JPS6045024A - ドライエツチング装置 - Google Patents

ドライエツチング装置

Info

Publication number
JPS6045024A
JPS6045024A JP15377283A JP15377283A JPS6045024A JP S6045024 A JPS6045024 A JP S6045024A JP 15377283 A JP15377283 A JP 15377283A JP 15377283 A JP15377283 A JP 15377283A JP S6045024 A JPS6045024 A JP S6045024A
Authority
JP
Japan
Prior art keywords
sample
dry etching
electrodes
etching apparatus
pair
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP15377283A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0566724B2 (cs
Inventor
Haruo Okano
晴雄 岡野
Takashi Yamazaki
隆 山崎
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp filed Critical Toshiba Corp
Priority to JP15377283A priority Critical patent/JPS6045024A/ja
Publication of JPS6045024A publication Critical patent/JPS6045024A/ja
Publication of JPH0566724B2 publication Critical patent/JPH0566724B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32623—Mechanical discharge control means

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Drying Of Semiconductors (AREA)
JP15377283A 1983-08-23 1983-08-23 ドライエツチング装置 Granted JPS6045024A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP15377283A JPS6045024A (ja) 1983-08-23 1983-08-23 ドライエツチング装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP15377283A JPS6045024A (ja) 1983-08-23 1983-08-23 ドライエツチング装置

Publications (2)

Publication Number Publication Date
JPS6045024A true JPS6045024A (ja) 1985-03-11
JPH0566724B2 JPH0566724B2 (cs) 1993-09-22

Family

ID=15569796

Family Applications (1)

Application Number Title Priority Date Filing Date
JP15377283A Granted JPS6045024A (ja) 1983-08-23 1983-08-23 ドライエツチング装置

Country Status (1)

Country Link
JP (1) JPS6045024A (cs)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63164219U (cs) * 1986-11-19 1988-10-26
US5099790A (en) * 1988-07-01 1992-03-31 Canon Kabushiki Kaisha Microwave plasma chemical vapor deposition apparatus
US5695597A (en) * 1992-11-11 1997-12-09 Mitsubishi Denki Kabushiki Kaisha Plasma reaction apparatus

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63164219U (cs) * 1986-11-19 1988-10-26
US5099790A (en) * 1988-07-01 1992-03-31 Canon Kabushiki Kaisha Microwave plasma chemical vapor deposition apparatus
US5695597A (en) * 1992-11-11 1997-12-09 Mitsubishi Denki Kabushiki Kaisha Plasma reaction apparatus

Also Published As

Publication number Publication date
JPH0566724B2 (cs) 1993-09-22

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