JPS60195542A - レジスト用材料 - Google Patents

レジスト用材料

Info

Publication number
JPS60195542A
JPS60195542A JP5114484A JP5114484A JPS60195542A JP S60195542 A JPS60195542 A JP S60195542A JP 5114484 A JP5114484 A JP 5114484A JP 5114484 A JP5114484 A JP 5114484A JP S60195542 A JPS60195542 A JP S60195542A
Authority
JP
Japan
Prior art keywords
resist
formula
electron beam
polymer
hydrocarbon residue
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP5114484A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0354336B2 (enrdf_load_stackoverflow
Inventor
Shozo Tsuchiya
土屋　昇三
Nobuo Aoki
信雄 青木
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Eneos Corp
Original Assignee
Nippon Oil Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Oil Corp filed Critical Nippon Oil Corp
Priority to JP5114484A priority Critical patent/JPS60195542A/ja
Priority to EP19850103038 priority patent/EP0157262B1/en
Priority to DE8585103038T priority patent/DE3563273D1/de
Publication of JPS60195542A publication Critical patent/JPS60195542A/ja
Priority to US06/852,198 priority patent/US4751168A/en
Publication of JPH0354336B2 publication Critical patent/JPH0354336B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G75/00—Macromolecular compounds obtained by reactions forming a linkage containing sulfur with or without nitrogen, oxygen, or carbon in the main chain of the macromolecule
    • C08G75/20—Polysulfones
    • C08G75/205—Copolymers of sulfur dioxide with unsaturated organic compounds
    • C08G75/22—Copolymers of sulfur dioxide with unsaturated aliphatic compounds
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L81/00—Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing sulfur with or without nitrogen, oxygen or carbon only; Compositions of polysulfones; Compositions of derivatives of such polymers
    • C08L81/06—Polysulfones; Polyethersulfones

Landscapes

  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
  • Polymers With Sulfur, Phosphorus Or Metals In The Main Chain (AREA)
JP5114484A 1984-03-19 1984-03-19 レジスト用材料 Granted JPS60195542A (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP5114484A JPS60195542A (ja) 1984-03-19 1984-03-19 レジスト用材料
EP19850103038 EP0157262B1 (en) 1984-03-19 1985-03-15 Novel electron beam resist materials
DE8585103038T DE3563273D1 (en) 1984-03-19 1985-03-15 Novel electron beam resist materials
US06/852,198 US4751168A (en) 1984-03-19 1986-04-15 Novel electron beam resist materials

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP5114484A JPS60195542A (ja) 1984-03-19 1984-03-19 レジスト用材料

Publications (2)

Publication Number Publication Date
JPS60195542A true JPS60195542A (ja) 1985-10-04
JPH0354336B2 JPH0354336B2 (enrdf_load_stackoverflow) 1991-08-19

Family

ID=12878627

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5114484A Granted JPS60195542A (ja) 1984-03-19 1984-03-19 レジスト用材料

Country Status (1)

Country Link
JP (1) JPS60195542A (enrdf_load_stackoverflow)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6537736B1 (en) 1999-03-12 2003-03-25 Matsushita Electric Industrial Co., Ltd. Patten formation method
JP2007191399A (ja) * 2006-01-17 2007-08-02 Arakawa Chem Ind Co Ltd 脂環式化合物およびその製造方法

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6537736B1 (en) 1999-03-12 2003-03-25 Matsushita Electric Industrial Co., Ltd. Patten formation method
JP2007191399A (ja) * 2006-01-17 2007-08-02 Arakawa Chem Ind Co Ltd 脂環式化合物およびその製造方法

Also Published As

Publication number Publication date
JPH0354336B2 (enrdf_load_stackoverflow) 1991-08-19

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