tl02 (500 people) In addition, in this example, the case where a cylindrical envelope was used was described in detail, but as a film forming method, coating methods such as dipping, electroless Since plating method is used, Example 3
As described above, it is possible to form a heat ray reflective film on an envelope having a complicated shape, as well as a spherical or elliptical shape.

As described above, in the method for manufacturing a heat ray reflective film according to this embodiment, a heat ray reflective film with a three-layer structure of dielectric film/metal film/dielectric film is formed by a coating method from a solution and an electroless plating method. It is possible to uniformly and reproducibly provide products with high performance spectral characteristics, low cost, and durability.

〔Effect of the invention〕

According to the present invention, a heat ray reflective film with good characteristics can be provided at low cost.

[Brief explanation of drawings]

Figure 1 is a diagram showing the radiation spectrum from sunlight and indoor heating elements, Figure 2 is an ideal spectral characteristic diagram of a heat-reflecting glass plate, Figure 3 is a schematic diagram of a halogen lamp, and Figure 4 is a diagram showing the radiation spectrum from sunlight and indoor heating elements. A diagram showing an example of the radiant energy intensity spectrum of a halogen lamp, FIG. 5 is a flowchart showing the manufacturing process of the heat ray reflective film of Example 1 of the present invention, FIG. 6 is a conceptual diagram showing the dipping method, and FIG. 7 8 is a diagram showing the relationship between the film thickness of the titanium dioxide film and the pulling speed, FIG. 8 is a diagram showing a heat ray reflective glass plate equipped with a heat ray reflective film according to Example 1 of the present invention, and FIG. 9 is shown in FIG. 8. A spectral characteristic diagram of a heat ray reflective glass plate, FIG. 10 is a diagram showing a heat ray reflective glass plate equipped with a heat ray reflective film of another example, and FIG. 11 is a flowchart showing the manufacturing process of the heat ray reflective film of Example 2. FIG. 12 is a diagram showing a heat ray reflective glass plate equipped with a heat ray reflective film according to Example 2, FIG. 13 is a spectral characteristic diagram of the heat ray reflective glass plate shown in FIG. 12, and FIG.
FIG. 15 is a conceptual diagram showing the dipping method in Example 3, FIG. 16 is a partially enlarged view of a tube provided with the heat ray reflective film of Example 3, and FIG.
7 is a spectral characteristic diagram of the tube shown in FIG. 16 (2), FIG. 18 is a flowchart showing the manufacturing process of the heat ray reflective film according to Example 4, and FIG. 19 is a tube equipped with the heat ray reflective film of Example 4. Fig. 20 is a spectral characteristic diagram of the tube shown in Fig. 19. Agent: Patent Attorney Noriyuki Chika (and one other person) No. 1
Figure Katomonaga (j I, 1r77-n Figure 2 Ji branch, 4iC<) I-Chiku) Figure 3 Figure 4 Diagram skin surface (P section) Figure 5 Figure 6 Figure 7 Figure I 1 top! # & 7nM7sec - Fig. 8 Fig. 10 Fig. 9 Wavelength 0/L9) Fig. 11 Fig. 12 Wavelength (B,, rL) Fig. 14 Fig. 16 Fig. 17 Wavelength (〃boat) Fig. 18 Figure 19 Figure 20 Wavelength 0tfr1-]

Claims (1)

[Claims] A transparent metal film made of one metal selected from nickel, copper, silver, or cobalt, or an alloy mainly composed of them, on a transparent substrate, and a transparent metal film selected from titanium dioxide, tantalum pentoxide, or niobium pentoxide. In the method for producing a heat ray reflective film, the transparent metal film is formed by an electroless plating method, and the dielectric film is formed by laminating a dielectric film made of one type or a mixture containing these as main components. A method for producing a heat ray reflective film, characterized in that it is formed by a coating method from a solution.