JPS6028603A - Prism type beam splitter - Google Patents

Prism type beam splitter

Info

Publication number
JPS6028603A
JPS6028603A JP13736883A JP13736883A JPS6028603A JP S6028603 A JPS6028603 A JP S6028603A JP 13736883 A JP13736883 A JP 13736883A JP 13736883 A JP13736883 A JP 13736883A JP S6028603 A JPS6028603 A JP S6028603A
Authority
JP
Japan
Prior art keywords
dielectric layer
refractive index
dielectric
layer
beam splitter
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP13736883A
Other languages
Japanese (ja)
Other versions
JPH0619482B2 (en
Inventor
Kazuo Kimura
和夫 木村
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Minolta Co Ltd
Original Assignee
Minolta Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Minolta Co Ltd filed Critical Minolta Co Ltd
Priority to JP58137368A priority Critical patent/JPH0619482B2/en
Publication of JPS6028603A publication Critical patent/JPS6028603A/en
Publication of JPH0619482B2 publication Critical patent/JPH0619482B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00Optical elements other than lenses
    • G02B5/20Filters
    • G02B5/28Interference filters
    • G02B5/285Interference filters comprising deposited thin solid films
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/10Beam splitting or combining systems
    • G02B27/14Beam splitting or combining systems operating by reflection only
    • G02B27/142Coating structures, e.g. thin films multilayers
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/10Beam splitting or combining systems
    • G02B27/14Beam splitting or combining systems operating by reflection only
    • G02B27/144Beam splitting or combining systems operating by reflection only using partially transparent surfaces without spectral selectivity
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00Optical elements other than lenses
    • G02B5/04Prisms

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Optical Filters (AREA)
  • Optical Elements Other Than Lenses (AREA)

Abstract

PURPOSE:To reduce the effect of polarization by forming a light semitransmitting film composed of three layers of the first dielectric layer, a silver metal layer, and the second dielectric layer between prisms. CONSTITUTION:A light semitransmitting film HM is formed between the junction faces of two right triangular prisms 2, 4 of n0 refractive index. This film HM is composed of the three layers of the first dielectric layer M having a refractive index of n1 and an optical thickness of n1d1, a silver metal layer, and the second dielectric layer having n2 and n2d2. C in the figure is an adhesive layer. The following relationships are satisfied: n0<n1, 1.55<=n1<=1.75, 1.85<=n2<=2.45, n1d1=n2d2=0.25lambda0, where lambda0 is a designed wavelength selected within the range of 400-700nm, and the algebraic thickness of the silver layer is selected within the range of 10-50nm in accordance with a desired reflectance to transmittance ratio.

Description

【発明の詳細な説明】 技術分野 本発明は、TTL測光により露出制御や合焦検出を行う
スチールカメラや、シネカメラなどに用いられるプリズ
ム式ビームスプリッタに関する。
DETAILED DESCRIPTION OF THE INVENTION Technical Field The present invention relates to a prism type beam splitter used in still cameras, cine cameras, etc. that perform exposure control and focus detection using TTL photometry.

従来技術 本願出願人が先に出願−し公開された特開昭56−43
601号公報には、プリズム式ビームスプリッタにおい
て、互いに同屈折率のガラスからなる2個のプリズムの
接合面に、順に、該ガラスよりも低い屈折率の誘電体か
らなる第1誘電体層、Agからなる金属層5及び該ガラ
スよりも高・・い屈折率の誘電体からなる第2誘電体層
の3層を積層し、第1及び第2誘電体層の光学的膜厚を
共にλO/4(λ0:設計波長)としたプリズム式ビー
ムスプリッタが開示されている。しかしながら、このよ
うな構成では、該公報mの表に示されているように、入
射角45°の光に対して透過率も反射率もP成分とS成
分とで20%以上の差があり、従って上述の如きスチー
ルカメラやシネカメラなどビームスプリッタの光半透過
膜への入射角か45°近傍となる場合には偏光の影響が
大きい。
Prior art: Japanese Patent Application Laid-open No. 56-43, which was first filed and published by the applicant.
Publication No. 601 discloses that in a prism type beam splitter, a first dielectric layer made of a dielectric material having a lower refractive index than that of the glass, and Ag A metal layer 5 consisting of a metal layer 5 and a second dielectric layer consisting of a dielectric with a higher refractive index than the glass are laminated, and the optical thicknesses of the first and second dielectric layers are both λO/ 4 (λ0: design wavelength) is disclosed. However, in such a configuration, as shown in the table of Publication M, there is a difference of 20% or more in transmittance and reflectance between the P component and the S component for light at an incident angle of 45°. Therefore, when the angle of incidence on the light semi-transmissive film of a beam splitter, such as the above-mentioned still camera or cine camera, is around 45°, the influence of polarization is large.

目 的 本発明は」−述の如き点に鑑みてなされたものであり、
その目的は、製造容易で、かつ、入射角45°の光に対
して偏光の影響の少ないプリズム式ビームスプリッタを
提[(することにある。
Purpose The present invention has been made in view of the points mentioned above.
The purpose is to provide a prism type beam splitter that is easy to manufacture and has little influence of polarization on light with an incident angle of 45°.

発明の要旨 本発明溝は、上記第11誘電体層の屈折率をガラスより
も高くし、該屈折率が1.55−1.75の物質を用い
ると偏光の影響を少なくすることができ上記目的が達成
されることを見い出し本発明に至ったものである。従っ
て、本発明は、互いに屈折率のほぼ等しいガラスからな
る第1.第2プリズムの間に光半透過膜が形成されるプ
リズム式ビームスプリッタにおいて、該光半透過膜は、
Slプリズム側から第2プリズム側へ順に、誘電体から
なる第1誘電体層、Agからなる金属層、及び誘電体か
らなる第2誘電体層の3層構成であり、かつ、第1プリ
ズムの屈折率をno、第1誘電体層の屈折率を旧、光学
的膜厚をnrdt、第2誘電体層の屈折率を12.光学
的膜厚をnzdz、 4QQnm 〜7QQnm 〕範
囲内で選択される設計波長をλ0とするとき、[11n
o<nt +21 1.55’旧≦1.75 +31 1.85 < nz G 2.45(41n+
dt = nzdz = Q、25λ0なる条件を満足
することを特徴とするものである。
SUMMARY OF THE INVENTION In the groove of the present invention, the refractive index of the eleventh dielectric layer is made higher than that of glass, and when a material having a refractive index of 1.55 to 1.75 is used, the influence of polarized light can be reduced. The present invention has been made based on the discovery that the object can be achieved. Therefore, in the present invention, the first glass is made of glasses having substantially the same refractive index. In a prismatic beam splitter in which a light semi-transparent film is formed between the second prisms, the light semi-transparent film is
It has a three-layer structure consisting of, in order from the Sl prism side to the second prism side, a first dielectric layer made of a dielectric, a metal layer made of Ag, and a second dielectric layer made of a dielectric. The refractive index is no, the refractive index of the first dielectric layer is old, the optical thickness is nrdt, and the refractive index of the second dielectric layer is 12. [11n
o<nt +21 1.55'old≦1.75 +31 1.85<nz G 2.45 (41n+
It is characterized by satisfying the following conditions: dt = nzdz = Q, 25λ0.

各条件ill〜(4)について説明すると、条件(月及
び(2)は、第1誘電体層とガラスとの屈折率の大小関
係及び第1誘電体層の屈折率範囲を規定するものであり
、条件(11をはすれると偏光に対する影響が大きくな
る。更に、条件+21の下限を越えると条件(1)を満
たす為にはプリズムの屈折率をもっと低くせねばならず
実現困難となるし、条件(2)の上限を越えると第2誘
電体層との屈折率差が小さくなりすきで偏光に対する影
響が大きぐなる。条件(3]は第2誘電体層の屈折率範
囲を規定するものであり、上限を越えると適用物質が存
在せず実現不可能となるし、下限を越えると第1誘電体
層との屈折率差が小さくなりすきで偏光に対する影響が
小さくなる。条件(41は!1 、’i42誘電体層の
光学的膜厚を規定するものであり、これをはずれると各
層真空蒸着時の膜厚モニタが複雑になり、製造に手間が
かかる。
To explain each condition (4), the condition (2) defines the magnitude relationship of the refractive index between the first dielectric layer and the glass and the refractive index range of the first dielectric layer. , if condition (11) is exceeded, the influence on polarization becomes greater.Furthermore, if the lower limit of condition (+21) is exceeded, the refractive index of the prism must be lowered even further to satisfy condition (1), which becomes difficult to achieve. , when the upper limit of condition (2) is exceeded, the refractive index difference with the second dielectric layer becomes small and the influence on polarization increases.Condition (3) defines the refractive index range of the second dielectric layer. If the upper limit is exceeded, the applicable substance does not exist and it becomes impossible to realize, and if the lower limit is exceeded, the difference in refractive index with the first dielectric layer becomes small and the influence on polarization becomes small.Condition (41 !1 defines the optical film thickness of the 'i42 dielectric layer, and if it deviates from this, monitoring the film thickness during vacuum deposition of each layer becomes complicated, and it takes time and effort to manufacture.

実施例 以下、本発明の実施例を詳細に説明する。Example Examples of the present invention will be described in detail below.

第1図は本発明一実施例に係るプリズム式ビームスプリ
ッタを示す図で、同図において、+2141はそれぞれ
同一のガラスからなる同一形状の直角二等辺三角形プリ
ズムからなる第1及び第2プリズムで、両プリズム+2
1 +4]の接合面に光半透過膜(HM)が形成されて
いる。光半透過膜(HM)は、第1プリズム+21側か
′ら第2プリズム(4)側へ順に、プリズムt21t4
1の屈折率より高い中屈折率の誘電体からなる第1誘電
体層(Ml 、 Agからなる金属層(Ag)、及び高
屈折率の誘電体からなる第2誘電体層四の3層構成を有
し、第1・@2誘電体層fly11四の光学的膜厚は、
設計波長をλ0として、それぞれ0.25λOとされて
いる。(C1は接着剤層である。金属層(Ag)の幾何
学的膜厚は、10〜5Qnmの範囲内で所望の反射率及
び透過率に応じて選択される。
FIG. 1 is a diagram showing a prismatic beam splitter according to an embodiment of the present invention. In the same figure, +2141 is a first and second prism made of right-angled isosceles triangular prisms of the same shape and made of the same glass, respectively; Both prisms +2
1 +4], a semi-light-transmitting film (HM) is formed on the bonding surface. The light semi-transparent film (HM) is applied to the prisms t21t4 in order from the first prism +21 side to the second prism (4) side.
A three-layer structure: a first dielectric layer (Ml) made of a dielectric with a medium refractive index higher than the refractive index of 1, a metal layer (Ag) made of Ag, and a second dielectric layer made of a dielectric with a high refractive index. The optical thickness of the first and second dielectric layers fly114 is
The design wavelength is 0.25λO, respectively. (C1 is an adhesive layer. The geometric thickness of the metal layer (Ag) is selected within the range of 10 to 5 Q nm depending on the desired reflectance and transmittance.

以上の如き構成からなるビームスプリッタは、頓1プリ
ズム(2)の接合面上に中屈折率誘電体、Ag。
The beam splitter constructed as described above has a medium refractive index dielectric material, Ag, on the cemented surface of the first prism (2).

高屈折率誘電体を順にそれぞれ各所定膜厚となるまで真
空蒸着し、その上に接着剤を塗布して′?@′J2プリ
ズム(4)を接合すれば良い。尚、通に接着剤層tel
を第1プリズム(2)と第1誘電体層+Mlとの間に設
けても良い。
A high refractive index dielectric material is vacuum-deposited in order until each film has a predetermined thickness, and an adhesive is applied on top of it. @' Just connect the J2 prism (4). In addition, the adhesive layer tel
may be provided between the first prism (2) and the first dielectric layer +Ml.

上記ビームスプリッタは、第1プリズム(2)の側から
光が入射し、この入射光+IIが反射光(R1と透過光
fTlとに二分割される。逆に、第2プリズム(4)の
側から光が入射するように用いても良いが、ビームスプ
リッタによる光の吸収が若干大きくなり、光損失が若干
大きくなる。
In the beam splitter, light enters from the first prism (2) side, and this incident light +II is split into two into reflected light (R1 and transmitted light fTl).On the contrary, the second prism (4) side Although it may be used so that the light is incident from the beam splitter, the absorption of light by the beam splitter becomes slightly large, resulting in a slightly large optical loss.

以下、各実施例の具体的構成を表に示す。The specific configuration of each example is shown in the table below.

実施例1 スO= 55Qnm 本実施例の分光特性を第2図に示す。第2図において、
RsはS波成分の反射率、 RpはP波成分の反射率、
 TsははS波成分の透過率・TpはP波成分の透過率
をそれぞれ示す。第2図から明らかなように、本実施例
によれば、反射率も透過率も1−IJ視波長全域におい
て比較的フラットであるとともに、RsとRp及びTS
とTpとの差が数%以下と少ないので偏光の影響も少な
く、吸収による光損失も少ない。更に、本実施例によれ
ば、両誘電体層岡(川の光学的膜厚は互いに等し、く設
計波長のV4であるので、真空蒸着特にモニタさ11.
る反射率力≦極値となったときに蒸着を停止させ;!L
 c工良< −IIK厚制御が簡単で製造が容易である
Example 1 SO=55Qnm The spectral characteristics of this example are shown in FIG. In Figure 2,
Rs is the reflectance of the S wave component, Rp is the reflectance of the P wave component,
Ts indicates the transmittance of the S-wave component, and Tp indicates the transmittance of the P-wave component, respectively. As is clear from FIG. 2, according to this example, the reflectance and transmittance are relatively flat over the entire 1-IJ visible wavelength range, and Rs, Rp, and TS
Since the difference between Tp and Tp is as small as several percent or less, the influence of polarization is small, and light loss due to absorption is also small. Furthermore, according to this embodiment, since the optical thicknesses of both dielectric layers are equal to each other and are at the design wavelength of V4, vacuum deposition is particularly difficult to monitor.
Vapor deposition is stopped when the reflectance power ≦ the extreme value; L
c Good quality < -IIK Thickness control is simple and manufacturing is easy.

実施例2゜ λo = 48Qnn1 本実施例の分光特性を、第2図と同様にして第3図に示
す。第3図から明らかなように、本実施例においても分
光特性が可視波長全域にわたってフラットでかつ光損失
も少なく、偏光の影響も少ない。更に、両誘電体層が)
町の光学的膜厚は共にλ0/4であるので膜厚制御か簡
単で製造が容易である。
Example 2 λo = 48Qnn1 The spectral characteristics of this example are shown in FIG. 3 in the same manner as in FIG. 2. As is clear from FIG. 3, also in this example, the spectral characteristics are flat over the entire visible wavelength range, with little optical loss, and little influence of polarization. Furthermore, both dielectric layers)
Since the optical film thickness of both films is λ0/4, film thickness control is simple and manufacturing is easy.

第4図は、本発明に係るプリズム式ビームスプリッタ(
BS)をシネカメラに用いた例を示しており、撮影レン
ズ(TL)を透過した光はビームスプリッタ(BS)で
二分割され、透過光はフィルム面例に導かれ反射光はフ
ァインダ系(FS)に導かれろ。
FIG. 4 shows a prismatic beam splitter (
BS) is used in a cine camera.The light that passes through the photographic lens (TL) is split into two by the beam splitter (BS), the transmitted light is guided to the film surface, and the reflected light is sent to the finder system (FS). Be guided by.

尚、本発明において、第2誘電体層(川は実施例の如(
Zr0z及びTiO2に限定されるものではなく、Ce
O2,ZnSなど屈折率が1.85〜2.45の誘電体
であれば良く、また、第1誘電体層(財))も屈折率1
.55〜1.75の誘電体で構成されれば良い。
In addition, in the present invention, the second dielectric layer (the river is as in the embodiment)
Not limited to Zr0z and TiO2, Ce
Any dielectric material with a refractive index of 1.85 to 2.45 such as O2 or ZnS may be used, and the first dielectric layer also has a refractive index of 1.
.. It suffices if it is made of a dielectric material having a diameter of 55 to 1.75.

効 果 り、]二のように、本発明は、」二連の如き条件を満足
することを特徴とするものであり、これによって、+j
J視波長波長全域いて反射率・透過率ともフラットな分
光特性とtXす、偏光の影響も少なく光損失も少ない」
二に、両誘電体層の光学的膜厚が共にλO/4であるの
で製造か容易な3層構成のプリズム式ビームスプリッタ
を得るこまかできる。
[Effect] As shown in item 2, the present invention is characterized by satisfying the conditions such as ``two series,'' and thereby, +j
It has spectral characteristics with flat reflectance and transmittance over the entire J-visual wavelength range, has little influence of polarization, and has little optical loss.
Second, since the optical thicknesses of both dielectric layers are both λO/4, it is possible to obtain a prism type beam splitter having a three-layer structure that is easy to manufacture.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は本発明実施例のプリズム式ビームスプリッタを
示す図、第2図及び第3図は実施例1及び2の入射角4
5°の光に対する分光特性を示すグラフ、第4図は本発
明に係るビームスプリッタをシネカメラに用いた例を示
す図である。 (21;第1プリズム、 [4) ;第2プリズム、 
(HM)。 光半透過膜、 [M+ +第1誘電体層+ (Ag);
金属層。 叫;第2誘電体層。 以」二 出願人 ミノルタカメラ株式会社
FIG. 1 shows a prism type beam splitter according to an embodiment of the present invention, and FIGS. 2 and 3 show the angle of incidence 4 of embodiments 1 and 2.
FIG. 4 is a graph showing the spectral characteristics for 5° light, and is a diagram showing an example in which the beam splitter according to the present invention is used in a cine camera. (21; first prism, [4); second prism,
(HM). Light semi-transparent film, [M+ + first dielectric layer + (Ag);
metal layer. Shout: Second dielectric layer. Applicant: Minolta Camera Co., Ltd.

Claims (1)

【特許請求の範囲】 α、いに屈折率のほぼ等しいガラスからなる第1゜第2
プリズムの間に光半透過膜が形成されるプリズム式ビー
ムスプリッタにおいて、該光半透過膜は、第1プリズム
側から第2プリズム側へ順に、誘「11体からなる第1
誘電体層、Agからなる金属層及び誘電体からなる第2
誘電体層の3層構成であり、かつ、次の条件を潤足する
ことを特徴とするプリズム式ビームスプリッタ; 110<旧 1.55’G旧≦1.75 ] 、 35 % n 2 ≦ 2.45n+d+ =
 r+zd2= Q、25λ0但し、ここで、 110;第1プリズムの屈折率。 111;第1誘電体層の屈折率2 n2;第2誘電体層の屈折率。 Htdt ; 第1誘電体層の光学的膜厚。 r+zd2;第2誘電体層の光学的膜厚。 λO; 4QQnm〜700nmの範囲内で選択される
設計波長。 である。
[Claims] α, first and second glass made of glass having substantially the same refractive index;
In a prismatic beam splitter in which a light semi-transparent film is formed between prisms, the light semi-transparent film is formed of a first dielectric film consisting of 11 dielectric bodies in order from the first prism side to the second prism side.
a dielectric layer, a metal layer made of Ag, and a second layer made of dielectric.
A prism type beam splitter having a three-layer structure of dielectric layers and satisfying the following conditions: 110<old 1.55'G old≦1.75], 35% n2≦2 .45n+d+ =
r+zd2=Q, 25λ0 However, here, 110; refractive index of the first prism. 111; refractive index of the first dielectric layer 2 n2; refractive index of the second dielectric layer. Htdt; optical thickness of the first dielectric layer. r+zd2: optical thickness of the second dielectric layer. λO; Design wavelength selected within the range of 4QQnm to 700nm. It is.
JP58137368A 1983-07-26 1983-07-26 Prism beam splitter Expired - Lifetime JPH0619482B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP58137368A JPH0619482B2 (en) 1983-07-26 1983-07-26 Prism beam splitter

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58137368A JPH0619482B2 (en) 1983-07-26 1983-07-26 Prism beam splitter

Publications (2)

Publication Number Publication Date
JPS6028603A true JPS6028603A (en) 1985-02-13
JPH0619482B2 JPH0619482B2 (en) 1994-03-16

Family

ID=15197046

Family Applications (1)

Application Number Title Priority Date Filing Date
JP58137368A Expired - Lifetime JPH0619482B2 (en) 1983-07-26 1983-07-26 Prism beam splitter

Country Status (1)

Country Link
JP (1) JPH0619482B2 (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6394201A (en) * 1986-10-09 1988-04-25 Ricoh Co Ltd Beam splitter
EP1227358A3 (en) * 2001-01-25 2004-03-31 Canon Kabushiki Kaisha Optical element and liquid crystal projector and camera using the same
WO2011048875A1 (en) * 2009-10-20 2011-04-28 シグマ光機株式会社 Plate-type broadband depolarizing beam splitter
EP3516448B1 (en) 2016-09-22 2022-08-24 Lightforce USA, Inc., D/B/A/ Nightforce Optics Optical targeting information projection system for weapon system aiming scopes and related systems

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101859728B1 (en) * 2018-04-18 2018-05-18 주식회사 경신 Detachable type multi-fuse

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5643601A (en) * 1979-09-17 1981-04-22 Minolta Camera Co Ltd Semipermeable mirror
JPS57130001A (en) * 1981-02-05 1982-08-12 Canon Inc Low polalization achromatic beam splitter

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5643601A (en) * 1979-09-17 1981-04-22 Minolta Camera Co Ltd Semipermeable mirror
JPS57130001A (en) * 1981-02-05 1982-08-12 Canon Inc Low polalization achromatic beam splitter

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6394201A (en) * 1986-10-09 1988-04-25 Ricoh Co Ltd Beam splitter
EP1227358A3 (en) * 2001-01-25 2004-03-31 Canon Kabushiki Kaisha Optical element and liquid crystal projector and camera using the same
WO2011048875A1 (en) * 2009-10-20 2011-04-28 シグマ光機株式会社 Plate-type broadband depolarizing beam splitter
EP3516448B1 (en) 2016-09-22 2022-08-24 Lightforce USA, Inc., D/B/A/ Nightforce Optics Optical targeting information projection system for weapon system aiming scopes and related systems

Also Published As

Publication number Publication date
JPH0619482B2 (en) 1994-03-16

Similar Documents

Publication Publication Date Title
US5912762A (en) Thin film polarizing device
US4367921A (en) Low polarization beam splitter
US4726654A (en) Multi-layered anti-reflection coating
US6317264B1 (en) Thin film polarizing device having metal-dielectric films
JPS6028603A (en) Prism type beam splitter
JP2835535B2 (en) Anti-reflection coating for optical components
JPH0516003B2 (en)
JPH0528361B2 (en)
JPS6028601A (en) Prism type beam splitter
JPS6239801A (en) Semi-transparent mirror
JPS6032001A (en) Reflection preventing film
JPS5811901A (en) Multilayered semipermeable mirror
JPS6238402A (en) Optical filter
JPS6133167B2 (en)
JPS59107304A (en) Semi-transmitting mirror
JPS6028602A (en) Half mirror
JPH0227301A (en) Adhesive structure for optical parts
JP2935765B2 (en) Manufacturing method of dichroic mirror
JPS6315562B2 (en)
JPS62187802A (en) Beam splitter
JPH09265005A (en) Mirror for excimer laser
JPS6239401B2 (en)
JP2001013308A (en) Prism type beam splitter
JPS6057802A (en) Half-mirror for single-lens reflex camera
JPS63266402A (en) Antireflection film