JPS60214577A - Gas laser oscillator - Google Patents
Gas laser oscillatorInfo
- Publication number
- JPS60214577A JPS60214577A JP7078384A JP7078384A JPS60214577A JP S60214577 A JPS60214577 A JP S60214577A JP 7078384 A JP7078384 A JP 7078384A JP 7078384 A JP7078384 A JP 7078384A JP S60214577 A JPS60214577 A JP S60214577A
- Authority
- JP
- Japan
- Prior art keywords
- laser medium
- flow path
- vacuum pump
- laser
- valve
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/02—Constructional details
- H01S3/03—Constructional details of gas laser discharge tubes
- H01S3/036—Means for obtaining or maintaining the desired gas pressure within the tube, e.g. by gettering, replenishing; Means for circulating the gas, e.g. for equalising the pressure within the tube
Landscapes
- Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Optics & Photonics (AREA)
- Lasers (AREA)
Abstract
Description
【発明の詳細な説明】
（産業上の利用分野）
本発明は、新鮮なレーザ媒質をレーザ媒質供給源からレ
ーザ媒質流通路に供給しながら、分解劣化したレーザ媒
質をレーザ媒質流通路から真空ポンプによって排出する
レーザ媒質給排機構を具備したガスレーザ発振装置に関
するものである。DETAILED DESCRIPTION OF THE INVENTION (Industrial Application Field) The present invention provides a method for supplying fresh laser medium from a laser medium supply source to a laser medium flow path while removing degraded laser medium from the laser medium flow path using a vacuum pump. The present invention relates to a gas laser oscillation device equipped with a laser medium supply/discharge mechanism for ejecting the laser medium.
（従来例の構成とその問題点）
第１図は、ガスレーザ発振装置における従来のレーザ媒
質給排機構の構成を示すもので、１は放電管２をレーザ
媒質流通経路上に設置したレーザ媒質流通路、３はレー
ザ媒質流通路１に設置した送風機、４は送風機３のギア
ボックス、５は新鮮なレーザ媒質を封入したレーザ媒質
供給源、６はレーザ媒質流通路１とレーザ媒質供給源５
とを連通する供給管、７はレーザ媒質流通路１の中のレ
ーザ媒質の圧力が常に一定になるようにレーザ媒質供給
源５からレーザ媒質流通路１にレーザ媒質を供給する流
量調整弁で、この流量調整弁７は供給管６に設置されて
いる。８は真空ポンプ９の駆動開始直後から所定の時晶
過すると開き、真空ポンプ９が停止すると閉じる供給弁
で、この供給弁８は供給管６に設置されている。１０は
真空ポンプ９に設けた吸入口、１１は真空ポンプ９の中
に設けたオイル室、１２は真空ポンプ９の吸入口１０と
オイル室１１とを連通する油管、１３はレーザ媒質流通
路１からレーザ媒質を排出する導管、１４は導管１３と
真空ポンプ９の吸入口１０とを連通ずる排出管、１５は
レーザ媒質流通路１から真空ポンプ９に流入するレーザ
媒質の流入量が真空ボ・ンプ９の排出量より少なくなる
ように調整された流量調整弁で、この流量調整弁１５は
排出管１４に設置されている。(Configuration of conventional example and its problems) Fig. 1 shows the configuration of a conventional laser medium supply/discharge mechanism in a gas laser oscillation device. 3 is a blower installed in the laser medium flow path 1, 4 is a gearbox of the blower 3, 5 is a laser medium supply source containing fresh laser medium, and 6 is the laser medium flow path 1 and the laser medium supply source 5.
7 is a flow rate adjustment valve that supplies the laser medium from the laser medium supply source 5 to the laser medium flow path 1 so that the pressure of the laser medium in the laser medium flow path 1 is always constant; This flow rate regulating valve 7 is installed in the supply pipe 6. Reference numeral 8 denotes a supply valve that opens when crystallization occurs at a predetermined time immediately after the start of driving of the vacuum pump 9 and closes when the vacuum pump 9 stops; this supply valve 8 is installed in the supply pipe 6. 10 is a suction port provided in the vacuum pump 9; 11 is an oil chamber provided in the vacuum pump 9; 12 is an oil pipe that communicates the suction port 10 of the vacuum pump 9 with the oil chamber 11; and 13 is a laser medium flow path 1. 14 is a discharge pipe that communicates the conduit 13 with the suction port 10 of the vacuum pump 9; 15 is a discharge pipe that discharges the laser medium from the laser medium flow path 1 into the vacuum pump 9; The flow rate regulating valve 15 is adjusted so that the discharge amount is smaller than the discharge amount of the pump 9, and is installed in the discharge pipe 14.
１６は導管１３と真空ポンプ９の吸入口１０とを連通ず
るバイパス管で、このバイパス管１６は排出管１４と並
列に設けられている。１７は真空ポンプ９の駆動開始直
後から所定の時間だけ開いている排出弁で、この排出弁
１７はバイパス管１６に設置されている。A bypass pipe 16 communicates the conduit 13 with the suction port 10 of the vacuum pump 9, and the bypass pipe 16 is provided in parallel with the discharge pipe 14. Reference numeral 17 denotes a discharge valve that is opened for a predetermined period of time immediately after the vacuum pump 9 starts driving, and this discharge valve 17 is installed in the bypass pipe 16.
１８はギアボックス４と導管１３とを連通ずるバイパス
管、１９は真空ポンプ９が駆動されると開き、真空ポン
プ９が停止すると閉じる開閉弁で、この開閉弁１９はバ
イパス管１８に設置されている。18 is a bypass pipe that communicates the gearbox 4 and the conduit 13; 19 is an on-off valve that opens when the vacuum pump 9 is driven and closes when the vacuum pump 9 stops; this on-off valve 19 is installed in the bypass pipe 18; There is.
このように構成された従来例では、ガスレーザ発振装置
の運転が開始されて、真空ポンプ９が駆動されると、供
給弁８が閉じると同時に、排出弁１７及び開閉弁１９が
開いて、レーザ媒質流通路１の中からその中に残留して
いる分解劣化したレーザ媒質が、又、ギアボックス４の
中からその中の空気、オイルミスト等が、それぞれ、真
空ポンプ９によって外部に排出され、時間が経過するに
つれて、レーザ媒質流通路１の中及びギアボックス４の
中がそれぞれ真空になる。そして、真空ポンプ９の駆動
開始直後から所定の時間が経過すると、供給弁８が開く
と同時に、排出弁１７が閉じて、新鮮なレーザ媒質が流
量調整弁７を介してレーザ媒質流通路１及びギアボック
ス４の中に供給される。In the conventional example configured in this way, when the operation of the gas laser oscillation device is started and the vacuum pump 9 is driven, the supply valve 8 is closed, and at the same time, the discharge valve 17 and the on-off valve 19 are opened, and the laser medium is removed. The decomposed and degraded laser medium remaining in the flow path 1 and the air, oil mist, etc. in the gearbox 4 are discharged to the outside by the vacuum pump 9, and the As time passes, the inside of the laser medium flow path 1 and the inside of the gearbox 4 become vacuum. Then, when a predetermined period of time has elapsed immediately after the start of driving the vacuum pump 9, the supply valve 8 opens and the discharge valve 17 closes, allowing fresh laser medium to flow through the flow rate adjustment valve 7 and into the laser medium flow path 1. It is fed into the gearbox 4.
同時に、レーザ媒質流通路１の中のレーザ媒質の圧力と
ギアボックス４の中の空気等の圧力とが常に等しくなる
ように管径が設定された導管１３、排出管１４とバイパ
ス管１８とを介して、レーザ媒質流通路１の中の分解劣
化したレーザ媒質を流量調整弁１５を介してレーザ媒質
流通路１の外に排出すると共に、ギアボックス４の中の
レーザ媒質と混合した空気、オイルミスト等を流量調整
弁１５を介してレーザ媒質流通路１の外に排出するので
、レーザ媒質流通路１の中は常に新鮮なレーザ媒質で満
される。又、真空ポンプ９の排気量は流量調整弁１５か
ら真空ポンプ９に流入するレーザ媒質の流入量よりも常
に多いので、レーザ媒質流通路１の中のレーザ媒質の圧
力は常に一定である。At the same time, a conduit 13, a discharge pipe 14, and a bypass pipe 18 whose pipe diameters are set so that the pressure of the laser medium in the laser medium flow path 1 and the pressure of air, etc. in the gearbox 4 are always equal. The decomposed and degraded laser medium in the laser medium flow path 1 is discharged to the outside of the laser medium flow path 1 through the flow rate adjustment valve 15, and the air and oil mixed with the laser medium in the gearbox 4 are discharged. Since mist and the like are discharged to the outside of the laser medium flow path 1 via the flow rate adjustment valve 15, the inside of the laser medium flow path 1 is always filled with fresh laser medium. Further, since the displacement of the vacuum pump 9 is always larger than the amount of laser medium flowing into the vacuum pump 9 from the flow rate regulating valve 15, the pressure of the laser medium in the laser medium flow path 1 is always constant.
ところで、真空ポンプ９が停止すると、供給弁８、排気
弁１７及び開閉弁１９が閉じて、新鮮なレーザ媒質の供
給と分解劣化したレーザ媒質及びギアボックス４の中の
空気等の排出が遮断され、レーザ媒質流通路１の中に残
留したレーザ媒質の圧力は大気圧以下に保持される。と
ころが、レーザ媒質流通路１と真空ポンプ９のオイル室
１１とは流量調整弁１５を介して連通しているので、オ
イル室１１の中の空気やオイルミストがレーザ媒質流通
路１の中に流れ込んで、レーザ媒質流通路１の中を汚染
するので、レーザ出力が低下する欠点があった。By the way, when the vacuum pump 9 stops, the supply valve 8, the exhaust valve 17, and the on-off valve 19 are closed, and the supply of fresh laser medium and the discharge of the decomposed and degraded laser medium and the air inside the gearbox 4 are cut off. , the pressure of the laser medium remaining in the laser medium flow path 1 is maintained below atmospheric pressure. However, since the laser medium flow path 1 and the oil chamber 11 of the vacuum pump 9 communicate with each other via the flow rate adjustment valve 15, air and oil mist in the oil chamber 11 may flow into the laser medium flow path 1. This contaminates the inside of the laser medium flow path 1, which has the disadvantage of reducing the laser output.
又、レーザ媒質流通路１に設けた送風機３は、回転翼（
図示しない）がレーザ媒質流通路１の中に、回転翼駆動
装Ｗ（図示しない）がギアボックス４の中にそれぞれ装
着されているが、回転翼と回転翼駆動装置とを接続する
回転軸（図示しない）はレーザ媒質流通路１とギアボッ
クス４との仕切板３ａ４−
に回転自在に貫装されているので、レーザ媒質流通路１
とギアボックス４との間をシール部材（図示しない）に
よって完全に密封できなくなる。このため、レーザ媒質
流通路１の中のレーザ媒質の圧力よりも空気の圧力が高
いギアボックス４の中の空気と共にオイルミストがシー
ル部材を通ってレーザ媒質流通路１の中に流れ込んで、
レーザ媒質流通路１の中を汚染するので、運転時間が長
くなるにつれて、レーザ出力が低下する欠点があった。In addition, the blower 3 provided in the laser medium flow path 1 has rotary blades (
A rotary blade drive unit W (not shown) is installed in the laser medium flow path 1, and a rotary blade drive unit W (not shown) is installed in the gearbox 4. (not shown) is rotatably installed in the partition plate 3a4- between the laser medium flow path 1 and the gearbox 4, so that the laser medium flow path 1
Therefore, the gap between the gearbox 4 and the gearbox 4 cannot be completely sealed by a sealing member (not shown). Therefore, the oil mist flows into the laser medium flow path 1 through the sealing member together with the air in the gearbox 4 where the air pressure is higher than the pressure of the laser medium in the laser medium flow path 1.
Since the inside of the laser medium flow path 1 is contaminated, there is a drawback that the laser output decreases as the operating time becomes longer.
（発明の目的）
本発明の目的は、真空ポンプを停止させた後に、真空ポ
ンプのオイル室及びギアボックスがら空気やオイルミス
トがレーザ媒質流通路の中に流れ込むのを防止して、レ
ーザ出力を安定させることにある。(Object of the Invention) An object of the present invention is to prevent air and oil mist from flowing into the laser medium flow path from the oil chamber and gearbox of the vacuum pump after the vacuum pump is stopped, thereby reducing the laser output. It's about stabilizing it.
（発明の構成）
本発明は、真空ポンプが停止すると、レーザ媒質供給源
からレーザ媒質流通路の中にレーザ媒質が加圧供給され
て、レーザ媒質流通路の中が大気圧以上のレーザ媒質で
満されるようにしたものである。(Structure of the Invention) According to the present invention, when the vacuum pump is stopped, the laser medium is supplied under pressure from the laser medium supply source into the laser medium flow path, and the laser medium inside the laser medium flow path is at atmospheric pressure or higher. It was designed to be fulfilled.
（実施例の説明）
第２図は、本発明の一実施例の゛構成を示すもので、第
１図の符号と同一符号のものは同一部分を示しており、
又、２０はレーザ媒質流通路Ｉとレーザ媒質供給源５と
を連通するバイパス管で、このバイパス管２０は供給管
６と並列に設けられている。(Description of Embodiment) FIG. 2 shows the configuration of an embodiment of the present invention, and the same reference numerals as those in FIG. 1 indicate the same parts.
Further, 20 is a bypass pipe that communicates the laser medium flow path I and the laser medium supply source 5, and this bypass pipe 20 is provided in parallel with the supply pipe 6.
２１は真空ポンプ９の駆動停止直後から所定の時間だけ
開いている開閉弁で、この開閉弁２１はバイパス管２０
に設置されている。２２は真空ポンプ９が駆動されると
開き、真空ポンプ９が停止すると閉じる開閉弁で、この
開閉弁２２は排出管１４に設置されている。21 is an on-off valve that is opened for a predetermined period of time immediately after the vacuum pump 9 stops driving; this on-off valve 21 is connected to the bypass pipe 20;
It is installed in Reference numeral 22 denotes an on-off valve that opens when the vacuum pump 9 is driven and closes when the vacuum pump 9 stops; this on-off valve 22 is installed in the discharge pipe 14.
このように構成された本実施例では、ガスレーザ発振装
置の運転が開始されて、真空ポンプ９が駆動されると、
供給弁８が閉じると同時に、排出弁１７、開閉弁１９及
び２２が開いて、レーザ媒質流通路１の中からその中に
残留している分解劣化したレーザ媒質が、又、ギアボッ
クス４の中からその中の空気、オイルミス］・等が、そ
れぞれ、真空ポンプ９によって外部に排出され、時間が
経過するにつれて、レーザ媒質流通路１の中及びギアボ
ックス４の中がそれぞれ真空になる。そして、真空ポン
プ９の駆動開始直後から所定の時間が経過すると、供給
弁８が開くと同時に、排出弁１７が閉じて、新鮮なレー
ザ媒質が流量調整弁７を介してレーザ媒質流通路１及び
ギアボックス４の中に供給される。同時に、レーザ媒質
流通路１の中のレーザ媒質の圧力とギアボックス４の中
の空気等の圧力とが常に等しくなるように管径が設定さ
れた導管１３、排出管１４とバイパス管１８とを介して
、レーザ媒質流通路１の中の分解劣化したレーザ媒質を
流量調整弁１５を介してレーザ媒質流通路１の外に排出
すると共に、ギアボックス４の中のレーザ媒質と混合し
た空気、オイルミスト等を流量調整弁１５を介してレー
ザ媒質流通路１の外に排出するので、レーザ媒質流通路
１の中は常に新鮮なレーザ媒質で満される。又、真空ポ
ンプ９の排気量は流量調整弁１５から真空ポンプ９に流
入するレーザ媒７−
質の流入量よりも常に多いので、レーザ媒質流通路１の
中のレーザ媒質の圧力は常に一定である。In this embodiment configured in this way, when the operation of the gas laser oscillation device is started and the vacuum pump 9 is driven,
At the same time as the supply valve 8 is closed, the discharge valve 17 and the on-off valves 19 and 22 are opened, and the decomposed and deteriorated laser medium remaining in the laser medium flow path 1 is also removed from the gear box 4. Air, oil mist, etc. are discharged to the outside by the vacuum pump 9, and as time passes, the inside of the laser medium flow path 1 and the inside of the gear box 4 become vacuum. Then, when a predetermined period of time has elapsed immediately after the start of driving the vacuum pump 9, the supply valve 8 opens and the discharge valve 17 closes, allowing fresh laser medium to flow through the flow rate adjustment valve 7 and into the laser medium flow path 1. It is fed into the gearbox 4. At the same time, a conduit 13, a discharge pipe 14, and a bypass pipe 18 whose pipe diameters are set so that the pressure of the laser medium in the laser medium flow path 1 and the pressure of air, etc. in the gearbox 4 are always equal. The decomposed and degraded laser medium in the laser medium flow path 1 is discharged to the outside of the laser medium flow path 1 through the flow rate adjustment valve 15, and the air and oil mixed with the laser medium in the gearbox 4 are discharged. Since mist and the like are discharged to the outside of the laser medium flow path 1 via the flow rate adjustment valve 15, the inside of the laser medium flow path 1 is always filled with fresh laser medium. Furthermore, since the displacement of the vacuum pump 9 is always larger than the amount of laser medium 7 flowing into the vacuum pump 9 from the flow rate adjustment valve 15, the pressure of the laser medium in the laser medium flow path 1 is always constant. be.
そして、真空ポンプ９が停止すると、供給弁８、排出弁
１７、開閉弁１９及び２２が閉じると同時に、開閉弁２
１が開いて、レーザ媒質供給源５からレーザ媒質流通路
１にレーザ媒質が加圧供給されて、レーザ媒質流通路１
の中が大気圧以上のレーザ媒質で満される。Then, when the vacuum pump 9 stops, the supply valve 8, the discharge valve 17, the on-off valves 19 and 22 close, and at the same time the on-off valve 2
1 is opened, and the laser medium is supplied under pressure from the laser medium supply source 5 to the laser medium flow path 1.
The inside of the chamber is filled with a laser medium at a pressure higher than atmospheric pressure.
（発明の効果）
以上説明したように、本発明によれば、真空ポンプが停
止すると、レーザ媒質流通路と真空ポンプのオイル室と
の間が開閉弁によって遮断されて、オイル室の中の空気
やオイルミストがレーザ媒質流通路の中に流れ込まなく
なるので、レーザ媒質流通路の中が汚染されなくなって
、レーザ出力が低下しなくなる利点がある。又、レーザ
媒質流通路の中のレーザ媒質の圧力がギアボックスの中
の空気の圧力よりも高くなって、ギアボックスの中の空
気、オイルミスト等がシール部材を通ってレーザ媒質流
通路の中に流れ込まなくなるので、レ９−
８−
−ザ媒質流通路の中が汚染されなくなって、レーザ出力
が低下しなくなる利点がある。(Effects of the Invention) As explained above, according to the present invention, when the vacuum pump is stopped, the on-off valve shuts off the laser medium flow path and the oil chamber of the vacuum pump, and the air in the oil chamber is shut off. Since oil mist and oil mist do not flow into the laser medium flow path, there is an advantage that the inside of the laser medium flow path is not contaminated and the laser output does not decrease. Also, the pressure of the laser medium in the laser medium flow path becomes higher than the pressure of the air in the gearbox, causing air, oil mist, etc. in the gearbox to pass through the seal member and into the laser medium flow path. Since the laser medium flow path is no longer contaminated, there is an advantage that the laser output does not decrease.
第１図はガスレーザ発振装置における従来のレーザ媒質
給排機構の構成図、第２図はガスレーザ発振装置におけ
る本発明の一実施例の構成図である。
■ ・・・ レーザ媒質流通路、 ５ ・・・レーザ媒
質供給源、 ９ ・・・真空ポンプ。
特許出願人 松下電器産業株式会社
第１図
第２図FIG. 1 is a block diagram of a conventional laser medium supply/discharge mechanism in a gas laser oscillation device, and FIG. 2 is a block diagram of an embodiment of the present invention in a gas laser oscillation device. ■... Laser medium flow path, 5... Laser medium supply source, 9... Vacuum pump. Patent applicant: Matsushita Electric Industrial Co., Ltd. Figure 1 Figure 2
Claims (1)
通路に供給すると共に、分解劣化したレーザ媒質を前記
レーザ媒質流通路から真空ポンプによって排出するレー
ザ媒質給排機構を具備したガスレーザ発振装置において
、前記真空ポンプが停止すると、前記レーザ媒質供給源
から前記レーザ媒質流通路の中に前記レーザ媒質が加圧
供給されて、前記レーザ媒質流通路の中が大気圧以上の
前記レーザ媒質で満されることを特徴とするガスレーザ
発振装置。In the gas laser oscillation device, the gas laser oscillator is equipped with a laser medium supply/discharge mechanism that supplies fresh laser medium from a laser medium supply source to a laser medium flow path and discharges decomposed and deteriorated laser medium from the laser medium flow path by a vacuum pump. When the vacuum pump stops, the laser medium is supplied under pressure from the laser medium supply source into the laser medium flow path, and the inside of the laser medium flow path is filled with the laser medium at atmospheric pressure or higher. A gas laser oscillation device featuring:
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP7078384A JPS60214577A (en) | 1984-04-11 | 1984-04-11 | Gas laser oscillator |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP7078384A JPS60214577A (en) | 1984-04-11 | 1984-04-11 | Gas laser oscillator |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS60214577A true JPS60214577A (en) | 1985-10-26 |
Family
ID=13441463
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP7078384A Pending JPS60214577A (en) | 1984-04-11 | 1984-04-11 | Gas laser oscillator |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS60214577A (en) |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS62136084A (en) * | 1985-12-10 | 1987-06-19 | Matsushita Electric Ind Co Ltd | Carbon dioxide gas laser oscillator |
| WO1989000353A1 (en) * | 1987-07-07 | 1989-01-12 | Fanuc Ltd | Gas laser |
| EP0328654B1 (en) * | 1987-07-07 | 1993-10-06 | Fanuc Ltd. | Gas laser |
| JP2010212551A (en) * | 2009-03-12 | 2010-09-24 | Panasonic Corp | Laser oscillation device and laser beam machine |
| CN103988378A (en) * | 2012-05-18 | 2014-08-13 | 松下电器产业株式会社 | Lasing device |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5729577A (en) * | 1980-07-30 | 1982-02-17 | Anelva Corp | Automatic continuous sputtering apparatus |
-
1984
- 1984-04-11 JP JP7078384A patent/JPS60214577A/en active Pending
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5729577A (en) * | 1980-07-30 | 1982-02-17 | Anelva Corp | Automatic continuous sputtering apparatus |
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS62136084A (en) * | 1985-12-10 | 1987-06-19 | Matsushita Electric Ind Co Ltd | Carbon dioxide gas laser oscillator |
| WO1989000353A1 (en) * | 1987-07-07 | 1989-01-12 | Fanuc Ltd | Gas laser |
| JPS6412591A (en) * | 1987-07-07 | 1989-01-17 | Fanuc Ltd | Gas laser equipment |
| EP0328654B1 (en) * | 1987-07-07 | 1993-10-06 | Fanuc Ltd. | Gas laser |
| JP2010212551A (en) * | 2009-03-12 | 2010-09-24 | Panasonic Corp | Laser oscillation device and laser beam machine |
| CN103988378A (en) * | 2012-05-18 | 2014-08-13 | 松下电器产业株式会社 | Lasing device |
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