JPS60196943A - 位置合せマ−ク検出方法 - Google Patents

位置合せマ−ク検出方法

Info

Publication number
JPS60196943A
JPS60196943A JP59052129A JP5212984A JPS60196943A JP S60196943 A JPS60196943 A JP S60196943A JP 59052129 A JP59052129 A JP 59052129A JP 5212984 A JP5212984 A JP 5212984A JP S60196943 A JPS60196943 A JP S60196943A
Authority
JP
Japan
Prior art keywords
alignment
positioning mark
wafer
circuit
image sensor
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP59052129A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0574211B2 (enrdf_load_html_response
Inventor
Tetsuzo Tanimoto
谷本 哲三
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP59052129A priority Critical patent/JPS60196943A/ja
Publication of JPS60196943A publication Critical patent/JPS60196943A/ja
Publication of JPH0574211B2 publication Critical patent/JPH0574211B2/ja
Granted legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP59052129A 1984-03-21 1984-03-21 位置合せマ−ク検出方法 Granted JPS60196943A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP59052129A JPS60196943A (ja) 1984-03-21 1984-03-21 位置合せマ−ク検出方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59052129A JPS60196943A (ja) 1984-03-21 1984-03-21 位置合せマ−ク検出方法

Publications (2)

Publication Number Publication Date
JPS60196943A true JPS60196943A (ja) 1985-10-05
JPH0574211B2 JPH0574211B2 (enrdf_load_html_response) 1993-10-18

Family

ID=12906258

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59052129A Granted JPS60196943A (ja) 1984-03-21 1984-03-21 位置合せマ−ク検出方法

Country Status (1)

Country Link
JP (1) JPS60196943A (enrdf_load_html_response)

Also Published As

Publication number Publication date
JPH0574211B2 (enrdf_load_html_response) 1993-10-18

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