JPS60168579A - Lifter mechanism - Google Patents

Lifter mechanism

Info

Publication number
JPS60168579A
JPS60168579A JP59023854A JP2385484A JPS60168579A JP S60168579 A JPS60168579 A JP S60168579A JP 59023854 A JP59023854 A JP 59023854A JP 2385484 A JP2385484 A JP 2385484A JP S60168579 A JPS60168579 A JP S60168579A
Authority
JP
Japan
Prior art keywords
lifter
glass substrate
main body
cleaning tank
cleaning
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP59023854A
Other languages
Japanese (ja)
Other versions
JPH0238275B2 (en
Inventor
義昭 峯岸
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
GOSEN SANGYO KK
Original Assignee
GOSEN SANGYO KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by GOSEN SANGYO KK filed Critical GOSEN SANGYO KK
Priority to JP59023854A priority Critical patent/JPS60168579A/en
Publication of JPS60168579A publication Critical patent/JPS60168579A/en
Publication of JPH0238275B2 publication Critical patent/JPH0238275B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Cleaning Or Drying Semiconductors (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Cleaning In General (AREA)
  • Cleaning By Liquid Or Steam (AREA)

Abstract

(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。
(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.

Description

【発明の詳細な説明】 本発明は塵埃その他の不純物の混入を極度に嫌う各種装
置に用いるリフター機構に関し、特にガラス基板洗浄装
置に用いるリフター機構に関する。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a lifter mechanism used in various apparatuses in which contamination with dust and other impurities is extremely disliked, and particularly to a lifter mechanism used in glass substrate cleaning apparatuses.

集積回路等の製造に使用されるフォ勢トフスク、レチク
ル、及びウェハー等の従来公知のガラス基板洗浄装置に
おいては、洗浄槽内のガラス基板を洗浄位置にまで昇降
させるリフター機構が、駆動部と機械的に連結されであ
る為、該部材同士の摺擦その他の機械的接触から発生す
る不純物が洗浄槽内に入り込むのを避ける為、両者間を
気密的にシールして構成している。
In conventionally known equipment for cleaning glass substrates used in the manufacture of integrated circuits, reticles, wafers, etc., a lifter mechanism that lifts and lowers glass substrates in a cleaning tank to a cleaning position is connected to a drive unit and a machine. Since the parts are connected to each other, the two parts are airtightly sealed to prevent impurities generated from rubbing or other mechanical contact between the parts from entering the cleaning tank.

又、かかる構成の前記従来公知の洗浄装置においては、
前記ガラス基板の昇降を行なうリフタ一本体をリフター
機構側より洗浄装置内に延在させる必要があり、この為
、前記リフター機構と洗浄槽間をシールするシール部は
、前記リフタ一本体が該シール部内を挿通可能にシール
する必要があり、コスト的にも又精度的にも極めて問題
があった。
Further, in the conventionally known cleaning device having such a configuration,
It is necessary to extend the lifter body that lifts and lowers the glass substrate into the cleaning apparatus from the lifter mechanism side. Therefore, the seal portion that seals between the lifter mechanism and the cleaning tank is It was necessary to seal the inside of the part so that it could be inserted, which was extremely problematic in terms of cost and accuracy.

更に前記構成の洗浄装置にあっては、前記シールを完全
に行なう事は困難であり、この為、ガラス基板の洗浄を
行なう為洗浄槽内に噴射滞留している純水がリフター機
構内に漏洩したり、又前記洗浄槽内に延在されたりフタ
一部材とシール部との摺擦により生じた不純物が洗浄槽
内に入り込み、該不純物が前記純水中に浮遊してガラス
基板に付着してしまう場合も多々あった。
Furthermore, in the cleaning device having the above configuration, it is difficult to completely seal the glass substrate, and therefore, the pure water sprayed and retained in the cleaning tank to clean the glass substrate may leak into the lifter mechanism. In addition, impurities that are extended into the cleaning tank or caused by rubbing between the lid member and the seal part enter the cleaning tank, and the impurities float in the pure water and adhere to the glass substrate. There were many cases where I ended up doing it.

而も前記ガラス基板にあっては、僅かに不純物が付着し
てもこれを使用する事が出来ず、この為、前記のような
不純物の付着の恐れのある従来公知の洗浄装置を使用す
る場合は、洗浄後の後工程において細密な検査を必要と
し、且つ該検査は一般に人間が行なう為、検査ミスが生
じ易く又検査工数にも多くの時間が費やされていた。
However, the glass substrate cannot be used even if a slight amount of impurity adheres to it, and for this reason, when using a conventionally known cleaning device that is likely to have the above-mentioned impurity attached. requires detailed inspection in the post-process after cleaning, and since the inspection is generally performed by humans, inspection errors are likely to occur and a large amount of time is consumed in inspection man-hours.

この為従来より不純物の発生の恐れのない洗浄装置の提
供が待ち望まれていた。
For this reason, it has long been desired to provide a cleaning device that is free from the possibility of generating impurities.

本発明はかかる従来技術の欠点に鑑み、主として前記洗
浄装置に使用するリフター機構において、その駆動部を
装置外に、又該駆動部の移動に追従して移動するりフタ
−機構本体を装置内に配設する事により、両者が完全に
隔離された状態で昇降作用を行なわしめる車の出来るリ
フター機構を提供する事を目的とする。
In view of the drawbacks of the prior art, the present invention mainly provides a lifter mechanism used in the cleaning device, in which the driving portion is moved outside the device, and the main body of the lid mechanism is moved inside the device in accordance with the movement of the driving portion. The object of the present invention is to provide a lifter mechanism for a car that can raise and lower the vehicle while the two parts are completely isolated.

この結果、前記リフター機構本体と洗浄槽間をシールす
る必要がない洗浄装置の提供が可能となり、水漏れの恐
れの除去、部品点数の削減、及び大幅なコストダウンが
可能になると共に、リフタ一本体とシール部材との摺擦
等の不純物発生の要因がなくなる為、前記洗浄装置内に
不純物等が入り込む恐れがなくなる。
As a result, it is possible to provide a cleaning device that does not require a seal between the lifter mechanism body and the cleaning tank, which eliminates the risk of water leakage, reduces the number of parts, and significantly reduces costs. Since there are no factors that cause impurities such as friction between the main body and the sealing member, there is no possibility that impurities will enter the cleaning device.

又、不純物の発生がほとんど皆無になる事は洗浄後の後
工程における細密な検査工程を省く事も可能となり、極
めて能率的なガラス基板の洗浄装置の提供が可能になる
In addition, since almost no impurities are generated, it is possible to omit a detailed inspection process in the post-cleaning process, making it possible to provide an extremely efficient glass substrate cleaning apparatus.

而して本発明の特徴とする所は、装置本体に開口される
昇降通路と、該通路内に配設されたリフタ一本体と、前
記昇降通路外に配設され、前記リフタ一本体を磁力によ
り前記通路内に中空保持する駆動部とを有し、該駆動部
を前記昇降通路に沿って昇降させる事により、前記リフ
タ一本体が追従して昇降するように構成した事にある。
The characteristics of the present invention are as follows: a lift passageway opened in the main body of the device; a lifter body disposed within the passageway; Accordingly, the lifter main body is configured to have a driving part held hollow in the passage, and to move the driving part up and down along the lifting passage, so that the lifter main body follows and goes up and down.

以下図面に基づいて本発明の詳細な説明する。The present invention will be described in detail below based on the drawings.

第1図乃至第2図は本発明の実施例に係るガラス基板洗
浄装置で、未処理のガラス基板1両面を1枚1枚連続的
にスクラブ洗浄を行なう洗浄槽Aと、該洗浄槽A内に戴
置されたガラス基板lを昇降させる為前記洗浄槽A下方
に配設されたリッター機構Bとにより構成されている。
1 and 2 show a glass substrate cleaning apparatus according to an embodiment of the present invention, including a cleaning tank A that continuously scrubs both surfaces of untreated glass substrates one by one, and an interior of the cleaning tank A. The cleaning tank A is configured with a litter mechanism B disposed below the cleaning tank A for raising and lowering the glass substrate l placed on the cleaning tank A.

洗浄槽Aは上面が開口され、下面に純水排出口2と通路
管取付03とを穿設すると共に、洗浄槽A内の前記取付
口3の上方に、カセット4を戴置するカセット取付台5
と、ガラス基板1上昇位置を規制するガイドローラ6と
、ガラス基板1両面をスクラブ洗浄するブラシ体7と、
ガラス基板lに純水をシャワーする純水噴射機構8とを
夫々配設する。
The cleaning tank A has an open upper surface, and has a pure water outlet 2 and a passage pipe attachment 03 bored in the lower surface, and a cassette mounting base on which the cassette 4 is placed above the installation opening 3 in the cleaning tank A. 5
, a guide roller 6 that regulates the ascending position of the glass substrate 1, and a brush body 7 that scrubs both sides of the glass substrate 1.
A pure water injection mechanism 8 for showering pure water onto the glass substrate l is provided, respectively.

カセット4は両側側壁面に配設された図示しない保持部
材により複数のガラス基板1が横列に且つ垂直方向に保
持可能に構成すると共に、上下両端が開口され、後記す
るリフタ一本体20の上昇により前記ガラス基板1が上
方に押出可能に構成する。
The cassette 4 is configured so that a plurality of glass substrates 1 can be held horizontally and vertically by holding members (not shown) disposed on both side wall surfaces, and both upper and lower ends are opened, and when the lifter main body 20 (described later) is lifted, the cassette 4 is opened. The glass substrate 1 is configured to be extrudable upward.

前記カセット4を戴置固定するカセット取付台5は、前
記ガラス基板1の昇降毎に水平方向に移動し、常に未処
理のガラス基板1がリフタ一本体20の垂直延長線上に
位置するよう構成する。又該カセット取付台5はリフタ
一本体20の垂直延長線上が開口され、該リフタ一本体
20が挿通可能に構成されている。
The cassette mounting base 5 for mounting and fixing the cassette 4 is configured to move in the horizontal direction each time the glass substrate 1 is raised and lowered, so that the unprocessed glass substrate 1 is always located on the vertical extension line of the lifter main body 20. . Further, the cassette mounting base 5 is opened on a vertical extension line of the lifter main body 20, so that the lifter main body 20 can be inserted therethrough.

ガイドローラ6はリフタ一本体20の垂直延長線上に配
設され、前記リフタ一本体20の上昇によりカセット4
より離脱したガラス基板lが位置規l■されながらスプ
レーリンス位置まで上昇するよう構成されている。
The guide roller 6 is disposed on a vertical extension line of the lifter main body 20, and when the lifter main body 20 rises, the cassette 4
The structure is such that the glass substrate 1 that has come off further is raised to the spray rinse position while being positioned.

ガイドローラ6のほぼ中央部には、該ガイドローラ6左
右両側よりブラシ面7aを対向させて各一対のブラシ体
7が配設されており、該ブラシ体7の回転によりガラス
基板1両面がスクラブ洗浄される。
A pair of brush bodies 7 are disposed approximately at the center of the guide roller 6 on both the left and right sides of the guide roller 6, with brush surfaces 7a facing each other, and the rotation of the brush bodies 7 scrubs both sides of the glass substrate 1. Washed.

ガイドローラ6斜め上方には純水噴射機構8が、噴出口
8aをガイドローラ6側に向けて配設されており、カセ
ット4に収納されているガラス基板lにシャワーし前洗
浄を行なうと共に、ブラシ体7で洗浄後のガラス基板!
にスプレーリンスを行なう如く構成する。
A pure water spraying mechanism 8 is disposed diagonally above the guide roller 6, with a spout 8a facing the guide roller 6, and performs pre-cleaning by showering the glass substrate l housed in the cassette 4. Glass substrate after cleaning with brush body 7!
The structure is such that spray rinsing is performed after

又、前記洗浄槽A底部の純水排出口2には、pvCパイ
プで形成された純水排出管9が取り付けられており、該
排出管8は前記排出口2より下方に垂下され、適宜長さ
位置でL字状に折曲し、該水平管路9aの途中にドレン
バルブ10を、又水平管路9aの終端部には図示しない
開閉(流量調整)弁が取り付けられている。
Further, a pure water discharge pipe 9 formed of a PVC pipe is attached to the pure water discharge port 2 at the bottom of the cleaning tank A, and the discharge pipe 8 is suspended downward from the discharge port 2 and has an appropriate length. A drain valve 10 is installed in the middle of the horizontal conduit 9a, and an on-off (flow rate adjustment) valve (not shown) is attached to the terminal end of the horizontal conduit 9a.

そして前記洗浄槽A底部に穿設された取付口3と前記ド
レンバルブlOの出口側の水平管路9aを結ぶ垂直線上
には昇降通路管11が連結されている。
An elevating passage pipe 11 is connected on a vertical line connecting the attachment port 3 bored at the bottom of the cleaning tank A and the horizontal pipe line 9a on the outlet side of the drain valve IO.

該昇降通路管11は円筒状の、例えばステンレスパイプ
やPvCパイプ等の非磁性パイプで形成すると共に、そ
の長さが、少なく共前記リフタ一本体20の昇降により
ガラス基板1がスプレーリンス位置まで達する程度の長
さに形成する。 。
The lifting passage pipe 11 is formed of a cylindrical non-magnetic pipe such as a stainless steel pipe or a PvC pipe, and its length is small enough to allow the glass substrate 1 to reach the spray rinse position by lifting and lowering the lifter main body 20. Form to a certain length. .

そして前記通路管ll内にリフタ一本体20を、又該通
路管11外には該リフタ一本体20の駆動部30を夫々
配設する。
The lifter main body 20 is disposed inside the passage pipe 11, and the drive section 30 of the lifter main body 20 is disposed outside the passage pipe 11.

リフタ一本体20は、前記通路管11内径より僅かに小
に形成し、該通路管11内で遊嵌可能に構成された円柱
状の内部マグネット21と、該内部マグネット21上面
より垂直方向に延伸された2本の円棒状のリフター棒2
2とよりなる。
The lifter main body 20 includes a cylindrical internal magnet 21 formed to be slightly smaller than the inner diameter of the passage pipe 11 and configured to fit loosely within the passage pipe 11, and a cylindrical internal magnet 21 extending vertically from the upper surface of the internal magnet 21. Two circular lifter rods 2
2 and more.

そして前記内部マグネット21は永久磁石体で形成され
ており、又前記リフター棒22は、前記先端部を洗浄槽
A内にまで延在させ、該リフター棒22の昇降により前
記カセット4内に収納されたガラス基板1がスプレーリ
ンス位置まで(図上想像線で示す位置)まで上昇し且つ
元のカセット4内に復帰可能に構成されている。
The internal magnet 21 is made of a permanent magnet, and the tip of the lifter rod 22 extends into the cleaning tank A, and is housed in the cassette 4 by raising and lowering the lifter rod 22. The glass substrate 1 is configured to be able to rise to the spray rinse position (the position shown by the imaginary line in the figure) and return to the original cassette 4.

又前記通路管11の下側内壁面の水平管路9a近傍にリ
ング状のストッパ一部材25が配設され、リング状のス
トッパ一部材25により前記リフタ一本体20の落下防
止と適切位置の位置決めを図る。一方前記通路管11上
方の洗浄槽A底部上面には、前記通路管11内に洗浄槽
A内の純水が流下可能な空隙部23aを有するガイド板
23が配設されており、該ガイド板23は前記リフタ一
本体20が挿通可能にガイド孔23bを穿設し、前記リ
フター棒22を前記ガイド孔23bに挿通させる事によ
り前記リフター棒22が横振れが生じる事なく通路管1
1内を昇降させる事が出来るように構成する。
Further, a ring-shaped stopper member 25 is disposed near the horizontal pipe line 9a on the lower inner wall surface of the passage pipe 11, and the ring-shaped stopper member 25 prevents the lifter body 20 from falling and positions it at an appropriate position. We aim to On the other hand, on the upper surface of the bottom of the cleaning tank A above the passage pipe 11, a guide plate 23 having a gap 23a through which pure water in the cleaning tank A can flow down is disposed in the passage pipe 11. 23 has a guide hole 23b drilled through which the lifter main body 20 can be inserted, and by inserting the lifter rod 22 into the guide hole 23b, the lifter rod 22 can move through the passage pipe 1 without causing lateral vibration.
It is configured so that the inside of the room can be raised and lowered.

一方、前記リフター機構駆動部30は、前記通路管11
外径より僅かに大なる内径を有し且つ該通路管11の周
囲に環設された円筒状の外部マグネ−/’)31と、前
記通路管11と平行に配設されたラックレール32と噛
合するリニアヘッドモータ33とにより構成される。
On the other hand, the lifter mechanism driving section 30
A cylindrical external magnet (/') 31 having an inner diameter slightly larger than the outer diameter and arranged around the passage pipe 11; and a rack rail 32 disposed parallel to the passage pipe 11. It is composed of a linear head motor 33 that meshes with the linear head motor 33.

外部マグネット31は前記内部マグネ、、)21と逆極
性の永久磁石体又は電磁石体で形成し、固定板38を介
して前記リニアへ1.ドモータ33に固定されている。
The external magnet 31 is formed of a permanent magnet or an electromagnet with a polarity opposite to that of the internal magnet 21, and is connected to the linear 1. It is fixed to the motor 33.

ラックレール32は、通路管11上下両端に固定された
取付板34.35を介、して、該通路管11と平行側こ
且つ該通路管11のほぼ全長に亙って配設されてl、)
る。
The rack rail 32 is arranged parallel to the passage pipe 11 and over almost the entire length of the passage pipe 11 via mounting plates 34 and 35 fixed to both the upper and lower ends of the passage pipe 11. ,)
Ru.

又前記ラックレール32側方の再取付板34.35間に
配設された垂直軸36には、リニアへラドモータ33の
昇降距離を調整する検知体37が上下動可能側こ取り付
けられており、前記リニアへラドモータ33側の固定板
38に取り付けられた近接センサー38との対応におい
て、前記リニアへラドモータ33の往復動距離を調整す
る事が出来る。
Further, a vertical shaft 36 disposed between the remounting plates 34 and 35 on the sides of the rack rail 32 has a detection body 37 movable up and down attached thereto, which adjusts the vertical distance of the linear rad motor 33. In correspondence with the proximity sensor 38 attached to the fixed plate 38 on the side of the linear torad motor 33, the reciprocating distance of the linear torad motor 33 can be adjusted.

リニアへラドモータ33は、前記ラックレール32と噛
合するリニアヘッド3.3a部と駆動モータ33bより
なり、前記近接センサー38よりの信号により駆動モー
タ33bを正回転又は逆回転せしめ、ラックレール32
上で往復動可能に構成する。
The linear gear motor 33 includes a linear head 3.3a that meshes with the rack rail 32 and a drive motor 33b, and rotates the drive motor 33b in the forward or reverse direction in response to a signal from the proximity sensor 38.
It is configured to be able to reciprocate on the top.

この結果、前記昇降通路管ll内に配設された内部マグ
ネット21は、前記外部マグネット31の磁力により通
路管11内壁面に接触する事なく中空状態に保持され、
且つリニアヘッドモータ33の昇降により該リニアへラ
ドモータ33に固定されてl、)る前記外部マグネット
31が昇降し、そして該外部マグネッ)31の昇降に追
従して前記内部マグネット21が昇降される事となる。
As a result, the internal magnet 21 disposed inside the lifting passage pipe ll is held in a hollow state without contacting the inner wall surface of the passage pipe 11 by the magnetic force of the external magnet 31,
In addition, as the linear head motor 33 moves up and down, the external magnet 31 fixed to the linear head motor 33 moves up and down, and the internal magnet 21 moves up and down following the up and down movement of the external magnet 31. becomes.

次にかかる実施例の作用を説明する。Next, the operation of this embodiment will be explained.

洗浄槽内Aにおいて、未処理のガラス基板1を収納した
カセット4をカセット取付台5に戴置固定すると、純水
噴射機構8よりガラス基板1に常時噴水シャワーされ、
前洗浄が行なわれる。
In the cleaning tank A, when the cassette 4 containing the untreated glass substrate 1 is placed and fixed on the cassette mount 5, the pure water injection mechanism 8 constantly showers the glass substrate 1 with water,
Pre-cleaning is performed.

前洗浄後、前記ニアヘッドモータ33を正回転させる事
により外部マグネット31がラックレール32に沿って
上昇し、該外部マグネット31により磁気的に保持され
た前記フタ一本体20の内部マグネッ)21が上昇し、
この結果、ガイド板のガイド孔により位置保持されたリ
フター棒22が、カセット4内に収納されたガラス基板
1を上方に押し出し、ガイドローラ6に沿って上方に押
し上げる。
After pre-cleaning, by rotating the near head motor 33 in the forward direction, the external magnet 31 rises along the rack rail 32, and the internal magnet 21 of the lid main body 20, which is magnetically held by the external magnet 31, rise,
As a result, the lifter rod 22 held in position by the guide hole of the guide plate pushes the glass substrate 1 housed in the cassette 4 upward, and pushes it upward along the guide roller 6.

そして前記ガラス基板1は、回転しているブラシ体7を
通過しながら前記ガラス基板1のスクラブ洗浄を行なっ
た後、更に上昇し、純水噴出口8aより噴出された純水
により、スプレーリンスが行なわれる。
After scrubbing the glass substrate 1 while passing through the rotating brush body 7, the glass substrate 1 rises further and is spray rinsed with pure water spouted from the pure water spout 8a. It is done.

スプレーリンス終了後、前記リニアへラドモータ33は
近接センサー38の信号により逆回転をし、外部マグネ
ット31がラックレール32に沿って下降し、該外部マ
グネット31により磁気的に保持された内部マグネット
21及び該内部マグネ−2ト21に連結されたりフター
棒22が、リフター棒22上に戴置されたガラス基板1
をカセット4内に収納するまで下降する。
After spray rinsing is completed, the linear gear motor 33 reversely rotates according to the signal from the proximity sensor 38, and the external magnet 31 moves down along the rack rail 32, and the internal magnet 21 and the internal magnet 21, which are magnetically held by the external magnet 31, The glass substrate 1 is connected to the internal magnet 21 and has a lid rod 22 placed on the lifter rod 22.
is lowered until it is stored in the cassette 4.

次にカセット取付台5は、次位の未処理のガラス基板1
かりフタ一本体20の垂直延長線に達するまで移動し、
前記と同様な方法でガラス基板1の洗浄を行なう。
Next, the cassette mounting base 5 is attached to the next untreated glass substrate 1.
Move until it reaches the vertical extension line of the lid body 20,
Glass substrate 1 is cleaned in the same manner as described above.

以下これを繰り返してカセット4内に収納された全ての
ガラス基板1の洗浄が終了した後、前記カセット取付台
5をセット位置まで移動させ、カセット4交換を行なう
After this is repeated and all the glass substrates 1 housed in the cassette 4 have been cleaned, the cassette mounting base 5 is moved to the set position and the cassette 4 is replaced.

一方前記純水噴出口8aより噴射され、洗浄槽A底部に
滞留している純水は、ガイド板23空隙部23aより昇
降通路管11とリフタ一本体20の隙間を通って水平管
路9aから外部に排出される。この結果、例え前記昇降
機構のりフタ一本体20の昇降により不純物が発生した
としても前記純水と共に外部に排出され、洗浄槽A内に
不純物が滞留又は逆流する恐れは全く生じない。
On the other hand, the pure water that is injected from the pure water spout 8a and stagnant at the bottom of the cleaning tank A passes through the gap 23a of the guide plate 23 between the lifting passage pipe 11 and the lifter main body 20, and then flows from the horizontal pipe 9a. It is discharged to the outside. As a result, even if impurities are generated due to the lifting and lowering of the lifting mechanism and the lid main body 20, they are discharged to the outside together with the pure water, and there is no possibility that the impurities will stay in the cleaning tank A or flow back.

かかる実施例の記載より明らかな如く、本発明に係る昇
降機構によれば、リフタ一本体が装置本体(洗浄槽)と
連通ずる昇降通路内に配設され、外部と完全に隔離され
ている為、洗浄を行なう為の純水が外部に漏洩する事が
全くなく、又、前記リフタ一本体が配設された昇降通路
と装置本体(洗浄槽)間は連通状態にある為、両者を気
密的にシールする必要がなく、シール部材等が不必要に
なり、構造の単純化が図れる。。
As is clear from the description of the embodiments, according to the elevating mechanism according to the present invention, the lifter main body is disposed in the elevating passage communicating with the device main body (cleaning tank) and is completely isolated from the outside. , Pure water used for cleaning never leaks outside, and since the lift passage where the lifter body is installed and the equipment body (cleaning tank) are in communication, both can be kept airtight. There is no need for sealing, and sealing members and the like are no longer necessary, and the structure can be simplified. .

又、リフタ一本体の内部マグネットの保持は、昇降通路
内壁面に接触する事なく、駆動部の外部マグネットの磁
力と装置本体(洗浄槽)底部に配設したガイド板のガイ
ド孔のみである為、ゴミ等の不純物の発生がほとんど皆
無であると共に、例え不純物が発生しても装置本体(洗
浄槽)と昇降通路間は連通状態にある為、装置本体(洗
浄槽)に滞留した純水を流下させるように構成する事に
より前記不純物を完全に排出させる事が出来る。
In addition, the internal magnet of the lifter main body is held by only the magnetic force of the external magnet of the drive part and the guide hole of the guide plate provided at the bottom of the equipment main body (cleaning tank), without contacting the inner wall surface of the lifting passage. , there is almost no generation of impurities such as dust, and even if impurities occur, there is communication between the equipment body (cleaning tank) and the lifting passage, so the pure water stagnant in the equipment body (cleaning tank) can be removed. By configuring it to flow down, the impurities can be completely discharged.

等の種々の著効を有す。It has various effects such as

【図面の簡単な説明】[Brief explanation of drawings]

第1図乃至第2図は本発明の実施例に係るガラス基板洗
浄装置で、第1図は正面図、第2図は側面図である。
1 and 2 show a glass substrate cleaning apparatus according to an embodiment of the present invention, with FIG. 1 being a front view and FIG. 2 being a side view.

Claims (1)

【特許請求の範囲】[Claims] 装置本体に開口される昇降通路と、該通路内に配設され
たりフタ一本体と、前記昇降通路外に配設され、前記リ
フタ一本体を磁力により前記通路内に中空保持する駆動
部とを有し、該駆動部を前記昇降通路に沿って昇降させ
る事により、前記リフタ一本体が追従して昇降するよう
に構成した事を特徴とするりフタ−機構。
A lifting passage opened in the device main body, a lid body disposed within the passage, and a drive unit disposed outside the lifting passage and holding the lifter body hollow in the passage by magnetic force. A lifter mechanism, characterized in that the lifter body is moved up and down by moving the drive section up and down along the lifting path.
JP59023854A 1984-02-10 1984-02-10 Lifter mechanism Granted JPS60168579A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP59023854A JPS60168579A (en) 1984-02-10 1984-02-10 Lifter mechanism

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59023854A JPS60168579A (en) 1984-02-10 1984-02-10 Lifter mechanism

Publications (2)

Publication Number Publication Date
JPS60168579A true JPS60168579A (en) 1985-09-02
JPH0238275B2 JPH0238275B2 (en) 1990-08-29

Family

ID=12122008

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59023854A Granted JPS60168579A (en) 1984-02-10 1984-02-10 Lifter mechanism

Country Status (1)

Country Link
JP (1) JPS60168579A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6268581A (en) * 1985-09-20 1987-03-28 松下電器産業株式会社 One tank type water washing tank
KR101274461B1 (en) * 2010-07-19 2013-06-14 노우철 an elevating device for panel the vacuum chamber

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5649118A (en) * 1979-09-28 1981-05-02 Toyo Giken Kogyo Kk Method and apparatus for transferring container for moving food and drinks
JPS57199794A (en) * 1981-06-01 1982-12-07 Festo Maschf Stoll G Pressure medium operating servo driving device for device for work or carrying proper to lifting of load

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5649118A (en) * 1979-09-28 1981-05-02 Toyo Giken Kogyo Kk Method and apparatus for transferring container for moving food and drinks
JPS57199794A (en) * 1981-06-01 1982-12-07 Festo Maschf Stoll G Pressure medium operating servo driving device for device for work or carrying proper to lifting of load

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6268581A (en) * 1985-09-20 1987-03-28 松下電器産業株式会社 One tank type water washing tank
KR101274461B1 (en) * 2010-07-19 2013-06-14 노우철 an elevating device for panel the vacuum chamber

Also Published As

Publication number Publication date
JPH0238275B2 (en) 1990-08-29

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