JPS6071540A - Glass for photomask substrate - Google Patents
Glass for photomask substrateInfo
- Publication number
- JPS6071540A JPS6071540A JP58176477A JP17647783A JPS6071540A JP S6071540 A JPS6071540 A JP S6071540A JP 58176477 A JP58176477 A JP 58176477A JP 17647783 A JP17647783 A JP 17647783A JP S6071540 A JPS6071540 A JP S6071540A
- Authority
- JP
- Japan
- Prior art keywords
- glass
- pbo
- zno
- thermal expansion
- component
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C4/00—Compositions for glass with special properties
- C03C4/0085—Compositions for glass with special properties for UV-transmitting glass
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/04—Glass compositions containing silica
- C03C3/076—Glass compositions containing silica with 40% to 90% silica, by weight
- C03C3/102—Glass compositions containing silica with 40% to 90% silica, by weight containing lead
- C03C3/108—Glass compositions containing silica with 40% to 90% silica, by weight containing lead containing boron
Landscapes
- Chemical & Material Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Glass Compositions (AREA)
Abstract
Description
【発明の詳細な説明】
本発明は、熱膨張係数(αX 107/’01100〜
300℃)が約27〜40の範囲にあり、また屈伏温度
が約750℃以上であって耐熱・耐火性に優れ、また安
定性、化学的耐久性および紫外線透過性にも優れている
うえ溶融性が改善された5iOz−820+−A]zO
a−MgO−Ban −ZnO−PbO系のホトマスク
基板材料に用いるに適したガラスに関する。DETAILED DESCRIPTION OF THE INVENTION The present invention provides a thermal expansion coefficient (αX 107/'01100~
300°C) is in the range of approximately 27 to 40°C, and the yield temperature is approximately 750°C or higher, providing excellent heat and fire resistance, as well as excellent stability, chemical durability, and ultraviolet transmittance. 5iOz-820+-A]zO with improved properties
The present invention relates to a glass suitable for use as an a-MgO-Ban-ZnO-PbO-based photomask substrate material.
近年、IC基板、ICホトマスクおよびストライプフィ
ルター等の電子工業分野で用いられる部材には、ガラス
が多く利用されている。しかし、これらのうちICホト
マスク、すなわちホトエツチング法によるIC製造工程
で利用されるホトマスク基板に対しては、泡・脈理およ
びインクルーとのほか、熱膨張係数の低いことがICの
集積度をより高める上で必要であり、さらに金属の蒸着
工程等におけるヒートサイクルでも破損や軟化変形する
ことのない耐熱・耐火性、様々の薬品による洗浄やエツ
チング等に対する化学的耐久性、紫外線透過性および集
積回路対応図形の金属蒸着膜の付着力等の性質に優れて
いることも必要である。In recent years, glass has been widely used in members used in the electronic industry such as IC substrates, IC photomasks, and stripe filters. However, among these, IC photomasks, that is, photomask substrates used in the IC manufacturing process using the photoetching method, are free from bubbles, striae, and inclusions, as well as a low coefficient of thermal expansion, which increases the degree of IC integration. In addition, heat resistance and fire resistance that will not be damaged or softened or deformed even during heat cycles in metal vapor deposition processes, chemical durability against cleaning and etching with various chemicals, ultraviolet transparency, and integrated circuit compatibility. It is also necessary that the shaped metal vapor deposited film has excellent properties such as adhesion.
しかし、従来から上記用途に使用されるガラスとして、
パイレックス型のアルカリ硼珪酸ガラスに劣り、さらに
屈伏点が約650℃程度であって耐火性が良好ではない
。また、ファイバmmEガラス型や耐火性ガラス型のカ
ルシウム−アルミノ珪酸塩ガラスも種々知られているが
、これらのガラスは、いずれもCaOの含有量を比較的
多くしなければならないため、溶融性は改善されるが、
熱膨張係数が約42〜65であって過大であり、このた
めICの集積度を高めることができず、また耐熱性に劣
るという欠点がある。However, as glass traditionally used for the above purposes,
It is inferior to Pyrex-type alkali borosilicate glass, and has a yield point of about 650°C, meaning it does not have good fire resistance. Various types of calcium-aluminosilicate glasses such as fiber mmE glass and fire-resistant glass are also known, but these glasses require a relatively high content of CaO, so their meltability is low. Although it will be improved,
The coefficient of thermal expansion is about 42 to 65, which is too high, and therefore, the degree of integration of the IC cannot be increased, and the heat resistance is poor.
そこで、本発明者らは、先に特願昭57−224957
号において、新たなSiO□−8203−Al1[]]
3−MgO−ZnO−PbO系ガラを提案した。しかし
、このガラスは熱膨張係数が小さいが、安定性の維持の
ため、ガラスの溶融を促進する成分の使用量が、実際−
ヒ、少量に制限されるので、ホトマスク基板用ガラスと
しては溶融性が十分とはいえない。そして、このガラス
の溶融性をとくに改善する場合は、高価なLa2O3等
の希土類元素や5b20+を比較的多量に添加する必要
がある。Therefore, the present inventors previously applied for patent application No. 57-224957.
In the issue, a new SiO□-8203-Al1[]]
We proposed a 3-MgO-ZnO-PbO glass. However, although this glass has a small coefficient of thermal expansion, in order to maintain stability, the amount of components that promote glass melting is actually -
H. Since the amount is limited, it cannot be said that the meltability is sufficient as a glass for photomask substrates. In order to particularly improve the meltability of this glass, it is necessary to add a relatively large amount of expensive rare earth elements such as La2O3 or 5b20+.
また、S 1o2−A 1203−CaO−MgO−Z
nO−PbO系のガラスが特開昭58−32038号お
よび同58−41738号において知られているが、ガ
ラスの安定性維持のためCaO成分を多量に含有させる
必要があるため、上記カルシウム−アルミノ珪酸塩ガラ
スと同様熱膨張係数が過大である。Also, S 1o2-A 1203-CaO-MgO-Z
nO-PbO glass is known from JP-A-58-32038 and JP-A-58-41738, but since it is necessary to contain a large amount of CaO component to maintain the stability of the glass, the calcium-alumino Like silicate glass, it has an excessive coefficient of thermal expansion.
本発明の目的は、上述のガラスにみられる諸欠点を総合
的に改善して、上記所定の低熱膨張性と高屈伏温度特性
および優れた安定性、化学的耐久性および紫外線透過性
を維持させつつ、一段と優れた溶融性を有するホトマス
ク基板用ガラスを提供することにある。The purpose of the present invention is to comprehensively improve the various drawbacks of the above-mentioned glass, and to maintain the above-described low thermal expansion, high yield temperature characteristics, excellent stability, chemical durability, and ultraviolet transmittance. At the same time, it is an object of the present invention to provide a glass for photomask substrates having even better melting properties.
本発明者らは、この目的を達成するため、鋭意試験研究
を行なったところ、上記5i02− B203−A I
203−MgO−ZnO−PbO系ガラスにBaOを必
須成分として導入すると、通常の耐火性ガラスに必須的
に用いられてい6 CaOを導入する場合に比べ、熱膨
張係数を低下させつつガラスの安定性を一段と向l−さ
せ得ることをみいだすことができた。また、その結果ガ
ラスの融剤効果を示す成分、すなわち、ZnO、および
PbO成分の含有量を大幅に増大させることができるこ
とをもみいだすことができた。本発明は、この知見に基
づいて完成したものである。In order to achieve this objective, the present inventors conducted intensive test research and found that the above 5i02-B203-A I
203-Introducing BaO as an essential component into MgO-ZnO-PbO glass improves the stability of the glass while lowering the coefficient of thermal expansion compared to the case of introducing CaO, which is essential for ordinary fire-resistant glasses. We have found that it is possible to further improve the Furthermore, as a result, it was found that the content of components exhibiting a fluxing agent effect in glass, that is, ZnO and PbO components, could be significantly increased. The present invention was completed based on this knowledge.
本発明のホトマスク基板用ガラスの組成の特徴は、重量
%で、5iOz 45〜60%、82030.5〜12
%、Al2O310〜22%、Mg05〜17%、Ca
O0〜5%、Sr0 0〜8%、Ban 1.5〜15
%、ZnO1,5〜17%、Pb00.5〜10%、た
だし、ZnO+PbO≧6%、Ta205+Nb2O5
+La2O3+Gd20s +Y2O3+Bi2O3+
WO30〜7%、ZrO2+ TiO20〜5%、Na
2O+に20 +Li2O0〜2.5%、As203o
〜0.5%および5b2030〜0.5%を含有すると
ころにある。The characteristics of the composition of the glass for photomask substrate of the present invention are: 5iOz 45-60%, 82030.5-12% by weight
%, Al2O3 10-22%, Mg05-17%, Ca
O0-5%, Sr0 0-8%, Ban 1.5-15
%, ZnO1.5-17%, Pb00.5-10%, however, ZnO+PbO≧6%, Ta205+Nb2O5
+La2O3+Gd20s +Y2O3+Bi2O3+
WO30-7%, ZrO2+ TiO20-5%, Na
20+Li2O0~2.5%, As203o to 2O+
~0.5% and 5b2030~0.5%.
本発明のガラスにおいて、上記のように各成分の含有量
の範囲を限定した理由は、つぎのとおりである。すなわ
ち、SiO2成分は、ガラスの耐熱性と化学的耐久性を
向上させる効果があるが、本発明の目的を達成するため
には45%以上含有させる必要がある。しかし、その量
が60%を超えると溶融性が悪化し、均質なガラスを得
がたくなる。In the glass of the present invention, the reason why the content range of each component is limited as described above is as follows. That is, although the SiO2 component has the effect of improving the heat resistance and chemical durability of glass, it must be contained in an amount of 45% or more in order to achieve the object of the present invention. However, if the amount exceeds 60%, the meltability deteriorates and it becomes difficult to obtain homogeneous glass.
B2O3成分は、ガラスの溶融性を高めるので、必要な
成分であるが、その量が0.5%未満では上記効果が現
われず、また12%を超えるとガラスの屈伏温度が低く
なり、また溶融の際、B2O3の揮発量が増し、組成が
変動しやすくなる。The B2O3 component is a necessary component because it increases the meltability of glass, but if its amount is less than 0.5%, the above effect will not appear, and if it exceeds 12%, the yield temperature of the glass will be low, and the melting At this time, the amount of B2O3 volatilized increases, making the composition more likely to fluctuate.
Al2O3成分の量は、ガラスの分相傾向を防止しつつ
所期の耐火性を得るため105以上含有させる必要があ
るが、その量が22%を超えるとガラスの溶融性が悪く
なる。The amount of Al2O3 component needs to be 105 or more in order to obtain the desired fire resistance while preventing the phase separation tendency of the glass, but if the amount exceeds 22%, the meltability of the glass will deteriorate.
MgO成分は、ガラスの熱膨張係数を大きくすることな
く溶融性を高める効果があるが、5%未満の含有量では
十分その効果が期待できず、また17%を超えるとガラ
スは失透しやすくなる。The MgO component has the effect of increasing the meltability of the glass without increasing the thermal expansion coefficient, but if the content is less than 5%, the effect cannot be expected to be sufficient, and if the content exceeds 17%, the glass is likely to devitrify. Become.
CaOおよびSrOの各成分は、ガラスの溶融性を改善
する効果があるので任意に添加し得るが、これらの成分
は下記BaO成分と異なり、ガラスの熱膨張係数を過大
にするうえ分相化や結晶化を抑制する効果も小さい。従
って、これらの成分の量は、それぞれ5%および8%以
内にとどめる。Each component of CaO and SrO has the effect of improving the meltability of glass and can be added arbitrarily, but unlike the BaO component described below, these components do not only increase the coefficient of thermal expansion of glass but also cause phase separation. The effect of suppressing crystallization is also small. Therefore, the amounts of these components should be kept within 5% and 8%, respectively.
本発明において、BaO成分は、ガラスの熱膨張係数を
過大にすることなく、分相化と結晶化の傾向を防止して
ガラスを安定化する効果がみいだされた重要な成分であ
る。しかし、BaO成分の量が1.5%より少ないとそ
の効果が顕著ではなく、また15%を超えるとガラスの
溶融性が悪化しやすくなる。末尾に掲げた図面は、5i
(h 53%、82037%、Al2O315%、Mg
0 12%、Zn08%、およびPbO5%の基礎組成
にBaOおよびCaO成分をそれぞれ添加し、後述の各
実施例と同様にしてガラスを得た場合、添加量によるガ
ラスの熱膨張係数と安定性に4える影響を表わすもので
、Ban添加の場合はCaOの場合に比ベガラスの熱膨
張係数を過大にすることなく、また少量で顕著な安定化
効果を示すとともに安定化領域の広いことを示している
。In the present invention, the BaO component is an important component that has been found to have the effect of stabilizing the glass by preventing the tendency of phase separation and crystallization without increasing the coefficient of thermal expansion of the glass. However, if the amount of BaO component is less than 1.5%, the effect is not significant, and if it exceeds 15%, the meltability of the glass tends to deteriorate. The drawings listed at the end are 5i
(h 53%, 82037%, Al2O315%, Mg
When BaO and CaO components are added to the basic composition of 0.012%, Zn08%, and PbO5%, respectively, and glass is obtained in the same manner as in each example described later, the thermal expansion coefficient and stability of the glass vary depending on the amount added. 4. In the case of Ban addition, compared to CaO, the coefficient of thermal expansion of the glass does not become excessive, and it shows a remarkable stabilizing effect even with a small amount, and shows that the stabilization region is wide. There is.
ZnO成分は、ガラスの溶融性、化学的耐久性および研
磨性を向上させる効果があるので重要な成分であるが、
その量が1.5%未満であるとこれらの効果が顕著でな
く、また17%を超えるとガラスは失透しやすくなる。The ZnO component is an important component because it has the effect of improving the meltability, chemical durability, and polishability of glass.
When the amount is less than 1.5%, these effects are not significant, and when it exceeds 17%, the glass tends to devitrify.
本発明のガラスにおいて、PbO成分は、溶融性を向上
しつつ失透傾向を防止する効果があるので、重要な成分
であるが、PbO成分の量が0.5%未満ではその効果
が十分ではなく、また10%を超えるとガラスの化学的
耐久性が悪化するので好ましくない。In the glass of the present invention, the PbO component is an important component because it has the effect of improving meltability and preventing a tendency to devitrify, but if the amount of the PbO component is less than 0.5%, the effect is not sufficient. Moreover, if it exceeds 10%, the chemical durability of the glass deteriorates, which is not preferable.
BaOを含有する本発明のガラスにおいては、−ヒ述の
とおり、融剤効果を有するZnOとPbO成分の含有量
を、失透傾向を防止しつつ、増大することが可能である
が、これらZnOおよびPbO成分の合計量はガラスの
溶融性改善のため、6%以上含有させる必要がある。In the glass of the present invention containing BaO, as mentioned above, it is possible to increase the content of ZnO and PbO components having a fluxing agent effect while preventing the tendency of devitrification. The total amount of the PbO component must be 6% or more in order to improve the meltability of the glass.
Ta205 、 Nb2O5,La20a 、 Gdz
03. Y2O3、Bi2O3およびl1i03の各成
分は、いずれもガラスの熱膨張係数を低下させ、また溶
融性を高める効果があるので、必要に応じ、任意に添加
し得るが、これらの成分の一種また哄二種の合計量は7
%以内が適当である。Ta205, Nb2O5, La20a, Gdz
03. Each of the components Y2O3, Bi2O3, and l1i03 has the effect of lowering the coefficient of thermal expansion of glass and increasing the melting properties, so they can be added arbitrarily as necessary, but one or two of these components can be added. The total amount of seeds is 7
% or less is appropriate.
ZrO2およびTiO2の各成分は、ガラスの化学的耐
久性を向ヒし、また後者は溶融性と失透性をも改善する
効果があるので任意に添加し得るが、これらの成分の一
種または二種の合計量は5%までで十分である。Each component of ZrO2 and TiO2 improves the chemical durability of the glass, and the latter has the effect of improving meltability and devitrification, so it can be added arbitrarily, but one or both of these components may be added. A total amount of seeds of up to 5% is sufficient.
と低熱膨張性を維持するため、これらの成分の一種また
は二種の合計量は2.5%以下とすることが好ましく、
またこれらの成分の総量の一部としてLizO成分を0
.5%まで使用し得る。In order to maintain low thermal expansion, the total amount of one or two of these components is preferably 2.5% or less,
In addition, as part of the total amount of these components, the LizO component is 0.
.. Up to 5% may be used.
Ag2O3および5b203の各成分は、ガラス溶融の
際の清澄剤として、それぞれ0.5%まで任意に添加し
得る。Each component of Ag2O3 and 5b203 can be optionally added up to 0.5% each as a refining agent during glass melting.
つぎに、本発明のガラスの実施組成例をこれらのガラス
ノ線膨張係数(α(lOo−30o℃)×107)、屈
伏点(At)、耐水性数値(RW(P))および耐酸性
数値(RW(P)) ; (粒度420〜590 p−
m (7)破砕粒を耐水性の場合は蒸留水に、また対酸
性の場合は0.01N硝酸水溶液に浸漬し、これをそれ
ぞれ沸騰水浴中で60分間処理した後の破砕粒の重量減
(WT%)を示す〕、紫外線透過率(Tuv(%))〔
試料の厚さ10m111、測定波長; 3401111
1 )および103ボイズの粘度におけるガラスの温度
(T(’O))についての測定結果とともに表−1に示
す。Next, practical composition examples of the glasses of the present invention will be described based on the linear expansion coefficient (α (lOo - 30oC) x 107), yielding point (At), water resistance value (RW (P)) and acid resistance value ( RW(P)); (particle size 420-590 p-
(7) Weight loss of the crushed grains after immersing them in distilled water if they are water-resistant or in a 0.01N nitric acid aqueous solution if they are acid-resistant and treating them in a boiling water bath for 60 minutes ( WT%)], ultraviolet transmittance (Tuv (%)) [
Sample thickness 10m111, measurement wavelength; 3401111
Table 1 shows the measurement results for the glass temperature (T('O)) at the viscosity of 1) and 103 voids.
(以下余白)
表−1には、前記特願昭57−.724957号明細書
に示されたガラスを比較例(No、IおよびFlk)、
II)として掲げた。表−1に掲げた4゛ラスの測定試
験試料は、全て分相乳濁性をテストする目的も兼ねて、
溶融清澄工程の後、900 ’0 .20分間の熱処理
を行い、ついで冷却して得たものである。(The following is blank space) Table 1 shows the above-mentioned patent application filed in 1983. Comparative examples (No, I and Flk) of the glass shown in No. 724957,
II). The 4-glass measurement test samples listed in Table 1 were all used for the purpose of testing phase separation emulsivity.
After the melt-fining step, 900'0. It was obtained by heat treatment for 20 minutes and then cooling.
なお、ガラスのαの値は、測定温度範囲によって、変わ
るものであるが、本発明のガラスを含めアルミノシリケ
ート系のガラスでは測定温度範囲が(100〜300℃
)の場合に対し、例えば(50〜200℃)の場合、一
般にαは3〜5程度低い値を示す。従って、本発明のガ
ラスのαの値は比較的高目に出る温度範囲を採用してい
る。Note that the value of α of glass changes depending on the measurement temperature range, but for aluminosilicate glasses including the glass of the present invention, the measurement temperature range is (100 to 300℃).
), for example, in the case of (50 to 200°C), α generally shows a value about 3 to 5 lower. Therefore, the value of α of the glass of the present invention is set within a relatively high temperature range.
表−1にみられるとおり、本発明の実施例のガラスは、
分相や結晶を生ずることなく安定であって透明であり、
紫外線透過性に優れており、耐水性や耐酸性にも優れて
いる。また、本発明の実施例のガラスは、線膨張係数が
28〜40の範囲にあって非常に低く同時に屈伏点も約
750°Cを超えており、優れた耐熱・耐火性を有して
いる。As seen in Table 1, the glasses of the examples of the present invention are:
Stable and transparent without phase separation or crystallization,
It has excellent UV transparency, water resistance and acid resistance. In addition, the glass of the example of the present invention has a very low linear expansion coefficient in the range of 28 to 40, and at the same time has a yield point of more than about 750°C, and has excellent heat resistance and fire resistance. .
さらに、本発明の実−一のガラスは、いずれもBaO成
分の導入によってZnOとPbO成分の総量の増大が図
られているため、無アルカリないし低アルカリ含有ガラ
スであるにも拘らず、溶融性の改善効果が高いものであ
る。lOボイズの粘度におけるガラスの温度は、比較例
No、IおよびNo、IIのガラスの場合、それぞれ1
000℃および1430℃であるが、比較例のガラスと
同程度のα値を有する実施例歯、1〜Il&)、5のガ
ラスは、それぞれ1300℃、1330℃、1350°
C,1310°Cおよび1320℃であって、本発明の
実施例のガラスは、他の実施例の場合も含めて全般に一
段と溶融性に富んでおり、均質化操作が有利である。Furthermore, in all of the first glasses of the present invention, the total amount of ZnO and PbO components is increased by introducing the BaO component, so even though they are alkali-free or low alkali-containing glasses, they have low meltability. It has a high improvement effect. The temperature of the glass at the viscosity of lO bois is 1 for the glasses of Comparative Examples No. I and No. II, respectively.
000°C and 1430°C, but the glasses of Example teeth 1 to Il&) and 5, which have α values comparable to those of the glass of the comparative example, were heated to 1300°C, 1330°C, and 1350°C, respectively.
C, 1310° C. and 1320° C., the glasses of the examples of the invention are generally more meltable than the other examples, and the homogenization operation is advantageous.
本発明のホトマスク基板用ガラスは、所定の酸化物ガラ
ス組成が得られるよう酸化物、炭酸塩および硝酸塩等の
原料を秤量混合し、これを通常のガラス製造装置を用い
て約1350〜1450°Cで脱泡均質化した後、所望
形状に成形し、冷却して得ることができるが、溶融性改
善にあたり、秤量原料は比較的安価である利点がある。The glass for photomask substrates of the present invention is produced by weighing and mixing raw materials such as oxides, carbonates, and nitrates so as to obtain a predetermined oxide glass composition, and then heating the mixture at a temperature of about 1350 to 1450°C using ordinary glass manufacturing equipment. It can be obtained by degassing and homogenizing it, molding it into a desired shape, and cooling it, but it has the advantage that the raw material to be weighed is relatively inexpensive in improving meltability.
以Hに述べたとおり、本発明のホトマスク基板用ガラス
は、特定組成範囲の5i02−BzO3−Al203−
MgO−BaO−ZnO−PbO系ガラスであるから、
低熱膨張性および耐熱・耐火性はもとより、耐失透性、
化学的耐久性、紫外線透過性、電気絶縁性、金属蒸着膜
等被膜の付着性に優れているのみならず、溶融性が一段
と改善されるので、均質な製品をより一層高い歩留りで
安定して経済的に製造することができる。このため、ホ
トマスク基板用ガラスとして有用であり、また上記緒特
性が要求されるストライプフィルター等の電子部材とし
て用いるにも適している。As described in H below, the glass for photomask substrate of the present invention has a specific composition range of 5i02-BzO3-Al203-
Since it is MgO-BaO-ZnO-PbO glass,
In addition to low thermal expansion, heat and fire resistance, devitrification resistance,
Not only does it have excellent chemical durability, ultraviolet transmittance, electrical insulation, and adhesion of metal-deposited films, but it also improves melting properties, making it possible to produce homogeneous products with even higher yields. Can be manufactured economically. Therefore, it is useful as a glass for photomask substrates, and is also suitable for use as electronic components such as stripe filters that require the above characteristics.
第1図は、Si02−8203−ASi02−8203
−Al203−系基礎ガラ・スにBaOおよびCaOを
それぞれ添加した場合のガラスの線膨張係数と安定性に
与える効果を示す比較図である。
図中、AはBaO添加、BはCaO添加の場合を示し、
e印は失透状態を○印は透明であることを示している。
特許出願人 株式会社 手厚光学硝子製造所成分添加量
(%)Figure 1 shows Si02-8203-ASi02-8203
FIG. 2 is a comparison diagram showing the effects on the linear expansion coefficient and stability of the glass when BaO and CaO are respectively added to the -Al203- based base glass. In the figure, A shows the case of BaO addition, B shows the case of CaO addition,
The mark e indicates a devitrified state, and the mark ○ indicates a transparent state. Patent applicant Teatsu Optical Glass Manufacturing Co., Ltd. Ingredient addition amount (%)
Claims (1)
805〜17%、Ca0 0〜5 %、Sr0 0〜8
%、Ba0 1.5〜15%、ZnO1,5〜17%
、Pb0 0.5〜10%、ただし、ZnO+ Pb0
56%、TazOs−1−Nb 205−1−La20
s +Gd2O3+YzOs+Bi2O3+WO30〜
7%ZrO2+Tio□O〜5%、Na2O+に20
+LizOO〜2.5%、Ag2O3070,5% お
よび5b2030〜0.5% を含有することを特徴と
するホトマスク基板用ガラス。[Claims] In weight%, 5i0245-80%, B2030.5-12%, A120310-22%, M
805-17%, Ca0 0-5%, Sr0 0-8
%, Ba0 1.5-15%, ZnO 1.5-17%
, Pb0 0.5-10%, however, ZnO + Pb0
56%, TazOs-1-Nb 205-1-La20
s +Gd2O3+YzOs+Bi2O3+WO30~
7% ZrO2+Tio□O~5%, 20 to Na2O+
+LizOO~2.5%, Ag2O3070.5% and 5b2030~0.5%. Glass for photomask substrates.
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP58176477A JPS6071540A (en) | 1983-09-26 | 1983-09-26 | Glass for photomask substrate |
US06/561,750 US4501819A (en) | 1982-12-23 | 1983-12-15 | Glass for a photomask |
GB08333560A GB2134100A (en) | 1982-12-23 | 1983-12-16 | Glass for a photomask |
DE3345943A DE3345943C2 (en) | 1982-12-23 | 1983-12-20 | Use of a glass essentially containing SiO 2, B 2 O 3, Al 2 O 3, MgO and PbO for a photomask and a glass of this system which additionally contains BaO and ZnO |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP58176477A JPS6071540A (en) | 1983-09-26 | 1983-09-26 | Glass for photomask substrate |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS6071540A true JPS6071540A (en) | 1985-04-23 |
JPH04936B2 JPH04936B2 (en) | 1992-01-09 |
Family
ID=16014351
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP58176477A Granted JPS6071540A (en) | 1982-12-23 | 1983-09-26 | Glass for photomask substrate |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6071540A (en) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS622259A (en) * | 1985-06-27 | 1987-01-08 | Hoya Corp | Photomask blank and photomask |
EP0714862A1 (en) | 1994-11-30 | 1996-06-05 | Asahi Glass Company Ltd. | Alkali-free glass and flat panel display |
JP2016074575A (en) * | 2014-10-08 | 2016-05-12 | 株式会社オハラ | Glass |
JP2019011244A (en) * | 2017-06-29 | 2019-01-24 | 日本板硝子株式会社 | Glass composition and glass product using the same |
-
1983
- 1983-09-26 JP JP58176477A patent/JPS6071540A/en active Granted
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS622259A (en) * | 1985-06-27 | 1987-01-08 | Hoya Corp | Photomask blank and photomask |
JPH0210406B2 (en) * | 1985-06-27 | 1990-03-08 | Hooya Kk | |
EP0714862A1 (en) | 1994-11-30 | 1996-06-05 | Asahi Glass Company Ltd. | Alkali-free glass and flat panel display |
JP2016074575A (en) * | 2014-10-08 | 2016-05-12 | 株式会社オハラ | Glass |
JP2019011244A (en) * | 2017-06-29 | 2019-01-24 | 日本板硝子株式会社 | Glass composition and glass product using the same |
Also Published As
Publication number | Publication date |
---|---|
JPH04936B2 (en) | 1992-01-09 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP2871163B2 (en) | Alkali-free glass | |
WO1997011920A1 (en) | Alkali-free glass substrate | |
JP3666054B2 (en) | Substrate glass | |
JPH0340933A (en) | Glass composition for substrate | |
JPH031247B2 (en) | ||
JP3800443B2 (en) | Non-alkali glass substrate for display and method for producing the same | |
JPH08295530A (en) | Alkali-free glass substrate | |
US4687750A (en) | Transparent glass-ceramics containing gahnite | |
JPH03164445A (en) | Transparent crystallized glass | |
JPH1025132A (en) | Alkali-free glass and its production | |
US2527693A (en) | Soft glass having wide working range | |
US4501819A (en) | Glass for a photomask | |
JPH10114538A (en) | Alkali-free glass and its production | |
EP0048120B1 (en) | Glass envelopes for tungsten-halogen lamps and production thereof | |
JPS61236631A (en) | Refractory and heat resistant glass | |
JP2000128572A (en) | Borosilicate glass and its production | |
JPS61261232A (en) | Fire-resistant and heat-resistant glass | |
JPH01208343A (en) | Transparent crystallized glass | |
JP3460298B2 (en) | Glass composition for substrates | |
JPS6071540A (en) | Glass for photomask substrate | |
JPS61295256A (en) | Glass for substrate | |
WO2023022074A1 (en) | Glass substrate for space-based solar power generation | |
US4385128A (en) | Germanium-containing glass of high infrared transmission and low density | |
JPS6287432A (en) | Optical glass | |
JPH0446908B2 (en) |