JPS6054400B2 - plating device - Google Patents

plating device

Info

Publication number
JPS6054400B2
JPS6054400B2 JP23368982A JP23368982A JPS6054400B2 JP S6054400 B2 JPS6054400 B2 JP S6054400B2 JP 23368982 A JP23368982 A JP 23368982A JP 23368982 A JP23368982 A JP 23368982A JP S6054400 B2 JPS6054400 B2 JP S6054400B2
Authority
JP
Japan
Prior art keywords
plating
plated
rack
arm
potential
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP23368982A
Other languages
Japanese (ja)
Other versions
JPS59118899A (en
Inventor
嘉夫 石川
博充 須沢
静男 高野
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kurosawa Tele Communications Ltd
Original Assignee
Kurosawa Tele Communications Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kurosawa Tele Communications Ltd filed Critical Kurosawa Tele Communications Ltd
Priority to JP23368982A priority Critical patent/JPS6054400B2/en
Publication of JPS59118899A publication Critical patent/JPS59118899A/en
Publication of JPS6054400B2 publication Critical patent/JPS6054400B2/en
Expired legal-status Critical Current

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  • Electroplating Methods And Accessories (AREA)

Description

【発明の詳細な説明】 (a)発明の分野 本発明は自勤めつき装置に関し、特にめつきする際被め
つき物に通電するための手法に関するものである。
DETAILED DESCRIPTION OF THE INVENTION (a) Field of the Invention The present invention relates to a self-service plating device, and more particularly to a method for energizing an object to be plated during plating.

(b)技術の背景 被めつき物、例えば、プリンタの活字等の表面へのめつ
き処理を自動化して、量産を図る事が行われている。
(b) Background of the technology The process of plating the surface of a plated object, such as printer type, is automated to achieve mass production.

(c)従来技術 第1図は、従来の自勤めつき処理の原理図である。(c) Conventional technology FIG. 1 is a diagram showing the principle of conventional self-loading processing.

図中、1は昇降腕、2はラック、3は被めつき物、4は
受け台、5は陽極、6はめつき浴、7はめつき液である
In the figure, 1 is a lifting arm, 2 is a rack, 3 is a plating object, 4 is a pedestal, 5 is an anode, 6 is a plating bath, and 7 is a plating liquid.

被めつき物3には、ラック2に被めつき物を懸吊させる
べく、腕3’が設けられる。
The object 3 is provided with an arm 3' for suspending the object from the rack 2.

またラック2及び腕3’、受け台4は導電性部材で構成
されて成る。動作を説明する。昇降腕1は、めつき処理
を行わない間は破線で示す位置に配置され、めつき処理
時には実線位置に移動し、更に、ラック2が、受台4に
保持される迄下降する。被めつき物3は昇降腕1が破線
位置にある時、ラック2と共に、昇降腕1の支持部1’
に自動又は手動でセットされる。昇降腕1が下降すると
、被めつき物3はめつき浴6のめつき液7に浸漬される
。受台4及び陽極5には図示されない電源からそれぞれ
が陰、陽両極性となる所定の電位が付与されている。こ
のため、昇降腕1が下降し、ラック2が受台4に接触し
た時点で、めつき処理が開始される事となる。
Further, the rack 2, arm 3', and pedestal 4 are made of conductive material. Explain the operation. The elevating arm 1 is placed at the position indicated by the broken line while plating is not being performed, and when plating is being performed, it moves to the position shown by the solid line and is further lowered until the rack 2 is held on the pedestal 4. When the lifting arm 1 is in the broken line position, the attached object 3 is attached to the support part 1' of the lifting arm 1 together with the rack 2.
automatically or manually. When the elevating arm 1 descends, the object 3 to be plated is immersed in the plating solution 7 of the plating bath 6. A predetermined potential is applied to the pedestal 4 and the anode 5 from a power source (not shown) so that each has negative and anode polarity. Therefore, the plating process is started when the elevating arm 1 descends and the rack 2 comes into contact with the pedestal 4.

その後、めつきをするに充分な時間が経過後、自動的に
昇降腕1が上昇し、めつき浴6のめつき液7から被めつ
き物3が取出され、めつき処理の工程が終了する。以上
の様な、従来のめつき装置であると、ラック2と、受け
台4とが接触する以前に、被めつき物3がめつき液7に
浸漬されることなるので、めつき液7により被めつき物
3が腐蝕されたり、不動態化されるという欠点がある。
Then, after sufficient time has passed for plating, the lifting arm 1 is automatically raised and the object 3 to be plated is taken out from the plating liquid 7 in the plating bath 6, completing the plating process. do. In the conventional plating apparatus as described above, the object 3 to be plated is immersed in the plating liquid 7 before the rack 2 and the pedestal 4 come into contact with each other. There is a disadvantage that the plated object 3 is corroded or passivated.

(d)発明の目的 本発明の目的は以上の従来の欠点を取除くべく被めつき
物を腐蝕、不動態化させる事なく、めつきできるめつき
装置を提供するにある。
(d) Object of the Invention The object of the present invention is to provide a plating device that can plate without corroding or passivating the object to be plated, in order to eliminate the above-mentioned conventional drawbacks.

(e)発明の構成 上記目的を達成するために本発明においては、昇降腕に
も、ラックに対し通電し得る構成とし、少なくとも、被
めつき物がめつき液に触れる前には、被めつき物がめつ
きのための一方の極を持つようにしたものである。
(e) Structure of the Invention In order to achieve the above object, in the present invention, the elevating arm is also configured to be able to conduct electricity to the rack, and at least before the object to be plated comes into contact with the plating liquid, the It is designed so that objects have one pole for glazing.

(f)実施例 第2図は本発明の一実施例の原理説明図、第3図は要部
の斜視図である。
(f) Embodiment FIG. 2 is an explanatory diagram of the principle of an embodiment of the present invention, and FIG. 3 is a perspective view of the main parts.

図中、第1図に用いたものと同じものは同一番号を付し
て示す。
In the figure, the same parts as those used in FIG. 1 are designated by the same numbers.

また10は支持部であり、本実施例の場合、この支持部
1『が導電性の部材で作られている。
Further, reference numeral 10 denotes a support section, and in the case of this embodiment, this support section 1'' is made of an electrically conductive member.

第3図において、11,12,14,16はそれぞれ導
電性の導通棒、13,15は導電性ブラシ、17はアー
ム、18はねじ棒であり、図示されない回転駆動系例え
ばモータに連結されており、回動することにより、アー
ム17を昇降するためのもの、19はガイド棒である。
本発明において、導通棒16に陰極となる電位が常時、
又は図示されないスイッチを作動した際印加される。
In FIG. 3, 11, 12, 14 and 16 are conductive rods, 13 and 15 are conductive brushes, 17 is an arm, and 18 is a threaded rod, which is connected to a rotational drive system (not shown), such as a motor. 19 is a guide rod for raising and lowering the arm 17 by rotation.
In the present invention, the potential of the conductive rod 16 as a cathode is always
Or it is applied when a switch not shown is activated.

また導通棒14はブラシ13が常時接触する位置に直立
して固定される。導通棒14は、図示されないフレーム
にねじ等により固定され、また導通棒14の先端に設け
られたブラシ15は、導通棒16に接触する。従つて、
支持部10は、導通棒16に電位が付与される事により
、ブラシ15、導通棒14、ブλど13、導通棒12、
導通棒11を介して常時電位を持つことになる。また陽
極5は常時通電された状態にある。動作を説明する。第
2図において、図示破線位置に昇降腕1が位置する時、
ラック2に、腕3″を介し、被めつき物3をセットした
ものを支持部10にセットする。
Further, the conductive rod 14 is fixed upright at a position where the brush 13 is always in contact. The conduction rod 14 is fixed to a frame (not shown) with screws or the like, and a brush 15 provided at the tip of the conduction rod 14 contacts the conduction rod 16. Therefore,
By applying a potential to the conductive rod 16, the support part 10 can be connected to the brush 15, the conductive rod 14, the brush λ etc. 13, the conductive rod 12,
A potential is always maintained through the conductive rod 11. Further, the anode 5 is always energized. Explain the operation. In FIG. 2, when the lifting arm 1 is located at the position shown by the broken line,
A mounted object 3 is set on a rack 2 via an arm 3'' and is set on a support part 10.

その後、前述したモータ等を前述したスイッチで起動す
ると、ねじ棒18が回転する。この時、これと同時に導
通棒に通電される。ねじ棒18には、アーム17一部に
設けられた雌ねじ部17″が係合しており、またガイド
棒19にはアーム17のガイド部1rが係合しているた
め、ねじ棒18が回動すると、アーム17が下降方向に
移動する。支持部10には前述の如く、めつき処理の陰
極となり得る電位が付加されているので、被めつき物3
は、陰極相当の電位となつている。アーム17の移動に
つれて、ブラシ13は、導通棒表面を摺動して、導通棒
16とラック2との電気的接続を保つ。被めつき物3が
、めつき液7に触れると、被めつき物3の接触部分は陰
極となり、即座にめつきが間始されることとなる。
Thereafter, when the aforementioned motor or the like is started using the aforementioned switch, the threaded rod 18 rotates. At this time, the conductive rod is energized at the same time. The threaded rod 18 is engaged with a female threaded portion 17'' provided on a part of the arm 17, and the guide rod 19 is engaged with the guide portion 1r of the arm 17, so that the threaded rod 18 cannot be rotated. When the arm 17 is moved, the arm 17 moves in the downward direction.As described above, since the support part 10 is applied with a potential that can serve as a cathode for plating processing, the object 3 to be plated
has a potential equivalent to that of the cathode. As the arm 17 moves, the brush 13 slides on the surface of the conducting rod to maintain electrical connection between the conducting rod 16 and the rack 2. When the object 3 to be plated comes into contact with the plating liquid 7, the contact portion of the object 3 to be plated becomes a cathode, and plating starts immediately.

以下従来と同様にして支持部10が下降を続け、受台4
にラック2を載置し、モータによるねじ棒18の回動が
停止する。受台4は、リード線4゛を介し導通棒16と
同電位にされている。従つて、ラック2が受台4に支持
部1『から受渡されても、被めつき物3は常時陰極とし
て保持。(e)発明の効果 以上、説明した様に本発明に依れば、少なく共、被めつ
き物がめつき液に触れる前に通電された状態にしたので
、被めつき物表面が腐蝕されたり、不動態化する等の欠
点を取除き得る。
Thereafter, the support part 10 continues to descend in the same manner as before, and the pedestal 4
The rack 2 is placed on the rack 2, and the rotation of the threaded rod 18 by the motor is stopped. The pedestal 4 is set at the same potential as the conductive rod 16 via a lead wire 4'. Therefore, even when the rack 2 is transferred from the support part 1' to the pedestal 4, the covered object 3 is always held as a cathode. (e) Effects of the Invention As explained above, according to the present invention, since the object to be plated is energized before it comes into contact with the plating liquid, the surface of the object to be plated is not corroded. , passivation etc. can eliminate the drawbacks.

尚、上記実施例においては、導通棒とブラシを用いて、
常時被めつき物に通電する構成とした”が、これに限ら
れるものではなく、要するに陰極と、昇降腕、ラック間
の導通が、少なくとも、めつき物がめつき液に触れる前
に、とれるように構成されれば良い。
In addition, in the above embodiment, using a conductive rod and a brush,
Although the configuration is such that electricity is always applied to the plated object, the present invention is not limited to this.In other words, the structure is such that conduction between the cathode, the lifting arm, and the rack is established at least before the plated object comes into contact with the plating solution. It is good if it is configured as follows.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は従来のめつき装置の原理図、第2図、第3図は
本発明の一実施例の原理図及び、要部斜視図である。 図中、1は昇降腕、2はラック、3は被めつき物、4は
受台、5は陽極、6ばめつき浴、7はめ”つき液である
FIG. 1 is a principle diagram of a conventional plating apparatus, and FIGS. 2 and 3 are a principle diagram and a perspective view of essential parts of an embodiment of the present invention. In the figure, 1 is a lifting arm, 2 is a rack, 3 is a fitting, 4 is a pedestal, 5 is an anode, 6 is a fitting bath, and 7 is a fitting liquid.

Claims (1)

【特許請求の範囲】[Claims] 1 メッキ時に一方の電極となる被メッキ物を装着する
導電材料で構成されたラックと、該ラックの両端を保持
し被メッキ物に電位を与えるとともにメッキ浴に対する
被メッキ物の位置を昇降させる昇降腕と、該昇降腕の下
側に設けられ、メッキ液と上記被メッキ物側と逆極性の
電位を与えられた電極を有するメッキ浴と、該メッキ浴
の上側に設けられ、上記ラックを保持して被メッキ物を
メッキ液中に保持するとともに該ラックにメッキ電位の
付与する受け台を備え、上記ラックが上記昇降腕に支え
られている状態で昇降腕が降下して被メッキ物がメッキ
液と接した時点から通電回路が形成されることを特徴と
するメッキ装置。
1. A rack made of a conductive material on which the object to be plated, which becomes one electrode during plating, is mounted, and an elevator that holds both ends of the rack, applies a potential to the object to be plated, and raises and lowers the position of the object to be plated relative to the plating bath. an arm, a plating bath provided under the elevating arm and having an electrode having a potential opposite to that of the plating solution and the object to be plated; and a plating bath provided above the plating bath to hold the rack. The rack is provided with a cradle that holds the object to be plated in the plating solution and applies a plating potential to the rack, and with the rack supported by the elevating arm, the elevating arm descends and the object to be plated is plated. A plating device characterized in that a current-carrying circuit is formed from the moment it comes into contact with a liquid.
JP23368982A 1982-12-27 1982-12-27 plating device Expired JPS6054400B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP23368982A JPS6054400B2 (en) 1982-12-27 1982-12-27 plating device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP23368982A JPS6054400B2 (en) 1982-12-27 1982-12-27 plating device

Publications (2)

Publication Number Publication Date
JPS59118899A JPS59118899A (en) 1984-07-09
JPS6054400B2 true JPS6054400B2 (en) 1985-11-29

Family

ID=16958993

Family Applications (1)

Application Number Title Priority Date Filing Date
JP23368982A Expired JPS6054400B2 (en) 1982-12-27 1982-12-27 plating device

Country Status (1)

Country Link
JP (1) JPS6054400B2 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2017180064A1 (en) 2016-04-14 2017-10-19 Pvp Labs Pte. Ltd. A drug for the effective control of acute and/or chronic pain and a method for its administration

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03277799A (en) * 1990-03-27 1991-12-09 Fujitsu Ltd Electroplating method

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2017180064A1 (en) 2016-04-14 2017-10-19 Pvp Labs Pte. Ltd. A drug for the effective control of acute and/or chronic pain and a method for its administration

Also Published As

Publication number Publication date
JPS59118899A (en) 1984-07-09

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