JPS6049546A - Complex analytical device - Google Patents

Abstract

PURPOSE:To simplify adjustment by arranging magnetic lenses and electrostatic lenses on the optical axis of an ion source device serving as both an ion gun and an electron gun while arranging plural analytical devices so as to watch a sample on the irradiation point thereof. CONSTITUTION:Magnetic lenses 21, 22 and electrostatic lenses 31, 32 are arranged on an optical axis A of a duoplasmatron 1 of an ion source serving as both an ion gun and an electron gun in order to irradiate the same spot of a sample S by means of an ion beam and an electron beam. Further, an energy analyzer 4 is provided so as to watch the point of intersection O of the surface of the sample S and the optical axis A for getting an Auger electron detection signal through an electron detector 5 while arrangeing an X-ray spectroscope consisting of a spectrocrystal 7 and an X-ray detector 8 in the position for watching the point of intersection O. Accordingly, as two kinds of beams are radiated on the same point of the sample S, the adjustment is simplified thus making it possible to perform complex analysis with enhanced utilization rate of a space.

Description

Detailed Description of the Invention B) Industrial Application Field The present invention irradiates a sample surface with both an ion beam and an electron beam, and while the sample surface is scraped by the ion beam, the sample surface is removed from the sample excited by the electron beam irradiation. Various analysis methods are used, such as energy analysis of emitted Auger electrons, spectroscopic analysis of X-rays emitted from the sample, and mass spectrometry of secondary ions emitted from the sample surface by ion beam irradiation. The present invention relates to a complex analysis device that can be implemented.

(b) Prior Art Conventionally, in analyzers that perform Auger electron spectroscopy after ion etching, the ion gun Gi and electron gun Ge are separate, as shown in Figure 1, and the ion beam is directed onto the sample surface. The ion optical system for converging and the electron optical system for converging the electron beam on the sample surface were configured such that their respective optical axes A1 and Ae intersect on the sample S surface. Needless to say, in this type of analyzer, the ion beam and electron beam must be able to irradiate the same spot on the sample surface, but the conventional analyzer described above requires an ion optical system and an electron optical system. Because the beams are separate from each other, it is extremely difficult to adjust the equipment so that both beams illuminate the same spot on the sample surface, and a great deal of effort is required to do so. AM is still an energy analyzer for Auger electron spectroscopy, but since the ion source device occupies space, it is difficult to obtain space for arranging other analysis devices.

(c) The purpose is to provide a configuration that irradiates the same part of the target material, and thereby allows two types of beams to irradiate the same part of the sample surface. This solved the difficulty of adjustment and increased the efficiency of space utilization, making it possible to create a complex analytical device as mentioned at the beginning.

(d) Configuration When negative ions are extracted from the ion gun, electrons are also extracted at the same time. Focusing on this point, the present invention shares an ion gun and an electron gun, arranges an electrostatic lens and a magnetic lens on one optical axis including the shared gun, and combines the ion beam and electron beam. The object of the present invention is to provide an m-combination analyzer that is formed coaxially and irradiates a sample.

For example, when a duoplasmatron is used as an ion source to extract negative ions, the ion current is about 10 μ8 when operated at 10 KV, whereas the electron current is about 1 mA. At the same accelerating voltage, electrostatic lenses exhibit the same optical properties for ions and electrons, but magnetic lenses have different optical properties depending on the mass of the charged particles. Therefore, by arranging an electrostatic lens and a magnetic lens on one axis, the ratio of negative ions and electrons extracted from the gun can be arbitrarily controlled, and the same part of the sample can be irradiated with an ion beam and an electron beam. becomes possible.

(E) Embodiment FIG. 2 shows an embodiment of the present invention. 1 is an ion source duoplasmatron that serves as both an ion gun and an electron gun.

2], 22 are magnetic lenses, 31.degree. and 32 are electrostatic lenses, and these are arranged on the optical axis A that includes the ion source 1. S is a sample. 4 is a charged particle energy analyzer,
5 is an electron detector. The energy analyzer 4 is installed so as to look at the intersection O between the surface of the sample S and the optical axis A, and the energy analyzer 4 is installed so as to look at the intersection O between the surface of the sample S and the optical axis A. The specific energy is converged on the slit 6, and by superimposing a minute amplitude AC voltage on the DC voltage applied to the energy analyzer, an AC component of the same frequency is extracted from the output of the electron detector 5. An Auger electron detection signal can be obtained by extracting the In the figure, if the electron detector 5 is a four-electrode mass spectrometer and the ion detector is placed after it, it is possible to perform mass analysis of the secondary ions emitted from the sample when the sample S is irradiated with an ion beam. can. As a practical matter, it is structurally difficult to replace the electron detector 5 with a four-electrode mass spectrometer, so an energy analyzer for secondary ion mass spectrometry is installed, although it is not shown in this example for reasons of illustration. It is installed so as to stare at the zero point, and a mass spectrometer and an ion detector are placed behind it. Reference numeral 7 denotes a spectroscopic crystal for dispersing X-rays emitted from the zero point on the sample S, and 8 an X-ray detector, which constitute an X-ray spectrometer that focuses on the zero point.

FIG. 3 is a diagram illustrating the operation of the ion and electron optical systems in the above embodiment. In the figure, the solid line indicates the ion beam, and the dotted line E indicates the electron beam. Ion source 1
The ions and electrons emitted from the are accelerated by the same accelerating voltage, so they have the same energy. In such a case, the magnetic ins has almost no effect on ions whose quality m is significantly smaller than that of electrons, and only the electron beam E is focused on 11 points up to the magnetic lens 2. Aperture into the magnetic lens 22,
! The current of the electron beam passing through the aperture 9 can be adjusted by adjusting the strength of the lens 21 and changing the distance between the 11 points and the aperture 9. The magnetic lens 22 acts to make the spread angle α of the electron beam that has passed through the aperture 9 approximately coincide with the wide angle β of the ion beam A, and to form an 11-point electron beam virtual image on the ion-electron common source Q. . The ion beam and electron beam, whose spread angles match in this way, are influenced by the electrostatic lenses 31 and 32 in exactly the same way and are converged to the zero point on the sample S.

(f) Effect As described above, the present invention provides an analyzer that irradiates a sample with an ion beam and an electron beam, in which the ion source and the electron source are used in common, and the beams are focused onto the sample using the same optical system. Therefore, there is no need for difficult assembly and adjustment work as in the conventional case.
Since the same point on the sample can be irradiated with the ion beam and electron beam accurately, and the ion optical system and electron optical system are common, the entire area around the sample can be used as a space for various analysis devices. Since the sample surface is removed by ion etching, not only Auger electron spectroscopy analysis but also various analysis methods such as X-ray spectroscopy and secondary ion mass spectrometry can be performed simultaneously.

[Brief explanation of the drawing]

FIG. 1 is a side view of a conventional device, FIG. 2 is a side view of an embodiment of the present invention, and FIG. 3 is an explanatory diagram of the operation of the charged particle beam optical system of the same embodiment. 1... Ion source serving as both an ion source and an electron source, 2.1.
2゜2...Magnetic lens, 31.32...Electrostatic lens, 4...Energy analyzer, 5...Electron detector, 7
...X-ray spectrometer crystal, 8...X-ray detector, 9...aperture, S...sample, E...electron beam, ■...ion beam. Agent Patent Attorney Kosuke Mai

Claims (1)

[Claims] An ion source device that serves as both an ion gun and an electron gun, a magnetic lens and an electrostatic lens that are arranged on one optical axis including this ion source device, and A complex analysis device similar to multiple types of analysis devices placed around the same sample so as to face the ion beam and electron beam irradiation points.