JPS6042900B2 - Photometric device - Google Patents
Photometric deviceInfo
- Publication number
- JPS6042900B2 JPS6042900B2 JP10997478A JP10997478A JPS6042900B2 JP S6042900 B2 JPS6042900 B2 JP S6042900B2 JP 10997478 A JP10997478 A JP 10997478A JP 10997478 A JP10997478 A JP 10997478A JP S6042900 B2 JPS6042900 B2 JP S6042900B2
- Authority
- JP
- Japan
- Prior art keywords
- photometric
- light
- lens
- optical system
- distribution
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 230000003287 optical effect Effects 0.000 claims description 24
- 238000005375 photometry Methods 0.000 claims description 10
- 238000009792 diffusion process Methods 0.000 claims description 6
- 230000004907 flux Effects 0.000 claims 1
- 238000010586 diagram Methods 0.000 description 4
- 230000000694 effects Effects 0.000 description 3
- 230000007423 decrease Effects 0.000 description 2
- 239000004744 fabric Substances 0.000 description 1
- 239000005337 ground glass Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000004091 panning Methods 0.000 description 1
- 230000002093 peripheral effect Effects 0.000 description 1
- 210000001747 pupil Anatomy 0.000 description 1
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J1/00—Photometry, e.g. photographic exposure meter
- G01J1/02—Details
- G01J1/04—Optical or mechanical part supplementary adjustable parts
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J1/00—Photometry, e.g. photographic exposure meter
- G01J1/02—Details
- G01J1/04—Optical or mechanical part supplementary adjustable parts
- G01J1/0407—Optical elements not provided otherwise, e.g. manifolds, windows, holograms, gratings
- G01J1/0411—Optical elements not provided otherwise, e.g. manifolds, windows, holograms, gratings using focussing or collimating elements, i.e. lenses or mirrors; Aberration correction
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J1/00—Photometry, e.g. photographic exposure meter
- G01J1/02—Details
- G01J1/04—Optical or mechanical part supplementary adjustable parts
- G01J1/0407—Optical elements not provided otherwise, e.g. manifolds, windows, holograms, gratings
- G01J1/0474—Diffusers
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Photometry And Measurement Of Optical Pulse Characteristics (AREA)
- Exposure Control For Cameras (AREA)
Description
【発明の詳細な説明】
本発明は測光装置、特に、望ましい測光分布が得られる
測光装置に関するものである。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a photometric device, and particularly to a photometric device that can obtain a desired photometric distribution.
物体、情報等の被測光体からの光をレンズ等の集光光学
系によつて測光素子上に集光することによつて測光する
装置は既に知られている。2. Description of the Related Art Apparatuses that perform photometry by condensing light from a photometric object such as an object or information onto a photometric element using a condensing optical system such as a lens are already known.
この様な装置において、口径食や、COS’則によつて
測光界周辺部の測光ウエートが著しく中心部に比べて低
くなる、すなわち中央重点測光、傾向が有つた。In such devices, due to vignetting and the COS' law, the photometric weight at the periphery of the photometric field tends to be significantly lower than that at the center, that is, there is a tendency for center-weighted photometry.
測光界周辺部の測光ウエートが著しく中心部に比べて低
くない測光が望まれる場合、この測光装置は好ましくな
かつた。特に連続的なシーンを撮影するシネカメラの測
光装置においてパンニング操作の際画面の急激な露光量
の変化を伴う為、中央重点測光を好ましくなく、平均測
光が望まれている。従つて、集光光学系を使用する測光
装置におい「山−2l−ご眉言!、IIAちSMIfi
L’、−1−|【■上古6を−■1Hh布[IX−仝ヨ
小測光分布に変更することが望まれる。This photometric device is not preferred when photometry is desired in which the photometric weight at the periphery of the photometric field is not significantly lower than that at the center. In particular, in photometering devices for cine cameras that photograph continuous scenes, center-weighted photometry is not preferred, and average photometry is desired, since panning operations involve sudden changes in the exposure of the screen. Therefore, in a photometric device that uses a condensing optical system,
L', -1-|[■ It is desirable to change the old 6 to -■1Hh cloth [IX-Yo small photometric distribution.
本発明はこの点を考慮して為されたものである。The present invention has been made in consideration of this point.
従つて、本発明の目的は測光分布が変更された集光光学
系を使用する測光装置を提供することにある。そして、
この目的は測光分布変更手段を集光光学系の一部に形成
したことによつて達成している。すなわち、本発明は測
光分布変更手段を単に装置内に設けることではなく、こ
の手段を集光光学系の一部に形成することを特徴として
いる。SUMMARY OF THE INVENTION Accordingly, an object of the present invention is to provide a photometric device using a condensing optical system with a modified photometric distribution. and,
This objective is achieved by forming the photometric distribution changing means as a part of the condensing optical system. That is, the present invention is characterized in that the photometric distribution changing means is not simply provided within the apparatus, but is formed as a part of the condensing optical system.
この特徴によつて、単に、測光分布を変更するのみなら
ず、作製の容易さ等の効果を有するものである。以下本
発明の実施例を添付した図面を使用して説明する。Due to this feature, it not only changes the photometric distribution but also has effects such as ease of manufacturing. Embodiments of the present invention will be described below with reference to the accompanying drawings.
第1図は従来の測光装置を有するシネカメラの光学配置
図で、1は対物レンズでフィルム3上に被写体像を形成
する。1’は対物レンズ1中に配置されたビームスプリ
ッターで不図示のファインダー光学系の方向に光を分割
する。FIG. 1 is an optical arrangement diagram of a cine camera having a conventional photometric device, in which numeral 1 denotes an objective lens which forms an object image on a film 3. As shown in FIG. Reference numeral 1' denotes a beam splitter disposed in the objective lens 1, which splits light in the direction of a finder optical system (not shown).
2は)対物レンズ1とフィルム3の間に配置された測光
光束分割用の光分割器である。この光分割器2は平行平
面板の間にハーフミラーを光軸に対して傾設している。
このハーフミラーによつて反射された光は光分割器の入
射面によつて全反射され、出;射面より射出される。4
はレンズである。2) is a light splitter for photometric light beam splitting arranged between the objective lens 1 and the film 3; This light splitter 2 has a half mirror tilted with respect to the optical axis between parallel plane plates.
The light reflected by this half mirror is totally reflected by the incident surface of the light splitter and exits from the incident surface. 4
is a lens.
対物レンズ1及びこのレンズ4によつて測光素子5に対
して集光光学系を構成する。測光素子5の配置位置はこ
の集光光学系の射出瞳位置近傍である。又、レンズ4は
測光素子5の配置位置等によつては凹面鏡としても良い
。第2図は第1図の測光素子5の部分が示されている。The objective lens 1 and this lens 4 constitute a condensing optical system for the photometric element 5. The photometric element 5 is arranged near the exit pupil position of the condensing optical system. Further, the lens 4 may be a concave mirror depending on the arrangement position of the photometric element 5, etc. FIG. 2 shows a portion of the photometric element 5 in FIG. 1.
この図から解るように、軸外光10は軸上光11に比ベ
ロ径食によつて光束幅がせまくなつている。更に、CO
S4則による照度の低下、レンズ4がフレネルレンズの
場合に生じる鋸部での光量ロス、あるいは軸外光の一部
が測光素子に入射しない等々の原因で周辺照度の低下が
生じる。この為、従来の集光光学系を使用している測光
装置は中央重点的な測光分布になつてしまう。この為、
本発明の測光装置は集光光学系特に、対物レンズ1と測
光素子5の間に配置されたレンズ、に測光分布を変更す
る手段を設けることによつて中央重点的な測光分布を他
の測光分布に変更している。第3図には本発明の測光装
置に適用するレンズ13が示されている。As can be seen from this figure, the beam width of the off-axis light 10 is narrower than that of the on-axis light 11 due to the relative radial eclipse. Furthermore, CO
The peripheral illuminance decreases due to reasons such as a decrease in illuminance due to the S4 rule, a loss in the amount of light at the saw section when the lens 4 is a Fresnel lens, or a portion of off-axis light not entering the photometric element. For this reason, a photometric device using a conventional condensing optical system has a center-weighted photometric distribution. For this reason,
The photometric device of the present invention has a means for changing the photometric distribution in the condensing optical system, particularly in the lens disposed between the objective lens 1 and the photometric element 5. The distribution has changed. FIG. 3 shows a lens 13 applied to the photometric device of the present invention.
このレンズ13は第1図のレンズ4の代りに配置される
。そして、このレンズの光軸部分には測光分布を変更す
る手段として拡散面6が形成されている。この拡散面は
スリガラス等のマット面、回折格子面等によつて形成,
し、少なくともこの部分に入射した光が測光素子面より
大きく拡散する拡散特性を有していることが望まれる。
この様に構成することによつて、レンズ13の中心部を
通る光のある部分は拡散によつて測光素子5に入射しな
い為、測光分布が変更ζする。従つて、拡散の度合、拡
散面の大きさ等を適宜設定することによつて平均測光が
行ない得る。第5図Bには第3図のレンズ13によつて
得られる測光分布が示されている。This lens 13 is placed in place of lens 4 in FIG. A diffusing surface 6 is formed on the optical axis of this lens as a means for changing the photometric distribution. This diffusion surface is formed by a matte surface such as ground glass, a diffraction grating surface, etc.
However, it is desirable that at least this portion has a diffusion characteristic in which the light incident on this portion is diffused more than on the photometric element surface.
With this configuration, a certain portion of the light passing through the center of the lens 13 is diffused and does not enter the photometric element 5, so that the photometric distribution changes ζ. Therefore, average photometry can be performed by appropriately setting the degree of diffusion, the size of the diffusion surface, etc. FIG. 5B shows the photometric distribution obtained by the lens 13 of FIG.
第5図Aに示され3た第1図の装置によつて得られる中
央重点的な測光分布に比べて測光ウエートが画面の各部
に平均化されていることが理解される。第4図には本発
明の第2実施例に使用するレンズ15が示されている。It will be appreciated that the photometric weights are averaged over different parts of the screen as compared to the center-weighted photometric distribution obtained with the apparatus of FIG. 1 shown in FIG. 5A. FIG. 4 shows a lens 15 used in a second embodiment of the invention.
このレンズ15には測光分布を変更する手段として集光
光学系の正規の集光作用を変更する手段、例えば異なる
曲率の面、レンズの切欠き、遮光板の設置等が形成され
ている。第4図の実施例においては、フレネル非形成面
8が形成されている。又、このフレネル非形成面8は被
写界の上部、すなわち空部からの光を測光素子5に向わ
さない様な位置に形成されている。すなわちフレネル非
形成面8は素通し面であノる為、測光素子5を素通し光
束の通過位置よりはずして配置することによつてこの部
分の光の多くは測光されない。従つて、測光分布が変更
される。この様に空部の測光を行なわない理由は明るい
空部からの光に影響されずに適切な露光を得る−為であ
る。もちろんこのフレネル形成面8部に遮光板をおいて
も同様の効果を得る。尚、このフレネル非形成面8によ
つて測光分布の変更は可能であるが、本実施例において
は更に測光分布を所望なものとする為第3図と同様に中
心部に拡散面6が設けられている。これによつて、空部
の測光ウエートが低く、かつそれ以外の部分においては
平均測光の測光分布が得られる。この測光分布は第5図
Cに示されている。尚第4図の16はレンズホルダーで
ある。又第3図、第4図の両実施例においてフレネル面
7は光分割器2側に配置されている方が拡散効果上好ま
しい。This lens 15 is formed with means for changing the normal light focusing action of the light focusing optical system as a means for changing the photometric distribution, such as a surface with a different curvature, a notch in the lens, a light shielding plate, etc. In the embodiment shown in FIG. 4, a Fresnel-free surface 8 is formed. Further, this Fresnel non-forming surface 8 is formed at a position that does not direct light from the upper part of the field, that is, the sky, toward the photometric element 5. That is, since the Fresnel non-forming surface 8 is a transparent surface, by arranging the photometric element 5 away from the passing position of the transparent light beam, much of the light in this portion is not photometered. Therefore, the photometric distribution is changed. The reason why photometry is not performed in the sky is to obtain appropriate exposure without being affected by light from the bright sky. Of course, the same effect can be obtained by placing a light shielding plate on the 8 portions of the Fresnel forming surface. Although it is possible to change the photometric distribution using this Fresnel-free surface 8, in this embodiment, in order to further obtain a desired photometric distribution, a diffusing surface 6 is provided at the center as shown in FIG. It is being As a result, the photometric weight of the empty area is low, and a photometric distribution of average photometry is obtained in other areas. This photometric distribution is shown in FIG. 5C. Note that 16 in FIG. 4 is a lens holder. Furthermore, in both the embodiments shown in FIGS. 3 and 4, it is preferable for the Fresnel surface 7 to be placed on the light splitter 2 side in view of the diffusion effect.
第1図及び第2図は集光光学系を使用した従来の測光装
置を適用したシネカメラの光学配置図、第3図は本発明
の測光装置の第1実施例に適用する集光光学系を示す図
、第4図は第2実施例に適用する集光光学系を示す図、
第5図は測光分布を示す図である。
図中、1,4は集光光学系、2は光分割器、3はフィル
ム、5は測光素子、6は拡散面、7はフレネル面、8は
フレネル非形成面、10は軸外光、11は軸上光、13
,15はフレネルレンズである。1 and 2 are optical layout diagrams of a cine camera to which a conventional photometric device using a condensing optical system is applied, and FIG. 3 shows a condensing optical system applied to the first embodiment of the photometric device of the present invention. FIG. 4 is a diagram showing a condensing optical system applied to the second embodiment,
FIG. 5 is a diagram showing the photometric distribution. In the figure, 1 and 4 are condensing optical systems, 2 is a light splitter, 3 is a film, 5 is a photometric element, 6 is a diffusing surface, 7 is a Fresnel surface, 8 is a Fresnel-free surface, 10 is off-axis light, 11 is on-axis light, 13
, 15 are Fresnel lenses.
Claims (1)
集光し測光する測光装置において、前記集光光学系の一
部分に該集光光学系の光軸近傍の光束を拡散させる拡散
手段を有した光学部材を配置し、被測光体の測光分布を
変更させたことを特徴とする測光装置。1. In a photometry device that performs photometry by condensing light from a photometric object onto a photometric element using a condensing optical system, a diffusion device that diffuses a luminous flux near the optical axis of the condensing optical system in a part of the condensing optical system. 1. A photometric device characterized in that an optical member having a means is arranged to change the photometric distribution of a photometric object.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP10997478A JPS6042900B2 (en) | 1978-09-07 | 1978-09-07 | Photometric device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP10997478A JPS6042900B2 (en) | 1978-09-07 | 1978-09-07 | Photometric device |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5536767A JPS5536767A (en) | 1980-03-14 |
JPS6042900B2 true JPS6042900B2 (en) | 1985-09-25 |
Family
ID=14523862
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP10997478A Expired JPS6042900B2 (en) | 1978-09-07 | 1978-09-07 | Photometric device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6042900B2 (en) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5732426A (en) * | 1980-08-02 | 1982-02-22 | Konishiroku Photo Ind Co Ltd | Photometric method of camera |
US7761003B2 (en) | 2007-05-24 | 2010-07-20 | Nikon Corporation | Optical apparatus and manufacturing method of optical apparatus |
-
1978
- 1978-09-07 JP JP10997478A patent/JPS6042900B2/en not_active Expired
Also Published As
Publication number | Publication date |
---|---|
JPS5536767A (en) | 1980-03-14 |
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