JPS6050619A - Magnetic disc and its production - Google Patents
Magnetic disc and its productionInfo
- Publication number
- JPS6050619A JPS6050619A JP58156313A JP15631383A JPS6050619A JP S6050619 A JPS6050619 A JP S6050619A JP 58156313 A JP58156313 A JP 58156313A JP 15631383 A JP15631383 A JP 15631383A JP S6050619 A JPS6050619 A JP S6050619A
- Authority
- JP
- Japan
- Prior art keywords
- radiation
- parts
- powder
- magnetic
- magnetic disk
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
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- 230000005855 radiation Effects 0.000 claims abstract description 49
- 229920005989 resin Polymers 0.000 claims abstract description 31
- 239000011347 resin Substances 0.000 claims abstract description 31
- 239000011230 binding agent Substances 0.000 claims abstract description 18
- 239000006229 carbon black Substances 0.000 claims abstract description 14
- 239000000843 powder Substances 0.000 claims abstract description 13
- 239000000945 filler Substances 0.000 claims abstract description 12
- 239000000463 material Substances 0.000 claims abstract description 5
- 239000004809 Teflon Substances 0.000 claims abstract description 4
- 229920006362 Teflon® Polymers 0.000 claims abstract description 4
- 239000011261 inert gas Substances 0.000 claims abstract description 4
- CWQXQMHSOZUFJS-UHFFFAOYSA-N molybdenum disulfide Chemical compound S=[Mo]=S CWQXQMHSOZUFJS-UHFFFAOYSA-N 0.000 claims abstract description 4
- 229910052982 molybdenum disulfide Inorganic materials 0.000 claims abstract description 4
- 238000000034 method Methods 0.000 claims description 16
- -1 α-IPego8 Substances 0.000 claims description 9
- 239000003973 paint Substances 0.000 claims description 8
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 7
- 229910002804 graphite Inorganic materials 0.000 claims description 7
- 239000010439 graphite Substances 0.000 claims description 7
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 claims description 6
- 238000010894 electron beam technology Methods 0.000 claims description 6
- 239000000126 substance Substances 0.000 claims description 5
- 239000005995 Aluminium silicate Substances 0.000 claims description 3
- 229910052582 BN Inorganic materials 0.000 claims description 3
- PZNSFCLAULLKQX-UHFFFAOYSA-N Boron nitride Chemical compound N#B PZNSFCLAULLKQX-UHFFFAOYSA-N 0.000 claims description 3
- 231100000987 absorbed dose Toxicity 0.000 claims description 3
- 235000012211 aluminium silicate Nutrition 0.000 claims description 3
- 229910052598 goethite Inorganic materials 0.000 claims description 3
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- NLYAJNPCOHFWQQ-UHFFFAOYSA-N kaolin Chemical compound O.O.O=[Al]O[Si](=O)O[Si](=O)O[Al]=O NLYAJNPCOHFWQQ-UHFFFAOYSA-N 0.000 claims description 3
- QLOAVXSYZAJECW-UHFFFAOYSA-N methane;molecular fluorine Chemical compound C.FF QLOAVXSYZAJECW-UHFFFAOYSA-N 0.000 claims description 3
- 239000000454 talc Substances 0.000 claims description 3
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- 239000011787 zinc oxide Substances 0.000 claims description 3
- 229910052925 anhydrite Inorganic materials 0.000 claims description 2
- OSGAYBCDTDRGGQ-UHFFFAOYSA-L calcium sulfate Chemical compound [Ca+2].[O-]S([O-])(=O)=O OSGAYBCDTDRGGQ-UHFFFAOYSA-L 0.000 claims description 2
- 230000001678 irradiating effect Effects 0.000 claims description 2
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 claims 2
- 229910052845 zircon Inorganic materials 0.000 claims 1
- GFQYVLUOOAAOGM-UHFFFAOYSA-N zirconium(iv) silicate Chemical compound [Zr+4].[O-][Si]([O-])([O-])[O-] GFQYVLUOOAAOGM-UHFFFAOYSA-N 0.000 claims 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 abstract description 5
- 239000002904 solvent Substances 0.000 abstract description 5
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 abstract description 4
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- 238000012546 transfer Methods 0.000 abstract description 3
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- 229910003465 moissanite Inorganic materials 0.000 abstract 1
- 229910052961 molybdenite Inorganic materials 0.000 abstract 1
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 abstract 1
- 229910010271 silicon carbide Inorganic materials 0.000 abstract 1
- 238000006243 chemical reaction Methods 0.000 description 27
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 24
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- 238000000576 coating method Methods 0.000 description 24
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 18
- QIGBRXMKCJKVMJ-UHFFFAOYSA-N Hydroquinone Chemical compound OC1=CC=C(O)C=C1 QIGBRXMKCJKVMJ-UHFFFAOYSA-N 0.000 description 14
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- 238000004132 cross linking Methods 0.000 description 12
- NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 10
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 10
- 239000000203 mixture Substances 0.000 description 10
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 10
- MTHSVFCYNBDYFN-UHFFFAOYSA-N diethylene glycol Chemical compound OCCOCCO MTHSVFCYNBDYFN-UHFFFAOYSA-N 0.000 description 9
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- PEDCQBHIVMGVHV-UHFFFAOYSA-N Glycerine Chemical compound OCC(O)CO PEDCQBHIVMGVHV-UHFFFAOYSA-N 0.000 description 6
- 239000005062 Polybutadiene Substances 0.000 description 6
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 6
- VZCYOOQTPOCHFL-UPHRSURJSA-N maleic acid Chemical compound OC(=O)\C=C/C(O)=O VZCYOOQTPOCHFL-UPHRSURJSA-N 0.000 description 6
- WWZKQHOCKIZLMA-UHFFFAOYSA-N octanoic acid Chemical compound CCCCCCCC(O)=O WWZKQHOCKIZLMA-UHFFFAOYSA-N 0.000 description 6
- 238000001723 curing Methods 0.000 description 5
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- 238000001816 cooling Methods 0.000 description 4
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 4
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- UPMLOUAZCHDJJD-UHFFFAOYSA-N 4,4'-Diphenylmethane Diisocyanate Chemical compound C1=CC(N=C=O)=CC=C1CC1=CC=C(N=C=O)C=C1 UPMLOUAZCHDJJD-UHFFFAOYSA-N 0.000 description 3
- JOYRKODLDBILNP-UHFFFAOYSA-N Ethyl urethane Chemical compound CCOC(N)=O JOYRKODLDBILNP-UHFFFAOYSA-N 0.000 description 3
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- 235000011187 glycerol Nutrition 0.000 description 3
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- 238000004804 winding Methods 0.000 description 3
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- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 2
- KAKZBPTYRLMSJV-UHFFFAOYSA-N Butadiene Chemical compound C=CC=C KAKZBPTYRLMSJV-UHFFFAOYSA-N 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 2
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- 238000011835 investigation Methods 0.000 description 1
- 230000005865 ionizing radiation Effects 0.000 description 1
- XEEYBQQBJWHFJM-UHFFFAOYSA-N iron Substances [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 1
- NIMLQBUJDJZYEJ-UHFFFAOYSA-N isophorone diisocyanate Chemical compound CC1(C)CC(N=C=O)CC(C)(CN=C=O)C1 NIMLQBUJDJZYEJ-UHFFFAOYSA-N 0.000 description 1
- 238000004898 kneading Methods 0.000 description 1
- 239000006249 magnetic particle Substances 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 125000005395 methacrylic acid group Chemical group 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 239000012299 nitrogen atmosphere Substances 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 230000000149 penetrating effect Effects 0.000 description 1
- WXZMFSXDPGVJKK-UHFFFAOYSA-N pentaerythritol Chemical compound OCC(CO)(CO)CO WXZMFSXDPGVJKK-UHFFFAOYSA-N 0.000 description 1
- 230000002093 peripheral effect Effects 0.000 description 1
- 229920001568 phenolic resin Polymers 0.000 description 1
- 239000005011 phenolic resin Substances 0.000 description 1
- NBIIXXVUZAFLBC-UHFFFAOYSA-N phosphoric acid Substances OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 1
- 239000000088 plastic resin Substances 0.000 description 1
- 229920002401 polyacrylamide Polymers 0.000 description 1
- 229920000058 polyacrylate Polymers 0.000 description 1
- 229920002647 polyamide Polymers 0.000 description 1
- 229920006122 polyamide resin Polymers 0.000 description 1
- 229920000120 polyethyl acrylate Polymers 0.000 description 1
- 229920000573 polyethylene Polymers 0.000 description 1
- 229920001223 polyethylene glycol Polymers 0.000 description 1
- 229920000139 polyethylene terephthalate Polymers 0.000 description 1
- 239000005020 polyethylene terephthalate Substances 0.000 description 1
- 239000009719 polyimide resin Substances 0.000 description 1
- 229920006324 polyoxymethylene Polymers 0.000 description 1
- 229920001155 polypropylene Polymers 0.000 description 1
- 229920001451 polypropylene glycol Polymers 0.000 description 1
- 229920002223 polystyrene Polymers 0.000 description 1
- 239000004800 polyvinyl chloride Substances 0.000 description 1
- 229920000915 polyvinyl chloride Polymers 0.000 description 1
- 239000001267 polyvinylpyrrolidone Substances 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 229960004063 propylene glycol Drugs 0.000 description 1
- 230000002285 radioactive effect Effects 0.000 description 1
- 238000005096 rolling process Methods 0.000 description 1
- 210000003296 saliva Anatomy 0.000 description 1
- 229910052814 silicon oxide Inorganic materials 0.000 description 1
- 229920002545 silicone oil Polymers 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 239000000600 sorbitol Substances 0.000 description 1
- 229940083466 soybean lecithin Drugs 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 239000005061 synthetic rubber Substances 0.000 description 1
- 238000001029 thermal curing Methods 0.000 description 1
- RUELTTOHQODFPA-UHFFFAOYSA-N toluene 2,6-diisocyanate Chemical compound CC1=C(N=C=O)C=CC=C1N=C=O RUELTTOHQODFPA-UHFFFAOYSA-N 0.000 description 1
- 230000007704 transition Effects 0.000 description 1
- 150000003673 urethanes Chemical class 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
Classifications
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/62—Record carriers characterised by the selection of the material
- G11B5/73—Base layers, i.e. all non-magnetic layers lying under a lowermost magnetic recording layer, e.g. including any non-magnetic layer in between a first magnetic recording layer and either an underlying substrate or a soft magnetic underlayer
- G11B5/735—Base layers, i.e. all non-magnetic layers lying under a lowermost magnetic recording layer, e.g. including any non-magnetic layer in between a first magnetic recording layer and either an underlying substrate or a soft magnetic underlayer characterised by the back layer
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B23/00—Record carriers not specific to the method of recording or reproducing; Accessories, e.g. containers, specially adapted for co-operation with the recording or reproducing apparatus ; Intermediate mediums; Apparatus or processes specially adapted for their manufacture
- G11B23/50—Reconditioning of record carriers; Cleaning of record carriers ; Carrying-off electrostatic charges
- G11B23/505—Reconditioning of record carriers; Cleaning of record carriers ; Carrying-off electrostatic charges of disk carriers
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/62—Record carriers characterised by the selection of the material
- G11B5/73—Base layers, i.e. all non-magnetic layers lying under a lowermost magnetic recording layer, e.g. including any non-magnetic layer in between a first magnetic recording layer and either an underlying substrate or a soft magnetic underlayer
- G11B5/735—Base layers, i.e. all non-magnetic layers lying under a lowermost magnetic recording layer, e.g. including any non-magnetic layer in between a first magnetic recording layer and either an underlying substrate or a soft magnetic underlayer characterised by the back layer
- G11B5/7356—Base layers, i.e. all non-magnetic layers lying under a lowermost magnetic recording layer, e.g. including any non-magnetic layer in between a first magnetic recording layer and either an underlying substrate or a soft magnetic underlayer characterised by the back layer comprising non-magnetic particles in the back layer, e.g. particles of TiO2, ZnO or SiO2
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/74—Record carriers characterised by the form, e.g. sheet shaped to wrap around a drum
- G11B5/82—Disk carriers
Landscapes
- Paints Or Removers (AREA)
- Magnetic Record Carriers (AREA)
- Manufacturing Of Magnetic Record Carriers (AREA)
Abstract
Description
【発明の詳細な説明】
本発明は、磁気ディスク及びその製造方法に関するもの
であり、特にはディスクのカール及びドロップアウトの
問題を解消した磁気ディスクに関するものである。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a magnetic disk and a method for manufacturing the same, and particularly to a magnetic disk that eliminates the problems of disk curl and dropout.
現在、磁気ディスクは、コンピュータ及び磁気カメラの
分野で広範囲に使用されるようになってきた。それに伴
い、磁気ディスクに記録すべき情報量も年々増加し、高
密度記録能を有する磁気ディスクが益々要求されるよう
になっている。Magnetic disks are now widely used in the fields of computers and magnetic cameras. Along with this, the amount of information to be recorded on magnetic disks is increasing year by year, and magnetic disks with high density recording capability are increasingly required.
高記録密度化が進む程ドロップアウトの問題が顕著とな
ってくる。即ち磁気ヘッドを用いる現在の記録方式にお
いては、ディスク−ヘッド間のスペーシング損失は54
.6T [aB) (a :ディスクーヘッド間距離、
λ:記録波長)で表わされる。As recording density increases, the dropout problem becomes more prominent. In other words, in the current recording method using a magnetic head, the spacing loss between the disk and the head is 54
.. 6T [aB) (a: distance between disk and head,
λ: recording wavelength).
この式かられかるように、記録密度の高い短波長記録に
おいては、スペーシングによる出力低下の割合が長波長
のそれより著しく大きくなる。従つ・て小さな異物がデ
ィスク上にあっても、それがドロップアウトとして検出
されることになるのである。As can be seen from this equation, in short wavelength recording with high recording density, the rate of output reduction due to spacing is significantly greater than that in long wavelength recording. Therefore, even if a small foreign object is present on the disk, it will be detected as a dropout.
ドロップアウトの原因として考えられるのは、繰返し応
力がかかることによる塗膜の劣化から生ずる磁気ディス
クの塗膜表面の磁性粉脱落物あるいは走行中にベースが
削り取られることにより発生する削片やホコリ等が静電
的にベース面に付着し更にそれが塗膜面に転移したもの
が挙げられる。Possible causes of dropouts include magnetic particles falling off from the coating surface of the magnetic disk resulting from deterioration of the coating due to repeated stress, or particles and dust generated when the base is scraped off during running. An example of this is when electrostatically adheres to the base surface and then transfers to the coating surface.
これらを防止するため、前者の原因に対しては塗膜の強
靭化を計るべく幾つかの工夫が為されそして後者の原因
に対しては、磁気ディスクの磁性面と反対の支持体表面
(バック面)に、カーボンブラックあるいはグラファイ
ト等を有機結合材とともに混練した塗料を塗布したり、
帯電防止剤を塗布する等によりベースの帯電現象を少く
する方法あるいは酸化硅素等を有機結合相とともに混練
した塗料を塗布し、ベースの強靭化をはかりベースの削
れを少くする方法等が考案されている。これらの処理に
より、くり返し走行に対するドロップアウト増加の傾向
はがなり抑えることができる。In order to prevent these problems, several efforts have been made to strengthen the coating film for the former cause, and for the latter cause, the support surface opposite to the magnetic surface of the magnetic disk (back Apply a paint made by kneading carbon black or graphite with an organic binder to the
Methods have been devised to reduce the charging phenomenon of the base by applying an antistatic agent, or to make the base tougher and less likely to scratch it by applying a paint containing silicon oxide, etc., mixed with an organic binder phase. There is. Through these processes, the tendency for dropouts to increase due to repeated driving can be significantly suppressed.
しかしながら、そのレベルは、現状ではまだ完全とは言
えず、さらに少くする必要がある。However, the current level is still not perfect and needs to be further reduced.
ドロップアウトをさらに少くするため、その発生原因を
詳細に調べた結果法の様なことがわかった。バック面形
成においては、バック面を磁性面より先に形成すると磁
性面を形成した後のカレンダー処理による表面平滑化の
際にバック面の凹凸が磁性面に転写して磁性塗膜の平滑
化が十分になされない。そのため、バックコート処理は
、磁性塗膜を支持体上に形成した後、その支持体の裏面
になされるのが普通である。バック層は走行回数を増し
てもドロップアウトが増加しないよ5強靭であることが
要求されるから、通常、熱硬化型樹脂が結合剤として使
用される。その場合、バック層が塗布された後、テープ
は巻き取られ、熱硬化処理が施されることになる。しか
し、塗布が終わった時点においては、パック層中ではま
だ硬化反応が始っておらずその塗膜は弱く、しかもバッ
ク面と磁性面とは密着状態であるため、バック層塗膜中
に充填されたカーボンブラック、グラファイト、あるい
は他の無機充填剤を含んだバック面塗膜表面は、それが
接触している反対側の磁性層表面に転移し易く、その転
移したものがドロップアウトやヘッド目づまりの原因と
なっていることがわかった。またこの現象は熱可塑性樹
脂であっても同様な現象が起こりうると考えられる。In order to further reduce dropouts, we have conducted a detailed investigation into the causes of their occurrence and have discovered a method. When forming the back surface, if the back surface is formed before the magnetic surface, the unevenness of the back surface will be transferred to the magnetic surface during surface smoothing by calendering after forming the magnetic surface, and the smoothing of the magnetic coating will be difficult. Not enough is done. Therefore, back coating treatment is usually performed on the back surface of the support after a magnetic coating film is formed on the support. Since the backing layer is required to be strong so that dropout does not increase even when the number of runs is increased, a thermosetting resin is usually used as a binder. In that case, after the backing layer is applied, the tape is wound up and subjected to a heat curing treatment. However, at the time the coating is finished, the curing reaction has not yet started in the pack layer and the coating is weak.Moreover, the back surface and magnetic surface are in close contact with each other. The back coating surface containing carbon black, graphite, or other inorganic fillers is likely to transfer to the opposite magnetic layer surface with which it is in contact, causing dropouts and head eyes. It turned out that this was the cause of the blockage. Further, it is thought that this phenomenon may occur in the case of thermoplastic resins as well.
本発明は、バック層形成工程での上記のような不具合を
解消するため、放射線感応樹脂(放射線の照射で硬化し
うる樹脂)を結合材としてカーボンブラックまたはグラ
ファイトあるいは他の無機充填剤と混練した塗料でバッ
ク層を形成した後活性エネルギー線源により放射線を照
射し、硬化処理を施すか、あるいはそのまま表面処理を
行った後硬化処理を施し、バック層中に三次元架橋を生
じさせ、強靭な塗膜とした後、そのテープを巻き取るこ
とにより、上記のような原因によるドロップアウトを減
少させるものである。この方法によればテープが巻き取
られるのは塗膜の架橋反応が終了した後であるから巻き
取りによりバック層が磁性層に密着してもバック層から
磁性層への転移更に重要なこととして、磁気ディスクで
はカールの問題がある。片面型の磁気ディスクにおいて
は、このカールは、塗膜と支持体の力学的バランスがと
れtK、シ・ために生ずると考えられる。つまり、塗膜
のヤング率が支持体のヤング率より太きいため、塗膜側
にそりが生ずる。カールは、ヘッドタッチ、走行性に悪
影響を与えるので、できるだけ/J%さくした方が好ま
し2い。そこで磁性層と反対側の支持体上にカーボンブ
ラック、グラファイト、あるいは他の無機充填桐を含ん
だバック面塗膜を設け、磁性面、ペース・バック面の力
学的バランスをとることにより、ヘッドタッチ及び走行
性で問題となるディスクのそりを改善することが考えら
れるが、熱硬化の場合、ロール状態で熱処理をするため
、その巻き方向にカールが生じたり、又、ベースの収縮
をまねきカールを助長することになる。しかし電子線硬
化の場合、オンラインで硬化できるため熱硬化の場合の
問題はなく有利にカールの改善ができる。In order to eliminate the above-mentioned problems in the back layer forming process, the present invention uses a radiation-sensitive resin (resin that can be cured by radiation irradiation) as a binder, which is kneaded with carbon black, graphite, or other inorganic fillers. After forming a backing layer with paint, it is irradiated with radiation from an active energy ray source and hardened, or the surface is treated as is and then hardened to create three-dimensional crosslinking in the backing layer, making it tough. By winding up the tape after forming a coating film, dropouts due to the causes mentioned above are reduced. According to this method, the tape is wound up after the cross-linking reaction of the coating film has finished, so even if the back layer is brought into close contact with the magnetic layer by winding, there is no transition from the back layer to the magnetic layer. , magnetic disks have a curl problem. In single-sided magnetic disks, this curling is thought to occur because the coating film and the support are not mechanically balanced. That is, since the Young's modulus of the coating film is greater than the Young's modulus of the support, warpage occurs on the coating film side. Curling has a negative effect on head touch and running performance, so it is preferable to reduce the curl by /J% as much as possible. Therefore, a back surface coating containing carbon black, graphite, or other inorganic filled paulownia is provided on the support opposite to the magnetic layer, and by creating a mechanical balance between the magnetic surface and the pace/back surface, head touch is improved. It may be possible to improve the warping of the disc, which is a problem with runnability, but in the case of heat curing, since the heat treatment is performed in a rolled state, curling may occur in the winding direction, or it may cause shrinkage of the base and cause curling. It will help. However, in the case of electron beam curing, since the curing can be done online, there is no problem with thermal curing, and curling can be advantageously improved.
斯様に、支持体の一方の面に磁性層を有する磁気ディス
クにおいて、バック面に、結合材中に充填材を含んだバ
ック層を設け、しかも結合材として放射線感応硬化性樹
脂を用いることによりディスクのそりの問題とドロップ
アウトの問題が一挙に解決される。In this way, in a magnetic disk having a magnetic layer on one side of the support, a back layer containing a filler in the binder is provided on the back side, and a radiation-sensitive curable resin is used as the binder. Disc warpage and dropout problems are solved all at once.
斯くして、本発明は、支持体の一方の面に磁性層をそし
て他方の面にバック層を具備し、該バック層が放射線感
応硬化樹脂を含む結合剤中に充填材を分散して成るもの
であることを%徴とする磁気ディスクを提供する。更に
、本発明は、支持体の一方の面に磁性層を形成した後、
支持体の他方の面に放射線感応硬化性樹脂を含む結合剤
中に充填材を分散した塗料をバック層として塗布し、そ
の後活性エネルギー線を照射して該放射線感応硬化性樹
脂を硬化することにより手記磁気ディスクを製造する方
法をも提供する。Thus, the present invention provides a support comprising a magnetic layer on one side and a back layer on the other side, the back layer comprising a filler dispersed in a binder containing a radiation-sensitive curable resin. To provide a magnetic disk characterized by the fact that it is a magnetic disk. Furthermore, in the present invention, after forming a magnetic layer on one side of the support,
By applying a paint in which a filler is dispersed in a binder containing a radiation-sensitive curable resin to the other side of the support as a back layer, and then irradiating active energy rays to cure the radiation-sensitive curable resin. A method of manufacturing a memorandum magnetic disk is also provided.
本発明で用いる放射線感応樹脂とは、放niI線により
ラジカルを発生し架橋構造な住じるような、分子鎖中に
不飽和2M結合を2個以」二含むものであり、これはま
た熱可塑性樹脂を放射線感応変性することによっても可
能である。The radiation-sensitive resin used in the present invention is one that contains two or more unsaturated 2M bonds in its molecular chain, which generate radicals by radioactive niI radiation and form a crosslinked structure. This is also possible by modifying the plastic resin to make it radiation sensitive.
放射線感応変性の具体例としては、ラジカル重合性を有
する不飽和二重結合を示すアクリル酸、メククリル酸あ
るいはそれらのエステル化合物のようなアクリル系二重
結合、ジアリルフタレートのようなアクリル系三重結合
、マレイン酸、マレイン酸誘導体等のマレイン酸系二重
結合等の放射線照射による架橋あるいは重合乾燥する基
を分子中に導入することである。Specific examples of radiation-sensitive modification include acrylic double bonds such as acrylic acid, meccrylic acid, or their ester compounds, which exhibit radically polymerizable unsaturated double bonds, acrylic triple bonds such as diallylphthalate, This method involves introducing into a molecule a group that can be crosslinked or polymerized and dried by radiation irradiation, such as a maleic acid double bond such as maleic acid or a maleic acid derivative.
その他放射線照射により架橋重合する不飽和二重結合で
あれば用いる事が出来る。Other unsaturated double bonds that can be crosslinked and polymerized by radiation irradiation can be used.
放射線感応樹脂に変性できる熱可塑性樹脂を以下に示す
。Thermoplastic resins that can be modified into radiation-sensitive resins are shown below.
−(I) 塩化ビニール系共重合体
塩化ビニール−酢酸とニール−ビニールアルコール共重
合体、塩化とニール−ビニルアルコール共重合体、塩化
ビニール−ビニルアルコール−プロピオン酸ビニール共
重合体、塩化ビニル−酢酸ビニール−マレイン酸共重合
体、塩化ビニール−酢酸ビニール−末端O■側鎖アルキ
ル基共重合体。たとえば、商品名としてUOO社VRO
H,YYNOlVYEGX等またUac tjvgu、
rt等が挙げられる。 ″
上記共重合体に後に述べる手法により、アクリル二重結
合を導入し放射線感応変性を行ったもの。-(I) Vinyl chloride copolymer Vinyl chloride-acetic acid and vinyl alcohol copolymer, chloride and vinyl alcohol copolymer, vinyl chloride-vinyl alcohol-vinyl propionate copolymer, vinyl chloride-acetic acid Vinyl-maleic acid copolymer, vinyl chloride-vinyl acetate-terminal O■ side chain alkyl group copolymer. For example, the product name is UOO company VRO.
H, YYNOlVYEGX etc. also Uac tjvgu,
rt, etc. `` Acrylic double bonds are introduced into the above-mentioned copolymer using the method described later to cause radiation-sensitivity modification.
財〕 飽和ポリエステル樹脂
フタル酸、イソフタル酸、テレフタル酸、マレイン酸、
マレイン酸誘導体、コノ・り酸、アジピン酸、セバシン
酸のような飽和多塩基酸とエチレングリコール、ジエチ
レングリコール、グリセリン、トリメチロールプロパン
′、1.2プロピレングリコール、1,3ブタジオール
、ジエチレングリコール、1,4ブタンジオール、1,
6ヘキサンジオール、ペンクエリスリット、ンルビトー
ル、グリセリン、ネオペンチルグリコール、1.4シク
ロヘヤサンジメタノールのような多価アルコールとのエ
ステル結合により得られる飽和ポリエステル樹脂又はこ
れらのポリエステル樹脂を5oeNa等で変性した樹脂
(バイロン53S)。これらを後に述べる手法により放
射線感応変性を行ったもの。Goods] Saturated polyester resin phthalic acid, isophthalic acid, terephthalic acid, maleic acid,
Saturated polybasic acids such as maleic acid derivatives, cono-phosphoric acid, adipic acid, sebacic acid and ethylene glycol, diethylene glycol, glycerin, trimethylolpropane', 1,2 propylene glycol, 1,3 butadiol, diethylene glycol, 1,4 butanediol, 1,
Saturated polyester resins obtained by ester bonding with polyhydric alcohols such as 6-hexanediol, penquerystrit, nrubitol, glycerin, neopentyl glycol, and 1.4-cyclohairsanedimethanol, or these polyester resins modified with 5oeNa, etc. Resin (Byron 53S). These were subjected to radiation sensitivity modification using the method described later.
唾 不飽和ポリエステル樹脂
分子鎖中に放射線硬化性不飽和二重結合を含有するポリ
エステル化合物、例えば第0項の熱可塑性樹脂として記
載の多塩基酸と多価アルコールのエステル結合から成る
飽和ポリエステル樹脂で多塩基酸の一部をマレイン酸と
した放射線硬化性不飽和二重結合を含有する不飽和ポリ
エステル樹脂、プレポリマー、オリゴマーを挙げること
ができる。Saliva Unsaturated polyester resin A polyester compound containing a radiation-curable unsaturated double bond in the molecular chain, for example, a saturated polyester resin consisting of an ester bond of a polybasic acid and a polyhydric alcohol described as a thermoplastic resin in Item 0. Examples include unsaturated polyester resins, prepolymers, and oligomers containing radiation-curable unsaturated double bonds in which part of the polybasic acid is maleic acid.
飽和ポリエステル樹脂の多塩基酸および多価アルコール
成分は第(I)項に記載した各化合物を挙げることがで
き、放射線硬化性不飽和二重結合としてはマレイン酸、
フマル酸等を挙げることができる。Examples of the polybasic acid and polyhydric alcohol components of the saturated polyester resin include the compounds listed in Section (I), and examples of the radiation-curable unsaturated double bond include maleic acid,
Examples include fumaric acid.
放射線硬化性不飽和ポリエステル樹脂の製法は、多塩基
酸成分1種以上と多価アルコール成分1程゛以上にマレ
イン酸、フマル酸等を加え常法、すなわち触媒存在18
0〜200″C窒素雰囲気下脱水あるいは脱アルコール
反応の後、240〜280°Cまで昇温し、0.5〜0
.1 mvmgの減圧下縮合反応によりポリエステル樹
脂を得ることカーできる。マレイン酸やフマル酸等の含
有量側ま、製造時の架橋、放射線硬化性等から酸成分中
1〜40モル%で好tt、<G−110〜30モル%で
ある。The radiation-curable unsaturated polyester resin is produced by a conventional method, in which maleic acid, fumaric acid, etc. are added to one or more polybasic acid components and one or more polyhydric alcohol components, i.e., in the presence of a catalyst.
After dehydration or dealcoholization reaction in a nitrogen atmosphere at 0 to 200"C, the temperature is raised to 240 to 280°C, and the temperature is increased to 0.5 to 0.
.. A polyester resin can be obtained by condensation reaction under reduced pressure of 1 mvmg. The content of maleic acid, fumaric acid, etc. in the acid component is preferably 1 to 40 mol %, and <G-110 to 30 mol %, considering crosslinking during production, radiation curability, etc.
W ポリビニルアルコール系樹脂
ポリビニルアルコール、ブチラール樹脂、アセタール樹
脂、ホルマール樹脂及びこれらの成分の共重合体。これ
らの樹脂中に含まれる水酸基を後に述べる手法により放
射線感応イヒ変性を行なったもの。W Polyvinyl alcohol resin Polyvinyl alcohol, butyral resin, acetal resin, formal resin, and copolymers of these components. The hydroxyl groups contained in these resins have been subjected to radiation-sensitive denaturation using the method described later.
(9) エポキシ系樹脂、フェノキシ樹脂ビスフェノー
ル人とエピクロルヒドリン、メチルエピクロルヒドリン
の反応による工d(キシ樹脂−シエル化学製(エピコー
ト152.154.828.1001.1004.10
07)ダウケミカル製(DEN4.31、DER732
、J)ER51]、DNR331)、大日本インキ製(
エビクロン400、エビクロン−800)、更に上記エ
ポキシの高重合度樹脂であるUOO社製フェノキシ樹脂
(PKm、 PKHOlPKE)I )臭素化ビスフェ
ノール人とエピクロルヒドリンとの共重合体、大日本イ
ンキ化学工業製(・エビクロン145.152.153
.1120)等。(9) Epoxy resin, phenoxy resin produced by the reaction of bisphenol, epichlorohydrin, and methyl epichlorohydrin
07) Manufactured by Dow Chemical (DEN4.31, DER732
, J) ER51], DNR331), Dainippon Ink (
Evicron 400, Evicron-800), phenoxy resin (PKm, PKHOlPKE) manufactured by UOO, which is a high polymerization degree resin of the above epoxy, and a copolymer of brominated bisphenol and epichlorohydrin, manufactured by Dainippon Ink & Chemicals (・Ebikuron 145.152.153
.. 1120) etc.
これらの樹脂中に含まれるエポキシ基を利用して、放射
線感応変性を行ったもの。These resins have undergone radiation-sensitivity modification using the epoxy groups contained in them.
■ 繊維素誘導体
各種分子量の繊維素系誘導体も、また熱可塑性プラスチ
ック成分として効果的である。その中でも、特に効果的
なものは硝化綿、セルローズアセトブチレート、エチル
セルローズ、ブチルセルローズ、アセチルセルローズ等
が好適であり、樹脂中の水酸基を活性して後に述べる手
法により放射線感応変性を行なったもの。■ Cellulose derivatives Cellulose derivatives of various molecular weights are also effective as thermoplastic components. Among these, particularly effective ones are nitrified cotton, cellulose acetobutyrate, ethyl cellulose, butyl cellulose, acetyl cellulose, etc., which have undergone radiation sensitivity modification by the method described later by activating the hydroxyl groups in the resin. .
その他、放射線感応変性に用いることのできる樹脂とし
ては、多官能ポリエステル樹脂、ポリエーテルエステル
樹脂、ポリビニルビ胃リドン樹脂及び誘導体(PVPオ
レフィン共重合体)、ポリアミド樹脂、ポリイミド樹脂
、フェノール樹脂、スピロアセクール樹脂、水酸基を含
有するアクリルエステル及びメタクリルエステルを少く
とも一種以上重合成分として含むアクリル系樹脂等も有
効である。Other resins that can be used for radiation-sensitive modification include polyfunctional polyester resins, polyether ester resins, polyvinyl bistolydone resins and derivatives (PVP olefin copolymers), polyamide resins, polyimide resins, phenolic resins, and spiroacecool. Also effective are resins, acrylic resins containing at least one kind of acrylic ester and methacrylic ester containing hydroxyl groups as polymerization components.
さらに上記放射線感応変性熱可塑性樹脂に熱可塑性エラ
ストマー又はプレポリマーをブレンドすることにより、
一層強靭な塗膜とすることができる。さらに、下記に述
べるように、これらニジストマーあるいはプレポリマー
が、同様に放射線感応性に変性された場合は、より効果
的である。以下に、上記放射線感応樹脂と組み合わせる
ことのできるニジストマー又はプレポリマーを挙げる。Furthermore, by blending a thermoplastic elastomer or prepolymer with the radiation-sensitive modified thermoplastic resin,
An even tougher coating film can be obtained. Furthermore, as described below, it is more effective if these nidistomers or prepolymers are similarly modified to be radiation sensitive. Listed below are nidistomers or prepolymers that can be combined with the above radiation-sensitive resin.
(I) ボリウレクンエラス)・マー及びプレポリマー
及びテロマー
ポリウレタンニジストマーは、耐摩耗性、PETフィル
ムへの接着性が良い点で特に有効である。(I) Polyurethane elastomers, prepolymers, and telomer polyurethane distoners are particularly effective in terms of good abrasion resistance and good adhesion to PET films.
このようなウレタン化合物の例としては、イソシアネー
トとして、2.4−)ルエンジイソシアネート、2,6
−トルエンジイソシアネート、1.3=キシレンジイソ
シアネート、1.4−キシレンジイソシアネート、1.
5−ナフタレンジイソシアネート、m−フェニレンジイ
ソシアネート、p−フェニレンジイソシアネート、3.
3′−ジメチル−4,4′−ジフエニルメタンジイソシ
アネート、4.4’−ジフェニルメタンジインシアネー
ト、3,3′−ジメチルビフェニレンジイソシアネート
、4.4’−ビフェニレンジインシアネート、ヘキサメ
チレンジイソシアネート、イソフオロンジイソシアネー
ト、ジシクロヘキシルメタンジインシアネート、デスモ
ジュールL1デスモジュールN等の多瀕多価インシアネ
ートと、綿状飽和ポリエステル(エチレングリコール、
ジエチレングリコール、グリセリン、トリメチロールプ
ロパン、1,4−ブタジオール、1.6−ヘキサンジオ
ール、ペンタエリスリット、ソルビトール、ネオペンチ
ルグリコール、1.4−シクロヘキサンジメタツールの
様な多価アルコールと、7タル酸、インクタル酸、テレ
フタル酸、マレイン酸、コハク酸、アジピン酸、セバシ
ン酸、の様な飽和多塩基酸との縮重合によるもの)、線
状飽和ポリエーテル(ポリエチレングリコール、ポリプ
ロピレングリコール、ポリテトラメチレングリコール)
やカプロラクタム、ヒドロキシル含有アクリル酸エステ
ル、ヒドロキシル含有メタアクリル酸エステル等の各種
ポリエステル類の縮重合物より成るポリウレタンエラス
トマー、プレポリマー、テロマーが有効である。Examples of such urethane compounds include, as the isocyanate, 2,4-)luene diisocyanate, 2,6
-Toluene diisocyanate, 1.3=xylene diisocyanate, 1.4-xylene diisocyanate, 1.
5-naphthalene diisocyanate, m-phenylene diisocyanate, p-phenylene diisocyanate, 3.
3'-dimethyl-4,4'-diphenylmethane diisocyanate, 4,4'-diphenylmethane diisocyanate, 3,3'-dimethylbiphenylene diisocyanate, 4,4'-biphenylene diisocyanate, hexamethylene diisocyanate, isophorone diisocyanate, Dicyclohexylmethane diincyanate, Desmodur L1, Desmodur N, and other multifunctional polyvalent incyanates, and flocculent saturated polyesters (ethylene glycol,
Polyhydric alcohols such as diethylene glycol, glycerin, trimethylolpropane, 1,4-butadiol, 1,6-hexanediol, pentaerythritol, sorbitol, neopentyl glycol, 1,4-cyclohexane dimetatool, and heptallic acid. , linear saturated polyethers (polyethylene glycol, polypropylene glycol, polytetramethylene glycol) )
Polyurethane elastomers, prepolymers, and telomers made of condensation products of various polyesters such as caprolactam, hydroxyl-containing acrylic esters, and hydroxyl-containing methacrylic esters are effective.
これらのニジストマーを放射線感応変性の各種熱可塑性
プラスチックスとそのまま組み合わせてもよいが、更に
ウレタンニジストマーの末端のインシアネート基又は水
酸基と反応するアクリル系二重結合又はアクリル系二重
結合等を有する単J1゜体と反応させることにより、放
射線感応性に変性することは非常に効果的である。These nidistomers may be combined as they are with various radiation-sensitive thermoplastics, but urethane nidistomers may also have an acrylic double bond or acrylic double bond that reacts with the incyanate group or hydroxyl group at the end of the urethane nidistomer. It is very effective to modify it to make it radiosensitive by reacting it with a single J1° form.
GD アクリルニトリル−ブタジェン共ポー合エジスト
マー
シンクレアベトロケミカル社製ポリBDリタイッドレジ
ンとして市販されている末端水酸基のあるアクリロニト
リルブタジェン共重合体プレポリマー、あるいは日本ゼ
オン社製ハイカー1432 、T等のニジストマーは、
特にブタジェン中の二重結合が放射線によりラジカルを
生じ架橋及び重合させるニジストマー成分として適する
。GD Acrylonitrile-butadiene copolymer prepolymer with a terminal hydroxyl group commercially available as PolyBD Retired Resin manufactured by Sinclairvetro Chemical Co., Ltd., or Nippon Zeon Co., Ltd. Hiker 1432, T, etc. ,
In particular, the double bond in butadiene generates radicals by radiation, making it suitable as a didistomer component for crosslinking and polymerization.
(ト) ポリブタジエンエラストマー
シンクレアベトロケミカル社製ポリEDリクイツドレジ
ンR−15等の低分子量末端水酸基を有するプレポリマ
ーが特に熱可塑性樹脂との相溶性の点で好適である。几
−15プレポリマーにおいては分子末端が水酸基となっ
ている為分子末端をアクリル系不飽和二重結合を付加す
ることにより放射線感応性を高めることが可能であり、
バインダーとして更に有利となる。(g) Polybutadiene elastomer A prepolymer having a low molecular weight terminal hydroxyl group, such as PolyED Liquid Resin R-15 manufactured by Sinclair Vetro Chemical Co., is particularly suitable in terms of compatibility with thermoplastic resins. Since Rin-15 prepolymer has a hydroxyl group at the end of the molecule, it is possible to increase its radiation sensitivity by adding an acrylic unsaturated double bond to the end of the molecule.
It is even more advantageous as a binder.
また、ポリブタジェンの環化物日本合成ゴム製013R
−M 901も熱可塑性との組合わせによりすぐれた性
能を発揮する。特に、環化されたポリブタジェンは、ポ
リブタジェン本来の有する不飽和結合のラジカルにより
放射線による架橋重合の効率が良く、バインダーとして
優れた性質を有している。In addition, polybutadiene cyclized product Nippon Synthetic Rubber Co., Ltd. 013R
-M 901 also exhibits excellent performance in combination with thermoplasticity. In particular, cyclized polybutadiene has excellent properties as a binder, as it is highly efficient in crosslinking polymerization by radiation due to the radicals of unsaturated bonds inherent in polybutadiene.
その他熱可塑性エラストマー及びそのプレポリマーの系
で好適なものとしては、エチレン−ブタジェンゴム、塩
化ゴム、アクリルゴム、インプレンゴム及びその環化物
(日本合成ゴム製0IR701)があり、エポキシ変性
ゴム、内部可塑化飽和線状ポリエステル(東洋紡バイロ
ンナ300)、等のエラストマーも下記に述べる放射線
感応変性処理をほどこすことにより有効に利用できる。Other suitable thermoplastic elastomer and prepolymer systems include ethylene-butadiene rubber, chlorinated rubber, acrylic rubber, imprene rubber and its cyclized product (0IR701 manufactured by Nippon Synthetic Rubber), epoxy-modified rubber, and internally plasticized rubber. Elastomers such as saturated linear polyester (Toyobo Byronna 300) can also be effectively used by subjecting them to the radiation-sensitive modification treatment described below.
放射線感応性バインダーの合成例については後に示す。Synthesis examples of radiation-sensitive binders will be shown later.
また、高分子には放射線照射により崩壊するものと分子
間に架橋を起こすものが知られている。Furthermore, some polymers are known to disintegrate when exposed to radiation, while others cause intermolecular crosslinking.
分子間に架橋を起こすものとしては、ポリエチレン、ポ
リプロピレン、ポリスチレン、ポリアクリル酸エチル、
ポリアクリルアミド、ポリ塩化ビニル、ポリエステル、
ポリビニルピロリドンゴム、ポリビニルアルコール、ポ
リアクロレインがある。Examples of substances that cause crosslinking between molecules include polyethylene, polypropylene, polystyrene, polyethyl acrylate,
polyacrylamide, polyvinyl chloride, polyester,
These include polyvinylpyrrolidone rubber, polyvinyl alcohol, and polyacrolein.
このような架橋型ポリマーであれば」二重のような変性
を特に施さなくても、架橋反応が起こるので、そのまま
放射線架橋用バックコート樹脂として使用可能である。If such a crosslinked polymer is used, the crosslinking reaction will occur even without special modification such as double-curing, so it can be used as it is as a backcoat resin for radiation crosslinking.
さらにまた、この方法によれば溶剤を使用しl、。Furthermore, according to this method, a solvent is used.
い無用剤型の樹脂であっても短時間で硬化することがで
きるので、この様な樹脂をノぐツクコート用として用い
ることもできる。Even if it is a non-useful type resin, it can be cured in a short time, so such a resin can also be used as a glue coat.
本発明のバックコートの架橋に使用−する活性エネルギ
ー線としては、放射線加速器を線源とした電子線、C0
60を線源としたγ−線、B r 90を線源としたβ
−線、X線発生器を線源としたX−線等が使用される。The active energy rays used for crosslinking the back coat of the present invention include electron beams using a radiation accelerator as a source, CO
γ-ray with 60 as the source, β with B r 90 as the source
- rays, X-rays using an X-ray generator as a radiation source, etc. are used.
特に照射線源としては吸収線量の制御、製造工程ライン
への導入、電離放射線のしゃ蔽等の見地から放射線加速
器により放射線を使用する方法が有利である。In particular, as an irradiation source, it is advantageous to use radiation using a radiation accelerator from the viewpoint of controlling the absorbed dose, introducing it into the manufacturing process line, and shielding ionizing radiation.
バック層を硬化する際に使用する放射線特性としては、
透過力の面から加速電圧100〜750kV好ましくは
150〜300 kVの放射線加速器を用い吸収線量を
0.5〜20メガランドになるように照射するのが好都
合である。The radiation characteristics used when curing the back layer are as follows:
From the viewpoint of penetrating power, it is convenient to irradiate using a radiation accelerator with an accelerating voltage of 100 to 750 kV, preferably 150 to 300 kV, so that the absorbed dose is 0.5 to 20 megaland.
本発明のバック層硬化に際しては、米国エナジーサイエ
ンス社にて製造されている低線量タイプの放射線加速器
(エレクトロカーテンシステム)等がテープコーティン
グ加エラインへの導入、加速器内部の2次X線の遮蔽等
に極めて有利である。When curing the back layer of the present invention, a low-dose type radiation accelerator (Electro Curtain System) manufactured by Energy Sciences, Inc. in the United States is introduced into the tape coating processing line, shielding secondary X-rays inside the accelerator, etc. This is extremely advantageous.
勿論、従来より放射線加速器として広(活用されている
ところのファンデグラフ型加速器を使用しても良い。Of course, a van de Graaf type accelerator, which has been widely used as a radiation accelerator, may also be used.
また、放射線架橋に際しては、N2ガス、HI3ガス等
の不活性ガス気流中で放射線をバック層に照射すること
が重要であり、空気中で放射線を照射することは、バイ
ンダー成分の架橋に際し放射線照射により生じた08等
の影響でポリマー中に生じたラジカルが有利に架橋反応
に働く事を阻害するので極めて不利である。In addition, during radiation crosslinking, it is important to irradiate the back layer with radiation in an inert gas stream such as N2 gas or HI3 gas. This is extremely disadvantageous because the radicals generated in the polymer due to the influence of 08 etc. generated by this will inhibit the advantageous crosslinking reaction.
従って、活性エネルギー線を照射する部分の雰囲気は、
特に酸素濃度が最大で1%のN2、lJe、COQ等の
不活性ガス雰囲気に保つことが重要となる。Therefore, the atmosphere of the area to be irradiated with active energy rays is
In particular, it is important to maintain an atmosphere of an inert gas such as N2, lJe, or COQ with a maximum oxygen concentration of 1%.
また、本発明でバック層中に上記結合材とともに使用さ
れる充填材としては、導電性のあるl)グラファイト、
カーボンブラック及び2)無機充填材としてハ8i0Q
、 TiO2、Al2O8,0rQOB、5iO1aa
ao8、酸化亜鉛、ゲーサイト、α−Fe20g、タル
ク、カオリン、CaSO4、窒化硼素、テフロン粉末、
フッ化黒鉛、二硫化モリブデンが単独で或いは併用して
用いられる。この様な充填材の使用量はl)に関しては
結合材100重量部に対して20〜100部、又2)に
関しては10〜300部が適当であり、充填材量があま
り多くなると、塗膜がもろくなりかえってドロップアウ
トが多くなるという欠点が生じる。Further, in the present invention, the filler used in the back layer together with the above-mentioned binder includes l) graphite, which is conductive;
Carbon black and 2) Ha8i0Q as an inorganic filler
, TiO2, Al2O8,0rQOB, 5iO1aa
ao8, zinc oxide, goethite, α-Fe20g, talc, kaolin, CaSO4, boron nitride, Teflon powder,
Graphite fluoride and molybdenum disulfide are used alone or in combination. The appropriate amount of filler to be used is 20 to 100 parts per 100 parts by weight of the binder for l), and 10 to 300 parts for 2). The drawback is that the material becomes brittle and dropouts occur more frequently.
バック層形成に当って、従来から使用されている分散剤
、潤滑剤等を使用できることはもちろんである。Of course, in forming the back layer, conventionally used dispersants, lubricants, etc. can be used.
支持体としては、ポリエチレンテレフタレート系フィル
ム、ポリイミド、ポリアミド等が使用できる。As the support, polyethylene terephthalate film, polyimide, polyamide, etc. can be used.
磁性層についても、従来から使用されている塗布型磁性
層いずれも使用でき、γ−F e 20B 、F es
04、CO被着乃至ドープ型γ−Fe9IQ3等を代
表とする酸化物系磁性粉、Fe、N1、CO或いはこれ
らの合金・を代表とする金属乃至合金系磁性粉が適宜使
用しうる。As for the magnetic layer, any conventionally used coated magnetic layer can be used, including γ-F e 20B, F es
04, CO-coated or doped γ-Fe9IQ3, and metal or alloy magnetic powders such as Fe, N1, CO, or alloys thereof may be used as appropriate.
磁性層が電子線硬化型磁性塗膜の場合、バックコート層
として磁性層と同じ塗膜を形成することは、カール対策
上極めて有効である。これはすべての工程がオンライン
ででき、ロール状態がないため長手方向のカールが改善
される。When the magnetic layer is an electron beam-curable magnetic coating, forming the same coating as the magnetic layer as the back coat layer is extremely effective in preventing curl. All processes can be done online, and since there is no rolling condition, longitudinal curling is improved.
バック層の厚さは1〜10μ、好ましくは2〜4μの範
囲で選択される。The thickness of the back layer is selected in the range of 1 to 10 microns, preferably 2 to 4 microns.
このようなバックコート層を設けるとドロップアウトの
改善、帯電防止、走行性の改善、ディスクの磁性層側へ
のそりの改善の効果がある。Providing such a back coat layer has the effects of improving dropout, preventing electrification, improving running performance, and reducing warping of the disk toward the magnetic layer side.
さらに、この様なバック層を設けるべき磁気ディスクと
しては、コンピュータ用ディスク、磁気カメラ用ディス
クがあるが前者ではドロップアウト、後者ではディスク
のそりが重要な特性となるので、本発明のバックコート
をこれらに用いることは有効である。Further, magnetic disks that should be provided with such a back layer include computer disks and magnetic camera disks, and since dropout is an important characteristic for the former and warpage of the disk is an important characteristic for the latter, the back coat of the present invention can be used. It is effective to use it for these purposes.
以下、実施例を示すが、最初に放射線感応性結合材の合
成例を説明する。Examples will be shown below, but first a synthesis example of a radiation-sensitive binder will be described.
1L幕化ビニ一ル酢酸ビニール共重合系牲N (h”i
。1L vinyl acetate copolymerized N (h”i
.
射線感応変性樹脂)のアクリル変性体の合成ビニライト
VAGH750部とトルエン1250部、シクロヘキサ
ノン500部を574つ口゛フラスコに仕込み加熱溶解
し、80℃昇温昇温ジトリレンジイソシアネート−ヒド
ロキシエチルメタアクリレートアダクト(製法は下記註
参照)を61.4部加え、更にオクチル酸スズ0.01
2部、ハイドロキノン(1012部加え80℃でN、気
流中NOO反応率が90%となるまで反応せしめる。反
応終了後冷却し、メチルエチルケトン1250部を加え
稀釈する。750 parts of vinylite VAGH, 1250 parts of toluene, and 500 parts of cyclohexanone were placed in a 574-necked flask, heated and dissolved, and the temperature was raised to 80°C to form ditolylene diisocyanate-hydroxyethyl methacrylate adduct (radiation-sensitive modified resin). For the manufacturing method, see the notes below), add 61.4 parts, and further add 0.01 parts of tin octylate.
Add 2 parts and 1012 parts of hydroquinone and react at 80°C in a N gas stream until the NOO reaction rate reaches 90%. After the reaction is complete, cool and dilute with 1250 parts of methyl ethyl ketone.
叱)トリレンジイソシアネート(TDl)の2−ヒドロ
キシエチルメタアクリレート(2EEMA)アダクトの
製法
トリレンジインシアネート348部をN2気流中1ノの
4つ目フラスコ内で80℃に加熱後、2−へキサエチレ
ンメタアクリレート260部、オクfルr11スズ0.
07部、ハイドロキノン0..05gを反応缶内の温度
が80〜85℃となるように冷却コントロールしながら
滴下終了後8Q”Cで3時間攪拌し反応を完結させる。Method for producing 2-hydroxyethyl methacrylate (2EEMA) adduct of tolylene diisocyanate (TDl) After heating 348 parts of tolylene diisocyanate to 80°C in a fourth flask in a N2 stream, 2-hexane 260 parts of ethylene methacrylate, 0.
07 parts, hydroquinone 0. .. After the dropwise addition of 0.5 g of the reactor was completed while controlling the cooling so that the temperature inside the reaction vessel was 80 to 85°C, the reaction was completed by stirring at 8Q''C for 3 hours.
反応終了後取り出して冷却後白色ペースト状のTDIの
2 Hli:MAを得た。After the reaction was completed, the reactor was taken out and cooled to obtain TDI 2Hli:MA in the form of a white paste.
ブチラール樹脂積木化学製EM−8100部をトルエン
191.2 部、シクロヘキザノン71.4部に514
つ目フラスコに仕込み加熱溶解し80℃昇温昇温ジトリ
レンジイソシアネート−ヒドロキシエチルメタアクリレ
ートアダクト を7.4部加え、更にオクチル酸スズ0
.015部、ハイドロキノン0.015部を加え、80
°CでN、気流中NGO反応率が90%以上となるまで
反応せしめる。反応終了後冷却しメチルエチルケトンに
て稀釈する。514 parts of butyral resin EM-8 manufactured by Building Blocks Chemical Co., Ltd. was added to 191.2 parts of toluene and 71.4 parts of cyclohexanone.
Add 7.4 parts of ditolylene diisocyanate-hydroxyethyl methacrylate adduct, and add 7.4 parts of ditolylene diisocyanate-hydroxyethyl methacrylate adduct.
.. 015 parts and 0.015 parts of hydroquinone were added, and 80
The reaction was allowed to occur at °C in a N gas stream until the NGO reaction rate reached 90% or more. After the reaction is completed, the mixture is cooled and diluted with methyl ethyl ketone.
東洋紡mバイロン几V−200100部をトルエン11
6部、メチルエチルケトン116部に加熱溶解し80℃
昇温後TD工の2汎凧 アダクトを3.55部加え、オ
クチル酸スズ0.007部、ハイドロキノン0.007
部を添加し、N、気流中so”cでNCo反応率90%
以上となるまで反応せしめる。Add 100 parts of Toyobo M Byron V-200 to 11 parts of toluene.
6 parts, dissolved in 116 parts of methyl ethyl ketone and heated to 80°C.
After raising the temperature, add 3.55 parts of TD engineered two-layer kite adduct, 0.007 parts of tin octylate, and 0.007 parts of hydroquinone.
90% NCo reaction rate at SO''C in N, air flow.
Let it react until it reaches the above level.
d)エポキシ樹脂アクリル変性体の合成(放射線シェル
化学製エピコート1007 400部をトルエン50部
、■に50部に加熱溶解後N、N−ジメチルベンジルア
ミン0.006部、ハイドロキノン0.003部を添加
し80℃とし、アクリル酸69部を滴下し80℃で酸価
5以下となるまで反応せしめる。d) Synthesis of acrylic modified epoxy resin (400 parts of Epicoat 1007 manufactured by Radiation Shell Chemical Co., Ltd. was heated and dissolved in 50 parts of toluene and 50 parts of (2), and then 0.006 parts of N,N-dimethylbenzylamine and 0.003 parts of hydroquinone were added. The temperature was then raised to 80°C, 69 parts of acrylic acid was added dropwise, and the mixture was allowed to react at 80°C until the acid value reached 5 or less.
末端インシアネートのジフェニルメタンジイソシアネー
ト(MDI )系ウレタンスプレポリマー(日本ポリウ
レタン製ニッポラン4040)250部、2損隋A32
−5部、ハイドロキノン0.07部、オクチル酸スズ0
.009部を反応缶に入れ、80℃に加熱溶解後TDI
43.5部を反応缶内の温度が80〜90℃となるよ
うに冷却しながら滴下し、滴下終了後80℃でNOO反
応率95%以上となるまで反応せしめる。250 parts of diphenylmethane diisocyanate (MDI)-based urethane prepolymer with terminal incyanate (Nipporan 4040 manufactured by Nippon Polyurethane), 2-loss Sui A32
-5 parts, hydroquinone 0.07 parts, tin octylate 0
.. Pour 009 parts into a reaction can, heat to 80°C and dissolve, then TDI
43.5 parts were added dropwise while cooling the reaction vessel to a temperature of 80 to 90°C, and after the dropwise addition was completed, the reaction was allowed to proceed at 80°C until the NOO reaction rate reached 95% or more.
−アクリル変性体の合成(放射線感応エラストマ→日本
ポリウレタン社製ポリエーテルPTG −500250
部、2]IEMA 32.5部、ハイド日キノン0、0
07部、オクチル酸スズ9.009部を反応缶に入れ8
0℃に加熱溶解後’rDI 43.5部を反応缶内の温
度が80〜90°Cとなるように冷却しながら滴下し、
滴下終了後80℃でNCo反応率95%以上となるまで
反応せしめる。- Synthesis of acrylic modified product (radiation-sensitive elastomer → Polyether PTG manufactured by Nippon Polyurethane Co., Ltd. -500250
Part, 2] IEMA 32.5 part, Hyde day quinone 0,0
07 parts and 9.009 parts of tin octylate into a reaction vessel.
After heating and dissolving at 0°C, 43.5 parts of 'rDI was added dropwise while cooling so that the temperature inside the reaction vessel was 80 to 90°C.
After completion of the dropwise addition, the reaction was allowed to proceed at 80° C. until the NCo reaction rate reached 95% or more.
シンクレアベトロケミカル社製低分子量末端水酸基ポリ
ブタジエンボリFDリクイットレジンR−15250部
、2HEMA 32.5部、ハイドロキノン0.007
部、オクチル酸スズ0.009部を反応缶に入れ、80
℃に加熱溶解後TDI 43.5部を反応缶内の温度が
80〜90℃となるように冷却しながら滴下し、滴下終
了後80°CでNOO反応率95%以上となるまで反応
せしめる。Low molecular weight terminal hydroxyl group polybutadiene polybutadiene FD liquid resin R-15250 parts manufactured by Sinclair Vetrochemical Co., 2HEMA 32.5 parts, hydroquinone 0.007
Place 0.009 parts of tin octylate in a reaction vessel, and add 80 parts of tin octylate.
After heating and dissolving at 0.degree. C., 43.5 parts of TDI is added dropwise while cooling the reaction vessel to a temperature of 80 to 90.degree. C. After completion of the dropwise addition, the reaction is allowed to proceed at 80.degree. C. until the NOO reaction rate reaches 95% or more.
実施例1
カーボンブラック
旭カーボン(株)製 旭n5soo(粒径81mμ)
50部アクリル変性塩ビー酢ビ−ビニルアルコール共重
合体 (試作品) 30部
アクリル変性ポリウレタンエラストマー(試作品) 2
0部
混合溶剤(MfBK/トルエン=171) 300部上
記混合物をボールミル中5時間分散させ、磁性面が形成
されているポリエステルフィルムの裏面に乾燥厚3μに
なるように塗布し、エレクトロカーテンタイプ電子線加
速装置を用いて加速電圧150 KeV、電極電流10
mA、吸収量 fc 10 Mrad。Example 1 Carbon black manufactured by Asahi Carbon Co., Ltd. Asahi n5soo (particle size 81 mμ)
50 parts Acrylic modified chloride, vinyl chloride, vinyl acetate, vinyl alcohol copolymer (prototype) 30 parts Acrylic modified polyurethane elastomer (prototype) 2
0 parts mixed solvent (MfBK/toluene = 171) 300 parts The above mixture was dispersed in a ball mill for 5 hours, applied to the back side of the polyester film where the magnetic surface was formed to a dry thickness of 3μ, and electrocurtain type electron beam Using an accelerator, the acceleration voltage was 150 KeV and the electrode current was 10
mA, absorption fc 10 Mrad.
N3ガス中で電子線をバック層に照射し、硬化を行なっ
た後巻き取り、5“フロッピーディスクに打抜いた。こ
のサンプルをAIとする。The back layer was irradiated with an electron beam in N3 gas to cure it, then wound up and punched into a 5" floppy disk. This sample is referred to as AI.
尚、磁性層は、
コバルト被着針状γ−FegOa
(長軸0.4μ、短軸0.05μ) 120部塩ビー酢
ビ−ビニルアルコール共M合体(v、01部1社製VA
GH) 30部ポリウレタンニジストマー
(日本ポリウレタン社製N5033) 20部カーボン
ブラック(帯電防止用、三菱カーボンブラックMA −
600) 5部
α−AI、O,粉末(0,5μ) 2部溶剤(メチルエ
チルケトン/トルエン=50150) 200部からな
る混合物をボールミル中5時間分散させ、インシアネー
ト(日本ポリウレタン、コロネートL)を10部加え、
乾燥厚3μになるよう塗布することにより形成した。The magnetic layer was made of cobalt-coated acicular γ-FegOa (major axis 0.4μ, short axis 0.05μ), 120 parts chloride, vinyl acetate, vinyl alcohol co-M combination (v, 01 parts, VA manufactured by 1 company).
GH) 30 parts polyurethane distomer (N5033 manufactured by Nippon Polyurethane Co., Ltd.) 20 parts carbon black (for antistatic use, Mitsubishi Carbon Black MA -
600) 5 parts α-AI, O, powder (0.5μ) 2 parts Solvent (methyl ethyl ketone/toluene = 50150) A mixture consisting of 200 parts was dispersed in a ball mill for 5 hours, and 10 parts of incyanate (Japan Polyurethane, Coronate L) In addition,
It was formed by coating to a dry thickness of 3 μm.
実施例2
SiO2(粒径2μ) 50部
アクリル変性ボリウレクンエラストマー(試作品) 2
0部
混合溶剤 300部
上記混合物を実施例1と同様に調製し、ザンプル煮2を
得た。Example 2 SiO2 (particle size 2 μ) 50 parts Acrylic modified polyurekne elastomer (prototype) 2
0 parts Mixed solvent 300 parts The above mixture was prepared in the same manner as in Example 1 to obtain Sample Boiled 2.
実施例3
カーボンブラック“旭JJS500旭カーボン(株)″
50部アクリル変性ポリエステル樹脂(試作品) 6
0部混合溶剤 300部
上記混合物を実施例1と同様に調製しサンプルA3を得
た。Example 3 Carbon black “Asahi JJS500 Asahi Carbon Co., Ltd.”
50 parts acrylic modified polyester resin (prototype) 6
0 parts Mixed solvent 300 parts The above mixture was prepared in the same manner as in Example 1 to obtain sample A3.
実施例4
カーボンブラック“旭H8500旭カーボン(株)”5
0部アクリル変性ポリウレタンエラストマー(試作品)
30部
混合溶剤 300部
上記混合物を実施例1と同様に調整し、サンプルA4を
得た。Example 4 Carbon black “Asahi H8500 Asahi Carbon Co., Ltd.” 5
0 parts Acrylic modified polyurethane elastomer (prototype)
30 parts Mixed solvent 300 parts The above mixture was prepared in the same manner as in Example 1 to obtain sample A4.
実施例5
α−A1. 、O,粉末(0,5μ粒状) 2部分散剤
(大豆精製レシチン) 3部
溶剤(メチルエチルケトン/トルエン50150) 1
00部上記組成をボールくル中にて3時間混合し、針状
磁性酸化鉄を分散剤により良(湿潤させる。Example 5 α-A1. , O, Powder (0.5μ granules) 2 parts Disperse (refined soybean lecithin) 3 parts Solvent (methyl ethyl ketone/toluene 50150) 1
00 parts The above composition was mixed in a bowl for 3 hours to wet the acicular magnetic iron oxide with the dispersant.
アクリル二重結合導入塩酢ビ共重合体 1o部(固形分
換算)
溶剤(メチルエチルケトン/トルエン50150) 2
00部潤滑剤(高級脂肪酸変性シリコンオイル) 3部
上記結合材の混合物を良く混合溶解させる。これを先の
磁性粉処理を行なったボールミル中に投入し再び42時
間混合分散させる。Acrylic double bond-introduced salt-vinyl acetate copolymer 10 parts (solid content equivalent) Solvent (methyl ethyl ketone/toluene 50150) 2
00 parts Lubricant (higher fatty acid modified silicone oil) 3 parts The above mixture of binders is thoroughly mixed and dissolved. This was put into the ball mill that had been subjected to the magnetic powder treatment and mixed and dispersed again for 42 hours.
この様にして得られた磁性塗料を、ポリエステルフィル
ムの片面に乾燥厚3μになるように塗布し電子線硬化さ
せ、ちにその裏面にも同じ塗料で乾燥厚3μとなるよう
に塗布し電子線硬化させ、5” フロッピーディスクに
打抜いたものを、サンプルA5とする。The magnetic paint thus obtained was applied to one side of a polyester film to a dry thickness of 3μ and cured with electron beams, and then the same paint was applied to the other side of the film to a dry thickness of 3μ and electron beams were applied. The sample A5 was cured and punched into a 5" floppy disk.
比較例エ
カーボンブラック“旭ES 500” 50混合合溶剤
300部
上記混合物を実施例1と同様に塗料化を行なった後、イ
ソシアネート(日本ポリウレタン、コロネー)L)を1
0部加え、乾燥厚3μになるよう忙塗布した。その後、
60℃中に24時間放置熱硬化処理を施した後、5′φ
に打抜いた。これをサンプルA6とする。Comparative Example E-carbon black "Asahi ES 500" 50 parts mixed solvent 300 parts The above mixture was made into a paint in the same manner as in Example 1, and then 1 part of isocyanate (Nippon Polyurethane, Coronet) L)
0 parts were added, and the coating was applied to a dry thickness of 3 μm. after that,
After being heat-cured for 24 hours at 60°C, 5'φ
It was punched out. This will be referred to as sample A6.
比較例2
実施例及び比較例1で用いたバンクコートがされていな
い磁気媒体をサンプルA7とした。これは、5′φフロ
ツピ一デイスク月ディスクであり、ポリエステルフィル
ム上に磁性塗膜がコーティングされたものである。Comparative Example 2 The magnetic medium used in Examples and Comparative Example 1 without bank coating was designated as Sample A7. This is a 5'φ floppy disc with a magnetic coating coated on a polyester film.
上記サンプルA1〜7についてドロップアウト及びそり
を評価した。Dropout and warpage were evaluated for the samples A1 to A7.
ドロップアウト試験
125 KHzの単一信号を記録し、再生した場合の信
号が、平均再生レベルの40%未満の時間が8μ秒以上
であるものの個数を全トラックについて数えた。 表
1
表1かられかるように、放射線硬化処理が施されたサン
プルA1〜A5#:t、通常の熱硬化タイプのA5より
はるかにドロップアウトは少ない。Dropout Test A single signal of 125 KHz was recorded and the number of times when the reproduced signal was less than 40% of the average reproduction level for 8 μsec or more was counted for all tracks. table
1 As can be seen from Table 1, samples A1 to A5#:t subjected to radiation curing treatment had much less dropout than the normal thermosetting type A5.
そり試験
8′φに打抜いたディスクを水平面上T/r−置き、顕
?lk鏡で水平面から浮上ったディスク外周端のM同距
離dを測定した。測定結果を表2に示す。Warp test: Place the punched disk at 8'φ on a horizontal surface T/r- and observe it. The M distance d of the outer peripheral edge of the disk floating above the horizontal plane was measured using an lk mirror. The measurement results are shown in Table 2.
表2
この結果から、バックコートされているサンプルの方が
、バックコートされていないサンプルよりも、カールが
少なく、バックコートされているサンプルでも、放射線
硬化処理が施されたA1〜A5の方が通常の熱硬化タイ
プのA6よりもカールが少ないことがわかる。Table 2 From these results, the back-coated samples have less curl than the non-back-coated samples, and even the back-coated samples A1 to A5 that have been subjected to radiation curing treatment have less curl. It can be seen that there is less curl than normal thermosetting type A6.
Claims (1)
ク層を具備し、該バック層が放射線感応硬化樹脂を含む
結合剤中に充填材を分散して成るものであることを特徴
とする磁気ディスク。 2)充填材が、カーボンブラック、グラファイト等の導
電物質の粉末である特許請求の範囲第1項記載の磁気デ
ィスク。 3)充填材が8109、Tie、、Al@O,,0rH
O@、SiO、OeOg、0aOOB 、酸化亜鉛、ゲ
ーサイト、α−IPego8、タルク、カオリン、Of
!L804 %窒化硼素、テフロン粉末、フッ化黒鉛、
二硫化モリブデン、ジルコニアなどの高靭性材料の粉末
である特許請求の範囲第1又は第2項記載の磁気ディス
ク。 リ 支持体の一方の面に磁性層を形成した後、支持体の
他方の面に放射線感応硬化性樹脂を含む結合剤中に充填
材を分散した塗料をバック層として塗布し、その後活性
エネルギー線を照射して該放射線感応硬化性樹脂を硬化
することにより上記磁気ディスクを製造する方法。 5)充填材がグラファイト、カーボンブラック等の導電
物質の粉末である特許請求の範囲第4項記載の磁気ディ
スクの製造方法。 6)充填材が、B1.OQ、 ’I’10s、Al g
OB、0rQOB、sio、0θ09.0aO06、
酸化亜鉛、ゲーサイト、α−FeIlOa1タルク、カ
オリン、CaSO4、窒化硼素、テフロン粉末、フッ化
黒鉛、二硫化モリブデン、ジルコンなどの高靭性材料で
ある特許請求の範囲第4又は5項記載の磁気ディス゛り
の製造方法。 7)活性エネルギー線の照射が活性エネルギー線源とし
て、100〜750kVの電子線加速器を用い、吸収線
量が0.5〜20Mradになる様にして、不活性気体
中で行われる特許請求の範囲第4.5或いは6項記載の
磁気ディスクの製造方法。[Claims] l) A support having a magnetic layer on one side and a back layer on the other side, the back layer comprising a filler dispersed in a binder containing a radiation-sensitive curable resin. A magnetic disk characterized by being a magnetic disk. 2) The magnetic disk according to claim 1, wherein the filler is a powder of a conductive substance such as carbon black or graphite. 3) The filler is 8109, Tie,, Al@O,,0rH
O@, SiO, OeOg, 0aOOB, zinc oxide, goethite, α-IPego8, talc, kaolin, Of
! L804% boron nitride, Teflon powder, graphite fluoride,
The magnetic disk according to claim 1 or 2, which is a powder of a highly tough material such as molybdenum disulfide or zirconia. After forming a magnetic layer on one side of the support, a paint containing a filler dispersed in a binder containing a radiation-sensitive curable resin is applied as a back layer to the other side of the support. A method of manufacturing the above-mentioned magnetic disk by curing the radiation-sensitive curable resin by irradiating with. 5) The method for manufacturing a magnetic disk according to claim 4, wherein the filler is a powder of a conductive substance such as graphite or carbon black. 6) The filler is B1. OQ, 'I'10s, Al g
OB, 0rQOB, sio, 0θ09.0aO06,
The magnetic disk according to claim 4 or 5, which is a highly tough material such as zinc oxide, goethite, α-FeIlOa1 talc, kaolin, CaSO4, boron nitride, Teflon powder, graphite fluoride, molybdenum disulfide, zircon, etc. How to make ri. 7) The irradiation of active energy rays is carried out in an inert gas using a 100-750 kV electron beam accelerator as an active energy ray source so that the absorbed dose is 0.5-20 Mrad. 4. The method for manufacturing a magnetic disk according to item 5 or 6.
Priority Applications (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP58156313A JPS6050619A (en) | 1983-08-29 | 1983-08-29 | Magnetic disc and its production |
GB08420131A GB2146269B (en) | 1983-08-29 | 1984-08-08 | Magnetic recording disc and process for its production |
NL8402557A NL8402557A (en) | 1983-08-29 | 1984-08-21 | MAGNETIC RECORD DISC AND METHOD FOR PRODUCING THE SAME |
DE19843430758 DE3430758A1 (en) | 1983-08-29 | 1984-08-21 | MAGNETIC RECORDING DISC AND METHOD FOR THEIR PRODUCTION |
FR8413243A FR2551246B1 (en) | 1983-08-29 | 1984-08-27 | MAGNETIC RECORDING DISC AND MANUFACTURING METHOD THEREOF |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP58156313A JPS6050619A (en) | 1983-08-29 | 1983-08-29 | Magnetic disc and its production |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS6050619A true JPS6050619A (en) | 1985-03-20 |
Family
ID=15625065
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP58156313A Pending JPS6050619A (en) | 1983-08-29 | 1983-08-29 | Magnetic disc and its production |
Country Status (5)
Country | Link |
---|---|
JP (1) | JPS6050619A (en) |
DE (1) | DE3430758A1 (en) |
FR (1) | FR2551246B1 (en) |
GB (1) | GB2146269B (en) |
NL (1) | NL8402557A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH06239232A (en) * | 1993-02-15 | 1994-08-30 | Sumitomo Metal Ind Ltd | Vibration control device for railway rolling stock |
CN103450790A (en) * | 2013-08-22 | 2013-12-18 | 吴江市物华五金制品有限公司 | Anti-oxidizing paint for metal and wood |
Family Cites Families (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR2463477B1 (en) * | 1979-08-06 | 1988-04-08 | Sony Corp | MAGNETIC RECORDING ELEMENT |
JPS56159838A (en) * | 1980-05-12 | 1981-12-09 | Tokyo Jiki Insatsu Kk | Magnetic recording medium |
JPS57150136A (en) * | 1981-03-09 | 1982-09-16 | Fuji Photo Film Co Ltd | Magnetic recording medium and its manufacture |
JPS57169929A (en) * | 1981-04-13 | 1982-10-19 | Tdk Corp | Magnetic recording medium and its manufacture |
JPS57200937A (en) * | 1981-06-05 | 1982-12-09 | Tdk Corp | Magnetic recording medium |
JPS583132A (en) * | 1981-06-30 | 1983-01-08 | Fuji Photo Film Co Ltd | Magnetic recording medium |
WO1983000767A1 (en) * | 1981-08-20 | 1983-03-03 | Ohtsuki, Akira | Two-layer coated magnetic recording medium |
JPS5965929A (en) * | 1982-10-06 | 1984-04-14 | Tdk Corp | Magnetic recording medium and its manufacture |
-
1983
- 1983-08-29 JP JP58156313A patent/JPS6050619A/en active Pending
-
1984
- 1984-08-08 GB GB08420131A patent/GB2146269B/en not_active Expired
- 1984-08-21 NL NL8402557A patent/NL8402557A/en not_active Application Discontinuation
- 1984-08-21 DE DE19843430758 patent/DE3430758A1/en not_active Withdrawn
- 1984-08-27 FR FR8413243A patent/FR2551246B1/en not_active Expired - Fee Related
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH06239232A (en) * | 1993-02-15 | 1994-08-30 | Sumitomo Metal Ind Ltd | Vibration control device for railway rolling stock |
CN103450790A (en) * | 2013-08-22 | 2013-12-18 | 吴江市物华五金制品有限公司 | Anti-oxidizing paint for metal and wood |
Also Published As
Publication number | Publication date |
---|---|
NL8402557A (en) | 1985-03-18 |
DE3430758A1 (en) | 1985-03-21 |
FR2551246A1 (en) | 1985-03-01 |
GB8420131D0 (en) | 1984-09-12 |
GB2146269A (en) | 1985-04-17 |
FR2551246B1 (en) | 1995-03-03 |
GB2146269B (en) | 1987-03-11 |
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