JPS6022798A - Semiconductor memory device - Google Patents

Semiconductor memory device

Info

Publication number
JPS6022798A
JPS6022798A JP58130207A JP13020783A JPS6022798A JP S6022798 A JPS6022798 A JP S6022798A JP 58130207 A JP58130207 A JP 58130207A JP 13020783 A JP13020783 A JP 13020783A JP S6022798 A JPS6022798 A JP S6022798A
Authority
JP
Japan
Prior art keywords
data
node
cmos inverter
transfer
line
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP58130207A
Other languages
Japanese (ja)
Inventor
Katsuhiro Kawabuchi
川「淵」 勝弘
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp filed Critical Toshiba Corp
Priority to JP58130207A priority Critical patent/JPS6022798A/en
Publication of JPS6022798A publication Critical patent/JPS6022798A/en
Pending legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C11/00Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor
    • G11C11/21Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements
    • G11C11/34Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements using semiconductor devices

Abstract

PURPOSE:To decrease the number of element and at the same time to attain a current read-out action by using a CMOS inverter, the 1st transfer MOS transistor (TR) connected to the gate of the CMOS inverter and the 2nd transfer MOS TR connected to the node of said CMOS inverter. CONSTITUTION:When data are written, the potential of the 1st word line 4 is set at a high level with the 1st transfer transistor 3 made conduct respectively. Then a node 5 is set at ''0'' by the function of a CMOS inverter 1 in case the data sent to a bit line 8 is set at ''1''. While the data of ''1'' is held at the node 5 in case the data of the line 8 is set at ''0''. In a read-out mode the potential of the line 4 is kept at a low level, and the potential of the 2nd word line 7 is set at a high level. Thus the 2nd transfer TR6 is conducted to transmit the data of the node 5 to the bit line.

Description

【発明の詳細な説明】 〔発明の属する技術分野〕 この技術は半導体集積回路に用いられるメモリセルに関
する。
DETAILED DESCRIPTION OF THE INVENTION [Technical field to which the invention pertains] This technology relates to memory cells used in semiconductor integrated circuits.

〔従来技術とその問題点〕[Prior art and its problems]

従来、記憶装置に用いられるメモリセルは、6個のトラ
ンジスタを用いてアリツブフロップを構成していた。こ
の為、素子数削減により一層の高集積化を図ることが望
まれていた。
Conventionally, a memory cell used in a memory device has constituted an array flop using six transistors. For this reason, it has been desired to achieve even higher integration by reducing the number of elements.

〔発明の目的〕[Purpose of the invention]

本発明はダイナミック動作を待人う、電流読み出し動作
可能なセルを提供する事を目的とする。
It is an object of the present invention to provide a cell capable of current read operation without waiting for dynamic operation.

〔発明の概要〕[Summary of the invention]

本発明は、CMOSインバーターと、この0MO8イン
バーターのゲートに接続されたgt4iのトランスファ
用MO8)ランジスタと、このMOS )ランジスタの
ゲートに接続された第1のワード線と、前記CMOSイ
ンバーターのノード(5)に接続された。
The present invention includes a CMOS inverter, a gt4i transfer MO8 transistor connected to the gate of the MO8 inverter, a first word line connected to the gate of the MOS transistor, and a node (5) of the CMOS inverter. ) connected to.

第2のトランスファ用MO8)ランジスタと、このMO
S ) 、Fンジスタのゲートに接続された第2のワー
ド線と、第1.第2のMOS )ランジスタの他端に共
通して接続されたビット線とを備えてなる半導体記憶装
置にある。
Second transfer MO8) transistor and this MO
S), a second word line connected to the gate of the F transistor; 2nd MOS) A semiconductor memory device comprising a bit line commonly connected to the other end of the transistor.

〔発明の効果〕〔Effect of the invention〕

かかる本発明によれば、少ない素子数で電流読み出し可
能な新規なメモリセルを提供する事ができる。
According to the present invention, it is possible to provide a novel memory cell capable of current reading with a small number of elements.

〔発明の実施例〕[Embodiments of the invention]

本技術が提供する半導体集積回路用のメモリセルはS0
MO8・インバーター1と、同CMOSインバーターの
ゲート2に接続された第1のトランスフアト2ンジスタ
3ど、第1のトランスファトランジスタに接続された第
1のワードiPi!4と、前記CMOSインバーターの
ノード5に接続された第2のトランスファトランジスタ
6と、 第2のトランスファトランジスタに接続された第2のワ
ード線7と、第1と第2のトランスファトランジスタに
共通のビット線8がら構成される。
The memory cell for semiconductor integrated circuits provided by this technology is S0
MO8 inverter 1 and the first word iPi! connected to the first transfer transistor, such as the first transfer transistor 3 connected to the gate 2 of the CMOS inverter. 4, a second transfer transistor 6 connected to the node 5 of the CMOS inverter, a second word line 7 connected to the second transfer transistor, and a bit common to the first and second transfer transistors. It consists of a line 8.

データの書き込みと読み出しは次のようにして行なわれ
る。データを噛、キ込む場合には第1のワード線の電位
をハイレベルにし、第1のトランスファトランジスタを
導通状態にする。するとビット線に送られたデータが「
1」の場合にはCMOSインバーターの動作によってノ
ードがrOJの状態になる(書き込み動作時には第2の
ワード線の箱2位はローレペIに設定され、a42c2
3トランスファトランジスタは遮断状態にある。)逆に
ビット線に送られたデータが「0」の場合にはメートに
「1」のデータが保持される。読み出し動作の場合には
、第1のワード線の電位をローンがルに保ち、第2のワ
ード線の電位をハイレベルにする。すると第2のトラン
スファトランジスタが導通状態になりビット線にノード
のデータが伝達される。なお、書き込みと読み出しの動
作を行わない場合は、第1、第2のワード線ともにロー
レベルに電位が設定される。
Data writing and reading are performed as follows. When data is to be bitten, the potential of the first word line is set to a high level, and the first transfer transistor is made conductive. Then the data sent to the bit line becomes “
1", the node enters the rOJ state due to the operation of the CMOS inverter (during a write operation, the second position of the box of the second word line is set to low repeat
3 transfer transistors are in a cut-off state. ) Conversely, if the data sent to the bit line is "0", data "1" is held in the mate. In the case of a read operation, the potential of the first word line is kept low and the potential of the second word line is set to high level. Then, the second transfer transistor becomes conductive and the data of the node is transmitted to the bit line. Note that when writing and reading operations are not performed, the potentials of both the first and second word lines are set to a low level.

本技術のモメリセルは6個のトランジスタを必要とする
フリップフロップ型のメモリセルよシトランジスタの個
数が少なくて済む。また、本技術のメモリセルはダイナ
ミック動作のセルであるが、従来の1トランジスタ1キ
ヤパシタ型のダイナミックメモリセルと異なシ、電流に
よる読み出し動作を行なうことができる。
The memory cell of the present technology requires fewer transistors than a flip-flop type memory cell that requires six transistors. Furthermore, although the memory cell of the present technology is a dynamic operation cell, it can perform a read operation using a current, which is different from a conventional one-transistor, one-capacitor type dynamic memory cell.

【図面の簡単な説明】[Brief explanation of drawings]

図面は、本発明の詳細な説明する回路図である。 The drawings are circuit diagrams illustrating the invention in detail.

Claims (1)

【特許請求の範囲】[Claims] CMOSインバーターと、との0MO8インバーターの
ゲートに接続された第1のトランスファ用MOSト2ン
ジスタと、とのM)S )ランジスタのゲートに接続さ
れた第1のワード線と、前記CMOSインバーターのノ
ード(5)に接続された第2のトランスファ用Mc)S
トランジスタと、このMOSトランジスタのゲートに接
続された第2のワード線と、第1.第2のMOS )ラ
ンジスタの他端に共通して接続されたビット線とを備え
てなる半導体記憶装置。
a CMOS inverter; a first transfer MOS transistor connected to the gate of the MO8 inverter; a first word line connected to the gate of the transistor; and a node of the CMOS inverter. (5) Second transfer Mc)S connected to
a second word line connected to the gate of the MOS transistor; A semiconductor memory device comprising a bit line commonly connected to the other end of a second MOS transistor.
JP58130207A 1983-07-19 1983-07-19 Semiconductor memory device Pending JPS6022798A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP58130207A JPS6022798A (en) 1983-07-19 1983-07-19 Semiconductor memory device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58130207A JPS6022798A (en) 1983-07-19 1983-07-19 Semiconductor memory device

Publications (1)

Publication Number Publication Date
JPS6022798A true JPS6022798A (en) 1985-02-05

Family

ID=15028648

Family Applications (1)

Application Number Title Priority Date Filing Date
JP58130207A Pending JPS6022798A (en) 1983-07-19 1983-07-19 Semiconductor memory device

Country Status (1)

Country Link
JP (1) JPS6022798A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5262064A (en) * 1991-09-26 1993-11-16 Florida Institute Of Phosphate Research Dewatering method and agent
JP2006338730A (en) * 2005-05-31 2006-12-14 Sony Corp Semiconductor memory device

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5262064A (en) * 1991-09-26 1993-11-16 Florida Institute Of Phosphate Research Dewatering method and agent
US5449464A (en) * 1991-09-26 1995-09-12 Florida Institute Of Phosphate Research Dewatering method and agent
JP2006338730A (en) * 2005-05-31 2006-12-14 Sony Corp Semiconductor memory device

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