JPS60224735A - Conductor material - Google Patents
Conductor materialInfo
- Publication number
- JPS60224735A JPS60224735A JP7857884A JP7857884A JPS60224735A JP S60224735 A JPS60224735 A JP S60224735A JP 7857884 A JP7857884 A JP 7857884A JP 7857884 A JP7857884 A JP 7857884A JP S60224735 A JPS60224735 A JP S60224735A
- Authority
- JP
- Japan
- Prior art keywords
- alloy
- plating
- conductive material
- plated
- electrically conductive
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Electroplating Methods And Accessories (AREA)
- Other Surface Treatments For Metallic Materials (AREA)
- Conductive Materials (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は導体材料に係り、特に電気的接続部を亜鉛置換
処理後鋼メッキ、錫メッキ等を施すような導体材料に関
するものである。DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a conductive material, and particularly to a conductive material whose electrical connection portions are subjected to zinc substitution treatment and then subjected to steel plating, tin plating, etc.
一般に、導体材料としては、その導電率が61%以上で
あることが要求され、例えばJIS )(4180に規
定されているように99.60wt%以上のアルミニウ
ム材が用いられ、そしてこのような99.60Wi%以
上の純度のアルミニウム材を圧延及び押出等によって成
形した後、所定の寸法に切断することによって作られて
いる。Generally, conductive materials are required to have a conductivity of 61% or more, and for example, aluminum materials with a conductivity of 99.60 wt% or more are used as specified in JIS (4180). It is made by forming an aluminum material with a purity of .60 Wi% or higher by rolling, extrusion, etc., and then cutting it into predetermined dimensions.
そして、このような導体材料は所定の部分に接続される
前に、電気的接続部分に銅メッキ及び錫メッキ等が施さ
れている。Before such a conductive material is connected to a predetermined portion, the electrical connection portion is plated with copper, tin, etc.
しかしながら、このような工程においては、メッキ工程
の前処理として、導体材料表面を苛性ソーダ等によって
エツチングすることにより表面の油及び酸化皮膜の除去
、及びエツチング後水洗、硝酸又はフッ酸浴等による中
和処理、及び再度の水洗をした後、亜鉛置換処理(ジン
ケート処理)が行なわれ、そしてこの後銅メッキ、錫メ
ッキ等が行なわれる。However, in such a process, as a pretreatment for the plating process, the surface of the conductor material is etched with caustic soda, etc. to remove the oil and oxide film on the surface, and after etching, it is washed with water, neutralized with a nitric acid or hydrofluoric acid bath, etc. After the treatment and washing with water again, zinc substitution treatment (zincate treatment) is performed, and then copper plating, tin plating, etc. are performed.
このような場合、従来では、ジンケート皮膜の生成が粗
く、かつ多いことより、メッキ後においてメッキ膜の剥
離が起きたり、ひどい場合にはジンケート皮膜自体が剥
離することもあり、従ってダブルジンケート処理、トリ
プルジンケート処理といった処理が行なわれていなけれ
ばならなかったりする。In such cases, in the past, since the formation of a zincate film was rough and large, the plating film could peel off after plating, or in severe cases, the zincate film itself could peel off, so double zincate treatment, Treatments such as triple zincate treatment may have to be carried out.
又、このようなマルチジンケート処理が行なわれていて
も、メッキ処理後、切断端面に米粒大状ないしは小豆大
状のフクレが発生することもあり、このような場合には
経時変化とともにメッキ膜の密着性が劣下してゆくとい
った問題がある。Furthermore, even if such multi-zincate treatment is performed, rice-grain-sized or azuki-bean-sized blisters may occur on the cut end surface after plating, and in such cases, the plating film deteriorates over time. There is a problem that adhesion deteriorates.
本発明者は、上記ジンケート性及びメッキ性の不良原因
について研究した結果、表面処理条件、すなわちエツチ
ング量といった前処理条件、 ZnO及びNaOH濃度
、添加物といったジンケート処理条件t pH及び温度
といったCuストライクメッキ条件の違いによって不良
度が異なることを見い出した。As a result of research into the causes of poor zincating properties and plating properties, the present inventor found that surface treatment conditions, i.e. pretreatment conditions such as etching amount, zincate treatment conditions such as ZnO and NaOH concentrations and additives, and Cu strike plating such as pH and temperature. It was found that the degree of defectiveness differs depending on the conditions.
しかしながら、単に表面処理条件の最適値への設足が行
なわれても完全なものとは言えず、又今まで行なわれて
きた表面処理条件を変更することは容易でないユーザー
もるり、このような点がら表面処理条件によってジンケ
ート性及びメッキ性の向上を図るのではなく、本質的な
改良が望まれた。However, simply setting the surface treatment conditions to the optimum values is not perfect, and some users find it difficult to change the surface treatment conditions that have been used up until now. Rather than trying to improve the zincating properties and plating properties through surface treatment conditions, essential improvements were desired.
そこで、本発明者は、更に研究を続けた結果、導体材料
の組成条件によってジンケート性及ヒメッキ性が大きく
影響を受け、塩基性浴中にてAlより電気化学的に責で
、かつカソード分極を小さくするZn、 Cu、 Ni
、 Sn等の元素を少なくとも二種類以上含有し、その
含有量が0.03〜o、oswt%、Alが99.60
wt%以上の組成のアルミニウム合金よりなる導体材料
は、ジンケート性及びメッキ性が良く、メッキ後におけ
るメッキ膜の密着性に優れ、かつメッキ後の切断端面に
フクレの問題も起きないことを見い出した。Therefore, as a result of further research, the present inventor found that the zincating property and the plating property are greatly affected by the compositional conditions of the conductor material, and that it is more electrochemically effective than Al in a basic bath, and has a lower cathodic polarization property. Reduce Zn, Cu, Ni
, Contains at least two or more types of elements such as Sn, the content is 0.03 to 0, oswt%, and Al is 99.60
It has been found that a conductor material made of an aluminum alloy with a composition of wt% or more has good zincating properties and plating properties, has excellent adhesion of the plating film after plating, and does not cause the problem of blistering on the cut end surface after plating. .
すなわち、塩基性浴中にてAlより電気化学的に責で、
かつカソード分極特性が小さな元素、特に、例えばZn
、 Gu、 Ni、 Sn等の中から少なくとも二種類
以上の元素を添加していると、素材表面の酸化皮膜のバ
リヤー性が低下し、その結果ジンケート処理性(皮膜の
密着性、均一性、微細化)が向上するものと考えられる
。That is, it is more electrochemically active than Al in a basic bath,
and elements with small cathodic polarization characteristics, especially, for example, Zn.
, Gu, Ni, Sn, etc., the barrier properties of the oxide film on the surface of the material decrease, resulting in poor zincate treatment properties (film adhesion, uniformity, and fineness). It is thought that this will improve the
特に、このジンケート処理性の向上は、zn%Cu。In particular, this improvement in zincate processability is achieved by zn%Cu.
Ni、Sn等を単に一種類しか含まないといった場合で
なく、二種類以上含ませておくことによって達成され、
特にznとCuとを含ませておくことによって達成され
、かつこれら二種類以上の元素の含有量の和が0.03
〜o、oswtチの場合に著しい効果が発揮される。同
、これらの元素がo、oswt%を越えて多く含まれて
いると、導電率が悪くなる。This is achieved by containing two or more types of Ni, Sn, etc., rather than just one type.
In particular, this is achieved by including Zn and Cu, and the sum of the contents of these two or more elements is 0.03
A remarkable effect is exhibited in the case of ~o, oswt. Similarly, if the content of these elements exceeds o, swt%, the conductivity will deteriorate.
又、導体材料は、JIS H4180に示される如く、
導電性向上の為にSi、Feその他の不可避不純物、T
i、 B等の結晶粒微細化剤の含有がJIS 1060
相当程度に制限されており、JI81060においては
、例えばSiが0.25wt%以下、Feが0.35w
t%以下となっているが、Slを0.10wt%以下、
Feをo、zo’wt%以下、そしてSiとFeの含有
量の和が0.28wt%以下とすることが導電率の面よ
り望ましい。In addition, the conductor material is as shown in JIS H4180.
Si, Fe and other unavoidable impurities, T are added to improve conductivity.
Contains grain refining agents such as i and B according to JIS 1060
In JI81060, for example, Si is 0.25wt% or less and Fe is 0.35w.
Although it is t% or less, Sl is 0.10wt% or less,
From the viewpoint of electrical conductivity, it is preferable that the Fe content be 0, zo'wt% or less, and the sum of the Si and Fe contents be 0.28wt% or less.
〔実施例1〜11〕
表1に示すNo1〜11の組成のアルミニウム合金を鋳
造して、直径278r1′Tr′11長さ500r1′
rrIのビレットを製造し、400〜450℃の温度で
直接押出にて250rrfT′I巾、板厚10rrmの
フラットバーを製造した。[Examples 1 to 11] Aluminum alloys having compositions Nos. 1 to 11 shown in Table 1 were cast, and the diameter was 278r1'Tr'11 and the length was 500r1'.
A billet of rrI was produced, and a flat bar having a width of 250 rrfT'I and a plate thickness of 10 rrm was produced by direct extrusion at a temperature of 400 to 450°C.
そして、このフラットバーを所定の長さに切断後、10
W’t%N aOH170℃、40秒の条件でアルカリ
エツチングを行ない、エツチング後水洗して10wt%
HNO,,、常温、30秒の条件で中和処理し、そして
再度水洗する。After cutting this flat bar into a predetermined length, 10
W't% NaOH Perform alkaline etching at 170°C for 40 seconds, and after etching, wash with water to reduce to 10 wt%.
Neutralize with HNO, room temperature for 30 seconds, and wash again with water.
この後、ZnO100gA、 NaOH500g/C常
温、1分の条件でジンケート処理を行ない、ジンケート
処理後水洗する。Thereafter, a zincate treatment is performed using 100 g of ZnO and 500 g/C of NaOH at room temperature for 1 minute, and after the zincate treatment, it is washed with water.
そして、上記水洗後、塩化第一銅、青化ソーダ、酒石酸
ソーダ浴でCuストライクメッキ処理を行ない、続いて
シアン化銅、青化ソーダ、ロダン塩浴でCuメッキを行
なう。After washing with water, Cu strike plating is performed in a cuprous chloride, soda cyanide, and sodium tartrate bath, and then Cu plating is performed in a copper cyanide, sodium cyanide, and Rodan salt bath.
このQuメッキ後、スズ酸カリ、水酸化カリウム浴でS
nメッキを行なう。After this Qu plating, S
Perform n plating.
〔比較例1〜3〕
表1に示すNo12〜14の組成のアルミニウム合金を
鋳造し、これを用いて前記実施例1と同様に行なう。[Comparative Examples 1 to 3] Aluminum alloys having compositions Nos. 12 to 14 shown in Table 1 were cast, and the same procedure as in Example 1 was conducted using the cast aluminum alloys.
前記実施例1〜1】及び比較例1〜3のものについて、
ジンケート処理性(ジンケート皮膜の剥離共付ン、メッ
キ性(メッキ後の端面のふくれ具合)及び導電率を調べ
ると表1に示す通りである。Regarding Examples 1 to 1] and Comparative Examples 1 to 3,
Table 1 shows the zincate treatment properties (removal and adhesion of the zincate film), plating properties (swelling of the end face after plating), and electrical conductivity.
Claims (1)
ード分極を小さくする元素を少なくとも二種類以上含有
し、その含有量が0.03〜o、oswt%、Alが9
9.6owt%以上のもので構成したことを特徴とする
導体材料。 ■特許請求の範囲第1項記載の導体材料において、塩基
性浴中にてAlより電気化学的に責で、かつカソード分
極を小さくする元素は、Znv (:’uv Nl及び
Snの群より選ばれるもの。[Claims] ■Contains at least two or more elements that are more electrochemically responsible than Al in a basic bath and that reduce cathode polarization, the content of which is 0.03 to 0, oswt%, Al is 9
A conductor material comprising 9.6wt% or more. ■In the conductor material according to claim 1, the element that is more electrochemically responsible than Al in a basic bath and reduces cathodic polarization is Znv (:'uv selected from the group of Nl and Sn). What you can do.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP7857884A JPS60224735A (en) | 1984-04-20 | 1984-04-20 | Conductor material |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP7857884A JPS60224735A (en) | 1984-04-20 | 1984-04-20 | Conductor material |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS60224735A true JPS60224735A (en) | 1985-11-09 |
JPS6318658B2 JPS6318658B2 (en) | 1988-04-19 |
Family
ID=13665783
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP7857884A Granted JPS60224735A (en) | 1984-04-20 | 1984-04-20 | Conductor material |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS60224735A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2010157416A (en) * | 2008-12-26 | 2010-07-15 | Sumitomo Electric Ind Ltd | Aluminum alloy wire |
JP2014037587A (en) * | 2012-08-17 | 2014-02-27 | Ota Mekki Kogyo Co Ltd | Electroplating method of pure iron to aluminum or aluminum alloy material |
-
1984
- 1984-04-20 JP JP7857884A patent/JPS60224735A/en active Granted
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2010157416A (en) * | 2008-12-26 | 2010-07-15 | Sumitomo Electric Ind Ltd | Aluminum alloy wire |
JP2014037587A (en) * | 2012-08-17 | 2014-02-27 | Ota Mekki Kogyo Co Ltd | Electroplating method of pure iron to aluminum or aluminum alloy material |
Also Published As
Publication number | Publication date |
---|---|
JPS6318658B2 (en) | 1988-04-19 |
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