JPS6023385A - Production of silanol compound - Google Patents

Production of silanol compound

Info

Publication number
JPS6023385A
JPS6023385A JP13062083A JP13062083A JPS6023385A JP S6023385 A JPS6023385 A JP S6023385A JP 13062083 A JP13062083 A JP 13062083A JP 13062083 A JP13062083 A JP 13062083A JP S6023385 A JPS6023385 A JP S6023385A
Authority
JP
Japan
Prior art keywords
compound
silanol
general formula
chlorosilane
manufacturing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP13062083A
Other languages
Japanese (ja)
Other versions
JPS6257188B2 (en
Inventor
Minoru Takamizawa
高見沢 稔
Akira Yamamoto
昭 山本
Toshinobu Ishihara
俊信 石原
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shin Etsu Chemical Co Ltd
Original Assignee
Shin Etsu Chemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shin Etsu Chemical Co Ltd filed Critical Shin Etsu Chemical Co Ltd
Priority to JP13062083A priority Critical patent/JPS6023385A/en
Publication of JPS6023385A publication Critical patent/JPS6023385A/en
Publication of JPS6257188B2 publication Critical patent/JPS6257188B2/ja
Granted legal-status Critical Current

Links

Abstract

PURPOSE:To produce the titled compound in quantitative yield, with simple operation, without necessitating rigorous control of pH and temperature, by mixing a disilazane compound with a chlorosilane compound, and hydrolyzing the mixture. CONSTITUTION:(A) The compound of formula I (R<1>-R<3> are H, 1-7C alkyl, alkenyl or phenyl) (preferably 1,1,1,3,3,3-hexaalkyldisilazane) is mixed with (B) the chlorosilane compound of formula II (preferably trialkylsilyl chloride) preferably at a molar ratio of 1:1-1.5:1. The mixture is subjected to the hydrolysis reaction preferably at 10-40 deg.C, if necessary in the presence of an inert organic solvent to obtain the objective silanol compound of formula III (e.g. trialkylsilanol).

Description

【発明の詳細な説明】 本発明はシラノール化合物とくにはトリオルガノシラノ
ール化合物の製造方法に関するものである。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a method for producing silanol compounds, particularly triorganosilanol compounds.

従来よりトリアルキルシラノールの製法としては、トリ
アルキルシリルクロライドを緩衝溶解を使ってpHをコ
ントロールしながら加水分解する方法〔科学と工業29
.70−3 (1955))、あるいは1.1.1.3
.3.3−ヘキサアルキルジシラザンを塩酸水を用いて
加水分解する方法(Zhur、 0bshei、 Kh
:1m、24.2202−6 (19541,’]など
が知られていZ)。
Traditionally, trialkylsilanol has been produced by hydrolyzing trialkylsilyl chloride using buffer dissolution while controlling the pH [Science and Industry 29].
.. 70-3 (1955)) or 1.1.1.3
.. 3. Method for hydrolyzing 3-hexaalkyldisilazane using hydrochloric acid water (Zhur, Obshei, Kh
:1m, 24.2202-6 (19541,'] etc. are known Z).

しかし、これらの万?IEはpH1温jyのコントロー
ルを厳密に行う必要があり、ヘキサアルキルジシロキサ
ンが副生するため、収唯の低下がさけられず、また操作
もむつかしくよい方法とは言えない。
But these million? In IE, it is necessary to strictly control the pH and temperature, and since hexaalkyldisiloxane is produced as a by-product, a decrease in yield is unavoidable, and the operation is difficult, so it cannot be said to be a good method.

本発明者らはこうした従来の不利欠点を解決下べく鋭意
研究し本発明に到達したもので、これは一般式 %式%( (R,R,Rは水木原子、炭素数1〜7のアルキル基、
アルケニル基およびフェニル基から選択される基)で表
わされるジシラザン化合物と、一般式 %式% (R1、R2、R3は自■記と同様)で表わされるクロ
ロシラン化合物とを予め混合し、これを加水分解反応さ
せること乞特徴とする一般式 %式% (R,R,Rは前記と同様)で表わされるシラノール化
合物の製造方法に関し、とくにはトリオルガノシラノー
ルなかんずくトリアルキルシラノールの有利7’l−!
!Q造方法を提供するものである。
The present inventors conducted intensive research to solve these conventional disadvantages and arrived at the present invention, which is based on the general formula % ((R, R, R are Mizuki atoms, alkyl having 1 to 7 carbon atoms). basis,
A disilazane compound represented by a group selected from an alkenyl group and a phenyl group) and a chlorosilane compound represented by the general formula Regarding the method for producing a silanol compound represented by the general formula % (R, R, R are the same as above), which is characterized by a decomposition reaction, especially triorganosilanol, especially trialkylsilanol, 7'l-!
! This provides a Q-building method.

本発明によれば、■pH1温度の厳密なコントロールは
不要で、きわめて簡単な操作で製造できる、■収率は定
量的であり、ヘキサアルキルジシロキサンのようなジシ
ロキサン化合物!副生じない、■収率が定量的であるの
で、反応液から水相を除くだけでそのままシラノール化
合物として使用できる(蒸留等の操作が不要である)と
いう、従来技術では得ることのできない、丁ぐれた効果
が得られる。
According to the present invention, 1) Strict control of pH and temperature is not required, and production is possible with extremely simple operations; 2) Yield is quantitative; and disiloxane compounds such as hexaalkyldisiloxane can be produced! No by-products are generated; ■ The yield is quantitative, so the silanol compound can be used as it is by simply removing the aqueous phase from the reaction solution (no operations such as distillation are required); You can get a great effect.

本発明の方法により、たとえばトリアルキルシラノール
を製造する場合について説明すると、原料としての1.
1.1.3.3.3−ヘキサアルキルジシラザンとトリ
アルキルシリルクロライドとをあらかじめ混合し、これ
に水を加えて反応(加水分解反応)させる。
For example, when manufacturing trialkylsilanol by the method of the present invention, 1.
1.1.3.3.3-Hexaalkyldisilazane and trialkylsilyl chloride are mixed in advance, and water is added to the mixture to react (hydrolysis reaction).

B この方法によれば、反応式から判るように、目的とする
トリアルキルシラノールが定量的C二層られる。この加
水分解反応を進行させるためC二必要とされる水の量は
トリアルキルシリルクロライドの3倍当lであるが、塩
化アンモンが副生するので、水の者はこの塩化アンモン
を溶解するに十分な量とすることがよく、トリアルキル
シリルクロライドの約10倍当喰以上使用することが好
ましい0 加水分解反応は、水に前記原料混合物を滴下するかもし
くは原料混合物に水を加える方法のいずれでもよいが、
この際の反応温間は0℃〜還流温度とくには10〜40
℃とすることが好ましい。
B According to this method, as can be seen from the reaction formula, the target trialkylsilanol is quantitatively produced in two layers. The amount of water required for this hydrolysis reaction is three times the amount of trialkylsilyl chloride, but since ammonium chloride is produced as a by-product, the amount of water needed to dissolve this ammonium chloride is The hydrolysis reaction can be carried out either by dropping the raw material mixture into water or by adding water to the raw material mixture. That's fine, but
The reaction temperature at this time is 0°C to reflux temperature, especially 10 to 40°C.
It is preferable to set it as °C.

また有機溶剤はなくてもよいが、加水分解生成物をその
まま次の反応C二側用する場合は、ジクロロメタン、エ
チルエーテル、トルエン、ヘキサンなどの不活性溶剤を
使用することが好ましい。
Although the organic solvent may not be used, when the hydrolyzed product is used as it is in the next reaction C2, it is preferable to use an inert solvent such as dichloromethane, ethyl ether, toluene, hexane, etc.

反応原料としてのヘキサアルキルジシラザンとトリアル
キルシリルクロライドとの混合モル比は1:1が好まし
いが、1.5:1までヘキサアルキルジシラザンを過剰
にしてもよい。しかし、トリアルキルシリルクロライド
を過剰にすると反応系が塩酸酸性となってヘキザアルキ
ルジシロキサンY副生じ大幅(−収率低下をまねくので
、トリアルキルシリルクロライドが過剰となる場合は避
けるべ舞である。
The mixing molar ratio of hexaalkyldisilazane and trialkylsilyl chloride as reaction raw materials is preferably 1:1, but hexaalkyldisilazane may be in excess up to 1.5:1. However, if trialkylsilyl chloride is used in excess, the reaction system will become acidic with hydrochloric acid, resulting in significant side production of hexaalkyldisiloxane Y (- leading to a decrease in yield, so this should be avoided if trialkylsilyl chloride is used in excess. be.

なお、反応原木9)の1つである一般式tl+で表わさ
れるジシラザン化合物としては各種のもの全使用するこ
とかで汽、これにはへキサメチルジシラザン、ヘキサメ
チルジシラザン、1.1.3.3−テトラメチル−1,
3−ジヒドロシラザン、1.1゜3.3−テトラメチル
−1,3−?)ビニルシラザン、1.3−ジメチル−・
1.3−ジヒドロ−1,3−i)ビニルシラザン、1.
1.9.3−テトラメチル−1゜3−ジフェニルシラザ
ンなどが例示される。
As the disilazane compound represented by the general formula tl+, which is one of the reaction logs 9), all kinds of compounds can be used, including hexamethyldisilazane, hexamethyldisilazane, 1.1. 3.3-tetramethyl-1,
3-dihydrosilazane, 1.1°3.3-tetramethyl-1,3-? ) Vinylsilazane, 1,3-dimethyl-・
1.3-dihydro-1,3-i) vinylsilazane, 1.
Examples include 1.9.3-tetramethyl-1°3-diphenylsilazane.

また(10の原料である一般式叩で表わされるクロロシ
ラン化合物としては、トリメチルシリルクロライド、ト
リエチルシリルクロライド、ジメチルヒドロシリルクロ
ライド、ジメチルビニルシリルクロライド、メチルビニ
ルヒドロシリルクロライド、ジメチルフェニルシリルク
ロライドなどが例示される。
Examples of the chlorosilane compound represented by the general formula (10) include trimethylsilyl chloride, triethylsilyl chloride, dimethylhydrosilyl chloride, dimethylvinylsilyl chloride, methylvinylhydrosilyl chloride, and dimethylphenylsilyl chloride.

混合使用するジシラザン化合物とクロロンラン化合物と
は、R、R,、Rがそれぞれ両者において同じであるこ
とが普通であるが、生成するシラノール化合物が2種以
上のシラノール化合物の混合物として取得したい場合に
は異なったものン組合せ使用する。
Generally, the disilazane compound and the chlororane compound used in a mixture have the same R, R, and R, respectively, but if the silanol compound to be produced is desired to be obtained as a mixture of two or more types of silanol compounds, Use different combinations.

つぎに本発明の実施例をあげる。Next, examples of the present invention will be given.

実施例1 ヘキサメチルジシラザン161?(1モル)とトリメチ
ルシリルクロライド108.5y−(1モル)を常温に
て混合し、水25〇−中にかくはんしながら20〜40
℃で滴下反応させた。30分かくはん後上層の有機層を
分液したところ、トリメチこのものはガスクロマトグラ
フィーで分析したところ純IWはぼ100%であり、ヘ
キサメチルジシロキサンは検出されなかった。
Example 1 Hexamethyldisilazane 161? (1 mole) and 108.5y-(1 mole) of trimethylsilyl chloride were mixed at room temperature, and while stirring in 250% water, 20 to 40%
The dropwise reaction was carried out at ℃. After stirring for 30 minutes, the upper organic layer was separated, and trimethylene was analyzed by gas chromatography to find that it was almost 100% pure IW, and no hexamethyldisiloxane was detected.

実施例 2 1、1.3.3−テトラメチル−1,3−ジビニルシラ
ザン22.2.P(0,12モル)とジメチルビニルシ
リルクロリド12.11+0.1モル】を常温にて混合
し、水30−とジエチルエーテル30−の混合液中にか
くはんしながら30℃で滴下反応させた。
Example 2 1,1.3.3-tetramethyl-1,3-divinylsilazane 22.2. P (0.12 mol) and dimethylvinylsilyl chloride (12.11+0.1 mol) were mixed at room temperature and reacted dropwise at 30° C. with stirring into a mixed solution of 30° of water and 30° of diethyl ether.

30分かくはん後」二層の有機層を分液しガスクロマト
グラフィーで分析したところ、ジメチルビニルシラノー
ルが定置的に生成していることが確認された。テトラメ
チルジビニルシロキサンは検出されなかった。
After stirring for 30 minutes, the two organic layers were separated and analyzed by gas chromatography, and it was confirmed that dimethylvinylsilanol was produced stationarily. No tetramethyldivinylsiloxane was detected.

比較例 ヘキサメチルジシラザン70?、水50−およびエチル
エーテル25[−を混合し、0〜lO℃に冷却しながら
I N−H0I水溶液250−を3時間かけて滴下し、
滴下終了後30分間この温度でかくはんした。上層の有
機層をガスクロマトグラフィーで分析したところ、トリ
メチルシラノールは87%生成していたが同時に13%
のへキサメチルジシロキチンが副生じていた。
Comparative Example Hexamethyldisilazane 70? , water 50- and ethyl ether 25[-] were mixed, and while cooling to 0 to 10°C, an IN-H0I aqueous solution 250- was added dropwise over 3 hours.
After the addition was completed, the mixture was stirred at this temperature for 30 minutes. When the upper organic layer was analyzed by gas chromatography, it was found that 87% of trimethylsilanol was produced, but at the same time 13% was produced.
Hexamethyldisilochitine was produced as a by-product.

応用例 ヘキサメチルジシラザン33ノとトリメチルシリルクロ
ライド22iPをあらかじめ混合しておき、これを水5
0−とジクロルメタン100dの混合液中にかくはんし
ながら20〜30℃で滴下反応させた。30分かくはん
後下層のジクロルメタン層を分液した後、無水硫酸ナト
リウムで脱水した。
Application example: 33 parts of hexamethyldisilazane and 22 parts of trimethylsilyl chloride are mixed in advance, and this is mixed with 5 parts of water.
The mixture was added dropwise to a mixed solution of 100 d of dichloromethane and 100 d of dichloromethane while stirring at 20 to 30°C. After stirring for 30 minutes, the lower dichloromethane layer was separated and dehydrated with anhydrous sodium sulfate.

このジクロルメタン溶液を、トリエチルアミン42ノと
メタクリル酸アリル−メチル−ジクロルシラン72ノお
よびジクロルメタン300dの溶液中に10〜30℃で
かくはんしながらそのまま滴下反応させた。滴下終了後
、水500dを加え有機層を分液し、溶剤を留去した後
減圧蒸留した11− ところ、メタクリル酸アリル−メチル−ジトリメチルシ
ロキシ−シランが98y−得られた(収率94%)。
This dichloromethane solution was added dropwise to a solution of 42 mm of triethylamine, 72 mm of allyl-methyl-dichlorosilane methacrylate, and 300 mm of dichloromethane while stirring at 10 to 30 DEG C. for reaction. After the addition, 500 d of water was added, the organic layer was separated, and the solvent was distilled off, followed by distillation under reduced pressure. As a result, 98 y of allyl-methyl-ditrimethylsiloxy methacrylate was obtained (yield: 94%). ).

特許出願人 信越化学工業株式会社 12−patent applicant Shin-Etsu Chemical Co., Ltd. 12-

Claims (1)

【特許請求の範囲】 1、一般式 %式% ( (R,R,Rは水素原子、炭素数1〜7のアルキル基、
アルケニル基およびフェニル基から選択される基)で表
わされるジシラザン化合物と、一般式 %式% (R2、R2、R3は前記と同様)で表わされるクロロ
シラン化合物とをあらかじめ混合し、これを加水分解反
応させることを特徴とする一般式%式% (R1、R2、R11は前記と同様)で表わされるシラ
ノール化合物の製造方法 2、前記一般式 ( Fl −8i−OHで表されるシラノール化合3 物がトリアルキルシラノールである特許請求の範囲′@
1項記載の製造方法 3、前記一般式 R−81−Of(で表されるシラノール化合3 物がジアルキルビニルシラノールである特許請求の範囲
第1項記載の製造方法 4、 ジシラザン化合物とクロロシラン化合物との混合
モル比が1:1〜1.5:1である特許請求の範囲第1
項記載の製造方法 5、前記ジシラザン化合物が1.1. ]、 3.3.
3−ヘキサアルキルジシラザンである特許請求の範囲第
1項記載の製造方法 6、前記クロロシラン化合物がトリアルキルシリルクロ
ライドである特許請求の範囲第1項記載の製造方法
[Claims] 1. General formula % ((R, R, R are hydrogen atoms, alkyl groups having 1 to 7 carbon atoms,
A disilazane compound represented by a group selected from alkenyl groups and phenyl groups) and a chlorosilane compound represented by the general formula Method 2 for producing a silanol compound represented by the general formula % (R1, R2, R11 are the same as above), characterized in that the silanol compound 3 represented by the general formula (Fl-8i-OH) Claims that are trialkylsilanol'@
The manufacturing method 3 according to claim 1, the silanol compound 3 represented by the general formula R-81-Of() The manufacturing method 4 according to claim 1, wherein the silanol compound 3 is a dialkyl vinyl silanol, a disilazane compound and a chlorosilane compound Claim 1, wherein the mixing molar ratio of is 1:1 to 1.5:1.
Manufacturing method 5 described in section 1.1. ], 3.3.
The manufacturing method 6 according to claim 1, wherein the chlorosilane compound is 3-hexaalkyldisilazane, and the manufacturing method according to claim 1, wherein the chlorosilane compound is trialkylsilyl chloride.
JP13062083A 1983-07-18 1983-07-18 Production of silanol compound Granted JPS6023385A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP13062083A JPS6023385A (en) 1983-07-18 1983-07-18 Production of silanol compound

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP13062083A JPS6023385A (en) 1983-07-18 1983-07-18 Production of silanol compound

Publications (2)

Publication Number Publication Date
JPS6023385A true JPS6023385A (en) 1985-02-05
JPS6257188B2 JPS6257188B2 (en) 1987-11-30

Family

ID=15038581

Family Applications (1)

Application Number Title Priority Date Filing Date
JP13062083A Granted JPS6023385A (en) 1983-07-18 1983-07-18 Production of silanol compound

Country Status (1)

Country Link
JP (1) JPS6023385A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7968741B2 (en) 2006-07-21 2011-06-28 Shin-Etsu Chemical Co., Ltd. Method of preparing disilanol compound and method of storing disilanol compound
CN109867692A (en) * 2017-12-01 2019-06-11 中昊晨光化工研究院有限公司 A kind of preparation method of tetramethyl divinyl disilazane

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7968741B2 (en) 2006-07-21 2011-06-28 Shin-Etsu Chemical Co., Ltd. Method of preparing disilanol compound and method of storing disilanol compound
US8247592B2 (en) 2006-07-21 2012-08-21 Shin-Etsu Chemical Co., Ltd. Method of preparing disilanol compound and method of storing disilanol compound
CN109867692A (en) * 2017-12-01 2019-06-11 中昊晨光化工研究院有限公司 A kind of preparation method of tetramethyl divinyl disilazane

Also Published As

Publication number Publication date
JPS6257188B2 (en) 1987-11-30

Similar Documents

Publication Publication Date Title
JPS60222492A (en) Preparation of tertiary hydrocarbon silyl compound
JP2938731B2 (en) Method for producing halopropyldimethylchlorosilane and catalyst for its synthesis
JPH0331290A (en) Production of tertiary hydrocarbon silyl compound
JPS6023385A (en) Production of silanol compound
JP2775239B2 (en) Catalytic alkylation method
JP3493934B2 (en) Method for producing N, N-bis (trimethylsilyl) allylamine
JP2003171384A (en) Method for reducing chlorine content of tetrakis(dimethylamino)silane
JP2006111548A (en) Method for producing silylalkoxymethyl halide
US3555064A (en) Method for the manufacture of phenyl and methylphenylchlorosilanes
JPH07126270A (en) Coproduction of dimethylchlorosilane and triorganochlorosilane
CN108409784B (en) Preparation method of phosphorus chiral important intermediate
JPH0959292A (en) Production of 4-aminopyrimidine nucleoside
JP3419207B2 (en) Method for producing 3-aminopropylalkoxysilane compound
JP6665437B2 (en) Method for producing tertiary alkyl silane and tertiary alkyl alkoxy silane
JP2501064B2 (en) Organic silicon compounds
US4663471A (en) Method for the preparation of N-methyl-N-trimethylsilyl trifluoroacetamide
JPS63253090A (en) Silyl (meth)acrylate having trimethylsiloxy group
JP3129021B2 (en) Method for producing polysilane oligomer
JPH0737468B2 (en) Method for producing tert-butyl-methyldimethoxysilane
JP2799619B2 (en) Method for producing N, 0-bis (t-butyldimethylsilyl) trifluoroacetamide
USRE32717E (en) Method for the preparation of N-methyl-N-trimethylsilyl trifluoroacetamide
JP2652248B2 (en) Process for producing alkoxynitrile compounds
JPH0426609B2 (en)
JP3459953B2 (en) Trimethylsilylethyl sulfide compound having a plurality of acetylene groups and method for producing the same
JP3564530B2 (en) Method for producing tetrakis (diarylsilyl) benzene