JPS60181776A - Manufacture of display panel - Google Patents

Abstract

(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.

Description

Detailed Description of the Invention Technical Field of the Invention The present invention is a method of forming a conductive film on a transparent electrode through a thin film formed by exposing a part of the transparent electrode, and patterning the conductive film by etching. The present invention relates to an improvement in a method for manufacturing a display panel in which an upper electrode is formed by forming an upper electrode.

Prior Art and Problems Conventionally, when forming the upper electrode of this type of display panel, a transparent electrode (RRO film) 2 is formed on a glass substrate 1, as shown in FIG. forming and then K Si3N4 O
Insulating layer 3. A thin film such as a light emitting layer 4 of ZnS:Kn and an insulating layer 5 of Si3N4 is laminated, and then a conductive film 6 of At or the like is deposited thereon, and a resist pattern 7 is formed thereon. Using 7 as a mask, the conductive film 6 is etched to form an upper electrode (back electrode). The resist pattern 8 is formed by applying a resist film, exposing it to a predetermined pattern, and then developing it.

In this case, developing the resist and etching the conductive film were performed with part of the transparent electrode 2 exposed from the thin film. The disadvantage was that the parts that were not connected) turned black and even broke.

Further, when each electrode is immersed in an alkaline solution such as a resist developer or an electrode etching solution during this development and etching, a kind of battery is formed there and an electromotive force is generated between the two electrodes. Therefore, as shown in FIG. 2, if a pinhole 9 exists in the thin film 8 between the two electrodes and the resistance between the two electrodes is low, current will flow there as shown by the arrow line in the figure. Electrons are supplied from the upper electrode to the transparent front &2. For example, if the transparent electrode is indium oxide (In20B), I
A reduction reaction such as n20B + 6g:→21n+ 50''- occurs9, which causes the transparent electrode to turn black and further to cause disconnection.

Purpose of the Invention The present invention is intended to solve the above-mentioned drawbacks, and an object of the present invention is to provide a method for manufacturing a display panel that can prevent discoloration and disconnection from occurring in areas where a thin film of transparent electrodes is not laminated. There is.

Structure of the Invention In the present invention, a protective layer that is resistant to a developer for forming a resist pattern and an etching solution for forming an upper electrode is formed on a portion of a transparent electrode where a thin film is not laminated, prior to forming a resist pattern. The above object is achieved by patterning the conductive film and etching the conductive film to form the upper electrode.

DESCRIPTION OF THE PREFERRED EMBODIMENTS The present invention will now be described in detail with reference to FIG. In the drawings, members having the same configuration as the conventional one are given the same symbols as the conventional one.

In the present invention, in the part of the transparent electrode 2 where the thin film is not laminated,
A protective layer 11 that is resistant to a developer for forming a resist pattern and an etching solution for forming an upper electrode is formed prior to forming a resist pattern, and patterning of the resist and etching of the conductive film are performed. In this way, since development and etching are performed with the exposed portion of the transparent electrode 2 protected by the protective layer 11, discoloration and cross-section of the exposed portion of the transparent electrode can be reliably prevented during these steps. .

Note that FIG. 6 shows an example in which the protective layer 11 is formed using a resist film. This is simultaneously patterned into the shape shown in the figure for forming the resist pattern 7. In this method, the protective layer 11 is formed in the same process as the resist pattern 7, so there is no need for a special process, which is advantageous in terms of man-hours. It will be kept safe.

The protective layer can be formed not only by using the above-mentioned resist film but also by applying tape.

Although the above description has been made with reference to thin film electroluminescent panels, the present invention is also applicable to the manufacture of other display panels such as electrochromic display panels or liquid crystal displays.

Effects of the Invention As described above, according to the present invention, discoloration of the transparent electrode during the manufacturing process of the display panel can be prevented.

It is possible to prevent cross-sections, and it is possible to improve the manufacturing process and the panel performance.

[Brief explanation of drawings]

FIG. 1 is an explanatory diagram of the manufacturing procedure of a thin film electroluminescent panel by a conventional manufacturing method, FIG. 2 is an explanatory diagram of the same problem, and FIG. 6 is a storage layer showing an embodiment of the method of manufacturing a display panel according to the present invention. In the figure, 1 is a glass substrate, 2 is a transparent electrode, 6 and 5 are insulating layers, 4 is a light emitting layer,
6 is a conductive film, 7 is a resist pattern, 8 is a thin film, and 11 is a protective layer. Patent applicant Fujitsu Ltd. Representative Patent Attorney Gobe Tamamushi (1 other person)

Claims (1)

[Claims] A part of the core transparent electrode is exposed on the transparent electrode, a conductive film is formed through the laminated thin film, and the conductive film is etched using a resist pattern formed on the conductive film. In the method for manufacturing a display panel in which an electrode is formed, a protective layer is provided on a portion of the transparent electrode where the thin film is not formed, and is resistant to a developer for forming the resist pattern and an elatin solution for forming the upper electrode. 1. A method for manufacturing a display panel, which comprises forming a layer, and performing processing using a developer and an etching solution in this state.