JPS6070577A - Magnetic bubble memory element - Google Patents

Magnetic bubble memory element

Info

Publication number
JPS6070577A
JPS6070577A JP58176907A JP17690783A JPS6070577A JP S6070577 A JPS6070577 A JP S6070577A JP 58176907 A JP58176907 A JP 58176907A JP 17690783 A JP17690783 A JP 17690783A JP S6070577 A JPS6070577 A JP S6070577A
Authority
JP
Japan
Prior art keywords
propagation path
ion implantation
propagation
bubbles
bubble
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP58176907A
Other languages
Japanese (ja)
Other versions
JPS6322382B2 (en
Inventor
Seiichi Iwasa
誠一 岩佐
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP58176907A priority Critical patent/JPS6070577A/en
Publication of JPS6070577A publication Critical patent/JPS6070577A/en
Publication of JPS6322382B2 publication Critical patent/JPS6322382B2/ja
Granted legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C11/00Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor
    • G11C11/02Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using magnetic elements
    • G11C11/14Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using magnetic elements using thin-film elements

Landscapes

  • Engineering & Computer Science (AREA)
  • Computer Hardware Design (AREA)

Abstract

PURPOSE:To form the propagation path of fine bubbles and to hold the bubbles with a small holding magnetic field by arranging a permalloy propagation path element close to the convex part of an ion implantation propagation path formed by ion implantation method on the ion implantation propagation path. CONSTITUTION:The chevron type permally propagation element 13 is arranged along the tips of the ion implantation propagation path 12. Since the cusps 14 of the ion implantation propagation path 12 take charge of the propagation, a gap (g) can be set up to the bubble diameter or more. When bubbles are to be stopped and held, the holding magnetic field is applied to the arrow direction, so that the bubbles are held on the tips of the permalloy propagation path element 13 on the upper side of the propagation path and on the cusps 14 of the ion implantation propagation path 12 on the lower side. Consequently, the necessary size of the holding magnetic field is <=1/3 as compared to the case holding the bubbles on the tips of the ion implantation propagation path 12 and the magnetic field is made asymmetrical about the advancing direction of the bubbles to stabilize the bubble propagation moreover.

Description

【発明の詳細な説明】 発明の技術分野 本発明は電子計算装置等の記憶装置として用いられる磁
気バブルメモリ装置に関するものである。
DETAILED DESCRIPTION OF THE INVENTION Technical Field of the Invention The present invention relates to a magnetic bubble memory device used as a storage device for electronic computing devices and the like.

従来技術と問題点 従来、磁気バブルメモリ素子の伝播路には第1図a、b
に示すi4−マロイ薄膜により形成された伝播路1と第
2図a、bに示す如きイオン注入によ多形成された伝播
路2が知られている。そして何れもホトリングラフィ技
術を応用して形成される。ところが前者のパーマロイに
よる伝播路1はバブル径の2/3以下のギャップgが必
要であるため、1μm程度の微小バブルを用いた場合、
0.7μm以下のギャップが要求され、通常のホトリソ
グラフィ技術では実現できない欠点があった。一方後者
のイオン注入伝播路2はイオン注入部と非イオン注入部
の境界に生ずるチャージドウオールによってバブルを伝
播させるため、ギャップを必要とせず1μm程度の最小
寸法で1μm以下のバブルを伝播させることができる。
Prior Art and Problems Conventionally, the propagation path of a magnetic bubble memory element is as shown in Fig. 1a and b.
A propagation path 1 formed of an i4-malloy thin film as shown in FIG. 2 and a propagation path 2 formed by ion implantation as shown in FIGS. 2a and 2b are known. All of them are formed by applying photolithography technology. However, since the former propagation path 1 using permalloy requires a gap g of 2/3 or less of the bubble diameter, when using microbubbles of about 1 μm,
A gap of 0.7 μm or less was required, which had the disadvantage that it could not be achieved using normal photolithography technology. On the other hand, the latter ion implantation propagation path 2 propagates bubbles by a charged wall that occurs at the boundary between the ion implanted part and the non-ion implanted part, so it does not require a gap and can propagate bubbles of 1 μm or less with a minimum dimension of about 1 μm. can.

しかしこのイオン注入伝播路でバブルを停止保持する場
合、凹部(以下カスプと称す)4には極めて小さい保持
磁界(以下ホールド磁界と称す)で保持できるが凸部(
以下ティップと称す)5に停止保持するためには極めて
大きなホールド磁界が必要になる。第3図に示すように
ホールド磁界方向6を90°ずつ変化させても必ず1個
所以上はティップに停止するバブル7、があるため全体
としてホールド磁界の大きさは極めて大きくする必要が
あるという欠点があった。なおパーマロイ伝播路におい
ては小さなホールド磁界でいずれの位置にも停止、保持
することができる。
However, when the bubble is stopped and held in this ion implantation propagation path, it can be held in the concave part (hereinafter referred to as cusp) 4 with an extremely small holding magnetic field (hereinafter referred to as hold magnetic field), but in the convex part (hereinafter referred to as cusp)
In order to stop and hold the tip at 5 (hereinafter referred to as the tip), an extremely large holding magnetic field is required. As shown in Fig. 3, even if the hold magnetic field direction 6 is changed by 90 degrees, there is always one or more bubbles 7 that stop at the tip, so the overall size of the hold magnetic field must be extremely large. was there. Note that in the permalloy propagation path, it is possible to stop and hold at any position with a small hold magnetic field.

発明9目的 本発明は上記従来の欠点に鑑み、通常のホトリング2フ
イ技術で微小バブルの伝播路を形成することができ、し
かも小さなホールド磁界でバブルを保持することができ
る磁気バブルメモリ素子を提供することを目的とするも
のである。
9th Object of the Invention In view of the above-mentioned drawbacks of the conventional art, the present invention provides a magnetic bubble memory element that can form a propagation path for microbubbles using the normal photoring 2-fi technology and can hold the bubbles with a small holding magnetic field. The purpose is to

発明の構成 そしてこの目的は本発明によれば、バブル結晶の表面に
バブル伝播路を形成した磁気パプルメそり素子において
、前記バブル伝播路はイオン注入法により形成されたイ
オン注入伝播路の凸部近傍に該イオン注入伝播路に沿っ
て・そ−マロイ伝播素子を配置したことを特徴とする磁
気バブルメモリ素子を提供することによって達成される
According to the present invention, the present invention provides a magnetic papule mesori element in which a bubble propagation path is formed on the surface of a bubble crystal. This is achieved by providing a magnetic bubble memory device characterized in that a So-Malloy propagation device is arranged along the ion implantation propagation path.

発明の実施例 以下、本発明実施例を図面によって詳述する。Examples of the invention Embodiments of the present invention will be described in detail below with reference to the drawings.

第4図は本発明による磁気バブルメモリ素子を説明する
ための図であり、aは構成図、bは作用説明図である。
FIG. 4 is a diagram for explaining the magnetic bubble memory element according to the present invention, in which a is a block diagram and b is an explanatory diagram of the operation.

同図において、10はイオン注入部、11は非イオン注
入部、12はイオン注入伝播路、13はパーマロイ伝播
素子をそれぞれ示している。
In the figure, 10 indicates an ion implantation section, 11 a non-ion implantation section, 12 an ion implantation propagation path, and 13 a permalloy propagation element.

本実施例は図に示す如くイオン注入伝播路12のティッ
プに沿ってシェブロン形のパーマロイ伝播素子13を配
置したものである。
In this embodiment, a chevron-shaped permalloy propagation element 13 is arranged along the tip of an ion implantation propagation path 12 as shown in the figure.

このように構成された本実施例はノe−マpイ伝播素子
13間のギャップ部はイオン注入伝播路12のカスプ1
4が伝播を受け持つためパーマロイ伝播素子13のギャ
ッf、をバブル径以上にすることができ、従って通常の
ホトリソグラフィ技術でも微小バブルの伝播路の作成が
可能となる。
In this embodiment configured as described above, the gap between the e-ma p propagation elements 13 is located at the cusp 1 of the ion implantation propagation path 12.
4 takes charge of propagation, the gap f of the permalloy propagation element 13 can be made larger than the bubble diameter, and therefore, it is possible to create a propagation path for microbubbles even with ordinary photolithography technology.

またバブルを停止保持する場合第4図すのようにホール
ド磁界15を矢印方向に印加しておけば伝播路の上側で
はパーマロイ伝播素子13の頂点に、下側ではイオン注
入伝播路のカス7’14にそれぞれバブル16.17が
保持される。このとき必要なホールド磁界の大きさはパ
ーマロイ伝播素子13の頂点にバf/I/を安定に保持
する大きさでよく、イオン注入伝播路のティップに保持
する場合に比較して1/3以下の大きさとなる。
In addition, to stop and hold the bubble, if the hold magnetic field 15 is applied in the direction of the arrow as shown in Figure 4, the top of the permalloy propagation element 13 is placed on the upper side of the propagation path, and the scrap 7' of the ion implanted propagation path is placed on the lower side. 14 respectively hold bubbles 16 and 17. The magnitude of the hold magnetic field required at this time is sufficient to stably hold f/I/ at the apex of the permalloy propagation element 13, and is 1/3 or less compared to the case where it is held at the tip of the ion implantation propagation path. The size will be .

第5図は他の実施例を説明するための図であシ、aはダ
イヤモンド型、bは非ダイヤモンドWを示す。同図にお
いて、第4図と同一部分は同一符号を付して示した。
FIG. 5 is a diagram for explaining another embodiment, in which a shows a diamond shape and b shows a non-diamond W. In this figure, the same parts as in FIG. 4 are designated by the same reference numerals.

本実施例が前実施例と異たるところはa、bともパーマ
ロイ伝播素子13が非対称シェブロンであることである
This embodiment differs from the previous embodiment in that the permalloy propagation elements 13 in both a and b are asymmetric chevrons.

このように構成された本実施例はパーマロイ伝播素子1
3が矢印で示すバブルの進行方向に対して非対称である
ので前実施例に比しパズルの伝播がさらに安定化される
This embodiment configured in this way has a permalloy propagation element 1.
3 is asymmetrical with respect to the traveling direction of the bubble indicated by the arrow, so the propagation of the puzzle is further stabilized compared to the previous embodiment.

発明の効果 以上、詳細に説明したように本発明の磁気・ぐプルメモ
リ素子は、イオン注入伝播路のティップ近傍に/f−マ
ロイ伝播素子を配し、この部分の・ぐプル伝播をパーマ
ロイ伝播素子が受け持ち、・(−マロイ伝播素子のギヤ
276部では伝播をイオン注入伝播路が受け持つように
したものであって、通常のホトリングラフィ技術によっ
て微小/6プルの伝播路を形成でき、しかも小さなホー
ルド磁界で・々プルを保持することができるといった効
果大なるものである。
Effects of the Invention As explained in detail above, the magnetic gupple memory element of the present invention has a /f-malloy propagation element disposed near the tip of the ion implantation propagation path, and the f-gupple propagation in this part is controlled by the permalloy propagation element. In the gear 276 part of the Malloy propagation element, the ion implantation propagation path takes charge of the propagation, and the propagation path of minute/6 pulls can be formed using ordinary photolithography technology. This has a great effect of being able to hold the pull with the hold magnetic field.

【図面の簡単な説明】 第4図は従来のパーマロイによる伝播路を示す図、第2
図は従来のイオン注入による伝播路を示す図、第3図は
従来のイオン注入伝播路におけるバブル停止位置の説明
図、第4図は本発明による磁気バブルメモリ素子を説明
するための図、第5図は他の実施例を説明するための図
である。 図面において、IOはイオン注入部、11は非イオン注
入部、12はイオン注入伝播路、13はパーマロイ伝播
素子をそれぞれ示す。 特許出願人 富士通株式会社 特許出願代理人 弁理士 青 木 朗 弁理士 西 舘 和 之 弁理士 内 1)幸 男 弁理士 山 口 昭 之 第20 第3回 第50
[Brief explanation of the drawings] Figure 4 is a diagram showing the propagation path using conventional permalloy.
3 is a diagram illustrating a propagation path by conventional ion implantation, FIG. 3 is an explanatory diagram of a bubble stop position in a conventional ion implantation propagation path, and FIG. 4 is a diagram illustrating a magnetic bubble memory element according to the present invention. FIG. 5 is a diagram for explaining another embodiment. In the drawings, IO indicates an ion implantation section, 11 a non-ion implantation section, 12 an ion implantation propagation path, and 13 a Permalloy propagation element. Patent applicant Fujitsu Limited Patent agent Akira Aoki Patent attorney Kazuyuki Nishidate 1) Yukio Patent attorney Akira Yamaguchi 20th 3rd 50th

Claims (1)

【特許請求の範囲】 1、バブル結晶の表面にバブル伝播路を形成した磁気バ
ブルメモリ素子において、前記バブル伝播路はイオン注
入法にょ多形成されたイオン注入伝播路の凸部近傍に該
イオン注入伝播路に沿ってノ臂−マ四イ伝播素子を配置
したことを特徴とする磁気バブルメモリ素子。 2.7や一マロイ伝播素子間のギャップがバブル径以上
であることを特徴とする特許請求の範囲第1項記載の磁
気バブルメモリ素子。 3、/4’−マロイ伝播素子がバブルの伝播方向に対し
て非対称であることを特徴とする特許請求の範囲第1項
又は第2項記載の磁気バブルメモリ素子0
[Scope of Claims] 1. In a magnetic bubble memory element in which a bubble propagation path is formed on the surface of a bubble crystal, the bubble propagation path is formed by ion implantation in the vicinity of a protrusion of the ion implantation path formed by the ion implantation method. A magnetic bubble memory device characterized in that propagation elements are arranged along the propagation path. 2. The magnetic bubble memory device according to claim 1, wherein the gap between the 2.7 and 1 Malloy propagation elements is equal to or larger than the bubble diameter. 3,/4′-Magnetic bubble memory device 0 according to claim 1 or 2, characterized in that the Malloy propagation device is asymmetrical with respect to the bubble propagation direction.
JP58176907A 1983-09-27 1983-09-27 Magnetic bubble memory element Granted JPS6070577A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP58176907A JPS6070577A (en) 1983-09-27 1983-09-27 Magnetic bubble memory element

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58176907A JPS6070577A (en) 1983-09-27 1983-09-27 Magnetic bubble memory element

Publications (2)

Publication Number Publication Date
JPS6070577A true JPS6070577A (en) 1985-04-22
JPS6322382B2 JPS6322382B2 (en) 1988-05-11

Family

ID=16021837

Family Applications (1)

Application Number Title Priority Date Filing Date
JP58176907A Granted JPS6070577A (en) 1983-09-27 1983-09-27 Magnetic bubble memory element

Country Status (1)

Country Link
JP (1) JPS6070577A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04114801U (en) * 1991-03-20 1992-10-09 シユウ,ダー−ジエン Freely rotating furniture legs

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5896705A (en) * 1981-12-04 1983-06-08 Hitachi Ltd Magnetic bubble memory element
JPS58108085A (en) * 1981-12-18 1983-06-28 Hitachi Ltd Magnetic bubble element
JPS6032197A (en) * 1983-08-03 1985-02-19 Hitachi Ltd Magnetic bubble element

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5896705A (en) * 1981-12-04 1983-06-08 Hitachi Ltd Magnetic bubble memory element
JPS58108085A (en) * 1981-12-18 1983-06-28 Hitachi Ltd Magnetic bubble element
JPS6032197A (en) * 1983-08-03 1985-02-19 Hitachi Ltd Magnetic bubble element

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04114801U (en) * 1991-03-20 1992-10-09 シユウ,ダー−ジエン Freely rotating furniture legs

Also Published As

Publication number Publication date
JPS6322382B2 (en) 1988-05-11

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