JPS60177647A - 自動精密位置合せシステム - Google Patents

自動精密位置合せシステム

Info

Publication number
JPS60177647A
JPS60177647A JP59032576A JP3257684A JPS60177647A JP S60177647 A JPS60177647 A JP S60177647A JP 59032576 A JP59032576 A JP 59032576A JP 3257684 A JP3257684 A JP 3257684A JP S60177647 A JPS60177647 A JP S60177647A
Authority
JP
Japan
Prior art keywords
pattern
wafer
key pattern
semiconductor wafer
automatic precision
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP59032576A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0580149B2 (cg-RX-API-DMAC7.html
Inventor
Shinichi Tamura
進一 田村
Masanori Uga
宇賀 正徳
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Disco Corp
Original Assignee
Disco Abrasive Systems Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Disco Abrasive Systems Ltd filed Critical Disco Abrasive Systems Ltd
Priority to JP59032576A priority Critical patent/JPS60177647A/ja
Priority to GB08407592A priority patent/GB2139348B/en
Priority to KR1019840001548A priority patent/KR900002508B1/ko
Publication of JPS60177647A publication Critical patent/JPS60177647A/ja
Publication of JPH0580149B2 publication Critical patent/JPH0580149B2/ja
Granted legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7088Alignment mark detection, e.g. TTR, TTL, off-axis detection, array detector, video detection

Landscapes

  • Engineering & Computer Science (AREA)
  • Multimedia (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Dicing (AREA)
JP59032576A 1983-03-26 1984-02-24 自動精密位置合せシステム Granted JPS60177647A (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP59032576A JPS60177647A (ja) 1984-02-24 1984-02-24 自動精密位置合せシステム
GB08407592A GB2139348B (en) 1983-03-26 1984-03-23 Automatic aligment system
KR1019840001548A KR900002508B1 (ko) 1983-03-26 1984-03-26 자동 정렬 시스템

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59032576A JPS60177647A (ja) 1984-02-24 1984-02-24 自動精密位置合せシステム

Publications (2)

Publication Number Publication Date
JPS60177647A true JPS60177647A (ja) 1985-09-11
JPH0580149B2 JPH0580149B2 (cg-RX-API-DMAC7.html) 1993-11-08

Family

ID=12362708

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59032576A Granted JPS60177647A (ja) 1983-03-26 1984-02-24 自動精密位置合せシステム

Country Status (1)

Country Link
JP (1) JPS60177647A (cg-RX-API-DMAC7.html)

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57198629A (en) * 1981-05-30 1982-12-06 Toshiba Corp Dicing equipment

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57198629A (en) * 1981-05-30 1982-12-06 Toshiba Corp Dicing equipment

Also Published As

Publication number Publication date
JPH0580149B2 (cg-RX-API-DMAC7.html) 1993-11-08

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