JPS60249209A - 酸化錫膜の電子回路パタ−ンの形成方法 - Google Patents
酸化錫膜の電子回路パタ−ンの形成方法Info
- Publication number
- JPS60249209A JPS60249209A JP10542284A JP10542284A JPS60249209A JP S60249209 A JPS60249209 A JP S60249209A JP 10542284 A JP10542284 A JP 10542284A JP 10542284 A JP10542284 A JP 10542284A JP S60249209 A JPS60249209 A JP S60249209A
- Authority
- JP
- Japan
- Prior art keywords
- tin oxide
- electronic circuit
- circuit pattern
- oxide film
- boron trifluoride
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Liquid Crystal (AREA)
- Manufacturing Of Printed Circuit Boards (AREA)
- Manufacturing Of Printed Wiring (AREA)
- Non-Insulated Conductors (AREA)
- Manufacturing Of Electric Cables (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10542284A JPS60249209A (ja) | 1984-05-24 | 1984-05-24 | 酸化錫膜の電子回路パタ−ンの形成方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10542284A JPS60249209A (ja) | 1984-05-24 | 1984-05-24 | 酸化錫膜の電子回路パタ−ンの形成方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS60249209A true JPS60249209A (ja) | 1985-12-09 |
| JPH0345489B2 JPH0345489B2 (https=) | 1991-07-11 |
Family
ID=14407157
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP10542284A Granted JPS60249209A (ja) | 1984-05-24 | 1984-05-24 | 酸化錫膜の電子回路パタ−ンの形成方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS60249209A (https=) |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5670636A (en) * | 1979-11-14 | 1981-06-12 | Toshiba Corp | Gas plasma etching of transparent conductive film |
-
1984
- 1984-05-24 JP JP10542284A patent/JPS60249209A/ja active Granted
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5670636A (en) * | 1979-11-14 | 1981-06-12 | Toshiba Corp | Gas plasma etching of transparent conductive film |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0345489B2 (https=) | 1991-07-11 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US3971684A (en) | Etching thin film circuits and semiconductor chips | |
| US3839110A (en) | Chemical etchant for palladium | |
| US3539408A (en) | Methods of etching chromium patterns and photolithographic masks so produced | |
| US3370948A (en) | Method for selective etching of alkali glass | |
| US3616349A (en) | Method for etching chromium oxide films | |
| US5269890A (en) | Electrochemical process and product therefrom | |
| TW200417628A (en) | Improved cleaning composition | |
| CN107104078A (zh) | 石墨烯电极及其图案化制备方法,阵列基板 | |
| US4009061A (en) | Etchant and method of etching tin oxide film | |
| JPS60249209A (ja) | 酸化錫膜の電子回路パタ−ンの形成方法 | |
| US3507759A (en) | Removal of conductive metal oxide from a metal oxide coated insulating substrate | |
| JPS6427229A (en) | Etching method for semiconductor substrate | |
| US3471291A (en) | Protective plating of oxide-free silicon surfaces | |
| US3860423A (en) | Etching solution for silver | |
| CA1061159A (en) | Method of etching a pattern in glass | |
| CN110491786B (zh) | 一种采用盐溶液腐蚀晶体硅的方法 | |
| US3482974A (en) | Method of plating gold films onto oxide-free silicon substrates | |
| JPS6227386B2 (https=) | ||
| CN106553992B (zh) | 金属电极结构的制造方法 | |
| CN113969173B (zh) | 一种ITO/Ag/ITO复合金属层薄膜的蚀刻液 | |
| JPH0318737B2 (https=) | ||
| JPS6237386B2 (https=) | ||
| KR830001799B1 (ko) | 액정표시소자의 제조 방법 | |
| CN105699429A (zh) | 一种微米级半导体传感器及其制备方法 | |
| CN119120025A (zh) | 一种ZnS蚀刻液 |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| EXPY | Cancellation because of completion of term |