JPS60214334A - 投影露光装置及び投影露光方法 - Google Patents

投影露光装置及び投影露光方法

Info

Publication number
JPS60214334A
JPS60214334A JP59072281A JP7228184A JPS60214334A JP S60214334 A JPS60214334 A JP S60214334A JP 59072281 A JP59072281 A JP 59072281A JP 7228184 A JP7228184 A JP 7228184A JP S60214334 A JPS60214334 A JP S60214334A
Authority
JP
Japan
Prior art keywords
imaging magnification
light source
optical system
image formation
wavelength
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP59072281A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0554687B2 (enrdf_load_stackoverflow
Inventor
Takamasa Hirose
広瀬　隆昌
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP59072281A priority Critical patent/JPS60214334A/ja
Publication of JPS60214334A publication Critical patent/JPS60214334A/ja
Priority to US07/212,145 priority patent/US4811055A/en
Publication of JPH0554687B2 publication Critical patent/JPH0554687B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
    • G03F7/70575—Wavelength control, e.g. control of bandwidth, multiple wavelength, selection of wavelength or matching of optical components to wavelength

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Variable Magnification In Projection-Type Copying Machines (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP59072281A 1984-02-27 1984-04-11 投影露光装置及び投影露光方法 Granted JPS60214334A (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP59072281A JPS60214334A (ja) 1984-04-11 1984-04-11 投影露光装置及び投影露光方法
US07/212,145 US4811055A (en) 1984-02-27 1988-06-24 Projection exposure apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59072281A JPS60214334A (ja) 1984-04-11 1984-04-11 投影露光装置及び投影露光方法

Publications (2)

Publication Number Publication Date
JPS60214334A true JPS60214334A (ja) 1985-10-26
JPH0554687B2 JPH0554687B2 (enrdf_load_stackoverflow) 1993-08-13

Family

ID=13484739

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59072281A Granted JPS60214334A (ja) 1984-02-27 1984-04-11 投影露光装置及び投影露光方法

Country Status (1)

Country Link
JP (1) JPS60214334A (enrdf_load_stackoverflow)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63213928A (ja) * 1987-03-03 1988-09-06 Canon Inc 露光装置
JPS6410624A (en) * 1987-07-02 1989-01-13 Nikon Corp Projection optical device
JPH021109A (ja) * 1987-10-13 1990-01-05 Theodore R Whitney 高解像光学系
US5095190A (en) * 1987-03-03 1992-03-10 Canon Kabushiki Kaisha Exposure apparatus
US6256086B1 (en) 1998-10-06 2001-07-03 Canon Kabushiki Kaisha Projection exposure apparatus, and device manufacturing method

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101487446B1 (ko) * 2013-08-30 2015-01-28 단국대학교 천안캠퍼스 산학협력단 내산성, 내담즙성, 유해세균 억제능력 및 장관의 흡착능력이 우수한 락토바실러스 뮤코세 lm1 유산균 및 이를 포함하는 조성물

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
IEEE JOURNAL OF QUANTUM ELECTRONICS=1979 *

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63213928A (ja) * 1987-03-03 1988-09-06 Canon Inc 露光装置
US5095190A (en) * 1987-03-03 1992-03-10 Canon Kabushiki Kaisha Exposure apparatus
JPS6410624A (en) * 1987-07-02 1989-01-13 Nikon Corp Projection optical device
JPH021109A (ja) * 1987-10-13 1990-01-05 Theodore R Whitney 高解像光学系
US6256086B1 (en) 1998-10-06 2001-07-03 Canon Kabushiki Kaisha Projection exposure apparatus, and device manufacturing method

Also Published As

Publication number Publication date
JPH0554687B2 (enrdf_load_stackoverflow) 1993-08-13

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Legal Events

Date Code Title Description
EXPY Cancellation because of completion of term