JPS6065746A - Manufacture of glass plate for transparent electrode - Google Patents

Manufacture of glass plate for transparent electrode

Info

Publication number
JPS6065746A
JPS6065746A JP17375083A JP17375083A JPS6065746A JP S6065746 A JPS6065746 A JP S6065746A JP 17375083 A JP17375083 A JP 17375083A JP 17375083 A JP17375083 A JP 17375083A JP S6065746 A JPS6065746 A JP S6065746A
Authority
JP
Japan
Prior art keywords
glass
alkali metal
metal ion
transparent electrode
glass plate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP17375083A
Other languages
Japanese (ja)
Inventor
Hideo Kawahara
秀夫 河原
Hirotsugu Nagayama
永山 裕嗣
Hisao Honda
久男 本田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Sheet Glass Co Ltd
Original Assignee
Nippon Sheet Glass Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Sheet Glass Co Ltd filed Critical Nippon Sheet Glass Co Ltd
Priority to JP17375083A priority Critical patent/JPS6065746A/en
Publication of JPS6065746A publication Critical patent/JPS6065746A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE:To prevent the dissolution of alkali metal ion from the substrate glass of a transparent electrode having transparent electrically conductive film on the surface, by substituting the alkali metal ion with a specific alkali metal ion. CONSTITUTION:The alkali metal ion in the surface layer of a glass substrate is substituted with other alkali metal ion having larger ionic radius. For example, a soda-lime glass is immersed in a molten potassium nitrate at about 400-450 deg.C for a long period (i.e. about 30min - several 10hr) to effect the substitution of the Na ion with K ion at the surface of the glass. The dissolution of the alkali metal ion from the glass can be remarkably suppressed by this process, and a glass plate giving a liquid crystal display panel and solar cell, etc. having stable property can be produced.

Description

【発明の詳細な説明】 本発明は透明電極用ガラス板の製造方法、特にガラス基
板表面に透明電導膜を形成して成る透明電極において、
該ガラス中のアルカリ成分の透明電導膜中への溶出・侵
入を防止することにより、長時間にわたり透明電極とし
ての機能を維持できるようにした透明電極用ガラス板を
製造する方法に関する。
DETAILED DESCRIPTION OF THE INVENTION The present invention provides a method for manufacturing a glass plate for a transparent electrode, particularly a transparent electrode formed by forming a transparent conductive film on the surface of a glass substrate.
The present invention relates to a method of manufacturing a glass plate for a transparent electrode that can maintain its function as a transparent electrode for a long period of time by preventing alkaline components in the glass from eluting or penetrating into the transparent conductive film.

今日、液晶表示パネル用・太陽電池用などの基板ガラス
にソーダライムガラス、またはホウ珪酸ガラスが用いら
れているが、表面処理をせずにそのまま使用した場合、
基板ガラス中に通常酸化物として数%から十数%含まれ
るアルカリ成分がガラス表面より溶出し、これらガラス
表面に形成している透明電導膜(酸化インジウム、酸化
錫またはそれらの混合物など)中へ、更には透明電導膜
の機能を低下せしめるという問題があった。
Today, soda lime glass or borosilicate glass is used as substrate glass for liquid crystal display panels, solar cells, etc., but if used as is without surface treatment,
Alkaline components, which are normally contained in substrate glass in the form of oxides ranging from several percent to more than ten percent, are eluted from the glass surface and enter the transparent conductive film (indium oxide, tin oxide, or a mixture thereof, etc.) formed on the glass surface. Furthermore, there is a problem that the function of the transparent conductive film is deteriorated.

このため、基板ガラスには通常アルカリ成分の溶出を防
止する目的で、ガラスの表面を酸化珪素膜で被覆するこ
とが行なわれている。
For this reason, the surface of the glass substrate is usually coated with a silicon oxide film for the purpose of preventing elution of alkaline components.

これらガラス表面を酸化珪素膜で被覆する方法には、真
空蒸着法・スパンター法・OVD法あるいは浸漬塗布法
(ディッピング法)などの方法がよく用いられているが
、これらの方法は装置及び付帯設備が高価なため、酸化
珪素被覆に要するコストが高くなる他、ガラスからのア
ルカリ成分の溶出防止効果に関しても必ずしも満足なも
のではないという欠点があった。
Methods such as vacuum evaporation, spunter method, OVD method, and dip coating method are often used to coat the glass surface with a silicon oxide film, but these methods require equipment and ancillary equipment. Since it is expensive, the cost required for coating with silicon oxide is high, and the effect of preventing the elution of alkaline components from glass is not necessarily satisfactory.

本発明者らはこの様な基板ガラスからのアルカリ成分溶
出防止に関し、鋭意研究の結果、ガラス表面層のアルカ
リ金属イオンを予めより大きなイオン半径のアルカリ金
属イオンで置換しておくことによってガラスからのアル
カリ金属イオンの溶出を著しく抑制できることを見出し
た。加えて本発明者らは本発明の効果を十分に発揮する
ためにはその後の熱的処理、例えば透明電導膜の付着形
成や液晶表示パネルにおける液晶注入後のセル封止時な
どにおけるガラス基板の温度を250°C以下とする必
要がある事もあわせて見いだした。これはガラス基板の
温度が2SO″Cを越えると置換したアルカリ金属イオ
ンの安定性がくずれ、ガラス表面から溶出しはじめ、元
のアルカリ金属イオンと同様の悪作用を及ぼし始めるた
めである。
The present inventors have conducted extensive research into preventing the elution of alkali components from the glass substrate, and have found that by replacing the alkali metal ions in the glass surface layer with alkali metal ions having a larger ionic radius in advance, the elution of alkali components from the glass can be prevented. It has been found that the elution of alkali metal ions can be significantly suppressed. In addition, the present inventors believe that in order to fully exhibit the effects of the present invention, it is necessary to perform subsequent thermal treatments on the glass substrate, such as during the deposition of a transparent conductive film or during cell sealing after liquid crystal injection in a liquid crystal display panel. It was also found that the temperature needs to be kept below 250°C. This is because when the temperature of the glass substrate exceeds 2SO''C, the stability of the substituted alkali metal ions deteriorates and they begin to elute from the glass surface, causing the same adverse effects as the original alkali metal ions.

ここで前記方法によりアルカリ金属イオンの溶出が防止
される理由は、ガラスの転移湿度をこえない温度域にお
いて表面層のアルカリ金属イオンを、より大きなイオン
半径をもったアルカリ金属イオンと置換する事により、
イオン交換後の常温のガラス板表面層には圧縮応力が発
生し、この圧縮応力の影響によりガラス板表面のアルカ
リ金属イオンが通常の状態とくらべて動きにくい状態に
なっているためであると推定される。
The reason why the elution of alkali metal ions is prevented by the above method is that the alkali metal ions in the surface layer are replaced with alkali metal ions having a larger ionic radius in the temperature range that does not exceed the transition humidity of the glass. ,
It is assumed that this is because compressive stress occurs in the surface layer of the glass plate at room temperature after ion exchange, and due to the influence of this compressive stress, the alkali metal ions on the glass plate surface are in a state where it is difficult to move compared to the normal state. be done.

ガラス表面のアルカリ金属イオンをより大きなイオン半
径のアルカリ金属イオンと置換する方法については、通
常qoo /−ttso℃に加熱されたアルカリ金属の
硝酸塩融液にガラスを長時間(30分〜数IO時間)浸
漬する方法がよく用いちれている。
Regarding the method of replacing the alkali metal ions on the glass surface with alkali metal ions having a larger ionic radius, the glass is usually immersed in an alkali metal nitrate melt heated to qoo/-ttso℃ for a long time (30 minutes to several IO hours). ) The method of immersion is often used.

以下に本発明の実施例につき従来の方法との比較の点で
説明する。
Examples of the present invention will be described below in comparison with conventional methods.

ここで、ガラス基板表面からのアルカリ溶出による透明
電極、液晶表示パネル、太陽電池パイ、ルの性能の劣化
の評価方法としてガラス基板表面の遊離アルカリ量の評
価方法(表面電気抵抗率、水の濡れ角ンを用いた。これ
は基板表面の遊離アルカリ量が多いと、透明電極として
の性能劣化が早いと推定されるからであり、評価値とし
ては遊離アルカリ量が増えると基板表面の電気抵抗率が
さがり、水の濡れ角が小さくなる。ここで表面抵抗率は
平面上正方形の相対する二辺間の抵抗率で、通常オーム
で表わされ、辺の大きさによらない値である。
Here, as a method for evaluating the performance deterioration of transparent electrodes, liquid crystal display panels, and solar cells due to alkaline elution from the glass substrate surface, we will use a method for evaluating the amount of free alkali on the glass substrate surface (surface electrical resistivity, water wetness, etc.). This is because it is estimated that the higher the amount of free alkali on the substrate surface, the faster the performance deterioration as a transparent electrode will occur.As an evaluation value, as the amount of free alkali increases, the electrical resistivity of the substrate surface The surface resistivity is the resistivity between two opposing sides of a square on a plane, and is usually expressed in ohms, and is a value that does not depend on the size of the sides.

実施例 IO×IO(Cm)、厚味へommのソーダライムガラ
ス(ガラス組成分析値Na2O/3,10%、に200
.79% + MgO4’ 、 03%、Ca07..
27%、 Aj+203 / 、73%、5i0272
.1%各重量%)を30枚、ホウケイ酸ガラス(ガラス
組成Na2O3,1%、’ N200.’1%B2O3
/、2.9%rA12032.2%、5i02ざO,S
%各重量%)を6枚準備した。このうちソーダライムガ
ラスについては、各々6枚づつ(110VD 法、(2
)スバく− ッ々−法C3)屡渣炉(ディッピング1で−そhらの表
面に約t2oo’hの酸化珪素被覆を形成した。以下に
各々の形成条件を示す。
Example IO x IO (Cm), thick omm soda lime glass (glass composition analysis value Na2O/3,10%, 200
.. 79% + MgO4', 03%, Ca07. ..
27%, Aj+203/, 73%, 5i0272
.. 1% each weight%), 30 sheets of borosilicate glass (glass composition Na2O3, 1%, 'N200.'1% B2O3
/, 2.9%rA12032.2%, 5i02zaO,S
% each weight %) were prepared. Of these, for soda lime glass, 6 pieces each (110VD method, (2
)Subaku-tsu-tsu-method C3) Tire furnace (In dipping 1, a silicon oxide coating with a thickness of about 2000 mm was formed on the surface of each layer.Each formation condition is shown below.

(1) cvD法の場合、唇料蒸気としてはモノシラン
(SiH4)と窒素ガス(N2)の混合がスを3oo’
cのソーダライムガラス上にノズルで吹付けて形成した
(1) In the case of the CVD method, the lip material vapor is a mixture of monosilane (SiH4) and nitrogen gas (N2).
It was formed by spraying with a nozzle onto the soda lime glass shown in c.

(2) スパンクー法の場合、真空度3X10TOrr
、ターゲットは石英ガラス、基板温度100″Cの条件
でソーダライムガラス上に酸化珪素被覆を形成した。
(2) In the case of the Spanku method, the degree of vacuum is 3 x 10 TOrr.
The target was quartz glass, and a silicon oxide coating was formed on soda lime glass at a substrate temperature of 100''C.

(3) 浸漬法の場合、シラノールアルフール溶液(東
京応化社製商品名 0hka Goat Diffus
ion−8ource)にソーダライムガラスを浸漬塗
布した後、iso°Cx1O分間の仮焼を経てsoo℃
で30分間焼成することにより酸化珪素被覆を形成した
(3) In the case of the immersion method, a silanol alfur solution (manufactured by Tokyo Ohka Co., Ltd., trade name: 0hka Goat Diffus)
Soda lime glass was applied by dip coating on ion-8source), then calcined for 10 minutes at iso°C, then heated to soo°C.
A silicon oxide coating was formed by baking for 30 minutes.

残る12枚(6枚1組で2組)のソーダライムガラスの
うち1組は特別の処理は施さなかった。
Of the remaining 12 pieces (2 sets of 6 pieces) of soda lime glass, one set was not subjected to any special treatment.

最後の1組については弘lO°Cの硝酸カリウム融液に
20時間浸漬することにより、これらガラス表面のナト
リウムイオンをカリウムイオンで[fAした。
The last pair was immersed in a potassium nitrate melt at 10°C for 20 hours to remove sodium ions on the glass surface with potassium ions.

以上のようにして準備調整した6組(各組6枚)のガラ
スから各2枚を取出し、アルコール洗浄、純水超音波洗
浄後それぞれにつき表面の直流電気抵抗率(Ω)及び水
の濡れ角(度)を測定した。
Two glasses were taken from each of the six sets (six glasses for each set) prepared and adjusted as described above, and after alcohol cleaning and pure water ultrasonic cleaning, the surface DC electrical resistivity (Ω) and water wetting angle were determined. (degrees) was measured.

次いでこれらサンプルを750℃で10分加熱し、冷却
後再度表面抵抗率及び濡れ角を測定した。
These samples were then heated at 750° C. for 10 minutes, and after cooling, the surface resistivity and wetting angle were measured again.

更に、残る各組1枚のガラスについては、上記と同様の
洗浄後各々2枚につき2!;O”C,3!;0℃で60
分加熱し、冷却後各2枚のうち1枚は表面直流電気抵抗
率、残る1枚については水の濡れ角を測定した。
Furthermore, for the remaining 1 glass in each group, after cleaning in the same manner as above, 2 glasses for each 2 glasses! ;O”C,3!;60 at 0℃
After cooling, one of the two sheets was measured for surface DC electrical resistivity, and the remaining one was measured for water wetting angle.

以上の実験で得られた結果を第1表および第2表にまと
めた。同表より本発明の通りガラス表面のナトリウムを
カリウムで置換したものが、2Sθ℃以下の熱処理条件
(室温、/!;O”C,l!;0″C)では、従来法で
1番すぐれたスパッタ5102膜に比べ表面直流電気抵
抗率および水の濡れ角がともに大きな値を示しており、
従来法とくらべて少ない表面遊離アルカリ量、つまり性
能劣化の少ないガラス基板を提供している事がわかる。
The results obtained in the above experiments are summarized in Tables 1 and 2. From the same table, the glass surface in which sodium is replaced with potassium according to the present invention is the best among the conventional methods under heat treatment conditions below 2Sθ℃ (room temperature, /!; O"C, l!; 0"C). Compared to the sputtered 5102 film, the surface DC electrical resistivity and water wetting angle are both larger.
It can be seen that compared to the conventional method, the amount of free alkali on the surface is smaller, that is, a glass substrate with less performance deterioration is provided.

又、ここで第1表および第2表を見てわかる通り、熱処
理温度が330°C以上となると本発明の効果を失う。
Furthermore, as can be seen from Tables 1 and 2, the effects of the present invention are lost when the heat treatment temperature exceeds 330°C.

上記実施例にもみられる通り、本発明により表面遊離ア
リカリ量が少ない透明電極用ガラス板を5i02膜など
を形成する事なしに券≠会妾吻嚇製造する事が出来る。
As seen in the above embodiments, the present invention makes it possible to produce a glass plate for transparent electrodes with a small amount of free alkali on the surface without forming a 5i02 film or the like.

又、上記実施例は通常のガラス(ナトリウム、カリウム
等アルカリ金属イオンが共存し、カリウムよりもはるか
に多量のナトリウムを含むガラス)の表面層のナトリウ
ムイオンをカリウムイオンと置換した場合であったが、
ガラス表面層に内在するアルカリ金属イオン(リチウム
またはナトリウムイオン)をより大きなイオン半径を持
ったアルカリ金属イオン(カリウム、ルビジウム、セシ
ウム等)で置換する場合でも同様の効果を持つ。
In addition, the above example was a case in which sodium ions in the surface layer of ordinary glass (glass in which alkali metal ions such as sodium and potassium coexist and contain far more sodium than potassium) were replaced with potassium ions. ,
A similar effect can be obtained even when the alkali metal ions (lithium or sodium ions) inherent in the glass surface layer are replaced with alkali metal ions (potassium, rubidium, cesium, etc.) having a larger ionic radius.

又、上記説明は遊離アルカリ量の少い基板用ガラスの製
造方法について述べたものであるが、基板温度を2!;
O’C以下に保った状態で導電性被覆(酸化インジウム
、酸化錫またはそれらの混合物の膜)を形成する事は可
能であり、上記発明力(透明電極用ガラス板の製造方法
として、有益である事を示している。
Furthermore, although the above explanation describes a method for producing glass for a substrate with a small amount of free alkali, the substrate temperature is set to 2! ;
It is possible to form a conductive coating (a film of indium oxide, tin oxide, or a mixture thereof) while keeping the temperature below O'C, and the invention described above (as a method for manufacturing a glass plate for transparent electrodes) is useful. It shows something.

Claims (3)

【特許請求の範囲】[Claims] (1)ガラスの表面層のアルカリ金属イオンをそれより
もイオン半径の大きなアルカリ金属イオンと置換する事
を特徴とす4アルカリ溶出のすくない透明電極用ガラス
板の製造方法。
(1) A method for producing a glass plate for a transparent electrode with low 4-alkali elution, characterized by replacing alkali metal ions in the surface layer of the glass with alkali metal ions having a larger ionic radius.
(2) 前記イオンの置換が、ガラス転移温度よりも低
い温度で行なわれる特許請求の範囲第1項記載の透明電
極用ガラス板の製造方法。
(2) The method for producing a glass plate for a transparent electrode according to claim 1, wherein the ion substitution is performed at a temperature lower than the glass transition temperature.
(3) 前記イオンの置換がナトリウムイオンをカリウ
ムイオンと置換するものである特許請求の範囲第1項ま
たは第2項記載の透明電極用ガラス板の製造方法。
(3) The method for manufacturing a glass plate for a transparent electrode according to claim 1 or 2, wherein the ion replacement is to replace sodium ions with potassium ions.
JP17375083A 1983-09-20 1983-09-20 Manufacture of glass plate for transparent electrode Pending JPS6065746A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP17375083A JPS6065746A (en) 1983-09-20 1983-09-20 Manufacture of glass plate for transparent electrode

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP17375083A JPS6065746A (en) 1983-09-20 1983-09-20 Manufacture of glass plate for transparent electrode

Publications (1)

Publication Number Publication Date
JPS6065746A true JPS6065746A (en) 1985-04-15

Family

ID=15966434

Family Applications (1)

Application Number Title Priority Date Filing Date
JP17375083A Pending JPS6065746A (en) 1983-09-20 1983-09-20 Manufacture of glass plate for transparent electrode

Country Status (1)

Country Link
JP (1) JPS6065746A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63175220A (en) * 1987-01-16 1988-07-19 Tdk Corp Magnetic recording medium
EP0992836A2 (en) * 1994-12-09 2000-04-12 Seiko Instruments Inc. Display device and method of manufacturing the same

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58115043A (en) * 1981-12-28 1983-07-08 Konishiroku Photo Ind Co Ltd Ion exchange of plate glass
JPS58156554A (en) * 1982-03-11 1983-09-17 Nippon Electric Glass Co Ltd Treatment of glass surface

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58115043A (en) * 1981-12-28 1983-07-08 Konishiroku Photo Ind Co Ltd Ion exchange of plate glass
JPS58156554A (en) * 1982-03-11 1983-09-17 Nippon Electric Glass Co Ltd Treatment of glass surface

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63175220A (en) * 1987-01-16 1988-07-19 Tdk Corp Magnetic recording medium
EP0992836A2 (en) * 1994-12-09 2000-04-12 Seiko Instruments Inc. Display device and method of manufacturing the same
EP0992836A3 (en) * 1994-12-09 2000-08-09 Seiko Instruments Inc. Display device and method of manufacturing the same

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