JPS6033566A - Substrate of electrophotographic sensitive body - Google Patents

Abstract

PURPOSE:To prevent intrusion of a vapor deposited layer and crystallization and to obtain an electrophotographic sensitive body having the uniform border line of a photosensitive layer by forming grooves between the vapor deposited part of the photosensitive layer of a cylindrical conductive substrate and the nondeposited parts. CONSTITUTION:Rectangular grooves 5 having 0.1-0.5mm. depth and 1-5mm. width are formed at the positions near both ends of a cylindrical conductive substrate 1, and vapor deposition masks 2 are fitted on the outside of these grooves 5, and vapor deposition is executed. Since it is difficult for the vapor to enter the inside of the grooves 5, the vapor deposited layer 3 is cut off in the grooves 5, and it never intrudes into the underside of the masks 2. Therefore, temp. at the ends of the deposited layer 3 rises to eliminate a danger of crystallization.

Description

[Detailed Description of the Invention] [Technical Field to which the Invention Pertains] The present invention relates to an electrophotographic photoreceptor in which a non-evaporated portion must be formed at the end portion when a photosensitive layer made of a selenium-based material or the like is formed by vacuum deposition. The present invention relates to a cylindrical conductive substrate.

[Prior art and its problems]

Electrophotographic photoreceptors are generally used in copying machines and printers, and many structures are used in which both ends or one outer circumference of the cylindrical photoreceptor are driven or held by rollers during the copying or printing process. ing.

At this time, if there is a vapor deposited layer on the part that contacts the roller,
Since the vapor deposition material peels off, scatters, and adheres to the surface of the photosensitive layer, causing image defects, that area is designated as a non-evaporation area. For this purpose, as shown in FIG. 1, vapor deposition masks 2 are attached to both sides (or one side) of a cylindrical conductive substrate 1, in which an aluminum tube is usually used, and a photosensitive layer 3 is vapor-deposited.

However, it is difficult to bring the mask 2 into close contact with the edge of the substrate 1, and the vapors of selenium and other vapors that are deposited per month enter through the gap between the mask and the substrate, making it impossible to form a clear boundary. A notch 4 as shown in Fig. 2 is formed at the tip of the mask to prevent such vapor from entering and to make it easier to wear the mask, but due to the difference in heat capacity between the base 1 and the mask, , the vapor deposited layer 3 in contact with the notch 4
The temperature in the area tends to be upward, Se crystallizes from the contact area, and a uniform boundary between the evaporated area and the non-evaporated area is not formed.

When a photoreceptor with a vapor deposition layer with crystallized edges is used in an electrophotographic device, the vapor deposition material may wrap around the non-evaporated areas, or when the photoreceptor has a vapor deposition layer with crystallized edges, the vapor deposition material may be crystallized by a roller or the like. The material will be removed and the photosensitive layer will be damaged.

[Purpose of the invention]

The present invention eliminates the above-mentioned defects during the photosensitive layer deposition process.

It is an object of the present invention to provide a photoreceptor substrate for electrophotography in which vapor deposition material does not run around to the vapor deposition part or crystallization of the edge of the vapor deposition layer occurs.

[Key points of the invention]

The photoreceptor substrate for electrophotography according to the present invention has a depth of 01 to 05 mm and a width of 1 mm between the portion to be deposited and the non-deposited portion of the photosensitive layer.
~5 The above objectives are achieved by having an annular groove.

[Embodiments of the invention]

FIG. 3 shows the end of a base body according to an embodiment of the present invention, in which an annular right-angled groove 5 is formed at a position close to the end of the cylindrical base body 1. As shown in FIG. As shown in FIG. 4, when the photosensitive layer 3 is deposited by attaching the vapor deposition mask 2 to the outside of the groove 5 of this substrate, it is difficult for steam to enter the groove 5, as shown in an enlarged view in FIG. So,
The vapor deposited layer is cut in the groove 5 and does not extend below the mask 2. Therefore, there is no possibility that the temperature at the edge of the vapor deposited layer 3 will rise and crystallization will occur.

The width of the groove 5 depends on the thickness of the vapor deposited layer, but may be between 1 to 5 mm. If the width becomes larger than that, the effect of the groove disappears. However, in order to shorten the length of the photoreceptor, it is desirable that the length be about 1 to 2 times. It is effective if the depth of the groove portion 5 is Q, l mm or more. If the groove is made deeper than necessary, the tightening of the vapor deposition mask 2 tends to cause deformation of the substrate from the groove due to thermal expansion of the substrate during the vapor deposition process, so it is necessary to limit the depth to a maximum of 0.5 mm. When manufacturing an As-8e photoreceptor, the As-8e evaporation source temperature should be set to 4.
It is formed by heating vapor deposition at around 00°0, and during this process the temperature of the substrate to be vaporized becomes 200 to 250'0, so if a soft iron mask is used, the problem of substrate deformation becomes important.

Therefore, although the depth of the groove 5 depends on the thickness of the base, it is desirable to make it as small as possible.

〔Effect of the invention〕

According to the present invention, by forming a groove at the boundary between the vapor-deposited part of the base of the photoreceptor and the non-evaporated part covered by the vapor deposition mask, the wraparound of the vapor-deposited layer and the occurrence of crystallization are prevented, and the uniform boundary line of the photosensitive layer is achieved. It is possible to obtain an electrophotographic photoreceptor having the following characteristics.

[Brief explanation of drawings]

FIG. 1 is a cross-sectional view showing a vapor deposition process using a conventional electrophotographic photoreceptor substrate, FIG. 2 is an enlarged cross-sectional view showing the shape of an example of a conventional vapor deposition mask, and FIG. 3 is an embodiment of the present invention. FIG. 4 is a sectional view showing a vapor deposition process using the substrate of FIG. 3, and FIG. 5 is a partially enlarged sectional view thereof. 1... Base body, 2... Vapor deposition mask, 5... Groove. (5) Figure 1 2〒a

Claims (1)

[Claims] 1) A depth of 0.1 to Q, 5 tntn, and a width of 1 between the part to be deposited and the non-deposited part of the photosensitive layer of the cylindrical conductive substrate.
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