JPS60195749A - Manufacture of stamper - Google Patents
Manufacture of stamperInfo
- Publication number
- JPS60195749A JPS60195749A JP5193884A JP5193884A JPS60195749A JP S60195749 A JPS60195749 A JP S60195749A JP 5193884 A JP5193884 A JP 5193884A JP 5193884 A JP5193884 A JP 5193884A JP S60195749 A JPS60195749 A JP S60195749A
- Authority
- JP
- Japan
- Prior art keywords
- film
- stamper
- resist
- glass
- glass master
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000004519 manufacturing process Methods 0.000 title claims description 17
- 239000011521 glass Substances 0.000 claims abstract description 42
- 238000007747 plating Methods 0.000 claims abstract description 12
- 238000000151 deposition Methods 0.000 claims abstract description 9
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims description 37
- 239000011651 chromium Substances 0.000 claims description 19
- 229910052759 nickel Inorganic materials 0.000 claims description 17
- 238000000034 method Methods 0.000 claims description 16
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 claims description 6
- 239000000758 substrate Substances 0.000 claims description 5
- 229910052804 chromium Inorganic materials 0.000 claims description 4
- 238000004299 exfoliation Methods 0.000 abstract 1
- 238000010586 diagram Methods 0.000 description 6
- 230000003287 optical effect Effects 0.000 description 5
- 238000007796 conventional method Methods 0.000 description 2
- 230000007547 defect Effects 0.000 description 2
- 241001494479 Pecora Species 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 230000002950 deficient Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 239000004744 fabric Substances 0.000 description 1
- 229920002120 photoresistant polymer Polymers 0.000 description 1
Classifications
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B23/00—Record carriers not specific to the method of recording or reproducing; Accessories, e.g. containers, specially adapted for co-operation with the recording or reproducing apparatus ; Intermediate mediums; Apparatus or processes specially adapted for their manufacture
- G11B23/0057—Intermediate mediums, i.e. mediums provided with an information structure not specific to the method of reproducing or duplication such as matrixes for mechanical pressing of an information structure ; record carriers having a relief information structure provided with or included in layers not specific for a single reproducing method; apparatus or processes specially adapted for their manufacture
Landscapes
- Manufacturing Optical Record Carriers (AREA)
Abstract
Description
【発明の詳細な説明】
（ａ） 発明の技術分野
本発明は基板表面に凹凸パターンを転写するような、例
えば光ディスク等の情報記録担体を１に製する場合に用
いられるスタンパの製造方決であって、特にスタンパ表
面にガラスが付着するのを防ぐようにしたスタンパの製
造方法に関する。DETAILED DESCRIPTION OF THE INVENTION (a) Technical Field of the Invention The present invention relates to a method for manufacturing a stamper, which is used when manufacturing an information recording carrier such as an optical disk, which transfers a concavo-convex pattern onto the surface of a substrate. In particular, the present invention relates to a method for manufacturing a stamper that prevents glass from adhering to the surface of the stamper.
（ｂ） 従来技術と問題点
基板表頁に凹凸パターンを転写するスタンパの従来の製
造方法は、ガラス円盤を低速で回転させ、その円盤の中
心からホトレジストをスピンコードして薄いレジスト膜
を形成し、そのレジス）ＩＩをレーザ等で露光現像して
同心円状の溝を多数形成し、第１図（イ）に示すように
ガラス原盤１上に凸起レジスト２を作る。次に１４０℃
位でベーキングし、そのレジスト２表間にスタンパ表面
の寿命の向上をはかるため第１図（ロ）のようにクロー
Ａ （Ｃｒ）ＩＩ３を蒸着し、そのＣｒ膜膜上上、第１
図（９のようにニッケル（Ｎ１）膜４を蒸着し、そのＮ
１Ｍ４を電極とし第１図に）のようにＮ１メＶキ５を施
した後、ガラス原盤１を剥離しくレジスト２がガラス原
盤１と一諸ｌこ殆んど剥れる）、第１図（ホ）のような
スタンパＡを得る。(b) Prior art and problems The conventional manufacturing method of a stamper that transfers a concavo-convex pattern onto the surface of a substrate is to rotate a glass disk at low speed and spin-code photoresist from the center of the disk to form a thin resist film. , the resist) II is exposed and developed using a laser or the like to form a large number of concentric grooves, thereby creating a convex resist 2 on the glass master 1 as shown in FIG. 1(a). Next 140℃
In order to improve the life of the stamper surface between the two resist surfaces, Cr A (Cr)II3 was deposited as shown in Figure 1 (b), and on the Cr film, the first
As shown in Figure 9, a nickel (N1) film 4 is deposited, and the N
After applying N1 V-cut 5 using 1M4 as an electrode as shown in Fig. 1), the glass master 1 is peeled off and the resist 2 is almost peeled off from the glass master 1), as shown in Fig. 1 ( A stamper A as shown in e) is obtained.
上記第１図（ロ）のＣｒ膜３を蒸着するとき、Ｃｒ膜３
とガラス原盤ｌが直接接するところで、Ｃｒとガラスが
反応し、Ｃｒ［３にガラスが付着し、第１図に）のよう
にスタンパＡにガラス凸起６ができる。そのためスタン
パＡにより転写された光デイスク媒体の欠陥となり、ビ
ートエラーを発生させる問題があった。When depositing the Cr film 3 in FIG. 1(b) above, the Cr film 3
At the point where the glass master plate L comes into direct contact with the stamper A, Cr and glass react, and glass protrusions 6 are formed on the stamper A as shown in FIG. This causes defects in the optical disk medium transferred by the stamper A, causing a problem of beat errors.
（ｃ） 発明の目的
本発明の目的はメッキ後のスタンパとガラス原盤を剥離
する時、スタンバパターン部にガラス付着するのを防止
し、ビットエラーの低減をはかったスタンパの製造方法
を提供することにある。(c) Purpose of the Invention The purpose of the present invention is to provide a method for manufacturing a stamper, which prevents glass from adhering to the standby pattern portion and reduces bit errors when the stamper and glass master are separated after plating. It is in.
（ｄ） 発明の構成
そしてこの目的は本発明によれば、基板表面に凹凸パタ
ーンを転写するときに用いるスタンパの製造方法であっ
て、ガラス原盤上にレジスト膜の凸起を形成し、該レジ
スト膜凸起上にニッケル膜を蒸着した後、該ニッケル膜
を電極としニッケルメッキを施し、前記ガラス原盤を剥
離し前記レジストを除去した後前記ニッケル膜上にクロ
ーム膜を蒸着しスタンパとするか、或いはガラス原盤上
に露光現像不能とした第１のレジスト膜を形成し、該第
１のレジスト膜上に、さらに第２のレジスト膜の凸起を
形成し、その第２のレジスト膜の凸起上にクローム膜を
蒸着し、該クローム膜上にニッケル膜を蒸着した後、該
ニッケル膜を電極としてニッケルメッキを施した後、前
記ガラス原盤を剥離してスタンパとしたことを特徴とす
るスタンパの製造方法を提供することにより達成される
。(d) Structure and object of the invention According to the present invention, there is provided a method for manufacturing a stamper used when transferring a concavo-convex pattern onto the surface of a substrate, the method comprising: forming convexities of a resist film on a glass master; After depositing a nickel film on the film protrusion, nickel plating is performed using the nickel film as an electrode, and after peeling off the glass master and removing the resist, a chromium film is deposited on the nickel film to form a stamper, or Alternatively, a first resist film that cannot be exposed and developed is formed on a glass master, and a second resist film is further formed on the first resist film, and the second resist film is formed on the first resist film. A stamper characterized in that a chromium film is vapor-deposited thereon, a nickel film is vapor-deposited on the chrome film, nickel plating is performed using the nickel film as an electrode, and the glass master is peeled off to obtain a stamper. This is achieved by providing a manufacturing method.
（ｅ） 発明の実施例 以下本発明の実施例を図面により詳述する。(e) Examples of the invention Embodiments of the present invention will be described in detail below with reference to the drawings.
第２図（イ）〜（ホ）は本発明のスタンパの製造方法の
一実施例を説明する図である。FIGS. 2A to 2E are diagrams illustrating an embodiment of the stamper manufacturing method of the present invention.
１、第２図（イ）は第１図（イ）に示す従来と全く同じ
ようｌこしてガラス原盤１上に凸起レジスト２を作りた
ものである。次に、１４０℃位でベーキングし、そのレ
ジスト２表面に第２図（ロ）のようにニッケル（Ｎ１）
膜７を蒸着し、そのＮ１Ｍ７を電極として第２図（ハ）
のようにＮ１メッキ８を施した後、ガラス原盤１を剥離
しくレジスト２がガラス原盤１と一諸に殆んど剥れる）
、第２図に）のようなスタンパ形状とする。次にスタン
パ表両を洗浄した後、前記Ｎ１膜７上に、第２図（ホ）
のようにＣｒ膜９を蒸着しスタンパＡをＩる。1. In FIG. 2(a), a convex resist 2 is formed on a glass master disk 1 by straining in exactly the same manner as the conventional method shown in FIG. 1(a). Next, it is baked at about 140°C, and nickel (N1) is applied to the surface of the resist 2 as shown in Figure 2 (b).
A film 7 is deposited and the N1M7 is used as an electrode in Fig. 2 (c).
After applying N1 plating 8 as shown, when the glass master 1 is peeled off, most of the resist 2 is peeled off along with the glass master 1)
The stamper shape is as shown in Fig. 2). Next, after cleaning both surfaces of the stamper, the N1 film 7 is coated as shown in FIG.
A Cr film 9 is deposited and a stamper A is formed as shown in FIG.
上記のような工程とすることで、ガラス原盤１とＣｒ
Ｍ ９が直接接するような工程がないので、Ｃｒとガラ
スが反応し、スタンバ人にガラスを付着させるようなこ
とがない。By performing the above steps, the glass master 1 and Cr
Since there is no process where M9 comes into direct contact, there is no chance of Cr reacting with glass and causing glass to stick to the standby person.
又本発明の別の方法として、第３図に示すようなスタン
パの製造方法がある。Another method of the present invention is a method of manufacturing a stamper as shown in FIG.
図において、第３図（イ）はガラス原盤１上に第１のレ
ジスト膜１０（レジストを一層塗布し、ハードベーク（
約２４０℃位）により露光、現像不能にする）を形成し
たものである。このレジスト膜上０上に、さらにレジス
トをもう一層塗布し、その二層目にパターンを形成し、
第３図（ロ）のようなレジスト凸起１１を作る。次にレ
ジスト凸起ｌｌ上に第３図（ハ）のようにＣｒ膜１２を
蒸着し、咳Ｏｒ膜１２上に第３図に）のようにＮ１膜１
３を蒸着した後、該Ｎ１Ｍ［１３を電極としてＮ１メッ
キ１４を施し、前記ガラス原盤１を剥離しくレジスト１
０．１１がガラス原盤１と一諸に殆んど剥れる５、第３
図（へ）のようにスタン／％Ａを得る。In the figure, FIG. 3(a) shows the first resist film 10 (one layer of resist applied on the glass master 1) and hard-baked (
(approximately 240° C.) to make it impossible to expose and develop. On top of this resist film, another layer of resist is applied, and a pattern is formed on the second layer.
A resist protrusion 11 as shown in FIG. 3(b) is created. Next, a Cr film 12 is deposited on the resist protrusion ll as shown in FIG.
After vapor-depositing N1M[13], N1 plating 14 is applied using the N1M[13 as an electrode, and resist 1 is applied to remove the glass master 1.
0.11 is almost peeled off from the glass master 1 5, 3rd
Obtain Stan/%A as shown in the figure.
上記のようにガラス原盤１上に露光、現像不能にしたレ
ジスト層１０を設けて、Ｃｒ膜１２とガラス原盤１が直
接接することのないようにしているので、スタンパＡに
ガラスが付着する危険は皆無となる。As described above, the resist layer 10 that cannot be exposed or developed is provided on the glass master 1 to prevent direct contact between the Cr film 12 and the glass master 1, so there is no risk of glass adhering to the stamper A. There will be none.
従って、上述のスタンバ人により転写された光デイスク
媒体が欠陥となりビットエラーを起すようなことはない
。Therefore, there is no possibility that the optical disk medium transferred by the above-mentioned standby person will become defective and cause a bit error.
（ｆ） 発明の効果
以上詳細に説明したように本発明のスタｙ／（の製造方
決はガラス原盤とＣｒ膜が直接接触しないよつに、Ｎｌ
メＶキの電極蒸着の方法を変えたり、或いはレジストの
二Ｘ＊布を行うことにより、ガラス原盤のガラスとＣｒ
が反応を起さないようにしているので、メッキ後のスタ
ンバとガラス原盤（イン
を剥離した時、従来のようにスタンバパターン部にガラ
スの付着を防ぐことができる。その結果、スタンバによ
り転写した光デイスク媒体の欠陥を（Ｇ７）
防ぎ、光ディスクのビットエラーを低減させることがで
きる。(f) Effects of the Invention As explained in detail above, the manufacturing method of the stud of the present invention is such that the glass master disk and the Cr film do not come into direct contact with each other.
By changing the method of evaporating the V-cut electrodes or by applying 2X* cloth to the resist, the glass of the glass master and the Cr
Since this prevents reactions from occurring, when the standby plate and the glass master disk (in) are removed after plating, it is possible to prevent glass from adhering to the standby pattern area as in the conventional case. It is possible to prevent defects in optical disc media (G7) and reduce bit errors in optical discs.
（ハ）
第１図（イ）〜（ホ）は従来のスタンバの製造方法を説
明する工程図、第２図は本発明のスタンバの製造方法の
一実施例を説明する図で、（イ）〜（ホ）は工程図を示
し、第３図は本発明の別の実施例を示す図で、１＝）（
イ）〜（へ）は工程図である。
図において、１はガラス原盤、２は凸起レジスト、７は
Ｎｉｌ［，８はＮｉメッキ、９はＣｒ ＪＩ！ ＋１０
はレジスト層、１１はレジスト凸起、１２は （ｆ、）
Ｃｒ膜、１３はＮ［膜、１４はＮ１メッキを示す。
亭１図 茅２図
羊 ３ 図(c) Figures 1 (a) to (e) are process diagrams for explaining the conventional method for manufacturing a standby bar, and Figure 2 is a diagram for explaining an embodiment of the method for manufacturing a standby bar according to the present invention. 〜(E) shows a process diagram, and FIG. 3 is a diagram showing another embodiment of the present invention, where 1=)(
A) to (F) are process diagrams. In the figure, 1 is a glass master, 2 is a raised resist, 7 is Nil [, 8 is Ni plating, and 9 is Cr JI! +10
is the resist layer, 11 is the resist protrusion, 12 is (f,)
Cr film, 13 is N film, and 14 is N1 plating. Pavilion 1 Figure 2 Sheep 3 Figures
Claims (2)
るスタンパの製造方法であって、ガラス原盤上にレジス
ト膜の凸起を形成し、該レジスト膜凸起上にニッケル膜
を蒸着した後、該ニッケル膜を電極としニッケルメッキ
を施し、前記ガラス原盤を剥離した後、前記ニッケル膜
上にクローム膜を蒸着してスタンパとしたことを特徴と
するスタンパの製造方法。(1) A method for manufacturing a stamper used when transferring a concavo-convex pattern onto the surface of a substrate, which involves forming convexities of a resist film on a glass master, depositing a nickel film on the convexities of the resist film, and then depositing a nickel film on the convexities of the resist film. A method for manufacturing a stamper, comprising applying nickel plating using a nickel film as an electrode, peeling off the glass master, and then vapor-depositing a chromium film on the nickel film to obtain a stamper.
スタンパの製造方法であって、ガラス原盤上に露光現像
不能とした第１のレジスト膜を形成し、該１ｇ１のレジ
スト膜上に、さらに第２のレジスト膜の凸起を形成し、
その第２のレジスト膜の凸起上にクローム膜を蒸着し、
該クローム膜上にニッケル膜を蒸着した後、該ニッケル
膜を電極としてニッケルメッキを施し、前記ガラス原盤
上剥離してスタンパとしたことを特徴とするスタンパの
製造方法。(2) A method for manufacturing a stamper used when transferring a concavo-convex pattern onto the surface of a substrate, in which a first resist film that cannot be exposed and developed is formed on a glass master, and a second resist film is further formed on the 1g1 resist film. 2. Forming convexities on the resist film,
A chrome film is deposited on the convexities of the second resist film,
A method for manufacturing a stamper, comprising: depositing a nickel film on the chromium film, applying nickel plating using the nickel film as an electrode, and peeling it off onto the glass master to obtain a stamper.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP5193884A JPS60195749A (en) | 1984-03-16 | 1984-03-16 | Manufacture of stamper |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP5193884A JPS60195749A (en) | 1984-03-16 | 1984-03-16 | Manufacture of stamper |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS60195749A true JPS60195749A (en) | 1985-10-04 |
Family
ID=12900805
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP5193884A Pending JPS60195749A (en) | 1984-03-16 | 1984-03-16 | Manufacture of stamper |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS60195749A (en) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH01253847A (en) * | 1988-04-01 | 1989-10-11 | Toppan Printing Co Ltd | Production of stamper for optical disk |
| EP0354773A2 (en) * | 1988-08-09 | 1990-02-14 | Plasmon Data Systems, Inc. | Optical disk manufacture |
| US5338178A (en) * | 1990-11-30 | 1994-08-16 | Hitachi, Ltd. | Embossing metal hold |
| US6927016B2 (en) | 2001-10-23 | 2005-08-09 | Matsushita Electric Industrial Co., Ltd. | Blank disc and direct stamper and its manufacturing method |
-
1984
- 1984-03-16 JP JP5193884A patent/JPS60195749A/en active Pending
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH01253847A (en) * | 1988-04-01 | 1989-10-11 | Toppan Printing Co Ltd | Production of stamper for optical disk |
| JP2526980B2 (en) * | 1988-04-01 | 1996-08-21 | 凸版印刷株式会社 | Manufacturing method for optical disk stamper |
| EP0354773A2 (en) * | 1988-08-09 | 1990-02-14 | Plasmon Data Systems, Inc. | Optical disk manufacture |
| US5338178A (en) * | 1990-11-30 | 1994-08-16 | Hitachi, Ltd. | Embossing metal hold |
| US6927016B2 (en) | 2001-10-23 | 2005-08-09 | Matsushita Electric Industrial Co., Ltd. | Blank disc and direct stamper and its manufacturing method |
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