JPS6032320A - ステップアンドリピート露光装置 - Google Patents

ステップアンドリピート露光装置

Info

Publication number
JPS6032320A
JPS6032320A JP58140896A JP14089683A JPS6032320A JP S6032320 A JPS6032320 A JP S6032320A JP 58140896 A JP58140896 A JP 58140896A JP 14089683 A JP14089683 A JP 14089683A JP S6032320 A JPS6032320 A JP S6032320A
Authority
JP
Japan
Prior art keywords
wafer
mask
alignment
mark
shot
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP58140896A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6349368B2 (en, 2012
Inventor
Naoki Ayada
綾田　直樹
Tadashi Konuki
小貫　忠
Masao Kosugi
小杉　雅夫
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP58140896A priority Critical patent/JPS6032320A/ja
Priority to GB08418927A priority patent/GB2146427B/en
Priority to DE19843428225 priority patent/DE3428225A1/de
Publication of JPS6032320A publication Critical patent/JPS6032320A/ja
Priority to US07/008,134 priority patent/US4719357A/en
Publication of JPS6349368B2 publication Critical patent/JPS6349368B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7069—Alignment mark illumination, e.g. darkfield, dual focus
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7073—Alignment marks and their environment
    • G03F9/7076—Mark details, e.g. phase grating mark, temporary mark
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7092—Signal processing
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Signal Processing (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP58140896A 1983-08-01 1983-08-01 ステップアンドリピート露光装置 Granted JPS6032320A (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP58140896A JPS6032320A (ja) 1983-08-01 1983-08-01 ステップアンドリピート露光装置
GB08418927A GB2146427B (en) 1983-08-01 1984-07-25 Semiconductor manufacture
DE19843428225 DE3428225A1 (de) 1983-08-01 1984-07-31 Geraet zur herstellung von halbleiterschaltungen
US07/008,134 US4719357A (en) 1983-08-01 1987-01-22 Semiconductor circuit manufacturing apparatus having selectively operable detectors for effecting automatic alignment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58140896A JPS6032320A (ja) 1983-08-01 1983-08-01 ステップアンドリピート露光装置

Publications (2)

Publication Number Publication Date
JPS6032320A true JPS6032320A (ja) 1985-02-19
JPS6349368B2 JPS6349368B2 (en, 2012) 1988-10-04

Family

ID=15279309

Family Applications (1)

Application Number Title Priority Date Filing Date
JP58140896A Granted JPS6032320A (ja) 1983-08-01 1983-08-01 ステップアンドリピート露光装置

Country Status (1)

Country Link
JP (1) JPS6032320A (en, 2012)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02144575U (en, 2012) * 1989-05-11 1990-12-07

Also Published As

Publication number Publication date
JPS6349368B2 (en, 2012) 1988-10-04

Similar Documents

Publication Publication Date Title
JP3376179B2 (ja) 面位置検出方法
US4748478A (en) Projection exposure apparatus
US5751404A (en) Exposure apparatus and method wherein alignment is carried out by comparing marks which are incident on both reticle stage and wafer stage reference plates
US20080316450A1 (en) Exposure Apparatus and Device Manufacturing Method
US5777722A (en) Scanning exposure apparatus and method
US4669867A (en) Alignment and exposure apparatus
US4617469A (en) Exposure apparatus with detecting means insertable into an exposure path
JPS61174717A (ja) 位置合わせ装置
US5666205A (en) Measuring method and exposure apparatus
WO1994024611A1 (en) On axis mask and wafer alignment system
JP3335126B2 (ja) 面位置検出装置及びそれを用いた走査型投影露光装置
US4717257A (en) Alignment device
JP3360744B2 (ja) アライメント方法、及び走査型露光装置
JP3303386B2 (ja) 投影露光装置及び方法
GB2133565A (en) An observation device and an aligner using same
IE51237B1 (en) Improved step-and-repeat projection alignment and exposure system with auxiliary optical unit
JP3754743B2 (ja) 表面位置設定方法、ウエハ高さ設定方法、面位置設定方法、ウエハ面位置検出方法および露光装置
JPS6032320A (ja) ステップアンドリピート露光装置
JPH06291019A (ja) ステージ駆動方法
JP2805238B2 (ja) 露光装置
JPS5831526A (ja) 焼付装置のアライメント装置
US6456360B1 (en) Projection exposure apparatus and method
JP3673625B2 (ja) 微細パターンの形成方法
JPS60173550A (ja) 半導体焼付装置
JPH0722097B2 (ja) 投影露光方法