JPS6047026A - Novel polymer - Google Patents
Novel polymerInfo
- Publication number
- JPS6047026A JPS6047026A JP15329483A JP15329483A JPS6047026A JP S6047026 A JPS6047026 A JP S6047026A JP 15329483 A JP15329483 A JP 15329483A JP 15329483 A JP15329483 A JP 15329483A JP S6047026 A JPS6047026 A JP S6047026A
- Authority
- JP
- Japan
- Prior art keywords
- polymer
- formula
- benzene
- present
- toluene
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Silicon Polymers (AREA)
Abstract
Description
【発明の詳細な説明】
〔発明のオＵ用分野〕
本発明は機能性高分子材料として、極めて有用な新規な
重合体に関する。DETAILED DESCRIPTION OF THE INVENTION [Field of the Invention] The present invention relates to a novel polymer that is extremely useful as a functional polymer material.
更に詳しくは、式（１）で表わされる構成単位よシなる
重合体に関するものである。More specifically, it relates to a polymer consisting of a structural unit represented by formula (1).
高分子主鎖に５ｉ−８ｉ結合を有する重合体としては、
式（２＞で表わされる構成単位
よりなる重合体などが知られているが、感光性材料など
の電子材料として使用する場合、汎用有機溶媒に対する
溶解性に乏しいために、実用上、その改善が強く望まれ
ていた。As a polymer having 5i-8i bonds in the polymer main chain,
Polymers consisting of structural units represented by the formula (2>) are known, but when used as electronic materials such as photosensitive materials, they have poor solubility in general-purpose organic solvents, so it is difficult to improve them in practice. It was strongly desired.
また、基板上に成膜して使用する場合、塗膜が均質に形
成できなかったり、あるいは塗膜が柔軟すぎたシして、
実用に供し得ないものであった。In addition, when using a film formed on a substrate, the film may not be uniformly formed or may be too flexible.
It could not be put to practical use.
本発明の目的は、上記した材料の欠点を補い特に溶解性
のすぐれたことを特徴とする、高分子主鎖に５ｉ−８ｉ
結合を有する重合体を提供することにある。The object of the present invention is to compensate for the drawbacks of the above-mentioned materials and to provide a material with 5i-8i in the polymer main chain, which is characterized by particularly excellent solubility.
The object of the present invention is to provide a polymer having a bond.
上記の目的を達成するために、本発明者は、５ｉ−８ｉ
結合を有する重合体を種々合成した結果、下記一般式（
１）で表わされる構成単位よシなる重合体が上記目的を
満足する有用な重合体であることを見い出した。In order to achieve the above object, the present inventor has developed a 5i-8i
As a result of synthesizing various polymers having bonds, the following general formula (
It has been found that a polymer consisting of the structural unit represented by 1) is a useful polymer that satisfies the above objectives.
１本発明０重合体は・バフ −ｅ ｘ （ｌ ｏ ｏ
ｌ ｆルフェニルシリル）ベンゼン（３）を金属ナトリ
ウム
られる。1 The polymer of the present invention is buff -ex (lo o
l f ruphenylsilyl)benzene (3) is converted into sodium metal.
本発明の重合体は常態では結晶であ蝋 トルエン等の有
機溶媒に容易に溶解するので、この溶液を用いて種々の
成形品、例えばフィルム、繊維、シート等に成形するこ
とができる。Since the polymer of the present invention is crystalline in its normal state and easily dissolves in organic solvents such as wax and toluene, it can be molded into various molded products such as films, fibers, sheets, etc. using this solution.
ま／辷、本発明の重合体は各種の金属やガラスに対する
密着性にすぐれており、接着剤や塗料等としての利用に
も供し得る。Additionally, the polymer of the present invention has excellent adhesion to various metals and glasses, and can be used as adhesives, paints, and the like.
更に、本発明の重合体は機能性高分子材料として、極め
て有用である。すなわち、本発明の重合体は感光性材料
や感放射線材料として有用に用いられるものであシ、ま
た、耐熱性が高いために、絶縁材料などにも利用できる
。Furthermore, the polymer of the present invention is extremely useful as a functional polymer material. That is, the polymer of the present invention can be usefully used as a photosensitive material or a radiation-sensitive material, and since it has high heat resistance, it can also be used as an insulating material.
また、本発明の重合体の数平均分子量は１，０００〜ｉ
、ｏｏｏ、ｏｏｏである。ｉ ｏｏｏ以下では、機能性
高分子材料として用いることは困難である。Further, the number average molecular weight of the polymer of the present invention is 1,000 to i
, ooo, ooo. If it is less than i ooo, it is difficult to use it as a functional polymer material.
本発明の重合体には、それ自体公知の処方に従い、周知
の配合剤、例えば酸化防止剤、熱安定剤、着色剤、難燃
剤等を配合しても良い。The polymer of the present invention may be blended with well-known compounding agents such as antioxidants, heat stabilizers, colorants, flame retardants, etc. according to known formulations.
以下に、本発明を合成例および実施例につき具体的に説
明する力も本発明はこの実施例に限定されるものではな
い。The present invention will be specifically explained below with reference to synthesis examples and examples, but the present invention is not limited to these examples.
合成例１（パラ−ビス（メチルフェニルエトキシシリル
）ベンゼン（４）の合成）
撹拌器、冷却器、滴下ロートを付した５００ｆｎｌの三
つロフ′ラスコに、メチルフェニルジエトキシシラン１
２３４．マグ°ネシウム１４２とテトラヒドロフラン１
００ ｍｌを加えて撹拌し、窒素気流下で滴下ロー川・
よりｐ−ジブロムベンゼン〜６９ｙのテトラヒドロフラ
ン溶液１００ｍ１を約６時間で滴下した。滴下後、撹拌
を続けながら、更に約５時間還流した。還流後、戸別し
、続いて溶媒を留去し、減圧蒸溜によシ、パラ−ビス（
メチルフェニルエトキシシリル）ベンゼンｎｙ （収率
ニア８％）（沸点： ２１３〜２１５°Ｃ／３ｍｍＨｙ
）を得た。Synthesis Example 1 (Synthesis of para-bis(methylphenylethoxysilyl)benzene (4)) In a 500fnl three-loaf flask equipped with a stirrer, a condenser, and a dropping funnel, 1 methylphenyldiethoxysilane was added.
234. Magnesium 142 and Tetrahydrofuran 1
00 ml, stirred and added dropwise under nitrogen stream.
Then, 100 ml of a solution of p-dibromobenzene ~69y in tetrahydrofuran was added dropwise over about 6 hours. After the dropwise addition, the mixture was further refluxed for about 5 hours while stirring was continued. After refluxing, the solvent was distilled off, and the parabis(
methylphenylethoxysilyl)benzene ny (yield near 8%) (boiling point: 213-215°C/3mmHy
) was obtained.
し４〕のＮＭＲスペクトル（ＣＣ１４） δ（１円）：
０．７６ （５Ｈ，ｓ 、Ｍａ Ｓ＆ ） 、 １．３
６ （３Ｉ４． ｔ 、 ＣＨ２Ｏ）。4] NMR spectrum (CC14) δ (1 yen):
0.76 (5H,s, Ma S&), 1.3
6 (3I4.t, CH2O).
３．９４ （２１−１、ｑ 、 ＣＨ２−８ｉ ） 、
７．４〜７．８ （７Ｈ，ｔｎ、 ｒｉｎｇｐｒｏｔ
ｏｎｓ ）
合成例２（パラ−ビス（クロロメチルフェニル）ベンゼ
ン［３Ｊの合成）
合成例１で得たパラ−ビス（メチルフェニルエトキシシ
リル）ベンゼン９２２とナセチルクロリド２５０２とを
約５時間還流することによシ、９４％の収率でパラ−ビ
ス（クロロメチルフェニルシリル）ベンゼン８２ｖ（沸
点： ２２９〜２３２°０．／ｓ ｍｙｎＨｙ）を得た
。3.94 (21-1, q, CH2-8i),
7.4~7.8 (7H, tn, ringprot
ons) Synthesis Example 2 (Synthesis of para-bis(chloromethylphenyl)benzene [3J) Refluxing para-bis(methylphenylethoxysilyl)benzene 922 obtained in Synthesis Example 1 and nacetyl chloride 2502 for about 5 hours. As a result, 82 V of para-bis(chloromethylphenylsilyl)benzene (boiling point: 229-232°0./s mynHy) was obtained with a yield of 94%.
〔６〕のＮＭＲスペクトル（ＣＣＺ４） δ（１戸）：
１．００ （５Ｈ，ｓ 、Ｍｅ−８ｉ ） 、７．５〜
７．８ （７Ｈ，’ｍ、 ｒｉｎｇｐｒｏｔｏｎｓ ）
実施例１
撹拌器、冷却器、滴下口−トをイ号シた３００ｍ１の三
つロフラスコに、窒素気流下でナトリウム２を゛含むト
ルエン約１００ ｍｌＪのデスバージョン溶液に、合成
例２で得たパラ−ビス（クロロメチルフェニルシリル）
ベンゼン１５７ノベンセン溶液１００ｍ１をゆっくシと
滴下し、７０〜８０℃で約２０時間加熱した。加熱後、
得られたポリマーをベンゼン−エタノール（１： １
ｂｙ ｖｏｗ ）溶液で再沈し、約６５％の収率で、
なる組成のポリマーの白色粉末を得た。[6] NMR spectrum (CCZ4) δ (1 house):
1.00 (5H,s, Me-8i), 7.5~
7.8 (7H,'m, ringprotons) Example 1 Approximately 100 mlJ of toluene containing sodium 2 was added to a 300 ml three-necked flask equipped with a stirrer, a condenser, and a dropping spout under a nitrogen stream. Para-bis(chloromethylphenylsilyl) obtained in Synthesis Example 2 is added to the desversion solution.
100 ml of benzene 157 nobenzene solution was slowly added dropwise and heated at 70 to 80° C. for about 20 hours. After heating,
The obtained polymer was mixed with benzene-ethanol (1:1
A white powder of a polymer having the following composition was obtained with a yield of about 65%.
得られたポリマーの性状および機器分析結果を以下に示
す。The properties and instrumental analysis results of the obtained polymer are shown below.
融点＝１５５〜１６３°Ｃ
数平均分子量： ５４．００Ｏ
ＮＭＲスペクトル（Ｃ６Ｄ６）δ（ｐｐｎ＋） ： ０
．６４（３１４゜ｓ 、 Ｍｅ −４３ｉ ） 、 ７
．２６ ａｎｄ ７．３０ （７Ｈ、、ｒｉｎｇ ｐｒ
ｏｔｏｎｓ ）１１Ｒスペクトル：、 ３０Ｂ０ 、５
０６０ 、２９８０ 、 １４ろ５゜１３Ｂ５ 、１２
６０ 、１１３０ 、１１１０ 、１ｏ００ ｃｎ′Ｌ
ＵＶスペクトル： λｍａｘ２７Ｑｎｍ〔発明の効果〕
本発明の重合体は感光性材料等の機能性高分子材料とし
て極めて効用の犬なるものである。Melting point = 155-163°C Number average molecular weight: 54.00O NMR spectrum (C6D6) δ (ppn+): 0
．． 64 (314゜s, Me-43i), 7
．． 26 and 7.30 (7H,, ring pr
otons) 11R spectrum:, 30B0, 5
060, 2980, 14ro5゜13B5, 12
60 , 1130 , 1110 , 1o00 cn'L
UV spectrum: λmax27Qnm [Effects of the Invention] The polymer of the present invention is extremely useful as a functional polymer material such as a photosensitive material.
１８９−189-
Claims (1)
る新規な重合体A novel polymer characterized by consisting of a structural unit represented by formula (1)
Priority Applications (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP15329483A JPS6047026A (en) | 1983-08-24 | 1983-08-24 | Novel polymer |
| DE8484107029T DE3470103D1 (en) | 1983-06-24 | 1984-06-19 | Photo and radiation-sensitive organopolymeric material |
| EP84107029A EP0129834B1 (en) | 1983-06-24 | 1984-06-19 | Photo and radiation-sensitive organopolymeric material |
| US06/623,168 US4544729A (en) | 1983-06-24 | 1984-06-22 | Photo and radiation-sensitive organopolymeric material |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP15329483A JPS6047026A (en) | 1983-08-24 | 1983-08-24 | Novel polymer |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6047026A true JPS6047026A (en) | 1985-03-14 |
| JPS6320451B2 JPS6320451B2 (en) | 1988-04-27 |
Family
ID=15559325
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP15329483A Granted JPS6047026A (en) | 1983-06-24 | 1983-08-24 | Novel polymer |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6047026A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2004507844A (en) * | 2000-08-25 | 2004-03-11 | レオポルト・コスタール・ゲゼルシヤフト・ミト・ベシユレンクテル・ハフツング・ウント・コンパニー・コマンデイトゲゼルシヤフト | Rotary actuator |
-
1983
- 1983-08-24 JP JP15329483A patent/JPS6047026A/en active Granted
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2004507844A (en) * | 2000-08-25 | 2004-03-11 | レオポルト・コスタール・ゲゼルシヤフト・ミト・ベシユレンクテル・ハフツング・ウント・コンパニー・コマンデイトゲゼルシヤフト | Rotary actuator |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6320451B2 (en) | 1988-04-27 |
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