JPS6023317Y2 - Electrode for partial plating - Google Patents
Electrode for partial platingInfo
- Publication number
- JPS6023317Y2 JPS6023317Y2 JP16900282U JP16900282U JPS6023317Y2 JP S6023317 Y2 JPS6023317 Y2 JP S6023317Y2 JP 16900282 U JP16900282 U JP 16900282U JP 16900282 U JP16900282 U JP 16900282U JP S6023317 Y2 JPS6023317 Y2 JP S6023317Y2
- Authority
- JP
- Japan
- Prior art keywords
- electrode
- contact
- length
- plating
- partial plating
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Landscapes
- Electroplating Methods And Accessories (AREA)
Description
【考案の詳細な説明】 (a) 考案の技術分野 本考案は部分メツ用電極の改良に係る。[Detailed explanation of the idea] (a) Technical field of the invention The present invention relates to an improvement of an electrode for partial eyelids.
(b) 技術の背景
金などのように高価なメッキ材料を使用する電気部品は
、低コスト化のために、必要最小限の部分のみ部分メッ
キするのが一般である。(b) Background of the Technology For electrical parts that use expensive plating materials such as gold, it is common to partially plate only the minimum necessary parts in order to reduce costs.
このような部分メッキする電気部品の一例を第1図に示
す。An example of such an electrical component that is partially plated is shown in FIG.
第1図はコネクタの斜視図であって、コネクタ1は直方
体状の絶縁体4に多数の接触子2が、インサート成形さ
れて並設されている。FIG. 1 is a perspective view of a connector, in which a large number of contacts 2 are insert-molded and arranged in parallel on a rectangular parallelepiped insulator 4. FIG.
接触子2は、所望の本数が一軒となり、接触予科2A、
2B、2Cに群別されている。The desired number of contacts 2 is one, and the contact preparatory section 2A,
It is divided into groups 2B and 2C.
コネクタ1の配列した始めの接触子2と終りの接触子2
との距離はIであり、それぞれの接触子群2A、2B、
2C内で始めの接触子2と終りの接触子2との距離はそ
れぞれ■1である。The first contact 2 and the last contact 2 of the connector 1
The distance from each contact group 2A, 2B,
The distance between the first contact 2 and the last contact 2 within 2C is 1.
また接触予科2A、 2B、 2Cの距離は同一接
触子群内の接触子ピッチよりも充分に大きい。Further, the distance between the contact preparatory sections 2A, 2B, and 2C is sufficiently larger than the contact pitch within the same contact group.
それぞれの接触子2の先端は、接点部3が形成され例え
ば金メッキされている。A contact portion 3 is formed at the tip of each contactor 2 and is plated with gold, for example.
このように構成されたコネクタの接点部3の片面のみを
部分メッキ手段について第2図を参照して説明する。A means for partially plating only one side of the contact portion 3 of the connector configured as described above will be described with reference to FIG. 2.
第2図は部分メッキ装置の断面図である。FIG. 2 is a sectional view of the partial plating apparatus.
同図において5は板状の樹脂よりなる下型で、下型5の
上面には、シリコンゴム板よりなる受板6が固着されて
いる。In the figure, reference numeral 5 denotes a lower mold made of plate-shaped resin, and a receiving plate 6 made of a silicone rubber plate is fixed to the upper surface of the lower mold 5.
受板6の上面には、2枚のコネクタ1が接点部3が対向
するごとく載置されている。Two connectors 1 are placed on the upper surface of the receiving plate 6 so that the contact portions 3 face each other.
8は浅い箱形の上型で、下底板のほぼ中央部には、平面
視で所望の大きさの矩形状の窓8aが設けられている。8 is a shallow box-shaped upper mold, and a rectangular window 8a having a desired size in plan view is provided approximately in the center of the lower bottom plate.
。上型8の上底板の下面には窓8aに対向して、長さが
コネクタ1の両端の接触子2間の距離■よりも所望に大
きいほぼ直方体状の電極11が固着され、一方の側板に
はメッキ液12を電極11に向って噴出する複数のノズ
ル9が、他方の側板にはメッキ液12を排出する複数の
排出口10が、それぞれ設けられている。. A substantially rectangular parallelepiped-shaped electrode 11 whose length is desirably larger than the distance between the contacts 2 at both ends of the connector 1 is fixed to the lower surface of the upper bottom plate of the upper mold 8, facing the window 8a. A plurality of nozzles 9 are provided on the side plate for ejecting the plating liquid 12 toward the electrodes 11, and a plurality of discharge ports 10 for discharging the plating liquid 12 are provided on the other side plate.
7はシリコンゴム板よりなるマスクであって、上型8の
窓8aに対応して、下底板に固着している。Reference numeral 7 denotes a mask made of a silicone rubber plate, which is fixed to the lower bottom plate in correspondence with the window 8a of the upper mold 8.
マスク7には長さが接触子2の距MIよりも所望に大き
く、対向した接触子2の接点部3の根元部の距離に等し
い幅の矩形状の窓が設けられている。The mask 7 is provided with a rectangular window whose length is desirably longer than the distance MI of the contacts 2 and whose width is equal to the distance between the bases of the contact portions 3 of the opposing contacts 2.
上述のようなマスク7が固着された上型8をコネクタ1
の上方より圧接して、ノズル9よりメッキ液12を接点
部3にジェット噴流せしめ、かつ電極11に通電して部
分メッキを行う。The upper mold 8 to which the mask 7 as described above is fixed is connected to the connector 1
The plating liquid 12 is jetted from the nozzle 9 onto the contact portion 3, and the electrode 11 is energized to perform partial plating.
接触子2は接点部3以外のところは、マスク7と受板6
によって気密に挟着されているので、メッキ液12が滲
透することがなく、接点部3の上面のみ部分メッキする
ことが出来る。The contact 2 has a mask 7 and a receiving plate 6 except for the contact part 3.
Since the contact portion 3 is airtightly sandwiched between the contact portions 3 and 3, the plating liquid 12 does not seep through, and only the upper surface of the contact portion 3 can be partially plated.
また静止メッキならば’lumの厚さにメッキするのに
約4紛を必要とするが、ジェット噴流することにより加
mの厚さの所要時間は、はぼW秒である。In addition, if it is static plating, approximately 4 powders are required to plate to a thickness of 100 lum, but by jetting, the time required to add 1000 lums of powder is approximately W seconds.
(C) 従来技術と問題点
第3図は従来の電極を裏返した斜視図であって、電極1
1は、長さがコネクタ1の両端の接触2間の距離1より
も所望に大きい直方体状である。(C) Prior art and problems Figure 3 is a perspective view of a conventional electrode turned over, with electrode 1
1 is a rectangular parallelepiped whose length is desirably greater than the distance 1 between the contacts 2 at both ends of the connector 1 .
そして材料としてはチタンの全表面に不溶性金属(例え
ば白金、ロジウムなど)をメッキ、あるいはこれらの金
属箱を溶接したものと、電極全体が白金などで形成され
たものとの2種がある。There are two types of materials: those in which the entire surface of titanium is plated with an insoluble metal (for example, platinum, rhodium, etc.) or a box of these metals is welded, and those in which the entire electrode is made of platinum or the like.
しかし乍ら前者はメッキ時のガス、あるいはメッキ液の
ジェット噴流によるキャビティションにより磨耗が著し
く、低寿命である。However, the former suffers from significant wear due to cavitation caused by gas during plating or by a jet of plating solution, resulting in a short lifespan.
後者は長寿命であるが全体が高価な白金であるためにコ
スト高であるという問題点がある。Although the latter has a long life, it has the problem of high cost because the entire material is made of expensive platinum.
さらにまた両者ともに、それぞれの接触子群の両端の接
触子に電荷が集中し、それだけメッキ厚が厚くなり、そ
れぞれの接触子のメッキ厚分布が不均一になるという問
題点がある。Furthermore, both methods have the problem that charges are concentrated on the contacts at both ends of each contact group, and the plating thickness becomes thicker, resulting in uneven plating thickness distribution of each contact.
(d) 考案の目的
本考案の目的は上記従来の問題点が除去された部分メッ
キ用電極を提供することにある。(d) Purpose of the invention The purpose of the present invention is to provide an electrode for partial plating that eliminates the above-mentioned conventional problems.
(e) 考案の構成
この目的を遠戚するために本考案は、長手方向の表面に
所望に長い凹部が設けられたほぼ直方体状のチタン電極
床と、該凹部に嵌着されるほぼ直方体状の電流遮蔽ブロ
ックと、該チタン電極床の長手側面に並行して該電流遮
蔽ブロックの側面と該凹部側面とのなす間隙に、加工物
の部分メッキ部に対向して挿着される白金電極板とを具
備し、それぞれの該白金電極板の表面側の端面長が、加
工物のそれぞれの部分メッキ部の長さに等しく構成され
てなるものである。(e) Structure of the Device In order to achieve this object distantly, the present invention consists of a titanium electrode bed having a substantially rectangular parallelepiped shape with a desirably long recess provided on its longitudinal surface, and a substantially rectangular parallelepiped-shaped titanium electrode bed fitted into the recess. a current shielding block, and a platinum electrode plate inserted parallel to the longitudinal side of the titanium electrode bed and facing the partially plated portion of the workpiece in the gap formed between the side surface of the current shielding block and the side surface of the recess. and the length of the end face on the front side of each of the platinum electrode plates is equal to the length of each partially plated portion of the workpiece.
(f) 考案の実施例
以下図示実施例を参照して本考案について詳細に説明す
る。(f) Embodiments of the invention The invention will be described in detail below with reference to illustrated embodiments.
第4図は本考案の一実施例のイは裏返しした斜図、口は
イの鎖線M−M部分の断面図である。FIG. 4 is a perspective view of an embodiment of the present invention when A is turned over, and the opening is a cross-sectional view taken along chain line M-M in A.
同図において13は部分メッキする加工物の長さよりも
長いほぼ直方体状のチタン電極床であって、長手方向の
表面にはほぼキ形の凹溝13bが形成されさらに凹溝1
bの幹部分はさらに深い平面視で矩形状の凹部13aが
形成されている。In the same figure, reference numeral 13 denotes a titanium electrode bed having a substantially rectangular parallelepiped shape that is longer than the length of the workpiece to be partially plated, and a substantially square groove 13b is formed on the longitudinal surface.
In the trunk portion b, a rectangular recess 13a is formed in a deeper plan view.
凹51abの枝の数は第1図のコネクタの接触子群の数
より1つだけ多い数である。The number of branches of the recess 51ab is one more than the number of contact groups of the connector of FIG.
また隣接する枝部間の距離は接触子群内の始めの接触子
と終りの接触子2の距離11に等しく、それぞれの枝部
の幅は、接触子群間の距離に等しい。Further, the distance between adjacent branches is equal to the distance 11 between the first contact and the last contact 2 in the contact group, and the width of each branch is equal to the distance between the contact groups.
14は例えば塩化ビニール樹脂よりなるとつめる電流遮
蔽ブロックで、平面、がチタン電極床13の凹溝13b
と同形状のキ形に形成され、凹部13aおよび凹溝13
bに嵌着されている。Reference numeral 14 denotes a current shielding block made of, for example, vinyl chloride resin, whose flat surface corresponds to the groove 13b of the titanium electrode bed 13.
It is formed in the same shape as the recess 13a and the groove 13.
It is fitted in b.
凹部13aの側面と電流遮蔽ブロック14の幹部の両側
面との間には所望幅の間隙を設けてなり、それぞれのこ
の間隙に長さが接触子群の両端の接触子の距離1□に等
しい長さの板状の白金電極板15が、チタン電極床13
の長手側面に並行して圧入されている。A gap of a desired width is provided between the side surface of the recess 13a and both side surfaces of the main body of the current shielding block 14, and the length of each gap is equal to the distance 1□ between the contacts at both ends of the contact group. A long plate-shaped platinum electrode plate 15 is attached to the titanium electrode bed 13.
It is press-fitted parallel to the long side of the.
なお、電流遮蔽ブロック14の上表面は、チタン電極床
13の上表面よりも所望に突出しており、それぞれの白
金電極板15の上部端面ば電流遮蔽ブロック14の上表
面とほぼ同一平面をなしている。The upper surface of the current shielding block 14 protrudes as desired from the upper surface of the titanium electrode bed 13, and the upper end surface of each platinum electrode plate 15 is approximately flush with the upper surface of the current shielding block 14. There is.
したがって白金電極板15の外方の側面の上部はチタン
電極床13より露出されメッキ液との接触面積が大きく
なるようになっている。Therefore, the upper part of the outer side surface of the platinum electrode plate 15 is exposed from the titanium electrode bed 13, so that the contact area with the plating solution is increased.
このように加工物の部分メッキ部の長さに等しい1□の
長さの電極板がそれぞれの部分メッキ部に対向して装着
されているので、電荷が部分的に集中することがなく、
メッキ厚分布が均一な部分メッキを得ることができる。In this way, the electrode plate with a length of 1 □, which is equal to the length of the partially plated part of the workpiece, is mounted facing each partially plated part, so that electric charges are not concentrated locally.
Partial plating with uniform plating thickness distribution can be obtained.
なおチタンはメッキ液により表面に酸化被膜が形成され
、メッキ液とは絶縁されている。Note that titanium has an oxide film formed on its surface by the plating solution, and is insulated from the plating solution.
(g) 考案の効果
以上説明したように本考案は、加工物のメッキする部分
に対向した部分のみに白金電極板を使用したことにより
、価格が低コスト、かつ長寿命でさらに均一なメッキ厚
を得ることが出来るなどといった実用上ですぐれた効果
のある部分メッキ用電極である。(g) Effects of the invention As explained above, the invention uses a platinum electrode plate only on the part facing the part to be plated on the workpiece, resulting in lower cost, longer life, and more uniform plating thickness. It is an electrode for partial plating that has excellent practical effects such as being able to obtain .
第1図はコネクタの斜視図、第2図は部分メツキ装置の
断面図、第3図は従来の電極を裏返した斜視図、第4図
は本考案の一実施例の電極でイは裏返した斜視図、口は
イの鎖線M−M部分の断面図である。
図中1はコネク、2は接触子、3は接点部、5は下型、
6は受板、7はマスク、8は上型、9はノスル、11は
電極、12はメッキ液、13はチタン電極床、13aは
凹部、13bは凹溝、14は電流遮蔽ブロック、15は
白金電極板を示す。Figure 1 is a perspective view of the connector, Figure 2 is a cross-sectional view of the partial plating device, Figure 3 is a perspective view of a conventional electrode turned over, and Figure 4 is an electrode of an embodiment of the present invention, with A turned over. The perspective view is a sectional view taken along chain line M-M in A. In the figure, 1 is the connector, 2 is the contact, 3 is the contact part, 5 is the lower mold,
6 is a receiving plate, 7 is a mask, 8 is an upper mold, 9 is a nozzle, 11 is an electrode, 12 is a plating solution, 13 is a titanium electrode floor, 13a is a recessed part, 13b is a groove, 14 is a current shielding block, 15 is A platinum electrode plate is shown.
Claims (1)
体状のチタン電極床と、該凹部に嵌着されるほぼ直方体
状の電流遮蔽ブロックと、該チタン電極床の長手側面に
並行して該電流遮蔽ブロックの側面と該凹部側面とのな
す間隙に、加工物の部分メッキ部に対向して挿着される
白金電極とを具備し、それぞれの該白金電極の表面長が
、加工物のそれぞれの部分メッキ部の長さに等しく構成
されてなることを特徴とする部分メッキ用電極。A titanium electrode bed in the shape of a substantially rectangular parallelepiped with a desirably long recess provided on its longitudinal surface, a current shielding block in the shape of a substantially rectangular parallelepiped fitted in the recess, and a current shielding block in parallel with the longitudinal side of the titanium electrode bed. A platinum electrode is provided in the gap formed between the side surface of the current shielding block and the side surface of the recess to face the partially plated portion of the workpiece, and the surface length of each platinum electrode is equal to the length of each of the workpiece. An electrode for partial plating, characterized in that the length of the partial plating part is equal to the length of the partial plating part.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP16900282U JPS6023317Y2 (en) | 1982-11-08 | 1982-11-08 | Electrode for partial plating |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP16900282U JPS6023317Y2 (en) | 1982-11-08 | 1982-11-08 | Electrode for partial plating |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5973372U JPS5973372U (en) | 1984-05-18 |
JPS6023317Y2 true JPS6023317Y2 (en) | 1985-07-11 |
Family
ID=30369316
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP16900282U Expired JPS6023317Y2 (en) | 1982-11-08 | 1982-11-08 | Electrode for partial plating |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6023317Y2 (en) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US10926756B2 (en) | 2016-02-23 | 2021-02-23 | Deka Products Limited Partnership | Mobility device |
USD803963S1 (en) | 2016-07-20 | 2017-11-28 | Razor Usa Llc | Two wheeled board |
USD807457S1 (en) | 2016-07-20 | 2018-01-09 | Razor Usa Llc | Two wheeled board |
-
1982
- 1982-11-08 JP JP16900282U patent/JPS6023317Y2/en not_active Expired
Also Published As
Publication number | Publication date |
---|---|
JPS5973372U (en) | 1984-05-18 |
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