JPS60182030A - Substrate for information recording and its production - Google Patents

Substrate for information recording and its production

Info

Publication number
JPS60182030A
JPS60182030A JP59035962A JP3596284A JPS60182030A JP S60182030 A JPS60182030 A JP S60182030A JP 59035962 A JP59035962 A JP 59035962A JP 3596284 A JP3596284 A JP 3596284A JP S60182030 A JPS60182030 A JP S60182030A
Authority
JP
Japan
Prior art keywords
substrate
subjected
information recording
resist
ion exchange
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP59035962A
Other languages
Japanese (ja)
Other versions
JPH0370866B2 (en
Inventor
Hisanori Suzuki
久則 鈴木
Takao Matsudaira
松平 他家夫
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hoya Corp
Original Assignee
Hoya Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hoya Corp filed Critical Hoya Corp
Priority to JP59035962A priority Critical patent/JPS60182030A/en
Publication of JPS60182030A publication Critical patent/JPS60182030A/en
Publication of JPH0370866B2 publication Critical patent/JPH0370866B2/ja
Granted legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11BINFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B23/00Record carriers not specific to the method of recording or reproducing; Accessories, e.g. containers, specially adapted for co-operation with the recording or reproducing apparatus ; Intermediate mediums; Apparatus or processes specially adapted for their manufacture
    • G11B23/0057Intermediate mediums, i.e. mediums provided with an information structure not specific to the method of reproducing or duplication such as matrixes for mechanical pressing of an information structure ; record carriers having a relief information structure provided with or included in layers not specific for a single reproducing method; apparatus or processes specially adapted for their manufacture

Landscapes

  • Optical Record Carriers And Manufacture Thereof (AREA)
  • Manufacturing Optical Record Carriers (AREA)

Abstract

PURPOSE:To form easily a memory disk having high uniformity by forming directly ruggedness on a glass substrate subjected to low temp. type ion exchange treatment thereby eliminating the need for a resin layer. CONSTITUTION:A discoid soda lime glass substrate 1 is subjected to low temp. type ion exchange treatment and is thereby chemically reinforced. The substrate is thereafter subjected to silazane treatment to increase the adhesive force to resist and photoresist is coated on one main surface of the substrate 1 and is prebaked. The photoresist is exposed by using a photomask on a disk patterned with the signals for pregrooves and is further developed, dried and post baked to form a resist pattern 4. The substrate is subjected to sputter etching by using a palallel flat plate type plasma etching device using the resist pattern as a mask, by which grooves 5 are obtd. The resist is stripped by hot concd. sulfuric acid, etc. and the substrate is washed and dried. A substrate 6 for information recording is thus formed.

Description

【発明の詳細な説明】 [yA明の技術分野] 本発明ケよ光デ1スクや光磁気ディスク等に用いられる
情報記録用基板およびその製造方法に関するものである
DETAILED DESCRIPTION OF THE INVENTION [Field of the Invention] The present invention relates to an information recording substrate used for optical disks, magneto-optical disks, etc., and a method for manufacturing the same.

[“従来技術〕 従来この種のメモリディスクは、例えば次のようにして
形成されている。まず、ガラス原盤の一生面上に直接に
、またはレジストの付着力を強めるためにクロムを薄く
コートした上でレジストを塗布する。次いで、レーザー
光を用いたカッティングにより所望のレジストパターン
を形成し、その上に導電性をもたせるために銀鏡反応に
より銀を析出させるか蒸着等により金属膜(例えば金、
銀、ニッケル〕全コートした上で、さらにニッケルをメ
ッキする。これ全ガラス原盤から剥離してニッケルマス
ター盤を作る。次いで、このマスター盤のごく表層部を
重クロム醜なとで酸化し、再びニッケルをメッキし、こ
の部分をマスター盤から剥離する。こt′N、’iマザ
ー盤として上述したと同様の方法でスタンバ−を作る。
[“Prior Art”] Conventionally, this type of memory disk has been formed, for example, in the following manner: First, the entire surface of a glass master disk is coated directly with chromium or by a thin coating of chromium to strengthen the adhesion of the resist. Then, a desired resist pattern is formed by cutting using a laser beam, and in order to make it conductive, silver is deposited by a silver mirror reaction or a metal film (e.g., gold,
[Silver, nickel] After full coating, nickel is further plated. This is peeled off from the all-glass master disc to create a nickel master disc. Next, the very surface layer of this master disk is oxidized with dichromium, plated with nickel again, and this area is peeled off from the master disk. Create a standby in the same manner as described above for the mother disk.

このスタンパ−の裏面を研磨し、このスタンハーヲ用い
て、ガラス盤とスタンパ−との間に樹脂を入れ、樹脂を
熱または紫外線などVこより硬化させてスタンバ−の凹
凸を転写する。このようにして得られる情報記録用基板
を第1図に示す。図において、1triソーダライムガ
ラス基板であり、2け樹脂層である。この情報配録用基
板の樹脂N2の凹凸面に、各種記録用薄膜卦よび保護層
を形成し、さらに:30−盤などではこのようなディス
ク′fC情報記録層が内側すこなるように2枚張−り合
せで、メモリディスクが形成される。。なお、凹凸は、
情報記録用トラックヲ構成ブる案内溝およO・径方向位
置決め用のブし・グループとして利用さi%る1゜ しかし7斤がら、この、11−、な従来のメモリディス
クでは、樹脂層イニ均一に形成しなければならないこと
、特に俵屈折等の影響全/J・さくして光学的(C均一
な#全形成しな(へ)ればならないこと、さらVこ、ス
〃ンバー十の欠陥はその1寸樹脂層に転写されるf(め
欠陥のないスタンバ−全作る必要かめるば7)lでなく
、スタンバ−上の微小な案内溝イぐ正確に転写しなけれ
ばなら々いことなど製造上4重々の困難がある。
The back surface of the stamper is polished, and using this stamper, a resin is placed between the glass disk and the stamper, and the resin is cured by heat or UV light, such as UV light, to transfer the irregularities of the stamper. The information recording substrate obtained in this manner is shown in FIG. In the figure, there is one tri soda lime glass substrate and two resin layers. Various recording thin films and a protective layer are formed on the uneven surface of the resin N2 of this information recording substrate, and furthermore, in the case of a 30-disk etc., two such discs'fC information recording layer is placed on the inner side. A memory disk is formed by pasting them together. . In addition, the unevenness is
However, in this 11-, conventional memory disk, the resin layer initial It must be formed uniformly, especially the effects of bale refraction, etc., and optically (C) it must be formed uniformly, and furthermore, it must be formed uniformly to avoid defects such as severance. The 1-inch resin layer is transferred to the resin layer (it is necessary to make a complete stambar with no defects), and the fine guide grooves on the stambar must be accurately transferred. There are four difficulties in manufacturing.

[発明の概要〕 本発明(CI:このような事情に鑑みてなされたもので
、その目的は、均一性の高いメモリディスクを容易に形
成することが可能な情報記録用基板およびその製造方法
を提供することにある。
[Summary of the Invention] The present invention (CI) was made in view of the above circumstances, and its purpose is to provide an information recording substrate that can easily form a highly uniform memory disk and a method for manufacturing the same. It is about providing.

このような目的を達成するために、本発明による情報記
録用基板は、低温形イオン交換処理を施しfcガラス基
板にjバ接凹凸を形成し、樹脂層を不要としたものであ
る。
In order to achieve such an object, the information recording substrate according to the present invention is a FC glass substrate subjected to low-temperature ion exchange treatment to form j-bar contact unevenness, thereby eliminating the need for a resin layer.

また、このような情報り己録用基板を得るために、本発
明による情報記録用基板の製造方法は、スパ′ツタエツ
チング法を用い“C凹凸の形成を行なうものである。
Further, in order to obtain such an information recording substrate, the method for manufacturing an information recording substrate according to the present invention involves forming "C unevenness" using a sputter etching method.

ここで、低温形イオン交換処理とtユ、ガラスの強化方
法の一種であり、ガラス看・転移点以下の温度、例えば
ソーダライムガラスの揚@380〜450℃の温度で、
ガラス中のアルカ・す1オン(本例ではNa+イオン)
をこれよりも太き〕2イオン半径のアルカリイオン(同
:工り1イ万ンなと)で交換することに”L !J ’
=ニガ9フ面に圧縮応力を導入する方法である。なお、
ガラス表面のNa+イオンはずベーこ八 イメノに交換
さ2°しているわけではなく、その置換率は90%程度
である。−また、このイオン交換処理で使用する溶融塩
は主として硝酸塩でめるが、硫酸塩を使用することもで
きる。これにより、ガラス基板は機械的に強化されると
とも((、表面のナトリウムイオン濃度が低下してエツ
チングの再IJI性か向上しかつ記録媒体の劣化が抑制
されるなとの効果がめる。
Here, low-temperature ion exchange treatment is a type of glass strengthening method, and is performed at a temperature below the glass transition point, for example, at a temperature of 380 to 450 °C for soda lime glass.
Alka ions in glass (Na+ ions in this example)
I decided to replace it with an alkali ion (thicker than this) with a radius of 2 ions (with a radius of 10,000 ions).
= This is a method of introducing compressive stress to the surface of the metal. In addition,
The Na+ ions on the glass surface are not replaced by 2 degrees, and the replacement rate is about 90%. -Furthermore, the molten salt used in this ion exchange treatment is mainly composed of nitrates, but sulfates can also be used. This not only mechanically strengthens the glass substrate, but also reduces the concentration of sodium ions on the surface, improving etching re-IJI properties and suppressing deterioration of the recording medium.

マタ、スパッタエツチングは、方向性−1−7チyグで
あるためにアンターカットが小さく、捷た再男性が良く
深さ方向のはらつきのt’rとんどないエツチング条件
上か行なえるっ以−1、大施例を用いて本発明の詳細な
説明する。
Since sputter etching has a directionality of -1-7, the undercut is small, and it is possible to perform it under etching conditions with good re-patterning due to unevenness in the depth direction. Hereinafter, the present invention will be explained in detail using a major example.

〔実施例」 第2図(a)〜(d)は、本発明の一実施例を示す工程
断面図でるる。
[Embodiment] FIGS. 2(a) to 2(d) are process sectional views showing an embodiment of the present invention.

ます、外径20Urr、+n、内径35 mm、板厚1
62mmのティスフ状のソーダライムカラス基板1につ
いて、380〜450℃の溶融硝酸カリウム中に数十発
表いし数十時間浸して低温形イオン交換処理を施し、化
学強化゛する。その後、シラザン処理を施ルてレジスト
との付着力を強めた上で\このガラス基板1の一生面上
に7オトレジストAz1300−27 (米国Hoec
hst社)3を約20000λ塗布しプリベークを行な
う(第2図(a))。
Masu, outer diameter 20Urr, +n, inner diameter 35mm, plate thickness 1
A 62 mm tissue-shaped soda lime glass substrate 1 is immersed in molten potassium nitrate at 380 to 450° C. for several tens of minutes to several tens of hours to undergo low-temperature ion exchange treatment and to chemically strengthen it. Thereafter, a silazane treatment was applied to strengthen the adhesion with the resist, and then a 7-photoresist Az1300-27 (US Hoec
About 20,000λ of Co., Ltd.) 3 was applied and prebaked (Fig. 2(a)).

次に、プレグルーブ用の信号をパターニングした円板上
の7オトマスクを用いて露光を行ない、さらにこれを現
像、乾燥、ポストベークしてレジストパターン4を形成
する(第2図(b)〕。
Next, exposure is performed using a 7-otomask on a disc patterned with pregroove signals, and this is further developed, dried, and post-baked to form a resist pattern 4 (FIG. 2(b)).

次いで、この1/シストパターン全マスクとし、平行平
板形プラズマエツチング装置を用い、Arガス圧力5 
x 10 Torr、高周波出力200W(0,44/
cm )のエツチング条件でスパッタエツチングを行な
った。記録ま一7’Cに再生に用いるレーザ光の波長を
λとすると、エツチング深さはおよそλ/4虜たはλ/
8とする必要がらり、本笑施例では1200〜1300
 Aとした。、前述したように、スパッタエツチングを
用いることによジアンダーカットが小さく、再現性が良
好で深さ方向のばらつきがほとんどない溝5が得られる
(第2図(C))。
Next, using this 1/cyst pattern as a whole mask, using a parallel plate plasma etching apparatus, Ar gas pressure was set at 5
x 10 Torr, high frequency output 200W (0,44/
Sputter etching was carried out under etching conditions of cm2). If the wavelength of the laser beam used for recording and reproduction is λ, the etching depth is approximately λ/4 or λ/
It is necessary to set it to 8, but in this example it is 1200 to 1300.
I gave it an A. As described above, by using sputter etching, grooves 5 with small undercuts, good reproducibility, and almost no variation in the depth direction can be obtained (FIG. 2(C)).

その後、アセトンなどの有機溶剤、熱濃硫酸等でレジス
トを剥離し、洗浄:乾燥を行なって情報記録用基板6が
作成される(第2図(d))。
Thereafter, the resist is peeled off using an organic solvent such as acetone, hot concentrated sulfuric acid, etc., followed by cleaning and drying to produce the information recording substrate 6 (FIG. 2(d)).

Cの基板6は、その後、その凹凸を形成し7j王面上に
各14の記憶用薄膜および保護層勿形成し、わるい17
rさらに、このよりにして形成した2枚のディスクを、
記録層が内側になるように封止ラーることVCよって耐
久性のめるメモリアイスフとなる。
After that, the substrate 6 of C was formed with unevenness, and 14 memory thin films and protective layers were formed on the king surface 7j.
rFurthermore, the two disks formed by this twisting are
By sealing the memory card so that the recording layer is on the inside, the memory card becomes durable.

なお、上記工程中フォトレジスト孕塗布する前に、化学
強化したガラス基板1eこシラザン処理を施したの11
丁、ガラスの主成分でめる5tO2が空気中の水分と反
J5Lでガラス表面Vζシラノール基を作りレジストと
の付着力を弱めることカ・ら、その対策として行なうも
ので、ブレヒートなどで代用することも可能である。
In addition, during the above process, before applying the photoresist, the chemically strengthened glass substrate 1e was subjected to silazane treatment.
5tO2, which is the main component of glass, creates Vζ silanol groups on the glass surface with moisture in the air and weakens the adhesion to the resist. It is also possible.

また、スパッタエツチングのエツチングガスとしては、
Arのみでなく、例えは Arと CF4等のフッ素系
の混合ガスケ用いてもよい。その場合1d: CF4の
分解によって生ずる活性種のために、ガラスの表面層が
化学エツチングF r)、る効果がめす、エツチング時
間が短くで済む利点かめる。
In addition, as an etching gas for sputter etching,
Not only Ar but also a mixed gas of Ar and fluorine such as CF4 may be used. In that case, 1d: the surface layer of the glass is chemically etched due to the active species generated by the decomposition of CF4, which has the advantage that the etching time can be shortened.

さらに、フォトレジストの露光方法として・円板状のフ
ォトマスクを使用したが、これは円板状に限定されず、
角形等でめってもよい。また、フォトマスク全使用せず
、レーザー光で直接レジスト全感光させてバター二二/
グすることもてきる。
Furthermore, although a disk-shaped photomask was used as an exposure method for photoresist, this is not limited to a disk-shaped photomask.
You can also use it as a square shape. In addition, without using a photomask, the entire resist was exposed directly to the laser beam, making it possible to create butter-22/
You can also search.

なお、ガラス基板に低温形イオン父換処理を施すことに
よシ複屈折が生じるが、屈折率が均一・で複屈折の方向
が同じになるため、問題とならない。
Note that birefringence occurs when the glass substrate is subjected to low-temperature ion father exchange treatment, but this does not pose a problem because the refractive index is uniform and the direction of birefringence is the same.

〔発明の効果〕〔Effect of the invention〕

以上説明したように、本発明によれは、低温形イオン交
換処理を施したガラス基板を用い、このガラス基板に厘
接系内濤碧の凹凸を形成するようtCシたことにより、
スタンパ−を作って樹脂を成形加工する必要がなくなる
ため、工程が簡略化できるとともに、樹脂に比較し“〔
強度の高いものが得ら゛れる。特に、低温形イオン交換
処理により化学強化したガラス基板ケ用いるため割れに
くく、かつガラス表面のナトリウムイオン濃度が極端に
低くなるため、エツゾングの再現性がよく均一性の高い
ものができるとともに、記碌媒体のナトリウムイオンに
よる劣化も防止できる。基板として、比較的安価なソー
ダライムガラスを使用することができるので、製造コス
トの低減に有効である。
As explained above, according to the present invention, a glass substrate subjected to low-temperature ion exchange treatment is used, and by performing TC to form smooth irregularities in the contact system on this glass substrate,
Since there is no need to make a stamper and mold the resin, the process can be simplified and compared to resin.
A product with high strength can be obtained. In particular, the use of glass substrates that have been chemically strengthened through low-temperature ion-exchange treatment makes them difficult to break, and the sodium ion concentration on the glass surface is extremely low, making it possible to achieve highly uniform etsonization with good reproducibility, as well as to improve recording performance. Deterioration of the medium due to sodium ions can also be prevented. Since soda lime glass, which is relatively inexpensive, can be used as the substrate, it is effective in reducing manufacturing costs.

また、凹凸の加工はスパッタエツチングを用いることに
より容易に所望の加工が行なえる。
In addition, the desired unevenness can be easily processed by using sputter etching.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は従来の情報記録用基板金納す断面図、第2図(
a)〜(d)は本発明の一実施例を示す1稈断面図であ
る。 1・・・tソーダライムカラス基根、3・・・・フ第1
・レジスト、4・・・・レジストパターン、5・・・・
然、6・・・・情報記録用基板。 竹許出願人 株式会社保谷硝子 代理人 山川政樹(ほか2名) 第1図 第2図
Figure 1 is a cross-sectional view of a conventional information recording substrate, and Figure 2 (
a) to (d) are cross-sectional views of one culm showing one embodiment of the present invention. 1...t soda lime crow base, 3...fu 1st
・Resist, 4...Resist pattern, 5...
Naturally, 6... information recording board. Bamboo permit applicant Hoya Glass Co., Ltd. Agent Masaki Yamakawa (and 2 others) Figure 1 Figure 2

Claims (2)

【特許請求の範囲】[Claims] (1)記録媒体全付着する側の主面に凹凸を設けたディ
スク状基板からなる1#報記録用基板において、上記デ
ィスク状基板は、低温形イオン交換処理しグこカラス基
板からなることを特徴とTる情報記録用基板。
(1) In a 1# information recording substrate consisting of a disk-shaped substrate with unevenness on the main surface on the side to which the entire recording medium is attached, the disk-shaped substrate is made of a glass substrate subjected to low-temperature ion exchange treatment. Information recording board with characteristics.
(2)デ(スフ状のガラス基板(Iご低温形イオン交換
処理金施す工程と、Cのガラス基板の主面tこレジスト
パターン蛍マスクとしスパッタエラチンf法”k用いて
ノヅr望の凹凸全形成する工程とを・含む情報記録用基
板の製造方法。
(2) The step of applying low-temperature ion exchange treatment to the glass substrate (I), and the process of applying a resist pattern to the main surface of the glass substrate (C) using a resist pattern as a fluorescent mask and using the sputtering method. A method for manufacturing an information recording substrate, including a step of completely forming unevenness.
JP59035962A 1984-02-29 1984-02-29 Substrate for information recording and its production Granted JPS60182030A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP59035962A JPS60182030A (en) 1984-02-29 1984-02-29 Substrate for information recording and its production

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59035962A JPS60182030A (en) 1984-02-29 1984-02-29 Substrate for information recording and its production

Publications (2)

Publication Number Publication Date
JPS60182030A true JPS60182030A (en) 1985-09-17
JPH0370866B2 JPH0370866B2 (en) 1991-11-11

Family

ID=12456582

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59035962A Granted JPS60182030A (en) 1984-02-29 1984-02-29 Substrate for information recording and its production

Country Status (1)

Country Link
JP (1) JPS60182030A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60195751A (en) * 1984-03-16 1985-10-04 Sharp Corp Manufacture of optical memory element

Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5477105A (en) * 1977-12-01 1979-06-20 Pioneer Electronic Corp Method of producing optical signal recording carrier
JPS54107705A (en) * 1978-02-10 1979-08-23 Pioneer Electronic Corp Method of fabricating information recording carrier
JPS55101144A (en) * 1979-01-25 1980-08-01 Pioneer Electronic Corp Production of signal recording disc
JPS5672332U (en) * 1979-11-07 1981-06-13
JPS5736446A (en) * 1980-08-11 1982-02-27 Discovision Ass
JPS5845997A (en) * 1981-09-08 1983-03-17 ゼロツクス・コ−ポレ−シヨン Manufacture of relief device
JPS59210547A (en) * 1983-05-13 1984-11-29 Sharp Corp Manufacture of optical memory element
JPS6055530A (en) * 1983-09-06 1985-03-30 Fuji Photo Film Co Ltd Information recording medium

Patent Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5477105A (en) * 1977-12-01 1979-06-20 Pioneer Electronic Corp Method of producing optical signal recording carrier
JPS54107705A (en) * 1978-02-10 1979-08-23 Pioneer Electronic Corp Method of fabricating information recording carrier
JPS55101144A (en) * 1979-01-25 1980-08-01 Pioneer Electronic Corp Production of signal recording disc
JPS5672332U (en) * 1979-11-07 1981-06-13
JPS5736446A (en) * 1980-08-11 1982-02-27 Discovision Ass
JPS5845997A (en) * 1981-09-08 1983-03-17 ゼロツクス・コ−ポレ−シヨン Manufacture of relief device
JPS59210547A (en) * 1983-05-13 1984-11-29 Sharp Corp Manufacture of optical memory element
JPS6055530A (en) * 1983-09-06 1985-03-30 Fuji Photo Film Co Ltd Information recording medium

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60195751A (en) * 1984-03-16 1985-10-04 Sharp Corp Manufacture of optical memory element

Also Published As

Publication number Publication date
JPH0370866B2 (en) 1991-11-11

Similar Documents

Publication Publication Date Title
JPS58501202A (en) High-density recording medium and method of manufacturing the same
JP3058062B2 (en) How to make a recording master for optical discs
JPS5842003A (en) Polarizing plate
JPS60182030A (en) Substrate for information recording and its production
JPS60226042A (en) Information glass substrate and its production
JPH0243380A (en) Metallic mold for forming optical disk substrate and production thereof
JPS593731A (en) Manufacture of information disk
JPH10241213A (en) Production of stamper for optical disk
KR100629831B1 (en) Method of forming mother for use in optical disc manufacture
JPS59180801A (en) Production of stamper disk
JPS60173737A (en) Manufacture of stamper for optical disk
JPS60226041A (en) Information glass substrate and its production
JPH0660441A (en) Production of stamper for optical disk
JP3480029B2 (en) Glass substrate for making optical disc masters
JPH02204023A (en) Stamper for optical disc and manufacture thereof
JPH06103617A (en) Stamper for optical disk and production of substrate
JPH05339774A (en) Production of stamper
JPS63112842A (en) Manufacture of stamper for duplicating optical disk substrate
JP2739841B2 (en) Manufacturing method of information recording medium
JPS61273760A (en) Manufacture of photomagnetic disk
JPH04229211A (en) Manufacture of stamper
JPH02123536A (en) Production of stamper for optical disk
JPH0329131A (en) Optical disk and production thereof
JP2517161B2 (en) Optical disc master and master stamper manufacturing method
JP2753388B2 (en) Manufacturing method of stamper

Legal Events

Date Code Title Description
LAPS Cancellation because of no payment of annual fees