JPS6057930A - Exposure device - Google Patents

Exposure device

Info

Publication number
JPS6057930A
JPS6057930A JP58165864A JP16586483A JPS6057930A JP S6057930 A JPS6057930 A JP S6057930A JP 58165864 A JP58165864 A JP 58165864A JP 16586483 A JP16586483 A JP 16586483A JP S6057930 A JPS6057930 A JP S6057930A
Authority
JP
Japan
Prior art keywords
arc
nose
mercury lamp
anode
tip
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP58165864A
Other languages
Japanese (ja)
Inventor
Takehiro Kira
健裕 吉良
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Ushio Denki KK
Ushio Inc
Original Assignee
Ushio Denki KK
Ushio Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ushio Denki KK, Ushio Inc filed Critical Ushio Denki KK
Priority to JP58165864A priority Critical patent/JPS6057930A/en
Publication of JPS6057930A publication Critical patent/JPS6057930A/en
Pending legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Microphotolithographic exposure; Apparatus therefor
    • G03F7/70008Production of exposure light, i.e. light sources

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

PURPOSE:To bake a fine pattern stably for a prolonged term at low cost by forming an anode for a short-arc type mercury lamp incorporated into an exposure device to a specific shape and forming an arc spot only at the nose of a cathode. CONSTITUTION:The nose section 73 of an anode 7 for a short-arc type mercury lamp 100 is formed to a tapered shape with a flat nose surface 72. Consequently, an arc spot at the nose of the anode 7 disappears, an arc is throttled to a small shape, and an arc spot is formed only at the nose 62 of a cathode 6, and functions as a point source. Beams can be focussed easily by mounting the mercury lamp 100 so that the arc spot is positioned onto a focus in a beam-condensing lens 101, the illuminance of beams on the surface to be irradiated of a semiconductor wafer 400 can be increased without augmenting power consumption, a temperature rise is inhibited comparatively, the generation of a sputtering phenomenon at the nose section 73 is reduced remarkably, and use-life can be lengthened.

Description

【発明の詳細な説明】 本発明は、紫外線を利用して例えば回路パターンなどの
焼付を行なうための側光装置er関するものである。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a side light device er for printing, for example, circuit patterns using ultraviolet rays.

電気(ロ)路或いはICなどの半導体電子沖1絡の11
1路パターンの焼付VCおいては、通常基板土に紫夕1
線感光性の樹脂層を積層して設け、この樹脂層に回路パ
ターンを介して紫外線を含む光を照射して焼付が行なわ
れる。
11 of the semiconductor electronic circuit 1 circuit such as electric circuit or IC
For baked VC with a one-way pattern, Shiyu 1 is usually used on the substrate soil.
Line-sensitive resin layers are laminated and baked by irradiating the resin layer with ultraviolet light through a circuit pattern.

第1図は、例えは牛導体電子Ll路の焼付に月」いられ
る露光装置の一例の概略を示す祝明図である。
FIG. 1 is a diagram schematically showing an example of an exposure apparatus that can be used for printing, for example, a conductive electronic Ll path.

(2) 100は露光用光源として用いられるショートアーク型
水銀灯でアシ、このショートアーク型水銀灯100はそ
のアークが集光鏡101の焦点上に位置するよう取付り
られる。このシ日−トアーク型水銀幻100よりの元り
は集光鏡101によって集光され、第1の平面鏡102
、インチグレーター103%謝2の’F 1111 飯
104及びコンデンサレンズ105を介して回路パター
ンが描かれたフォトマスク300に投射され、このフォ
トマスク300を透過した光が縮小レンズ106により
縮小されて、基台200上に保持された、その上面に葉
、a!lit・比衛脂が積層された半導体ウェハー40
0に投射され、これにより半導体ウェハー400にフォ
トマスク300に対応した回路パターンが焼付けられる
0 107はフィルターでるる。
(2) Reference numeral 100 denotes a short-arc mercury lamp used as a light source for exposure. This short-arc mercury lamp 100 is mounted so that its arc is located on the focal point of the condenser mirror 101. The source of light from this day-to-arc type mercury illusion 100 is collected by a condensing mirror 101, and a first plane mirror 102
, Inch Greater 103% X2 'F 1111 The light is projected onto a photomask 300 on which a circuit pattern is drawn through the rice 104 and the condenser lens 105, and the light transmitted through this photomask 300 is reduced by the reduction lens 106. Leaf on its upper surface, a! held on the base 200! Semiconductor wafer 40 on which lit/hiei resin is laminated
A circuit pattern corresponding to the photomask 300 is printed onto the semiconductor wafer 400.0 107 is projected onto the filter.

この露光装置に組み込まれるシ1−トアーク型水銀灯1
00の一例を第2図に示す。
A sheet-arc type mercury lamp 1 incorporated in this exposure device
An example of 00 is shown in FIG.

1は石英ガラス製封体であり、この封体1の両端部には
口金2人、2Bが設けられている。3及び4はそれぞれ
陽極支持棒及び陰極支持棒であり、(3) W#極支持棒3の先端には陽極5が固定さね、l與極支
持棒4の先端には陰極6が同定されており、これら陽極
5と陰極6は封体1の内部中央において互に対向してい
る。陽&5及び陰極6の先端部51及び61は(”]れ
もコーン状に形成されている。これは点灯起豫ノが容易
になるからである〇このようなシクートアーク型水銀灯
100を組み込んだ露光装置は、広〈産業界で用いられ
ているが、最近、半導体電子回路の高集積化、生産コス
トの低減等の要求から、との棟露九装履においても、 (イ)光源であるシ廖−トアーク型水釧灯の消費電力を
大きくせすに半導体ウェハーを拙明する被照射面での九
の照抜の増大を図ること (ロ)光源であるショートアーク型水欽幻のイ9シ月]
寿命の延長を図ること等が増々強く果求されるようにな
ってきている。
Reference numeral 1 denotes a quartz glass enclosure, and two caps 2B are provided at both ends of the enclosure 1. 3 and 4 are an anode support rod and a cathode support rod, respectively. The anode 5 and the cathode 6 are opposed to each other at the center inside the enclosure 1. The tips 51 and 61 of the positive electrode 5 and the negative electrode 6 are both formed into a cone shape. This is because it is easy to start the lighting. The device is widely used in industry, but recently, due to the demand for higher integration of semiconductor electronic circuits and lower production costs, the device is also being used as a light source. To increase the illumination of the irradiated surface for illuminating semiconductor wafers while increasing the power consumption of the short-arc type water lamp. month]
There is an increasing desire to extend lifespan.

このような要求(イ)、(ロ)Kついて、千わそれ別個
の手段により個別に解決することは可能である。
It is possible to individually solve these requirements (a) and (b)k using different means.

即ち、(イ)K対しては例えば特殊な構成のξラーを用
いて集光率を向上させること、(ロ)に対しては例えば
シロートアーク型水銀灯において電極を大きくしたり或
いは封体を大きくしたりすること、などにより解決する
ことが可能ではある。しかしながらこのような個別的に
解決する手段では、露光装置の#)成が複雑になり、結
局装置のコストが上昇し半導体を子回路の生産コストの
低減化を図るという当初の目的を達成することができな
い。
That is, for (a) K, for example, by using a specially configured It is possible to solve the problem by doing something like However, with such individual solutions, the structure of the exposure equipment becomes complicated and the cost of the equipment increases, making it difficult to achieve the original purpose of reducing the production cost of semiconductor sub-circuits. I can't.

このような事情から、本発明者は第2図Vこ示した構成
のシタートアーク型水銀灯における点灯時のアークの状
態を調べたところ、第3図に示すような輝度分布が得ら
れ、との輝度分布によると、アーク輝点が陰極6の先端
62と陽極5の先端52の2ケ所に形成されており、こ
のため簡単な光学系では2ケ川のアーク輝点の光の両者
を良好に集光することが困難であシ、しかも陽極5の先
端部51の損耗が激しくて早期に黒化現象が光年し、結
局このことが既述の要求C1)、(ロ)を同時に満足さ
せることを相当に内部にしている原因であると推定され
、この知見に基いて鋭意研究を1ねた結果、(5) 露光装置に組み込むシ1−トアーク型水釧灯において、
陽極の形状を特定の形状にすることVこより、極めて簡
単に上述の要求(イ)、(ロ)を同時に満足することが
できることを見出し、本発明を構成するに至りだ。
Under these circumstances, the present inventor investigated the state of the arc during lighting in the sitart arc type mercury lamp having the configuration shown in FIG. According to the distribution, arc bright spots are formed at two locations, the tip 62 of the cathode 6 and the tip 52 of the anode 5, and therefore a simple optical system cannot converge the light from the two arc bright spots well. It is difficult to emit light, and furthermore, the wear and tear of the tip 51 of the anode 5 is severe, and the blackening phenomenon occurs light years early, which ultimately satisfies the above-mentioned requirements C1) and (B) at the same time. Based on this knowledge, we conducted extensive research and found that (5) In the sheet-arc water lamp installed in the exposure equipment,
It has been found that the above requirements (a) and (b) can be simultaneously satisfied extremely easily by forming the anode into a specific shape, and the present invention has been completed.

本発明の目的は、簡単な構成で効率的にしかも低コスト
で微細パターンの焼付を長期間にbり安定に行なうこと
ができる露光装置を提イ1(することにあり、その特徴
とするところは、陰極の先端部をコーン状に形成しかつ
陽極の先端部を平坦な先端面を有するテーパ状に形成し
て成り点灯時アーク輝点が陰極の先端のみに形成される
シ1−トアーク型水銀灯を露光用光源として組み込んだ
点にある。
An object of the present invention is to provide an exposure apparatus that can print fine patterns stably over a long period of time with a simple configuration, efficiently, and at low cost. is a sheet arc type in which the tip of the cathode is formed into a cone shape and the tip of the anode is formed into a tapered shape with a flat tip surface, so that when lighting, an arc bright spot is formed only at the tip of the cathode. The key point is that it incorporates a mercury lamp as the light source for exposure.

以下図面により本発明の一実施例fに5こ明する。Embodiment f of the present invention will be explained below with reference to the drawings.

第4図は本発明の一実施例に係る露光装置に露光用光源
として組み込むシーートアーク型水鈑幻100の一例を
示す駅、切回であり、7は陽極でそJす、この陽極7は
、第5図及び氾6図に拡大して示すように、大径柱状の
胴部71と、この胴IN1\71か(6) らテーバ状に伸びその先端部72が平皿面である先端部
73とにより構成されている0その他の部分については
第2図に示した構成と同一であり、同一部分には同一の
符号を付して示しである。
FIG. 4 shows an example of a sheet arc type water plate 100 that is incorporated as an exposure light source in an exposure apparatus according to an embodiment of the present invention, and 7 is an anode. As shown in enlarged form in Fig. 5 and Fig. 6, there is a large-diameter columnar body 71, and a tip 73 extending in a tapered shape from the body IN1\71 (6), the tip 72 of which is a flat dish surface. 0 and other parts are the same as the structure shown in FIG. 2, and the same parts are denoted by the same reference numerals.

このシーートアーク型水銀灯10a、の共体的構成例を
下記嬉1懺に示す。
An example of the combined structure of this sheet arc type mercury lamp 10a is shown below.

第 1 衣 すなわち本発明で用いるシ日−トアーク型水銀灯とは、
直流電源で駆動される高圧若しくは超高圧のシ1−トア
ーク型水銀灯であり、点灯時V(おける封体内圧力は上
記構成例を含めて約(7) 7〜30気圧の範囲内のものである。
First, the mercury vapor lamp used in the present invention is:
It is a high-pressure or ultra-high-pressure single-arc type mercury lamp driven by a DC power source, and the pressure inside the envelope at V (including the above configuration example) is within the range of approximately (7) 7 to 30 atmospheres when lit. .

斯かる構成のシw−1’アーク型水銀灯100を露光用
光源として用い、wJ1図に示(7た構成と同様にして
露光装置を構成する。
Using the arc-type mercury lamp 100 having such a configuration as a light source for exposure, an exposure apparatus is configured in the same manner as the configuration shown in Figure WJ1 (7).

以上のような露光装置によtlば、シーートアーク型水
銀灯100において、陰極7の先端部73が平戸な先端
面72を有するテーバ状であるため、点灯時において、
第7図に示すような輝度分布が得られ、従来のように陽
極先端がコーン状である場合には生じていた陽極先端の
アーク輝点が消滅し、この結果と(7てアークが小さく
絞られて陰極6のコーン状の先端62の一ケ所のみにア
ーク輝点が形成され、このアーク輝点がいわば点光源と
して機能するようになるnこのように陰極の先端62の
アーク輝点に放射エネルギーが集中するようになるから
当該アーク輝点の輝度は?l!l費電力が同一の従来構
成のものに比して大きくなり、しかもこのアーク輝点が
実買上点光源であるから当該アーク輝点が集光鏡101
の焦点上に位置するようシ1−トア−り型水銀灯100
を取付けることにより容易に集光することができ、この
結果半導体ウェハー400を照明する被照射面での光の
照度を消費電力を増大することなく大きくすることがで
き、その上陽極7の先端部73が平定な先端面72を有
するテーバ状であって先端の面積が大きくなったため比
較的昇温が抑制され、当該先端部73におけるスパッタ
リング現象の発生が著しく小さくなり、この結果黒化現
象の発生が抑止されて露光用光源の使用寿命を延長する
ことができる。
According to the above-described exposure apparatus, in the sheet arc type mercury lamp 100, the tip 73 of the cathode 7 has a tapered shape with a flat tip surface 72, so that when the lamp is lit,
A brightness distribution as shown in Figure 7 was obtained, and the arc bright spot at the anode tip, which occurred when the anode tip was cone-shaped as in the conventional case, disappeared. As a result, an arc bright spot is formed at only one place on the cone-shaped tip 62 of the cathode 6, and this arc bright spot functions as a point light source. Since the energy is concentrated, what is the brightness of the arc bright spot? l!l The power consumption is higher than that of the same conventional configuration, and since this arc bright spot is the actual point light source, the arc brightness The bright spot is the condenser mirror 101
The mercury lamp 100 is placed on the focal point of the
By attaching a Since the tip 73 has a tapered shape with a flat tip surface 72 and the area of the tip is large, temperature rise is relatively suppressed, and the occurrence of sputtering phenomenon at the tip 73 is significantly reduced, resulting in the occurrence of a blackening phenomenon. This can extend the service life of the exposure light source.

このように露光用光源として用いるシ、−)アーク型水
銀灯100における陽&7を既述のような特定の形状に
するといり簡単な構成により、既述の搬水(イ)、(ロ
)を同時に満足することができ、この結果効率的にしか
も低コストで微細パターンの焼付を長期間に亘シ安定に
行なうことができるという著しいオリ益が得られる○以
上本発明の一実施例について説明したが、本発明におい
ては種々変更が可能であって、シ(9) 置−トアーク型水銀灯100のアーク輝点よりの光をど
のような光学系によって整形するかは自由に選定してよ
い。
In this way, the above-mentioned water conveyance (a) and (b) can be carried out at the same time by making the positive &7 of the arc-type mercury lamp 100 used as an exposure light source into a specific shape as described above. As a result, a remarkable advantage can be obtained in that fine patterns can be printed stably over a long period of time efficiently and at low cost. Various modifications can be made to the present invention, and the type of optical system used to shape the light from the arc bright spot of the stationary arc type mercury lamp 100 may be freely selected.

尚本発明露光装置は、半導体ウェハー以外の露光焼付に
も用いることができ、この場合にも既述と同様の作用効
果を得ることができる。
The exposure apparatus of the present invention can also be used for exposure and printing of materials other than semiconductor wafers, and in this case also the same effects as described above can be obtained.

以上のように本発明は、陰極の先端部をコーン状に形成
しかつ陽極の先端部を平担な先端面を有するテーパ状に
形成してhi、#)点灯時アーク輝点が陰極の先端のみ
に形成されるシ雪−トアーク型水銀幻を露光用光源とし
て組み込んだことを特徴とする露光装置であるから、簡
単な構成で効率的にしかも低コストで微細パターンの焼
付を長期間に亘p安定に行なうことができる。
As described above, in the present invention, the tip of the cathode is formed in a cone shape, and the tip of the anode is formed in a tapered shape with a flat tip surface. This exposure device is characterized by incorporating a snow-tight arc type mercury phantom, which is formed in the wafer, as an exposure light source, so it has a simple configuration, can print fine patterns efficiently, and at low cost for a long period of time. This can be done stably.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は露光装置の一例の概略を模式的に示す説明図、
第2図μ位米の露光装置に用いられているシーートアー
ク型水銀灯の一例を示す説明図、第3図は第2図に示し
たシ1−トアーク型水銀灯の点刻時におりるアークの輝
度分布を(10) 示す説明図、第4図は本発明露光装置に用いることがで
きるシ贈−トアーク型水銀灯の一例を示す説明図、第5
図及び第6図はそれぞれ第4図の要部を拡大して示す説
明用正面図及び説明用側面図、第7図は第4図に示した
シ翳−トアーク型水銀灯の点灯時におけるアークの輝度
分布を示す説明図である。 100・・・シ嘗−トアーク型水銀灯 101・・・集光fi 102・・・第1の平面鏡10
3・・・インチグレーター 104・・・第2の平面鏡
105・・・コンデンサレンズ 106・・・縮小レン
ズ107・・・フィルター 200・・・基台300・
・・フォトマスク 400・・・半導体ウニハート・・
石英ガラス製封体 5・・・陽 極51・・・先端部 
6・・・陰 極 61・・・先端部 7・・・陽 極 71・・・胴 部 72・・・先端面 73・・・先端部 〆に―、。
FIG. 1 is an explanatory diagram schematically showing an example of an exposure apparatus;
Figure 2 is an explanatory diagram showing an example of a sheet-arc type mercury lamp used in a micro exposure device. Figure 3 is the brightness distribution of the arc that occurs when the sheet-arc type mercury lamp shown in Figure 2 is turned on. (10) FIG. 4 is an explanatory diagram showing an example of a sheet arc type mercury lamp that can be used in the exposure apparatus of the present invention.
6 and 6 are an explanatory front view and an explanatory side view, respectively, showing enlarged main parts of FIG. 4, and FIG. It is an explanatory diagram showing brightness distribution. 100...Shot arc type mercury lamp 101...Focusing fi 102...First plane mirror 10
3... Inch grater 104... Second plane mirror 105... Condenser lens 106... Reducing lens 107... Filter 200... Base 300.
...Photomask 400...Semiconductor sea urchin heart...
Quartz glass enclosure 5... Anode 51... Tip part
6... Cathode 61... Tip 7... Anode 71... Body 72... Tip surface 73... At the end of the tip.

Claims (1)

【特許請求の範囲】[Claims] 1)陰極の先端部をコーン状に形成しかつ′m極の先端
部を平坦な先端面を有するデーパ状Vト、形成して成9
点灯時アーク輝点が陰極の先端のみに形成されるシ1−
トアーク型水銀灯を露光用光源として組み込んだことを
%微とする鮨光装獣。
1) The tip of the cathode is formed into a cone shape, and the tip of the pole is formed into a tapered V shape with a flat tip surface.
A screen in which an arc bright spot is formed only at the tip of the cathode during lighting
Sushi Hikari Soju is unique in that it incorporates a mercury vapor lamp as a light source for exposure.
JP58165864A 1983-09-10 1983-09-10 Exposure device Pending JPS6057930A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP58165864A JPS6057930A (en) 1983-09-10 1983-09-10 Exposure device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58165864A JPS6057930A (en) 1983-09-10 1983-09-10 Exposure device

Publications (1)

Publication Number Publication Date
JPS6057930A true JPS6057930A (en) 1985-04-03

Family

ID=15820432

Family Applications (1)

Application Number Title Priority Date Filing Date
JP58165864A Pending JPS6057930A (en) 1983-09-10 1983-09-10 Exposure device

Country Status (1)

Country Link
JP (1) JPS6057930A (en)

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS49119481A (en) * 1973-03-16 1974-11-14
JPS57185663A (en) * 1982-04-23 1982-11-15 Ushio Inc Lighting of mercury rare-gas electric-discharge lamp

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS49119481A (en) * 1973-03-16 1974-11-14
JPS57185663A (en) * 1982-04-23 1982-11-15 Ushio Inc Lighting of mercury rare-gas electric-discharge lamp

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