JPS6034349Y2 - Draft chamber equipment - Google Patents

Description

[Detailed description of the invention] The purpose of this invention is to separate and locally discharge various types of toxic mist (mist generated from chemicals used) from draft chamber equipment in the cleaning process of the semiconductor industry, etc. The present invention provides a simple and inexpensive device.

In the semiconductor industry, due to the uniqueness of semiconductors, products must be manufactured by repeatedly forming various metal films, oxide films, dielectric films, organic compounds, etc., and removing unnecessary parts thereof.

There are some of these work processes that require several etching and cleaning devices to be installed and run on one line.

Conventionally, there are many types of chemicals (cleaning liquids) used, including inorganic chemicals such as nitric acid, hydrofluoric acid, and sulfuric acid, and organic solvents such as trichlene and alcohol xylene.Depending on the specificity of the chemicals, draft chamber equipment is specialized for each chemical used. I am using it.

However, although separate exhaust is required to discharge the generated mist, the conventional exhaust method using an exhaust fan requires a large amount of space for connecting the exhaust duct, and equipment for the equipment and neutralization tower. Due to the high cost involved, currently all mist is exhausted through the same exhaust system, except in special cases.

This problem also has an adverse effect on the factory layout since the same exhaust devices must be installed in a concentrated manner in relation to the exhaust system, which conflicts with the work surface.

The present invention introduces an aspirator mechanism using liquid (water) to enable localized and separated discharge of generated mist, thereby eliminating the above-mentioned drawbacks of the conventional method.

The present invention is a draft chamber device for chemical processing, in which the exhaust port of the chamber is connected to an aspirator connected to a water pipe equipped with a water flow rate control valve, the water pipe is connected to a waste liquid treatment tank, and the water pipe is connected to a waste liquid treatment tank. The present invention is characterized in that the mist generated from the chemical is evacuated by sending water to the aspirator.

An embodiment of the present invention will be described in detail below with reference to the drawings.

The figure is a schematic diagram of a draft chamber showing this embodiment.

Reference numeral 1 denotes a chamber in which a chemical tank 2 containing processing chemicals 3 is mounted, and various treatments are performed within the chamber.

Reference numeral 4 denotes a work door, which is opened by the worker when processing inside the chaso bar 1, and the worker inserts his or her hand through the door to perform the processing.

The mist M generated from the chemical 3 is exhausted to the outside through the exhaust port 5, and even if the work door 4 is opened, the mist M is released from there to the outside.
will no longer flow out.

In this embodiment, an aspirator 6 and a water pipe 7 are provided for each chamber, and an aspirator 6 and a water pipe 7 are provided for each chamber, and the exhaust ports 5 are connected to the same neutralization tower. is connected to.

Water is sent to the water pipe 7 from the water pump 10, and the amount of water sent to the aspirator 6 is adjusted by the water flow rate control valve 8.

As water passes through the aspirator 6, the mist M is absorbed from the exhaust port 5 by its pressure.

Once sent, it is accumulated in the wastewater treatment tank 9.

This drainage liquid is transferred to the switching bubble 11 and the water pipe 1 as necessary.
It is used again for water supply by the pump 13 via the pump 2.

Moreover, it is treated as waste liquid by the switching bubble 14.

As explained above, according to the present invention, there is no need to provide large-scale equipment such as a neutralization tower as in the past.

In addition, since each chamber 1 has an aspirator 6 and water supply equipment, there is no need to gather equipment for the same chemical in one place as much as possible and layout the production line accordingly, which was the case in the past. can be laid out.

In other words, the versatility of the factory layout becomes greater.

Furthermore, the exhaust volume can be adjusted simply by adjusting the water flow rate using a water flow rate control valve, making it easier to adjust the exhaust volume with higher precision and safety than with conventional fan exhaust systems, for example. .

Furthermore, since each chamber is equipped with its own aspirator, for example, an acid and an organic solvent can be used in the same chamber.

In this respect, conventionally, chambers connected to dedicated hydration towers could only use dedicated chemicals.

Of course, with the present invention, it is also possible to provide the aspirator and fan exhaust in the same chamber and perform separate exhaust.

Note that the water supply system used in this invention does not have any regular customers because a large amount of water is used in a semiconductor factory.

[Brief explanation of the drawing]

The figure is a schematic diagram of an embodiment of the present invention. In the figure, 1 is a chamber, 5 is an exhaust port, 6 is an aspirator, 7 is a water pipe, 8 is a water flow rate control valve, and M is a mist.

Claims (1)

[Scope of utility model registration request] In draft chamber equipment for chemical processing,
The exhaust port of the chamber is connected to an aspirator connected to a water pipe equipped with a water flow rate control valve, and the water pipe is connected to a waste liquid treatment tank, and ice generated from the chemical is sent from the water pipe to the aspirator. A draft chamber device characterized by exhausting mist.