JPS60214335A - 投影露光装置及び投影露光方法 - Google Patents

投影露光装置及び投影露光方法

Info

Publication number
JPS60214335A
JPS60214335A JP59072282A JP7228284A JPS60214335A JP S60214335 A JPS60214335 A JP S60214335A JP 59072282 A JP59072282 A JP 59072282A JP 7228284 A JP7228284 A JP 7228284A JP S60214335 A JPS60214335 A JP S60214335A
Authority
JP
Japan
Prior art keywords
light source
optical system
imaging magnification
wavelength
projection
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP59072282A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0554688B2 (enrdf_load_stackoverflow
Inventor
Takamasa Hirose
広瀬　隆昌
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP59072282A priority Critical patent/JPS60214335A/ja
Publication of JPS60214335A publication Critical patent/JPS60214335A/ja
Publication of JPH0554688B2 publication Critical patent/JPH0554688B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Variable Magnification In Projection-Type Copying Machines (AREA)
JP59072282A 1984-04-11 1984-04-11 投影露光装置及び投影露光方法 Granted JPS60214335A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP59072282A JPS60214335A (ja) 1984-04-11 1984-04-11 投影露光装置及び投影露光方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59072282A JPS60214335A (ja) 1984-04-11 1984-04-11 投影露光装置及び投影露光方法

Publications (2)

Publication Number Publication Date
JPS60214335A true JPS60214335A (ja) 1985-10-26
JPH0554688B2 JPH0554688B2 (enrdf_load_stackoverflow) 1993-08-13

Family

ID=13484767

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59072282A Granted JPS60214335A (ja) 1984-04-11 1984-04-11 投影露光装置及び投影露光方法

Country Status (1)

Country Link
JP (1) JPS60214335A (enrdf_load_stackoverflow)

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63213928A (ja) * 1987-03-03 1988-09-06 Canon Inc 露光装置
JPS6410624A (en) * 1987-07-02 1989-01-13 Nikon Corp Projection optical device
US4888614A (en) * 1986-05-30 1989-12-19 Canon Kabushiki Kaisha Observation system for a projection exposure apparatus
US5095190A (en) * 1987-03-03 1992-03-10 Canon Kabushiki Kaisha Exposure apparatus
US5701169A (en) * 1994-03-30 1997-12-23 Canon Kabushiki Kaisha Illumination system and exposure apparatus with demountable transparent protective member
US5789734A (en) * 1993-05-14 1998-08-04 Canon Kabushiki Kaisha Exposure apparatus that compensates for spherical aberration of an image forming device
US5831715A (en) * 1994-01-27 1998-11-03 Canon Kabushiki Kaisha Projection exposure apparatus with means to vary spherical aberration
JP2010087506A (ja) * 2008-09-30 2010-04-15 Asml Holding Nv 球状色収差補正のための検査装置、リソグラフィ装置および方法

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4888614A (en) * 1986-05-30 1989-12-19 Canon Kabushiki Kaisha Observation system for a projection exposure apparatus
JPS63213928A (ja) * 1987-03-03 1988-09-06 Canon Inc 露光装置
US5095190A (en) * 1987-03-03 1992-03-10 Canon Kabushiki Kaisha Exposure apparatus
JPS6410624A (en) * 1987-07-02 1989-01-13 Nikon Corp Projection optical device
US5789734A (en) * 1993-05-14 1998-08-04 Canon Kabushiki Kaisha Exposure apparatus that compensates for spherical aberration of an image forming device
US5831715A (en) * 1994-01-27 1998-11-03 Canon Kabushiki Kaisha Projection exposure apparatus with means to vary spherical aberration
US5701169A (en) * 1994-03-30 1997-12-23 Canon Kabushiki Kaisha Illumination system and exposure apparatus with demountable transparent protective member
JP2010087506A (ja) * 2008-09-30 2010-04-15 Asml Holding Nv 球状色収差補正のための検査装置、リソグラフィ装置および方法

Also Published As

Publication number Publication date
JPH0554688B2 (enrdf_load_stackoverflow) 1993-08-13

Similar Documents

Publication Publication Date Title
US4811055A (en) Projection exposure apparatus
US4492459A (en) Projection printing apparatus for printing a photomask
TWI416272B (zh) 表面形狀量測設備、曝光設備以及裝置製造方法
JP3445045B2 (ja) 投影露光装置及びそれを用いたデバイスの製造方法
JP2009092389A (ja) 測定装置、露光装置及びデバイス製造方法
KR100291564B1 (ko) 광리소그래피용광학부재및광학부재의평가방법
JPH0628227B2 (ja) 半導体露光装置
JPH11502941A (ja) 小フィールド走査用の倍率補正
JPS60223122A (ja) 投影露光装置
JPH01123238A (ja) 光学系の結像特性に対する環境パラメーターの影響を補正する方法および装置
JPS60214335A (ja) 投影露光装置及び投影露光方法
KR100566254B1 (ko) 노광 장치
JPH10294268A (ja) 投影露光装置及び位置合わせ方法
JP2897345B2 (ja) 投影露光装置
US6774982B2 (en) Exposure apparatus and device manufacturing method using the same
WO2024245923A2 (de) Berührungslos messender temperatursensor für einen spiegel, projektionsobjektiv und verfahren zum messen der temperatur eines spiegels
JPH0554687B2 (enrdf_load_stackoverflow)
JP3632264B2 (ja) Ｘ線投影露光装置
KR100992302B1 (ko) 광학계, 노광장치 및 디바이스 제조방법
US6160623A (en) Method for measuring an aberration of a projection optical system
JP2002169083A (ja) 対物光学系、収差測定装置、投影露光装置、対物光学系の製造方法、収差測定装置の製造方法、投影露光装置の製造方法及びマイクロデバイスの製造方法
JPH10197791A (ja) 投影レンズ
JP2840314B2 (ja) 投影露光装置
JP4921512B2 (ja) 露光方法、露光装置およびデバイス製造方法
JP2897346B2 (ja) 投影露光装置

Legal Events

Date Code Title Description
EXPY Cancellation because of completion of term