JPS6055969B2 - Voltage nonlinear resistor and its manufacturing method - Google Patents

Voltage nonlinear resistor and its manufacturing method

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Publication number
JPS6055969B2
JPS6055969B2 JP55114803A JP11480380A JPS6055969B2 JP S6055969 B2 JPS6055969 B2 JP S6055969B2 JP 55114803 A JP55114803 A JP 55114803A JP 11480380 A JP11480380 A JP 11480380A JP S6055969 B2 JPS6055969 B2 JP S6055969B2
Authority
JP
Japan
Prior art keywords
sintered body
oxide film
tin
indium
film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP55114803A
Other languages
Japanese (ja)
Other versions
JPS5739503A (en
Inventor
武夫 山崎
研 高橋
忠彦 三吉
邦裕 前田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP55114803A priority Critical patent/JPS6055969B2/en
Publication of JPS5739503A publication Critical patent/JPS5739503A/en
Publication of JPS6055969B2 publication Critical patent/JPS6055969B2/en
Expired legal-status Critical Current

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Description

【発明の詳細な説明】 本発明はアレスタ、サージアブソーバなどに使用でき
る酸化亜鉛を主成分とする焼結体からなる電圧非直線抵
抗体およびその製法に関する。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a voltage nonlinear resistor made of a sintered body mainly composed of zinc oxide, which can be used for arresters, surge absorbers, etc., and a method for manufacturing the same.

従来の電圧非直線抵抗体は、第1図に示すように酸化
亜鉛を主成分とする焼結体1の上下端面に電極2が形成
された構造となつている。 このような酸化亜鉛系の電
圧非直線抵抗体は、一般に良く知られているセラミック
焼結技術で製造される。
As shown in FIG. 1, a conventional voltage nonlinear resistor has a structure in which electrodes 2 are formed on the upper and lower end surfaces of a sintered body 1 whose main component is zinc oxide. Such a zinc oxide-based voltage nonlinear resistor is manufactured using a generally well-known ceramic sintering technique.

その概要は酸化亜鉛粉末に酸化ビスマス、酸化コバルト
、酸化クロム、酸化マンガン、酸化ニッケルなどを加え
十分に混合した後、水及びポリビニールアルコールなど
の適当なバインダを加えて造粒して成形する。焼成は電
気炉を用いて900〜1400℃の温度で行われる。成
形体には浴面放電防止の目的で、その側面にBi2O3
−Si)、Os−SiO。系ペーストなどを塗布して焼
成してもよい。焼成した焼結体は電極を形成する両端面
が所定の厚さに研摩調整され、溶射または焼付け法に″
よつて電極が形成される。なお、このようにして得た電
圧非直線抵抗体を高圧送電用避雷器に用いる場合には、
さらに滑面放電防止をする必要があり、その側面にガラ
ス膜を形成することがある。このような方法で得られた
電圧非直線抵抗体はシリコンカーバイドから成る電圧非
直線抵抗体などに比べて働圧一電流特性の非直線性がす
ぐれているが、長時間の定電圧課電によつて特性の劣化
が起り、もれ電流が徐々に増加してついには熱暴走する
という問題があつた。たとえば1200kV送電用避雷
器用の電圧非直線抵抗体素子としては使用周囲温度40
℃、印加電圧は初期電流1mAを与える電圧の80%と
いう条件下で100年以上の寿命を要求される。電圧非
直線抵抗体の劣化原因としては、1電圧非直線抵抗体を
N2を雰囲気中て熱処理すると定電圧課電の場合と同様
に特性劣化すること、2特性劣化した素子を大気中及び
酸素雰囲気中で熱処理する特性がもとに戻ること、など
から、焼結体中の結晶粒界層中の酸素または結晶粒子表
面の吸着酸素か定電圧課電時に脱離して外界に逃れ、こ
の結果粒界層の静電ポテンシャルが低下して、もれ電流
が増加するものてあると考えられる。一方、これに対し
て酸化亜鉛系電圧非直線抵抗体の定電圧課電に対する安
定性を増す方法としては、1焼結体表面からBl2O3
を拡散する方法、2焼結体の焼成温度または焼成後の熱
処理温度を制御して、焼結体中に含まれるBl2O3相
中のγ−Bl2O3相の割合を多くする方法、3酸化ホ
ウ素または酸化ホイ素を含むガラスを添加した焼結体を
用いる方法などが提案されている。
The outline is that bismuth oxide, cobalt oxide, chromium oxide, manganese oxide, nickel oxide, etc. are added to zinc oxide powder, mixed thoroughly, water and a suitable binder such as polyvinyl alcohol are added, and the powder is granulated and molded. Firing is performed at a temperature of 900 to 1400°C using an electric furnace. Bi2O3 is added to the side of the molded body for the purpose of preventing bath surface discharge.
-Si), Os-SiO. Alternatively, a paste or the like may be applied and fired. Both end faces of the fired sintered body, which form electrodes, are polished to a predetermined thickness and then subjected to thermal spraying or baking.
An electrode is thus formed. In addition, when using the voltage nonlinear resistor obtained in this way in a lightning arrester for high voltage power transmission,
Furthermore, it is necessary to prevent smooth surface discharge, and a glass film may be formed on the side surface. The voltage nonlinear resistor obtained by this method has superior nonlinearity in working pressure-current characteristics compared to voltage nonlinear resistors made of silicon carbide, but it is difficult to apply a constant voltage for a long time. As a result, there was a problem that the characteristics deteriorated, the leakage current gradually increased, and eventually thermal runaway occurred. For example, as a voltage non-linear resistor element for a 1200 kV power transmission lightning arrester, the operating ambient temperature is 40
℃, and the applied voltage is 80% of the voltage that gives an initial current of 1 mA, and a life of more than 100 years is required. The causes of deterioration of voltage nonlinear resistors are: (1) When a voltage nonlinear resistor is heat treated in an N2 atmosphere, its characteristics deteriorate in the same way as when constant voltage is applied, and (2) When an element with deteriorated characteristics is exposed to air or an oxygen atmosphere, its characteristics deteriorate. Due to the fact that the characteristics of the heat treatment inside the sintered body return to their original state, oxygen in the grain boundary layer in the sintered body or adsorbed oxygen on the surface of the crystal grains is desorbed and escapes to the outside world when a constant voltage is applied, resulting in grain formation. It is thought that the electrostatic potential of the interface layer decreases and the leakage current increases. On the other hand, as a method to increase the stability of a zinc oxide-based voltage nonlinear resistor against constant voltage charging, Bl2O3
2. A method of increasing the proportion of γ-Bl2O3 phase in the Bl2O3 phase contained in the sintered body by controlling the firing temperature of the sintered body or the heat treatment temperature after firing, boron trioxide or oxidation A method using a sintered body to which glass containing boron is added has been proposed.

しかし、これらの方法でも、長時間の定電圧課電に対し
ては、いま一歩であつた。本発明の目的は、上述した長
時間課電に対して特に安定な電圧非直線抵抗体およびそ
の製法を提供するにある。
However, even these methods are still a step away from applying constant voltage over a long period of time. An object of the present invention is to provide a voltage nonlinear resistor that is particularly stable against long-term energization as described above, and a method for manufacturing the same.

本発明は、酸化亜鉛を主成分とする焼結体に電極を付け
て成る電圧非直線抵抗体において、上記電極と接触した
上記焼結体表面に導電性の酸化インジウム膜または酸化
スズ膜を形成することを特徴としている。該膜は気密な
膜を形成し、焼結体中の酸化亜鉛結晶粒子表面の吸着酸
素や結晶粒界層中の酸素が定電圧課電時に脱離して外界
に逃れるのを防ぎ、長時間課電に対して特性を安定化さ
せるものと思われる。なお、該膜にはさらに導電性を良
くするために、酸化アンチモン、酸化タンタルなどの添
加物を加えても良い。上記導電性膜の形成方法としては
スパッタリング法やCVD法なども使用できるが、イン
ジウム塩やスズ塩の溶液を焼結体表面に塗布後熱処理す
る方法が最も望ましい。
The present invention provides a voltage non-linear resistor in which electrodes are attached to a sintered body mainly composed of zinc oxide, in which a conductive indium oxide film or tin oxide film is formed on the surface of the sintered body in contact with the electrode. It is characterized by This film forms an airtight film and prevents oxygen adsorbed on the surface of zinc oxide crystal particles in the sintered body and oxygen in the grain boundary layer from desorbing and escaping to the outside world when a constant voltage is applied. It is thought that this stabilizes the characteristics against electricity. Note that additives such as antimony oxide and tantalum oxide may be added to the film in order to further improve the conductivity. Although a sputtering method or a CVD method can be used as a method for forming the conductive film, it is most preferable to apply a solution of indium salt or tin salt to the surface of the sintered body, followed by heat treatment.

この方法によれば上記溶液の一部が粒界に拡散して粒界
にも酸化インジウムや酸化スズ層が形成されるため、粒
界からの酸素の脱離が特に起こりにくくなる利点がある
。第2図に、本発明の電圧非直線抵抗体の構造を・示す
。酸化亜鉛を主成分とする焼結体は、具体的には酸化亜
鉛に0.01〜10モル%の酸化ビスマス及び酸化マン
ガンを加え、さらに望ましくはそれぞれ0.01〜10
モル%の酸化コバルト、酸化アンチモン、酸化クロム、
酸化ホウ素、酸化珪素及び酸化ニッケルなどを添加して
900〜1400℃で焼成した焼結体1の両端面に、前
記導電性膜3を設け、その上に電極2が設けられている
。本発明において、焼結体1と電極2の間に形成される
導電性膜は、上述の効果を有する上に次のような特性を
持つことが重要である。
According to this method, a portion of the solution is diffused into the grain boundaries and an indium oxide or tin oxide layer is formed also at the grain boundaries, so there is an advantage that desorption of oxygen from the grain boundaries becomes particularly difficult. FIG. 2 shows the structure of the voltage nonlinear resistor of the present invention. Specifically, the sintered body containing zinc oxide as a main component is produced by adding 0.01 to 10 mol% of bismuth oxide and manganese oxide to zinc oxide, and preferably 0.01 to 10 mol% of each.
Mol% cobalt oxide, antimony oxide, chromium oxide,
The conductive film 3 is provided on both end faces of the sintered body 1 which is made by adding boron oxide, silicon oxide, nickel oxide, etc. and firing at 900 to 1400°C, and the electrode 2 is provided thereon. In the present invention, it is important that the conductive film formed between the sintered body 1 and the electrode 2 has the following characteristics in addition to having the above-mentioned effects.

第1に焼結体と電極の間で通電による発熱が問題となら
ないために、抵抗率が十分に低いことが望ましい。焼結
体の酸化亜鉛粒子の抵抗率は1〜10Ω・Cmてあるた
め、導電性膜の抵抗率は1Ω・Cm以下が良い。第2に
焼結体を熱処理した場合、第3図に見られるように52
0゜Cより高温て1000℃より低温の熱処理温度範囲
ては抵抗体の非直線係数が低下する。この原因は、この
温度で焼結体中の酸化ビスマスが相変化するためと考え
られる。また導電性膜の焼付け温度が1000℃以上に
なると導電性膜と焼結体が反応して、非直線抵抗体の特
性を損う。従つて導電性膜は520℃以下で焼結体に焼
付け、かつ焼付けられた導電性膜が充分な耐湿性を持つ
ことが必要である。第3に焼結体と導電性膜の密着性を
良くし、かつ気密を良くして長時間の定電圧課電に対し
て安定なものにするためには、導電性膜の厚さを1μm
以上にする必要がある。また、焼結体と導電性膜の熱膨
張係数も近いことが望ましい。本発明における前記導電
性膜は上記特性を満足する。
First, it is desirable that the resistivity be sufficiently low so that heat generation due to current passing between the sintered body and the electrodes will not be a problem. Since the resistivity of the zinc oxide particles of the sintered body is 1 to 10 Ω·Cm, the resistivity of the conductive film is preferably 1 Ω·Cm or less. Second, when the sintered body is heat-treated, 52
In the heat treatment temperature range of higher than 0°C and lower than 1000°C, the nonlinear coefficient of the resistor decreases. The reason for this is thought to be that bismuth oxide in the sintered body undergoes a phase change at this temperature. Furthermore, if the baking temperature of the conductive film exceeds 1000° C., the conductive film and the sintered body will react, impairing the characteristics of the nonlinear resistor. Therefore, it is necessary that the conductive film is baked into a sintered body at a temperature of 520° C. or lower, and that the baked conductive film has sufficient moisture resistance. Thirdly, in order to improve the adhesion between the sintered body and the conductive film, as well as to improve the airtightness and make it stable against long-term constant voltage application, the thickness of the conductive film must be 1 μm.
It is necessary to do more than that. Further, it is desirable that the thermal expansion coefficients of the sintered body and the conductive film are similar to each other. The conductive film in the present invention satisfies the above characteristics.

導電性膜の形成された電圧非直線抵抗体は次のようにし
て製造することが望ましい。前記した酸化亜鉛を主成分
とする焼結体の両端面を所定の厚さに研摩し、その面に
硝酸インジウムをアセチルアセトンまたは金属スズをア
セチルアセトン及び硝酸に溶解した溶液を塗布し、35
0〜520℃の温度で焼付けた後に、形成された該膜面
上に電極を形成する。
It is desirable to manufacture the voltage nonlinear resistor on which the conductive film is formed as follows. Both end faces of the sintered body containing zinc oxide as the main component were polished to a predetermined thickness, and a solution of indium nitrate dissolved in acetylacetone or metal tin dissolved in acetylacetone and nitric acid was applied to the face.
After baking at a temperature of 0 to 520°C, electrodes are formed on the formed film surface.

この時、該導電性膜の焼付け温度が520℃以下の場合
は抵抗体の非直線係数が抵抗体本来の値より低下しない
At this time, if the baking temperature of the conductive film is 520° C. or lower, the nonlinear coefficient of the resistor does not decrease from the original value of the resistor.

また350℃より低温で焼付けた酸化インジウム及び酸
化スズ膜は、耐熱性が悪く使用上望ましくない。さらに
導電性膜は1μmより薄い時には上述の効果がなく、3
0pmより厚い場合は焼結体との熱膨張係数の違いが影
響して一様な膜の形成がむずかしくなる。以下実施例に
よつて本発明を説明する。
Furthermore, indium oxide and tin oxide films baked at temperatures lower than 350° C. have poor heat resistance and are undesirable for use. Furthermore, when the conductive film is thinner than 1 μm, it does not have the above effect;
If it is thicker than 0 pm, it will be difficult to form a uniform film due to the difference in thermal expansion coefficient from the sintered body. The present invention will be explained below with reference to Examples.

実施例1 酸化亜鉛(ZnO)2360V1酸化ビスマス(Bl2
O3)70g、酸化コバルト(CO2O3)25V1酸
化アンチモン(Sb2O3)87y1酸化マンガン(M
nO2)17y1酸化クロム(Cr2O3)23y及び
酸化珪素(SiO2)9Vをボールミルで15時間湿式
混合した。
Example 1 Zinc oxide (ZnO) 2360V1 Bismuth oxide (Bl2
O3) 70g, cobalt oxide (CO2O3) 25V1 antimony oxide (Sb2O3) 87y1 manganese oxide (M
nO2)17y1 Chromium oxide (Cr2O3) 23y and silicon oxide (SiO2) 9V were wet mixed in a ball mill for 15 hours.

混合粉を乾燥した後造粒し、直径20咽、厚さ5wrm
に形成した。成形体の側面にBi2O3一Sb2O3−
SiO2を含有するペーストを塗布した後、大気中12
50℃で2時間保持して焼成した。焼成時に上記ペース
トはZnOと反応して、側面にZn2slO4をZn7
sb2Ol2を主体とする高抵抗層を形成した。焼結体
は厚さ4wnになるように両端面を研摩した。別に金属
スズ(Sn)、アセチルアセトン(CH3COCH2C
OCH3)及び硝酸(I(NO3)を重量比で1:10
:4の割合で混合してスズを溶解しておき、これを所定
の厚さに研摩した焼結体の研摩面に酸化スズ膜の厚さが
2〜10μmになるようにディップ方式で塗布した。
After drying the mixed powder, it is granulated into granules with a diameter of 20 mm and a thickness of 5 wrm.
was formed. Bi2O3-Sb2O3- on the side surface of the molded body
After applying the paste containing SiO2, 12
It was held at 50° C. for 2 hours and fired. During firing, the above paste reacts with ZnO, forming Zn2slO4 and Zn7 on the sides.
A high resistance layer mainly composed of sb2Ol2 was formed. Both end faces of the sintered body were polished to a thickness of 4wn. Separately, metal tin (Sn), acetylacetone (CH3COCH2C
OCH3) and nitric acid (I(NO3) in a weight ratio of 1:10
: 4 to dissolve tin, which was then polished to a predetermined thickness and applied to the polished surface of the sintered body using a dip method so that the tin oxide film had a thickness of 2 to 10 μm. .

これを大気中450℃で2時間熱処理した。このときの
昇降温速度は200℃/hである。酸化スズ膜を被覆1
7た焼結体の酸化スズ膜形成面にA1溶射電極を形成し
た。この発明品と.従来品(酸化スズ膜を形成させてい
ないもの)について、定電圧加速課電試験を行い、これ
より1200kV避雷器用抵抗体としての予測寿命、及
び非直線係数の値を比較した。結果を第1表に示す。導
電性酸化スズ膜の形成により定電圧課電に対して特性が
安定化して寿命が伸び、抵抗体の非直線係数も若干向上
していることがわかる。実施例2 実施例1と同様にして両端面が研摩された厚さ37fn
の焼結体を得た。
This was heat treated at 450° C. for 2 hours in the air. The rate of temperature rise and fall at this time was 200°C/h. Coated with tin oxide film 1
An A1 sprayed electrode was formed on the tin oxide film forming surface of the sintered body. With this invention. A constant voltage accelerated charging test was conducted on a conventional product (one without a tin oxide film formed thereon), and the predicted life as a resistor for a 1200 kV lightning arrester and the value of the nonlinear coefficient were compared. The results are shown in Table 1. It can be seen that the formation of the conductive tin oxide film stabilizes the characteristics against constant voltage application, extends the life, and slightly improves the nonlinear coefficient of the resistor. Example 2 Thickness 37fn with both end faces polished in the same manner as Example 1
A sintered body was obtained.

別の硝酸インジウム〔In(NOJ)3−9H20〕を
アセチルアセトンに溶解した5鍾量%溶液を所定の厚さ
に研摩した焼結体の研摩面に酸化インジウム膜厚さが2
〜10μmになるようにディップ方式で塗布した。
A 5 weight percent solution of another indium nitrate [In(NOJ)3-9H20] dissolved in acetylacetone was polished to a predetermined thickness, and an indium oxide film was formed on the polished surface of the sintered body to a specified thickness.
It was coated using a dip method to a thickness of ~10 μm.

これを実施例1と同様に熱処理し、N溶射電極を形成し
た。これを酸化インジウム膜を形成しないものとを比較
した。その結果を第2表に示す。この結果より、導電性
酸化インジウム膜の形成により、寿命が向上すると共に
、非直線係数が若干増加することがわかる。
This was heat treated in the same manner as in Example 1 to form an N sprayed electrode. This was compared with one in which no indium oxide film was formed. The results are shown in Table 2. The results show that the formation of the conductive indium oxide film improves the lifetime and slightly increases the nonlinear coefficient.

実施例3 Zn02360y,.B1.0370y,.C0203
25y1Mn0217′、Sb2O385f..Cr2
O323f及びSlO2lOgを実施例1と同様に湿式
混合、乾燥、造粒し、直径20wr1n1厚さ5藺に成
形した後、成形体側面にSj2O3−Sb,O3−Si
O2を含有するペーストを塗布し、大気中1250℃で
2時間保持して焼成した。
Example 3 Zn02360y,. B1.0370y,. C0203
25y1Mn0217', Sb2O385f. .. Cr2
O323f and SlO2lOg were wet mixed, dried, and granulated in the same manner as in Example 1, and formed into a diameter of 20wr1n1 and a thickness of 5cm.
A paste containing O2 was applied and fired at 1250° C. for 2 hours in the air.

焼結体を厚さ4Tn!nに研摩した後、両端面に実施例
1と同様にして得たスズとアンチモン(3重量%)溶解
液を厚さ15〜20μmになるように塗布し、大気中て
250′C,3OO℃,350℃,450℃,520℃
及ひ600′Cの6点の温度で保持時間30分間熱処理
した。このときの昇降温速度は100′C/hである。
このようにして得たそれぞれの酸化スズ膜の耐湿性及び
抵抗率を調べ、さらに酸化スズ膜形成面にAl電極を溶
射して得た抵抗体の定電圧加速課電試験を行い、その寿
命及び非直線係数を比較した。結果を第3表に示す。な
お酸化スズ膜の耐湿性は、煮沸水に3紛間浸漬後、酸化
スズ膜が変色あるいは脱離するかどうかでチェックした
。第3表によれば、250℃及び300℃の温度で焼付
けた酸化スズ膜は煮沸水に浸漬後脱離や変色を起こし、
かつ抵抗率も1ΩGより大きい。また600℃の温度で
スズ膜を焼付けた抵抗体は、非直線係数が大幅に低下す
る。従つて焼結体に酸化スズ膜を形成する焼付け温度は
、350〜520℃の範囲が良い。実施例4 Zn02360y,.B120370y..C0203
25y,.Mn017y..Sb,0385y..Cr
20323y及びSiO2lOyをボールミルで1時間
混合した。
The thickness of the sintered body is 4Tn! After polishing to n, a solution of tin and antimony (3% by weight) obtained in the same manner as in Example 1 was applied to both end faces to a thickness of 15 to 20 μm, and heated at 250'C and 300°C in the atmosphere. , 350℃, 450℃, 520℃
The sample was then heat treated at six temperatures of 600'C for a holding time of 30 minutes. The rate of temperature rise and fall at this time was 100'C/h.
The moisture resistance and resistivity of each of the tin oxide films obtained in this way were investigated, and a constant voltage accelerated electrification test was conducted on the resistor obtained by spraying an Al electrode on the surface on which the tin oxide film was formed. The nonlinear coefficients were compared. The results are shown in Table 3. The humidity resistance of the tin oxide film was checked by checking whether the tin oxide film changed color or came off after being immersed in boiling water. According to Table 3, tin oxide films baked at temperatures of 250°C and 300°C desorb and change color after being immersed in boiling water.
Moreover, the resistivity is also greater than 1ΩG. Furthermore, a resistor whose tin film is baked at a temperature of 600° C. has a significantly reduced nonlinear coefficient. Therefore, the baking temperature for forming the tin oxide film on the sintered body is preferably in the range of 350 to 520°C. Example 4 Zn02360y,. B120370y. .. C0203
25y,. Mn017y. .. Sb,0385y. .. Cr
20323y and SiO2lOy were mixed in a ball mill for 1 hour.

混合粉を乾燥造粒し、直径20Tn1厚さ6?に成形し
、大気中で1250℃、2時間保持して焼成した。焼成
した焼結体を厚さ4W!77!に研摩し、研摩した面に
実施例2のインジウム溶液を厚さ15〜20pmになる
ように塗布し、大気中で2505C,300℃,350
℃,4500C,520℃及び600℃の6点の温度で
保持時間30分間熱処理した。このときの昇降温速度は
100℃/hである。このようにして得た酸化インジウ
ム膜の耐湿性及び抵抗率を調べ、かつ酸化インジウム膜
面にN電極を溶射して定電圧加速課電試験を行なつた。
測定方法等は実施例3と同様である。結果を第4表に示
す。第4表によれば250℃及び300℃の温度で熱処
理した酸化インジウム膜は煮沸水に浸漬後脱離や変色が
起り、かつ抵抗率も1Ω・dより大きい。
Dry and granulate the mixed powder, diameter 20Tn1 thickness 6? It was molded into a mold and fired at 1250° C. for 2 hours in the air. The fired sintered body is 4W thick! 77! The indium solution of Example 2 was applied to the polished surface to a thickness of 15 to 20 pm, and heated at 2505C, 300℃, 350℃ in the atmosphere.
Heat treatment was performed at six temperatures: 4500°C, 520°C, and 600°C for a holding time of 30 minutes. The rate of temperature rise and fall at this time was 100°C/h. The moisture resistance and resistivity of the indium oxide film thus obtained were investigated, and an N electrode was thermally sprayed on the surface of the indium oxide film to perform a constant voltage accelerated charging test.
The measurement method and the like are the same as in Example 3. The results are shown in Table 4. According to Table 4, indium oxide films heat-treated at temperatures of 250°C and 300°C undergo desorption and discoloration after being immersed in boiling water, and their resistivity is also greater than 1Ω·d.

また、600℃で酸化インジウム膜を形成した非直線抵
抗体は非直線係数が大幅に低下する。したがつて、焼結
体に酸化インジウム膜を形成する焼付け温度は350〜
520℃の範囲が良い。実施例5 Zn02340f..B1203140y..C020
325y1Mn0217q..Sb20388y..N
1023y,.Cr2035q及びSiO25qを実施
例1と同様に湿式混合し、乾燥、造粒した。
Furthermore, the nonlinear coefficient of the nonlinear resistor formed with the indium oxide film at 600° C. is significantly reduced. Therefore, the baking temperature for forming an indium oxide film on the sintered body is 350~
A range of 520°C is preferable. Example 5 Zn02340f. .. B1203140y. .. C020
325y1Mn0217q. .. Sb20388y. .. N
1023y,. Cr2035q and SiO25q were wet mixed in the same manner as in Example 1, dried, and granulated.

これを直径20T1r!n、厚さ5=に成形し、成形体
側面にBl2O3−Sb2O3−SlO2を含有するペ
ーストを塗布した後、大気中1270′Cで2時間保持
して焼成した。焼結体を厚さ4醋に研摩した後、両端面
に実施例1のスズ溶解液を筆塗りで酸化スズ膜の膜厚が
0.5μM,lμM,lOμM,2OμM,3Oμm及
び40μmになるように塗布した後、500℃大気中で
30分間保持で焼付けた。焼付け後の酸化スズ膜に亀裂
が発生しているかどうかを調べ、亀裂のないものはN溶
射電極を形成して、得られた電圧非直線抵抗体の定電圧
加速課電試験を行つた。結果を第5表に示す。第5表に
見られるように、導電性酸化スズ膜を40pmと厚くす
ると、亀裂が発生することがわかる。
This has a diameter of 20T1r! After applying a paste containing Bl2O3-Sb2O3-SlO2 to the side surface of the molded product, it was held at 1270'C in the air for 2 hours and fired. After polishing the sintered body to a thickness of 4 mm, the tin solution of Example 1 was applied to both end faces with a brush so that the thickness of the tin oxide film was 0.5 μM, 1 μM, 10 μM, 20 μM, 30 μm, and 40 μm. After coating, it was baked at 500° C. in the atmosphere for 30 minutes. It was examined whether cracks had occurred in the tin oxide film after baking, and N sprayed electrodes were formed on those without cracks, and a constant voltage accelerated electrification test was performed on the obtained voltage nonlinear resistor. The results are shown in Table 5. As seen in Table 5, it can be seen that cracks occur when the conductive tin oxide film is made as thick as 40 pm.

これは焼結体と酸化スズ膜の熱膨張係数の違いによる影
響と考えられる。また導電性酸化スズ膜の厚さが0.5
μmと薄い場合には、定電圧加速課電試験結果が酸化ス
ズ膜を形成しないものと変らないことがわかる。これは
酸化スズ膜が薄いためにピンホールを生成し、定電圧課
電時に酸化亜鉛結晶粒子の吸着酸素や結晶粒界層中の酸
素が脱離して外界に逃げるのを防ぐ効果がないためと考
えられる。従つて焼結体に形成する導電性酸化スズ膜の
厚さは1〜30μmの範囲がよいことがわかる。実施例
6 実施例5と同じ組成の混合粉を造粒し、直径20醜、厚
さ6?に成形した。
This is thought to be due to the difference in thermal expansion coefficient between the sintered body and the tin oxide film. Also, the thickness of the conductive tin oxide film is 0.5
It can be seen that when the film is as thin as μm, the constant voltage accelerated charging test results are the same as when no tin oxide film is formed. This is because the tin oxide film is thin and produces pinholes, and is not effective in preventing oxygen adsorbed by zinc oxide crystal particles and oxygen in the grain boundary layer from desorbing and escaping to the outside world when a constant voltage is applied. Conceivable. Therefore, it can be seen that the thickness of the conductive tin oxide film formed on the sintered body is preferably in the range of 1 to 30 μm. Example 6 A mixed powder having the same composition as in Example 5 was granulated, and the diameter was 20 mm and the thickness was 6 mm. It was molded into.

成形体はSiO2−Bi2O3−Sb2O3を含有する
ペーストを塗布した後、1270℃て2時間保持して焼
成した。焼成した焼結体は厚さ4mに研摩し、研摩した
面に実施例2のインジウム溶液を筆塗りで酸化インジウ
ムの膜厚が0.5μM,lμM,lOμM,2OμM,
3Oμm及び45μmになるように塗布した後500℃
で3紛間大気中で焼付けた。そして、焼付け後の酸化イ
ンジウム膜に亀裂が発生したかどうかを調べ、亀裂のな
いものはAI溶射電極を形成し、得られた電圧非直線抵
抗体の定電圧加速課電試験を行なつた。その結果を第6
表に示す。第6表に見られるように、酸化インジウム膜
を45μmと厚くすると亀裂が発生することがわかる。
After coating the molded body with a paste containing SiO2-Bi2O3-Sb2O3, it was held at 1270 DEG C. for 2 hours and fired. The fired sintered body was polished to a thickness of 4 m, and the indium solution of Example 2 was applied with a brush to the polished surface to give an indium oxide film thickness of 0.5 μM, 1 μM, 10 μM, 20 μM,
500℃ after coating to 30μm and 45μm
It was baked in a 3-minute atmosphere. The indium oxide film after baking was examined to see if any cracks had occurred, and those without cracks were formed into AI sprayed electrodes, and the obtained voltage nonlinear resistor was subjected to a constant voltage accelerated charging test. The result is the 6th
Shown in the table. As shown in Table 6, it can be seen that cracks occur when the indium oxide film is made as thick as 45 μm.

また酸化インジウム膜を0.5μmと薄く形成すると定
電圧加速課電試験結果が酸化インジウム膜を形成しない
ものと変らないことがわかる。実施例5実施例1と同様
にして得られた酸化亜鉛系焼結体の両主面上にスパッタ
リング法により酸化スズ膜を形成し、さらにその上にA
l電極を形成した。
Furthermore, it can be seen that when the indium oxide film is formed as thin as 0.5 μm, the constant voltage accelerated charging test results are the same as when no indium oxide film is formed. Example 5 Tin oxide films were formed by sputtering on both main surfaces of a zinc oxide-based sintered body obtained in the same manner as in Example 1, and then A
1 electrode was formed.

この場合にも酸化スズ膜の膜厚が1μm以上で定電圧課
電寿命が向上することがわかつた。
In this case as well, it was found that when the thickness of the tin oxide film was 1 μm or more, the constant voltage application life was improved.

実施例8実施例2と同様にして得られた酸化亜鉛系焼結
体の両主面上にスパッタリング法により酸化インジウム
膜を形成し、さらにその上にN電極を形成した。
Example 8 An indium oxide film was formed by sputtering on both main surfaces of a zinc oxide-based sintered body obtained in the same manner as in Example 2, and an N electrode was further formed thereon.

この場合にも酸化インジウム膜の厚さが1μm以上で定
電圧課電寿命が向上することがわかつた。
In this case as well, it was found that when the thickness of the indium oxide film was 1 μm or more, the constant voltage application life was improved.

以上の例から明らかなように、本発明によれば、非直線
性を損うことなく、長時間課電寿命の長い電圧非直線抵
抗体が得られる。
As is clear from the above examples, according to the present invention, a voltage nonlinear resistor can be obtained that has a long energized lifetime without impairing nonlinearity.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は従来の電圧非直線抵抗体の構造、第2図は本発
明の電圧非直線抵抗体の構造、第3図は酸化亜鉛を主成
分とした焼結体の熱処理温度と非−線係数との関係を示
す図である。 1・・・・・・焼結体、2・・・・・・電極、3・・・
・・・導電性膜。
Figure 1 shows the structure of a conventional voltage non-linear resistor, Figure 2 shows the structure of the voltage non-linear resistor of the present invention, and Figure 3 shows the heat treatment temperature and non-linear resistance of a sintered body mainly composed of zinc oxide. It is a figure showing the relationship with a coefficient. 1... Sintered body, 2... Electrode, 3...
...Conductive film.

Claims (1)

【特許請求の範囲】 1 酸化亜鉛を主成分とする焼結体の上下端面に電極が
形成された電圧非直線抵抗体において、上記電極と焼結
体表面の間に導電性の酸化インジウム膜または酸化スズ
膜が介在されていることを特徴とする電圧非直線抵抗体
。 2 特許請求の範囲第1項において上記導電性の酸化イ
ンジウム膜または酸化スズ膜の厚さが1〜30μmの範
囲にあることを特徴とする電圧非直線抵抗体。 3 酸化亜鉛を主成分とする焼結体の表面にインジウム
塩またはスズ塩を含む溶液を塗布する工程、350〜5
20℃の温度範囲で熱処理して、該溶液を分解し導電性
の酸化インジウムまたは酸化スズ膜を形成する工程、該
導電性膜上に電極を形成する工程より成ることを特徴と
する電圧非直線抵抗体の製法。 4 特許請求の範囲第3項において、インジウム塩また
はスズ塩を含む溶液として硝酸インジウムをアセチルア
セトンに溶解またはスズを硝酸とアセチルアセトンに溶
解した液を用いることを特徴とする電圧非直線抵抗体の
製法。
[Claims] 1. A voltage nonlinear resistor in which electrodes are formed on the upper and lower end surfaces of a sintered body mainly composed of zinc oxide, in which a conductive indium oxide film or A voltage nonlinear resistor characterized by having a tin oxide film interposed therein. 2. The voltage nonlinear resistor according to claim 1, wherein the conductive indium oxide film or tin oxide film has a thickness in the range of 1 to 30 μm. 3. Applying a solution containing an indium salt or a tin salt to the surface of a sintered body containing zinc oxide as a main component, 350-5
A voltage non-linear method characterized by comprising the steps of heat treatment in a temperature range of 20°C to decompose the solution to form a conductive indium oxide or tin oxide film, and a step of forming an electrode on the conductive film. Manufacturing method of resistor. 4. A method for producing a voltage nonlinear resistor according to claim 3, characterized in that the solution containing an indium salt or tin salt is a solution in which indium nitrate is dissolved in acetylacetone or tin is dissolved in nitric acid and acetylacetone.
JP55114803A 1980-08-22 1980-08-22 Voltage nonlinear resistor and its manufacturing method Expired JPS6055969B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP55114803A JPS6055969B2 (en) 1980-08-22 1980-08-22 Voltage nonlinear resistor and its manufacturing method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP55114803A JPS6055969B2 (en) 1980-08-22 1980-08-22 Voltage nonlinear resistor and its manufacturing method

Publications (2)

Publication Number Publication Date
JPS5739503A JPS5739503A (en) 1982-03-04
JPS6055969B2 true JPS6055969B2 (en) 1985-12-07

Family

ID=14647074

Family Applications (1)

Application Number Title Priority Date Filing Date
JP55114803A Expired JPS6055969B2 (en) 1980-08-22 1980-08-22 Voltage nonlinear resistor and its manufacturing method

Country Status (1)

Country Link
JP (1) JPS6055969B2 (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5745203A (en) * 1980-08-29 1982-03-15 Mitsubishi Mining & Cement Co Varistor

Also Published As

Publication number Publication date
JPS5739503A (en) 1982-03-04

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